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4971887 |
Positive-working photosensitive mixture and recording material of high thermal stability with phenolic novolak of m-cresol and 2,3,6-trialkylphenol
A positive-working photosensitive mixture is disclosed, which comprises an o-quinonediazide as the photosensitive compound and a novolak resin, which is insoluble in water and soluble in...
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4968581 |
High resolution photoresist of imide containing polymers
Photoresist compositions suitable for deep UV and excimer laser lithography are disclosed that are mixtures of a photoacid and a polymer having imide residues to which acid labile groups are...
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4965167 |
Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
A light-sensitive composition comprising an admixture of: (a) at least one alkali-soluble binder resin; (b) at least one photoactive compound; (c) a sufficient amount of a solvent mixture...
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4963462 |
Positive working, peel developable, color proofing system having two photosensitive layers
This invention relates to positive working color proofing sheet construction which, upon exposure to an actinic radiation source through a screened image, can accuratley reprouce said image. The...
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4959293 |
Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
2-diazo-1-ones are useful deep UV photoresist solubility modification agents exhibiting improved photosensitivity allowing shorter deep UV exposure times to achieve the same extent of photoreaction...
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4959292 |
Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde
A phenolic novolak resin comprising the product of a condensation reaction of an aldehyde comprising a haloacetaldehyde source or a mixture of a haloacetaldehyde source and a formaldehyde source...
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4957846 |
Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
A trinuclear novolak oligomer of the formula (I): ##STR1## wherein each X is selected from the group consisting of hydroxyl group and halide group and Y is selected from the group consisting of a...
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4948697 |
Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl...
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4943511 |
High sensitivity mid and deep UV resist
Positive photoresist compositions are provided which contain (a) a mixture of mono-, di-, and triesters of 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazo-4-sulfonic acid and (b) a...
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4942108 |
Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line...
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4929534 |
Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler
A positive-working photosensitive mixture containing an o-quinone diazide and a binder is disclosed wherein the mixture contains a compound which is able to form an azo coupling with the o-quinone...
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4929536 |
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2...
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4906549 |
Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms
A positive-working photoresist composition suitable for fine patterning in the manufacturing of semiconductor devices such as VLSIs with high fidelity is proposed. The composition comprises: (A)...
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4898803 |
Light-sensitive o-quinone diazide composition with acidic polyurethane resin
A light-sensitive composition comprises at least one polyuretane resin having repeating unit represented by formula (I) and/or repeating unit represented by formula (II) and which is insoluble in...
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4892801 |
Mixed ester O-quinone diazide photosensitizers and process of preparation
The invention relates to new mixed ester photosensitive compounds and photosensitizer compositions comprised thereof. The photosensitive compounds and photosensitizer compositions are prepared by...
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4883739 |
Light-sensitive resin composition with 1,2-naphthoquinone diazide compound having spirobichroman or spirobiinoane ring
A light-sensitive resin composition comprising a light-sensitive substance represented by the formula (A) shown below and an alkali-soluble resin: ##STR1## wherein R 1 to R 8 are independently...
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4873169 |
Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same
A process for the preparation of an o-naphthoquinonediazide sulfonic acid ester is disclosed. Esterification of an o-naphthoquinonediazide sulfonic acid halide with a mono- or polyvalent phenolic...
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4863829 |
Positive type high gamma-value photoresist composition with novolak resin possessing
A positive type photoresist composition comprising a novolak resin and O-quinone diazide compound, the novolak resin being one which is obtained by the addition condensation reaction of a phenol...
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4863828 |
Positive-working o-quinone diazide photoresist composition
A positive-working photoresist composition is disclosed, which comprises a light-sensitive substance of 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3',4',5'-hexahydroxybenzophenone...
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4859563 |
Positive photoresist composition
Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-napthtoquinone diazides photosensitive-material comprising an ester of...
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4853315 |
O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
Esters of 1-oxo-2-diazo-naphthalene sulfonic acid wherein the sulfonic acid group is at either the 4 or the 5 position of a hydroxymethyl-tricyclo [5.2.1.0 2 ,6 ] decane wherein the hydroxy group...
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4847178 |
Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester
A positive type photosensitive composition capable of improving the drawback in the conventional positive type photosensitive resin composition, improving adhesion between the positive type...
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4845008 |
Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
A positive-working light-sensitive composition is herein disclosed, which comprises a mixed organic solvent consisting of (i) at least one organic solvent having a boiling point of at least 40° C....
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4839256 |
Perfluoroalkyl group-containing 1,2-napthoquinone daizide compounds and reproduction materials produced therefrom
Light-sensitive perfluoroalkyl group-containing 1,2-naphthoquinone diazide compounds and reproduction materials comprising a support and a light-sensitive layer containing such compounds useful in...
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4835085 |
1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound
Compounds of the general formula (I) or (II) ##STR1## in which R is 1,2-naphthoquinone-2-diazide-4- or -5-sulfonyl and X is a straight-chain or branched C 1 -C 12 -alkylene group, which is...
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4828958 |
Photosensitive composition and method of forming a resist pattern with copolymer of polyvinyl phenol
The photosensitive composite of the present invention is obtained by including a nonsubstitutional or substitutional benzyl radical in the phenol side chain of polyvinylphenol. The photosensitive...
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4818658 |
Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
The subject invention involves reduction of light reflection into a photoresist coating over a reflective substrate by the use of a photoactive compound in a photoresist formulation that is the...
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4816380 |
Water soluble contrast enhancement layer method of forming resist image on semiconductor chip
A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound...
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4812880 |
Exposure apparatus
Disclosed is an exposure apparatus used in photolithographic process in fabrication of semiconductor devices. More particularly, in an exposure apparatus using an excimer laser, the TTL alignment...
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4812551 |
Novolak resin for positive photoresist
A novolak resin for a positive photoresist is provided herein, which resin is produced by the addition condensation reaction of a phenol with formaldehyde. This novolak resin has improved heat...
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4810601 |
Top imaged resists
The present invention is concerned with methods of converting a single resist layer into a multilayered resist. The upper portion of the single resist layer can be converted into a dry-etch...
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4808512 |
Process of deep ultra-violet imaging lithographic resist compositions
Photosensitive solubilization inhibitor compounds of the formula ##STR1## wherein: x is an integer equal to the valence or functionality of the radical R, and R is a radical selected from the...
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4804612 |
Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation
Although the positive-working photoresist composition comprises a phenolic novolac resin as the film-forming component and a known photosensitizing compound as in conventional compositions, the...
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4797345 |
Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoester of a cycloalkyl-substituted phenol corresponding to the formula: ##STR1## wherein n is from about 2 to about 10 and their use...
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4789619 |
Positive-working radiation-sensitive mixture comprising a sensitizing polymethine dye
A positive-working radiation-sensitive mixture is described that contains (a) a radiation-sensitive compound which forms a strong acid under the action of actinic radiation, (b) a compound with at...
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4777111 |
Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied...
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4774171 |
Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in a radiation-sensitive mixture, and radiation-sensitive copying material
Novel bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides of secondary diamines, which amides are represented by the formula ##STR1## in which R is a straight-chain or branched, unsubstituted or...
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4772533 |
Positive working naphthoquinone diazide color proofing element with polyvinyl acetate adhesive layer
This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The...
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4758497 |
Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds
The invention features a new series of triazine compounds which are characterized by their ability to generate free radicals upon irradiation in a desired optical region, such that they are useful...
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4752551 |
Photosensitive solubilization inhibition agents, and deep ultra-violet lithographic resist compositions
Photosensitive solubilization inhibitor compounds of the formula ##STR1## wherein: x is an integer equal to the valence or functionality of the radical R, and R is a radical selected from the...
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4745045 |
Method for improving resolution in microelectronic circuits using photoresist overlayer by using thermally processed polyimide underlayer formed from positive photoresist and polyamic acid
A method which provides for a permanent planarization layer on a multilayer integrated circuit. The planarization layer resides above other circuit layers which reflect incident light. A layer of...
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4738915 |
Positive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenone
The invention provides an improvement over the conventional positive-working photoresist compositions comprising a novolac resin and an ester compound between 2,3,4-trihydroxybenzophenone and...
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4737437 |
Light sensitive diazo compound, composition and method of making the composition
The specification discloses photosensitizers comprising esters of 1-oxo-2-diazo-naphthalene sulfonic acid and 4-benzyl-1,2,3-trihydroxybenzene, photo resists based thereon and methods for making...
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4735885 |
Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
Disclosed are substituted derivatives of 5-diazobarbituric acid selected from those having the formulas: ##STR1## wherein R 1 and R 2 are substituents selected from the group consisting of C 3 ...
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4732837 |
Novel mixed ester O-quinone photosensitizers
The invention relates to new mixed ester photosensitive compounds and photosensitizer compositions comprised thereof. The photosensitive compounds and photosensitizer compositions are prepared by...
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4731319 |
Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins
A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g. VLSIs, with high fidelity is proposed. The composition comprises a cresol...
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4719167 |
Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde
Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of...
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4696886 |
Positive photoresist composition with m-hydroxy-α-methylstyrene homopolymer and quinonediazide compound
A positive type photoresist composition comprising an m-hydroxy-α-methylstyrene polymer and as a photo-sensitizer a quinonediazide compound is disclosed. A positive type photoresist composition...
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4684597 |
Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor
There is disclosed a photoresist composition comprising a light-sensitive, quinone diazide polymer, a binder and a benzene monomer trisubstituted with a diazo-naphthoquinone-sulfonyloxy group. The...
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4672021 |
Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied...
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