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6927274 |
Resin compositions, processes for preparing the resin compositions and processes for forming resin films
Polyimide precursors contained in resin compositions of the present invention have a polymer structure unit represented by formula (1) below:
wherein chemical structure A 2 includes an...
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6913865 |
Surface modified encapsulated inorganic resist
The present invention describes encapsulated inorganic resists which are compatible with conventional resist processing and development. The encapsulated inorganic materials increase the plasma...
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6911293 |
Photoresist compositions comprising acetals and ketals as solvents
Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive...
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6908717 |
Positive photosensitive resin composition, process for its preparation, and semiconductor devices
The present invention provides a positve photosensitive resin composition of high sensitivity which can form a pattern of high resolution and high residual film ration and which can give a cured...
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6905809 |
Photoresist compositions
The present invention relates to a composition and a process for preparing a composition that comprises: 1) a film-forming novolak resin wherein the hydrogen atom of a hydroxyl group in the novolak...
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6893791 |
Photoresist composition and method of forming pattern using the same
Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by...
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6875554 |
Positive photosensitive polyimide resin composition
A positive photosensitive polyimide resin composition comprising:
(a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that...
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6869742 |
Positive photoresist composition
A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl...
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6852465 |
Photoresist composition for imaging thick films
The present invention relates to a light-sensitive photoresist composition especially useful for imaging thick films, comprising a film-forming alkali-soluble resin, a photoactive compound, and a...
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6849372 |
Method of manufacturing imaging compositions
The present invention provides methods of forming and using thermally imageable composite elements which may be developed into lithographic printing plates. More specifically, the present invention...
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6841330 |
Planographic printing plate precursor
A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A...
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6824947 |
Photosensitive composition comprising a phenol resin having a urea bond in the main chain
Photosensitive compositions comprising a phenol resin having a urea bond in the main chain, planographic printing plate precursors containing the photosensitive compositions, and methods for...
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6815140 |
Positive resist composition
A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, is described and includes a novolac resin, a...
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6806019 |
High-resolution photosensitive resin composition usable with i-line and method of forming pattern
A radiation sensitive resin composition for i-line light exposure comprising an alkaline soluble resin and a quinonediazide group-containing photosensitizer where said alkaline soluble resin...
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6803167 |
Preparation of lithographic printing plates
Processes for imaging and developing imageable elements useful as lithographic printing plate precursors either thermally or with ultraviolet radiation that use the same developer are disclosed....
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6797450 |
Radiation-sensitive composition, insulating film and organic EL display element
According to the present invention, there are provided an insulating film for an organic EL element, which has sufficiently low water permeability and a good sectional form and whose reactivity...
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6790581 |
Hybrid compound, resist, and patterning process
A phenolic resin/silicone resin hybrid compound is obtained by effecting hydrolytic condensation of an organooxysilane in the co-presence of a phenolic resin. The hybrid compound is used as the...
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6783914 |
Encapsulated inorganic resists
The present invention describes encapsulated inorganic resists which are compatible with conventional resist processing such as spin casting from organic solvents and development with aqueous 2.38%...
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6783911 |
Isocyanate crosslinked imageable compositions
The present invention provides a positive working imageable composition, which includes a hydroxyfunctional resin comprising a covalently bound radiation sensitive group capable of increasing the...
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6780561 |
Polybenzoxazole precursor and coating composition using the same
Provided is a polybenzoxazole precursor having a high purity which does not contain ionic by-products. The above polybenzoxazole precursor comprises a repetitive unit represented by Formula (1): ...
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6773858 |
Positive photoresist composition
A photoresist composition comprising a novolac resin in which 3-27 mol % of the hydroxyl group hydrogens are substituted with 1,2-naphthoquinonediazidosulfonyl groups and an alkali-soluble...
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6762005 |
Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process
A composition includes (A) an alkali-soluble resin having Mw of 1500 to 10000, (B) a quinonediazide ester of, for example, the following formula, and (C) a phenolic compound containing an...
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6746812 |
Photosensitive resin composition
A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula —L—P (wherein L represents a divalent...
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6737212 |
Photosensitive composition
A radiation sensitive composition useful as a photoresist containing a resin composition and a radiation sensitive material, wherein the resin composition comprises a mixture of two or more resins...
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6733949 |
Novolak resin mixtures and photosensitive compositions comprising the same
Disclosed is an alkali-soluble, film-forming novolak resin mixture containing at least two novolak resins, each novolak resin containing the addition-condensation reaction product of at least one...
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6730769 |
Novolak resin, production process thereof and positive photoresist composition using the novolak resin
(i) As a primary reaction, m-cresol is allowed to react with propionaldehyde in the presence of an acid catalyst and thereby yields a polymer having a weight average molecular weight Mw of 200 to...
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6723484 |
Positive-working photosensitive resin precursor composition
The present invention relates to a positive-working photosensitive resin precursor composition which is characterized in that it contains (a) polymer in which the chief component comprises...
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6713225 |
1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition
The invention provides a 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated...
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6706454 |
Method for the production of a printing plate using particle growing acceleration by an additive polymer
A coating solution useful in the preparation of printing plate precursors comprises: a) a radiation sensitive composition C comprising a phenolic resin; b) at least one thermoplastic polymer P...
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6689531 |
Resist composition
A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing...
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6680155 |
Positive photoresist composition
A composition includes (A) an alkali-soluble resin; and (B) (b-1) a compound of Formula (I): wherein Ds are each a hydrogen atom or a naphthoquinonediazidosulfonyl group; and (b2) a...
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6677099 |
Positive type photosensitive polyimide resin composition
A positive type photosensitive resin composition which can be developed by an aqueous alkaline solution and which is excellent in the developability and the adhesion to a substrate, is presented....
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6670090 |
Positive working photosensitive composition, article and process for forming a relief pattern
The present invention relates to a positive-working photosensitive composition comprising a partially diazonaphthoquinone (DNQ) capped polyamic ester with a capping level of about 5-80 molar %; a...
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6660445 |
Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide...
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6645689 |
Solvent resistant polymers with improved bakeability features
A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a...
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6641972 |
Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same
A positive photoresist composition includes an alkali-soluble novolak resin (A), an alkali-soluble acrylic resin (B) and a quinonediazido-group-containing compound (C) and is used for the formation...
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6638680 |
Material and method for making an electroconductive pattern
A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element...
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6620978 |
Positive photoresist composition and process for synthesizing polyphenol compound
The present invention provides a positive photoresist composition including (A) an alkali-soluble resin and (B) a photosensitizer, and the ingredient (B) is a quinonediazide ester of, for example,...
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6607865 |
Positive photosensitive resin composition
The present invention provides a positive photosensitive resin composition which can form a pattern of high resolution and high residual film ratio and has high sensitivity. That is, the present...
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6593043 |
Composition of positive photosensitive resin precursor, and display device thereof
A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl...
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6566031 |
Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern
A positive photoresist composition includes (A) an alkali-soluble resin, (B) a photosensitizer including, for example, a quinonediazide ester of...
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6558872 |
Relation to the manufacture of masks and electronic parts
Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as...
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6558867 |
Lift-off resist compositions
A single layer lift-off resist composition comprising a novolac resin, a quinonediazidosulfonate photosensitive agent, and an aromatic hydroxy compound having at least one phenolic hydroxyl group...
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6551755 |
Positive photoresist composition
A positive photoresist composition includes (A) an alkali-soluble resin and (B) a photosensitive ingredient, in which the photosensitive ingredient (B) includes an ester of a compound represented...
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6537719 |
Photosensitive resin composition
A radiation sensitive resin composition which contains a specific amount of a fluorescent material and has high sensitivity, high resolution, excellent highly normalized film remaining...
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6534235 |
Photosensitive resin composition and process for forming pattern
photosensitive resin composition of the present invention is prepared by adding inorganic particles having a functional group and a mean particle size smaller than the wavelength of light for...
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6525152 |
Copolymer for improving the chemical and developer resistance of positive working printing plates
Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R 1 and R 4 are selected...
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6524764 |
Positive-type photosensitive polyimide precursor composition
The present invention relates to a positive type photosensitive resin precursor composition which is characterized in that it contains polymer having, as its chief component, structural units...
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6517987 |
Positive-working presensitized plate useful for preparing a lithographic printing plate
The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at...
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6517988 |
Radiation-sensitive, positive working coating composition based on carboxylic copolymers
A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the...
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