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6514658 |
Photosensitive polymer composition, method for forming relief patterns, and electronic parts
A positive-type, heat-resistant photosensitive polymer composition comprising (a) a polyimide precursor or a polyimide which is soluble in an aqueous alkaline solution, (b) a compound capable of...
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6514676 |
Method for forming micropattern of resist
A method of forming a minute resist pattern wherein a positive-working photoresist composition containing 3 to 15 parts by weight of a quinone diazide group-containing photosensitizer relative to...
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6514656 |
Positive type image forming material
The present invention relates to a positive type image forming material comprising A: an alkali-aqueous-solution-soluble polymer compound having a phenolic hydroxyl group, B: a light and heat...
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6512087 |
Fractionation of resins using a static mixer and a liquid-liquid centrifuge
Disclosed is a method for producing low molecular weight oligomers of a film forming resin, which involves: a) providing a solution of the film forming resin in a first solvent system comprising a...
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6503682 |
Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition
A positive photoresist composition having improved sensitivity and resolution, a method of making the composition, and a method for forming a pattern during semiconductor processing using the...
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6475693 |
Positively photosensitive resin composition
A positive-working radiation-sensitive resin composition showing a good throughput upon production of semiconductors or the like and less process dependence of dimensional accuracy as well as...
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6475694 |
Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group
A positive photoresist composition includes (A) an alkali-soluble resin, in which part of phenolic hydroxyl groups is protected by an acid-decomposable group; (B) a quinonediazide ester; and (C) a...
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6461785 |
Composition for positive photoresist
A photoresist composition is provided. The photoresist composition includes a polymer resin for forming a photoresist layer, a photosensitive chemical for changing solubility of the photoresist...
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6451496 |
Heat-curable photosensitive compositions
From a heat-curable photosensitive composition comprising a cresol and/or xylenol novolac resin which has been partially 1,2-naphthoquinonediazido-4- or 5-sulfonate esterified and having a weight...
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6451497 |
Positive photosensitive composition
The present invention relates to a positive photosensitive composition, and in particular to a material for plate printing for heat mode printing. The positive photosensitive composition of the...
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6447975 |
Composition for positive type photoresist
A photoresist composition including a polymer resin for forming a photoresist layer, a photosensitive chemical that changes the solubility of the photoresist layer when exposed to some form of...
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6440632 |
Photosensitive resin composition and process for producing the same
A photosensitive resin composition comprises a base resin (e.g., novolak resins, polyvinylphenol-series polymers), a first photoactive ingredient (e.g., diazobenzoquinone derivatives,...
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6440646 |
Positive resist composition suitable for lift-off technique and pattern forming method
A positive resist composition contains (A) a novolak resin having a weight average molecular weight calculated as polystyrene of 2,000-20,000 wherein 2.5-27 mol % of the hydrogen atom of a hydroxyl...
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6436601 |
Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements
An infrared imaging composition comprises a mixture of at least two novolak resins esterified with from about 0.1 to 50 mole % of a 2-diazo-1-naphthol-4 or 5-sulfonic acid or derivative thereof,...
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6423467 |
Photosensitive resin composition
A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula —L—P (wherein L represents a divalent...
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6423463 |
Photosensitive resin composition, photosensitive resin film, and method of forming bumps using same
A positive-tone photosensitive resin composition for forming a thick film which is suitably used for photofabrication such as manufacture of circuit boards, a photosensitive resin film, and a...
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6420464 |
Polyhydric phenol compounds, epoxy resins, epoxy resin compositions and cured products thereof
Resin compositions having a low viscosity, a low hygroscopicity, high adhesive properties and a high heat resistance as well as being light in weight and excellent in mechanical properties are...
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6417317 |
Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin
A novolak resin precursor is composed of bonded phenolic moieties, one of the hydrogen atoms in the o- or p-positions relative to the hydroxy group of each phenolic moiety is substituted with an...
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6406827 |
Positive photoresist composition and process for forming resist pattern
A positive photoresist composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of, e.g., bis[ 2,5 -dimethyl- 3 -( 2 -hydroxy- 5 -methylbenzyl)- 4 -hydroxyphenyl]methane and/or ...
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6399267 |
Radiation sensitive resin composition and use of the same in an interlaminar insulating film
A radiation sensitive resin composition which can be processed and molded at low temperatures and has resolution, solvent resistance, adhesion to a substrate and storage stability required as an...
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6395447 |
Resist material and fabrication method thereof
A resist material having a resist and particles mixed into the resist, a major component of the particles being a cluster of carbon atoms, is provided. A method for fabricating a resist material is...
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6391514 |
Mixed solvent system for positive photoresists
A photosensitive positive working composition suitable for use as a photoresist, which comprises an admixture of at least one film forming resin; at least one photosensitizer; and a photoresist...
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6383709 |
Positive resist composition comprising N-(n-octylsulfonyloxy) succinimide
A positive resist composition which gives improved profile without lowering other properties such as sensitivity and resolution, and comprises an alkali-soluble novolak resin, a quinone diazide...
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6376151 |
Positive resist composition
A positive resist composition comprising a hydroxypolyamide represented by the following general formula (I) and a photoactive component: (wherein R 1 and R 3 may be the same or different and...
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6376150 |
IR- and UV-radiation-sensitive composition and lithographic plate
An IR- and UV-radiation-sensitive composition comprising a diazo resin, a diazo ester, at least one novolac resin and an IR-ray absorber. A lithographic plate comprising a support coated with the...
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6372403 |
Photosensitive resin composition
A photosensitive resin composition comprising (a) a photosensitizer having in its structure 1,2-diazidonaphthoquinone structure, and a methylene-bridged structure composed of two or more...
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6340546 |
Positive photosensitive resin composition, method of forming relief pattern, and electronic part
Positive photosensitive resin compositions, which comprise (A) a polyamidate having repetitive units of general formula (I) wherein R 1 is a tetravalent organic group, R 2 is a divalent...
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6338930 |
Positive photoresist layer and a method for using the same
A method for preparing a positive photoresist layer is provided. In this method, a photoresist composition is drop-wise applied on an insulator layer or a conductive metal layer formed on a...
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6306990 |
Film-forming polymers
Film-forming, functionalized polymers having 1,2-dicarboxylic acid monoester groups have at least two polymer units, one of which is acid-labile and hydrolysis-stable and the other is thermally...
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6296982 |
Imaging articles
An imagable composition, for example a coating on a lithographic printing plate, comprises a carboxylic acid derivative of a cellulosic polymer and a diazide moiety, and may be imaged in various...
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6296992 |
Positive photoresist composition and process for forming contact hole
A positive photoresist composition for forming a contact hole which comprises (A) an alkali-soluble resin; (B) a naphthoquinonediazide group-containing compound; and (C) a solvent, wherein the...
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6270939 |
Radiation-sensitive resin composition
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This...
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6265129 |
Positive photosensitive compositions for application of the lift-off technique and a method of forming patterns using the compositions
Improved positive photosensitive composition for application of the lift-off technique comprises (A) an alkali-soluble resin and (B) a mixture of two photosensitive agents in admixture with the...
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6242151 |
Polymers, resist compositions and patterning method
The invention provides a novel polymer in the form of a novolac resin in which some of the hydrogen atoms of the hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups and...
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6232031 |
Positive-working, infrared-sensitive lithographic printing plate and method of imaging
A positive-working, infrared imageable coating and a lithographic printing plate or other element with the coating are described. The coating is a phenolic resin containing an o-diazonaphthoquinone...
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RE37179 |
Radiation sensitive resin composition
A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid...
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6228552 |
Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material
A photosensitive material, which comprises, an alkali-soluble resin moiety having an alicyclic skeleton, a polycyclic condensation skeleton, or both alicyclic and polycyclic condensation skeletons,...
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6218083 |
Pattern-forming methods
A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing...
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6218069 |
Photosensitive resin composition and making process
A photosensitive resin composition contains a photosensitive resin comprising recurring units of formula (1) and having a Mw of 1,300-11,000 and 20-5,000 ppm of a tertiary amine compound of formula...
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6214516 |
Photosensitive resin compositions
A positive photosensitive resin composition comprising (a) a silane diol such as diarylsilane diol or dialkylsilane diol, (b) one or more polybenzoxazole precursors having the structure: ##STR1##...
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6197473 |
Photosensitive composition and a pattern forming process using the same
The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or...
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6190825 |
Polymers containing N-substituted maleimide units and their use in radiation-sensitive mixtures
The invention relates to polymers containing N-substituted maleimide units, to a positive- or negative-working radiation-sensitive mixture comprising a) a polymeric binder which is insoluble in...
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6187500 |
Positive photoresist compositions and multilayer resist materials using same
In a positive photoresist composition including (A) an alkali-soluble novolak resin and (B) a naphthoquinonediazide ester, the alkali-soluble novolak resin is obtained synthetically by condensation...
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6177225 |
Photosensitive resin compositions
A positive photosensitive resin composition. The composition comprising: (a) a capped polybenzoxazole precursor polymer having the structure; ##STR1## wherein Ar 1 is a tetravalent aromatic group,...
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6171750 |
Radiation-sensitive resin composition
A radiation-sensitive resin composition including (A) an alkali-soluble novolak resin obtained by condensing a particular combination of a first phenol having formula: ##STR1## wherein R 1 and R 2...
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6156474 |
Positive type photoresist composition
To provide a positive type photoresist composition which is capable of forming a resist pattern having an excellent adhesion to a substrate, a positive type photoresist composition comprising a...
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6140026 |
Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures
A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formula (II): ##STR1## wherein the...
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6127087 |
Positive photoresist compositions and multilayer resist materials using same
A positive photoresist composition comprises (A) an alkali-soluble resin, and (B) at least one quinonediazide group-containing compound in which part or all of the hydroxyl groups of a compound...
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6120969 |
Polyphenol compound, quinonediazide ester and positive photoresist composition
Disclosed is, for example, bis(2,5-dimethyl-3-(2-hydroxy-5-ethylbenzyl)-4-hydroxyphenyl
)methane and quinonediazide ester thereof. These are used for positive photoresist compositions. According to...
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6117610 |
Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
An infrared imaging composition contains two essential components, a non-basic infrared radiation absorbing material (such as carbon black), and a phenolic resin that is either mixed or reacted...
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