Matches 501 - 550 out of 614 < 1 2 3 4 5 6 7 8 9 10 11 12 13 >
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4670372 Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant  
A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist. The developer disclosed comprises a formulation of aqueous alkali-base such as...
4663268 High-temperature resistant photoresists featuring maleimide binders  
There is disclosed a resist comprising a radiation-sensitive sensitizer that produces, with a binder, imagewise differential solubility when imagewise exposed. The resist is improved in that the...
4661436 Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant  
A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist. The developer disclosed comprises a formulation of aqueous alkali-base such as...
4640884 Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group  
Quinone diazide derivatives of adamantane, and especially quinone diazide derivatives of 1,3-dialkyl-5,7-bis(hydroyphenol) adamantanes, have been found to provide unique properties when coated on...
4639406 Light-sensitive compound, light-sensitive mixture, and light-sensitive copying material prepared therefrom with 0-naphthoquinone diazide compound  
A light-sensitive copying material for the preparation of printing plates and photoresists is described, which material contains, as the light-sensitive compound, a naphthoquinone-diazide-sulfonic...
4632900 Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface  
A positive photoresist is electrodeposited onto a substrate, exposed to actinic radiation in a predetermined pattern, and then exposed areas are removed by contact with a developer. When the...
4628020 Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound  
A light-sensitive mixture comprising a light-sensitive naphthoquinone-diazide-sulfonic acid ester corresponding to the formula: ##STR1## wherein D represents a...
4626492 Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound  
Disclosed is a positive-working resist composition which demonstrates improved photospeed and rate of development. The resist composition contains a solvent and select proportions of a novolak...
4626491 Deep ultra-violet lithographic resist composition and process of using  
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents oligomeric compounds of the formula ##STR1## wherein X is...
4624908 Deep ultra-violet lithographic resist composition and process of using  
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents compounds of the formula ##STR1## wherein: R 4 is...
4603195 Organosilicon compound and use thereof in photolithography  
A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.
4601969 High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution  
A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
4596763 Positive photoresist processing with mid U-V range exposure  
The invention provides a method for producing a positive working photoresist which comprises coating at least one novolak resin, and 1-naphthalenesulfonic acid,...
4588670 Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist  
A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a...
4581321 Process for producing negative copies in a material based on 1,2-quinone diazides with thermal curing agent  
A process for producing negative relief copies is disclosed in which a light-sensitive material, comprising (1) a light-sensitive ester or amide of a 1,2-quinone-diazide-sulfonic acid or of a...
4576901 Process for producing negative copies by means of a material based on 1,2-quinone diazides with 4-ester or amide substitution  
A process for producing negative relief copies is disclosed in which a light-sensitive material, consisting essentially of (1) a binder which is insoluble in water and soluble in aqueous-alkaline...
4575480 Photoresist composition  
A positive photoresist composition in the form of solution which comprises a resin soluble in an aqueous alkaline solution, a 1,2-quinonediazide derivative as a photosensitizer, and at least one...
4555469 Process of preparing light-sensitive naphthoquinonediazidesulfonic acid ester  
A light-sensitive mixture comprising a water-insoluble binder soluble in aqueous alkaline solutions, and the reaction product of a naphthoquinonediazidesulfonyl halide with a mixture composed of a...
4544627 Negative image forming process in o-quinone diazide layer utilizing laser beam  
A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide...
4536464 Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone  
The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general...
4530895 Aqueous-alkaline solution and process for developing positive-working reproduction layers  
The aqueous-alkaline developer solution for radiation-sensitive, positive-working reproduction layers contains silicate and a quaternary ammonium base, such as tetraalkylammonium hydroxide; it may...
4526856 Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents  
A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in...
4522911 Deep ultra-violet lithographic resists with diazohomotetramic acid compounds  
A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
4517275 Light-sensitive mixture based on O-naphthoquinone-diazides, and light-sensitive copying material prepared therefrom  
A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoquinonediazide...
4499171 Positive type photosensitive resin composition with at least two o-quinone diazides  
A positive type photosensitive resin composition comprising an alkali-soluble novolac resin and (A) a compound represented by the following general formula (I) and a compound represented by the...
4492740 Support for lithographic printing plate  
Disclosed is a support for lithographic printing plate having an electrodeposited chromium layer on an iron material, characterized in that the surface of said electrodeposited layer has a shape in...
4477553 Photosensitive compositions  
There is disclosed a photosensitive composition comprising an o-quinonediazide compound and, as a binder resin, a resin containing in the molecule the unit represented by the following formula...
4469776 Developing solution for light-sensitive printing plates  
A developing solution for a light-sensitive printing plate having an o-quinonediazide-containing light-sensitive layer is disclosed. The developing solution is comprized of an aqueous solution of...
4467025 Photosensitive compositions  
A photosensitive composition containing an o-naphthoquinonediazido compound of Formula I ##STR1## wherein X is an oxy or amino group, Y is a cyano or nitro group, and n is an integer of 2 to 5, and...
4464458 Process for forming resist masks utilizing O-quinone diazide and pyrene  
A resist system for semiconductor device fabrication comprised of bottom positive resist layer of a diazoquinone/novolak resist applied to a substrate and overcoated with a like or different...
4458000 Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light  
Disclosed is a light-sensitive mixture comprising (a) a 1,2-quinonediazide or a mixture of (a 1 ) a compound forming an acid on exposure and (a 2 ) a compound having at least one C--O--C bond...
4457999 Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light  
Disclosed is a light-sensitive mixture comprising (a) a 1,2-quinonediazide or a mixture of (a 1 ) a compound forming an acid on exposure and (a 2 ) a compound having at least one C--O--C bond...
4439516 High temperature positive diazo photoresist processing using polyvinyl phenol  
This invention is for a photoresist capable of withstanding temperatures in excess of 200° C. without image distortion. The photoresist comprises a high temperature diazo sensitizer, preferably an...
4424270 Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester  
A light-sensitive mixture comprising a water-insoluble binder soluble in aqueous alkaline solutions, and the reaction product of a naphthoquinonediazidesulfonyl halide with a mixture composed of a...
4409314 Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom  
A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel...
4407926 Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom  
A light-sensitive composition, especially suitable for preparation of planographic printing plates, comprising a water-insoluble resinous binder which is soluble or swellable in aqueous alkaline...
4399210 Photosensitive compositions  
A photosensitive composition containing at least one o-naphthoquinonediazide compound represented by the following general formula (I): ##STR1## wherein A represents a divalent aliphatic residue, a...
4397937 Positive resist compositions  
Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol...
4347305 Photosensitive lithographic printing plate precursors and methods of preparing printing plate therefrom  
A photosensitive lithographic printing plate precursor which has a camera speed together with all the advantageous features inherent to positive type, conventional PS plates is disclosed. On an...
4342820 Dry planographic printing plate and preparation thereof  
Provided is a presensitized planographic printing master plate requiring no dampening water for use in negative work which comprises a base substrate, a light releasing photosensitive layer...
4339521 Heat resistant positive resists containing polyoxazoles  
The invention relates to heat-resistant positive resists based upon precursor stages of highly heat-resistant polymers and light-sensitive diazoquinones, as well as to a method for preparing...
4339522 Ultra-violet lithographic resist composition and process  
Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
4330479 Thermal decomposition of aryl urethanes  
A process for making aryl isocyanates comprises thermally decomposing aryl urethanes at a temperature between 175° C. and 600° C. in the presence of a catalyst, present in the heterogeneous...
4307173 Light-sensitive composition comprising phthalic anhydride  
Disclosed is an improved photosensitive composition having increased light sensitivity. Said composition comprises an O-quinone diazide, phthalic anhydride and an aromatic sulfonic acid.
4296194 Positive-working light sensitive diazo materials with azo dye  
A positive working light-sensitive composition comprises in admixture (a) a first component which is an azo dye formed by reacting a p-amino-benzene diazonium salt and a compound including the...
4284706 Lithographic resist composition for a lift-off process  
Lithographic resist compositions are provided which permit an improved lift-off process in which the deposition mask with apertures has the desirable negative slope or overhang. The resist...
4271251 Photosensitive compositions  
A stabilized photosensitive composition comprising a leuco dye, a photooxidizing agent, and further a 2,4-dihydroxybenzaldoxime which is suitable for use in lithography, photoresists, etc., for...
4265999 Process for the preparation of planographic printing forms  
A process for the preparation of planographic printing forms is described, in which a light-sensitive material composed of a support having a hydrophilic surface and of a light-sensitive layer,...
4266001 Light-sensitive mixture  
A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble...
4266000 Photosensitive copying composition  
This invention relates to a photosensitive copying composition comprising a solvent and a naphthoquinone-(1,2)-diazidesulfonic acid ester as the photosensitive compound, said naphthoquinone diazide...
Matches 501 - 550 out of 614 < 1 2 3 4 5 6 7 8 9 10 11 12 13 >