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7615331 |
Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device
A photosensitive resin composition contains: a polymer represented by the formula (I) as defined herein, in which 0.5 mol % or more of A in the polymer represented by the formula (I) is a...
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7615324 |
Photosensitive composition, and cured relief pattern production method and semiconductor device using the same
A photosensitive resin composition includes (a) a resin comprising a repeating unit represented by a following formula (1); (b) a photosensitive agent; (c) a thermo-acid generator; and (d) a...
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7604911 |
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device
A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formed on the resist pattern, wherein the...
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7598009 |
Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device
According to the present invention, there is provided: a photosensitive resin composition comprising a polyamide resin having a specific structure, a photosensitive agent, and a compound having at...
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7592119 |
Photosensitive polyimide resin composition
The developability of a photosensitive polyimide resin composition with a weakly alkaline aqueous solution is improved without reduction in the solubility in general-purpose organic solvents even...
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RE40728 |
Acid functional polymers based on benzocyclobutene
The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low...
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7524594 |
Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films...
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7521167 |
Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition
Provided are an ester group-containing poly(imide-azomethine)copolymer having low linear thermal expansion coefficient; a production method thereof; an ester group-containing poly(amide...
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7507518 |
Photosensitive resin precursor composition
The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises...
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7462436 |
Positive photoresist composition and method of forming resist pattern
There is provided a positive photoresist composition capable of forming a pattern with excellent resolution, excellent resistance to reflection off the substrate, and excellent perpendicularity....
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7455948 |
Photosensitive resin composition
This invention relates to a positive photosensitive resin composition allowing development with an alkaline aqueous solution and excellent in resolution, photosensitivity and pattern form even if...
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7452657 |
Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof
The resist composition of the present invention contains at least one of a tannin and a derivative thereof. The method of forming a resist pattern of the present invention includes: forming a...
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7439005 |
Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern
There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous...
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7435525 |
Positive photosensitive resin composition, method for forming pattern, and electronic part
Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the...
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7419763 |
Near-field exposure photoresist and fine pattern forming method using the same
A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field...
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7416830 |
Photosensitive resin compositions
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound...
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7416822 |
Resin and resin composition
Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and...
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7387872 |
Solution and method for the treatment of a substrate, and semiconductor component
An embodiment of the invention provides a method for the treatment of a substrate made of paper or a substrate containing paper as support material for a semiconductor component. In an embodiment,...
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7378230 |
Photoresist composition for multi-micro nozzle head coater
The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular...
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7378215 |
Positive photoresist composition
A positive photoresist composition comprising an alkali-soluble resin, a 1,2-quinonediazide compound, an organic solvent, and a fluorinated organosilicon compound of formula (1) serving as a...
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7374856 |
Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film
A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a...
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7371501 |
Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same
A photosensitive resin composition comprises: a polybenzoxazole precursor (A); a naphthoquinone diazide photosensitizer (B); and a specific phenolic hydroxyl group-containing compound (C).
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7371500 |
Positive photosensitive insulating resin composition and cured product thereof
Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group,...
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7371499 |
Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same
A photoresist resin composition comprises about 10 to about 35% by weight of an acryl-based copolymer, about 5 to about 10% by weight of a quinone diazide compound, about 55 to about 80% by weight...
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7368216 |
Photosensitive resin composition and manufacturing method of semiconductor device using the same
A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor...
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7368205 |
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure...
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7361445 |
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
A positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH 2 OH group but not a phenolic...
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7348122 |
Photosensitive resin composition and method for manufacturing semiconductor device using the same
A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole...
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7338737 |
Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl...
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7303859 |
Photoresist, photolithography method using the same, and method for producing photoresist
There is provided a positive photoresist for near-field exposure excellent in light utilization efficiency even with small layer thickness of the photoresist layer for image formation, and allowing...
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7279263 |
Dual-wavelength positive-working radiation-sensitive elements
A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polymers capable of being eluted in an alkaline aqueous solution and a development-enhancing...
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7255972 |
Chemically amplified positive photosensitive resin composition
A photosensitive resin composition suitable for forming a thick film and an ultra-thick film used for forming a thick resist pattern used in the process of forming a magnetic pole on a magnetic...
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7255970 |
Photoresist composition for imaging thick films
The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes...
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7214455 |
Photosensitive resin composition and process for producing heat-resistant resin film
The present invention is directed to a photosensitive resin composition comprising (a) a resin having a specific structure, (b) a photosensitive agent, and (c) an organic solvent having a boiling...
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7214454 |
Positively photosensitive insulating resin composition and cured object obtained therefrom
Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group,...
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7195854 |
Photoresist composition
The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene...
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7189488 |
Polyimide precursor, manufacturing method thereof, and resin composition using polyimide precursor
A polyimide precursor in accordance with the present invention contains amide acid ester units, either imide units or amide acid units, and fluorine atoms bonded to some of these structural units....
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7175960 |
Positive resist composition and patterning process
A positive resist composition comprising a mixture of an alkali-soluble novolak resin prepared using m-cresol, p-cresol and 2,5-xylenol as starting reactants and a phenolic compound, wherein the...
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7144662 |
Photoresist composition having a high heat resistance
The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat...
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7132213 |
Positive photoresist composition and method of forming resist pattern
A positive photoresist composition comprising an alkali-soluble novolak resin (A) containing a structural unit (a1) represented by a general formula (I) shown below, and a structural unit (a2)...
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7108951 |
Photosensitive resin composition
The photosensitive resin composition comprising:
(A) a resin containing (A1) a repeating unit having at least two groups represented by the specific general formula; and (B) a compound...
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7101652 |
Photosensitive resin compositions
New photosensitive PBO precursor polymers which contain diazoquinone moieties attached to its backbone and in which all amino end groups are converted into amide groups. The photosensitive...
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7101650 |
Photosensitive resin composition for photoresist
The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate...
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7090958 |
Positive photoresist compositions having enhanced processing time
Novel compositions comprising photoactive polymers comprising a dinitrobenzyl group in conjunction with a photoacid generator are disclosed. In one embodiment, the photoacid generator is a diazide...
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7063939 |
Method for high aspect ratio pattern transfer
The present invention relates a method for high aspect ratio pattern transfer, by using combination of imprint and Step and Flash techniques to transfer high aspect ratio pattern. The present...
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7060410 |
Novolak resin solution, positive photoresist composition and preparation method thereof
There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are...
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7026091 |
Positive photoresist composition and patterning process using the same
A positive photoresist with uniform reactivity for use in a thick film lithography process, includes thermal curing during soft-baking and photo dissociation through UV exposure. The positive...
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7026080 |
Positive photosensitive polyimide resin composition
The invention provides a positive photosensitive resin composition which is free from film reduction, swelling or peeling at the time of development with an aqueous alkaline solution and which...
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7008883 |
Photoresist composition for forming an insulation film, insulation film for organic electroluminescence devices and process for producing the insulation film
A photoresist composition comprising (A) a resin soluble in an alkali, (B) an ester of a quinonediazidesulfonic acid, (C) a thermosetting component and an organic solvent; an insulation film for...
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7001705 |
Positively photosensitive resin composition and method of pattern formation
The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high...
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