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5077173 |
Positive photoresist containing 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene
Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each...
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5075194 |
Positive photoresist composition containing 4,4-diester, 4,5-diester, or 5,5-diester of spiroglycol and 1-oxo-2-diazonaphthalene-5-sulfonic acid chloride
A positive photoresist composition and formulation comprising a resin matrix and a photosensitizer obtained from 1-oxo-2-diazo naphthalene-4-sulfonic acid chloride, on 1-oxo-2-diazo...
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5075193 |
Desensitized quinone diazide compounds utilizing microcrystalline cellulose as desensitizing agent
The invention relates to desensitized quinone diazide compounds for use as photoactive components in radiation-sensitive compositions, such as, especially, photoresists, which compounds contain...
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5069996 |
Process for developing selected positive photoresists
The process of developing an image-wise exposed positive-working photoresist-coated substrate comprising the steps of: (1) coating said substrate with a radiation-sensitive composition useful as...
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5066561 |
Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl...
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5066567 |
Image reversal process utilizing a positive-working photosensitive composition containing a dye
A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination...
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5064741 |
Positive working light-sensitive composition containing a free radical generator and a discoloring agent
A light-sensitive composition is herein disclosed, which comprises at least one free radical generator represented by the following general formula: ##STR1## and at least one discoloring agent...
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5063138 |
Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
A light-sensitive composition comprising an admixture of: (a) at least one alkali-soluble binder resin; (b) at least one photoactive compound; (c) a sufficient amount of a solvent mixture...
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5043243 |
Positive-working quinone diazide photoresist composition containing a dye
A positive type photoresist composition comprising at least one alkali-soluble resin, at least one quinone diazide compound and a compound of the general formula (I) ##STR1## wherein R 1 and R 2 ...
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5034304 |
Photosensitive compounds and thermally stable and aqueous developable negative images
Selected photosensitive compounds activated by deep ultraviolet radiation or x-rays and capable of being employed at very low concentrations in photosensitive compositions are provided for...
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5024921 |
Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image
A phenolic resin composition comprising units of formula (I): ##STR1## wherein R 1 is a halogen and R 2 is a lower alkyl group having 1 to 4 carbon atoms and said units of formula (I) are made by...
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5021320 |
Polyamide containing the hexafluoroisopropylidene group with O-quinone diazide in positive working photoresist
This invention is that of high temperature polyamides containing the hexafluoroisopropylidene group. The high temperature polyamides of the invention and photo or radiation sensitizers provide...
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5017462 |
Process of producing negative relief copies utilizing photosensitive copying material with thermal hardening triazine compound
The invention describes a photosensitive composition, a copying material prepared from this composition and the production of negative relief copies, in which a photosensitive material containing a...
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5008175 |
Copying materials
A light-sensitive composition for the preparation of printing plates is described, which contains a water-insoluble binder which is soluble in aqueous-alkaline solutions; a light-sensitive...
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5002851 |
Light sensitive composition with o-quinone diazide and phenolic novolak resin made using methylol substituted trihydroxybenzophenone as reactant
A methylol-substituted trihydroxybenzophenone of the formula (I): ##STR1## This methylol-substituted trihydroxybenzophenone may be reacted with selected phenolic monomers during or after the...
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5001040 |
Process of forming resist image in positive photoresist with thermally stable phenolic resin
A phenolic novolak resin comprising the product of a condensation reaction of an aldehyde comprising a haloacetaldehyde source or a mixture of a haloacetaldehyde source and a formaldehyde source...
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4990429 |
Process for the production of negative relief copies utilizing reversal processing
The invention describes a photosensitive composition, a copying material prepared from this composition, and a process for the production of negative relief copies, in which a photosensitive...
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4988601 |
Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol
A photosensitive resin composition having high heat resistance, sensitivity, and resolution performance, including a novolak resin prepared by condensing 2,5-xylenol with m-cresol and/or p-cresol...
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4985333 |
Positive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcumin
The positive-working photosensitive composition useful as a material of photoresist comprises, in addition to a film-forming resin, such as a cresol novolak resin, and a photosensitive compound,...
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4983492 |
Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.
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4971887 |
Positive-working photosensitive mixture and recording material of high thermal stability with phenolic novolak of m-cresol and 2,3,6-trialkylphenol
A positive-working photosensitive mixture is disclosed, which comprises an o-quinonediazide as the photosensitive compound and a novolak resin, which is insoluble in water and soluble in...
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4965167 |
Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
A light-sensitive composition comprising an admixture of: (a) at least one alkali-soluble binder resin; (b) at least one photoactive compound; (c) a sufficient amount of a solvent mixture...
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4963463 |
Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group
A radiation-sensitive resin composition comprising a quinonediazide-type radiation-sensitive resin and a compound generating an acid upon irradiation. Said radiation-sensitive resin composition can...
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4959293 |
Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
2-diazo-1-ones are useful deep UV photoresist solubility modification agents exhibiting improved photosensitivity allowing shorter deep UV exposure times to achieve the same extent of photoreaction...
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4957845 |
Printing plate
The present invention is concerned with a printing plate of which image formation is done by photoirradiation, having a front side covered waith a peelable or removable protective layer which...
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4948697 |
Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl...
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4943511 |
High sensitivity mid and deep UV resist
Positive photoresist compositions are provided which contain (a) a mixture of mono-, di-, and triesters of 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazo-4-sulfonic acid and (b) a...
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4937176 |
Method of manufacturing a semiconductor device, in which a negative image is formed on a semiconductor substrate in a positive photolacquer
A method of manufacturing a semiconductor device, in which a layer of photolacquer (5) containing as a photoactive component a diazo oxide is provided on a semiconductor substrate. Of this layer,...
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4933257 |
Positive quinone diazide photo-resist composition with antistatic agent
Disclosed herein is an antistatic photo-resist containing an antistatic agent. Since antistatic photo-resist according to the present invention is hardly charged, it can be suitably used as a mask...
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4929534 |
Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler
A positive-working photosensitive mixture containing an o-quinone diazide and a binder is disclosed wherein the mixture contains a compound which is able to form an azo coupling with the o-quinone...
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4929536 |
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2...
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4927732 |
Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared therefrom
A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination...
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4904564 |
Process for imaging multi-layer resist structure
An image is provided by depositing a first layer of a photoresist containing a phenolic-formaldehyde novolak type polymer and an imidazole, benzimidazole, triazole, or indazoles to increase the...
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4898803 |
Light-sensitive o-quinone diazide composition with acidic polyurethane resin
A light-sensitive composition comprises at least one polyuretane resin having repeating unit represented by formula (I) and/or repeating unit represented by formula (II) and which is insoluble in...
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4889787 |
Low gain positive acting diazo oxide pre-press proofing system with polyvinyl ether and particulate slip agent in adhesive layer
A positive-acting photosensitive proofing element is constructed with a thermal adhesive layer having a Tg between 45° C. and 60° C., said adhesive comprising a polymer or copolymer derived from...
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4889789 |
Photosensitive composition and photosensitive copying material prepared therefrom wherein composition has a thermal crosslinking urethane formaldehyde condensate
A photosensitive composition which substantially comprises a binder which is insoluble in water and soluble in aqueous-alkaline solutions, a photosensitive 1,2-naphthoquinone-diazide or a...
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4883739 |
Light-sensitive resin composition with 1,2-naphthoquinone diazide compound having spirobichroman or spirobiinoane ring
A light-sensitive resin composition comprising a light-sensitive substance represented by the formula (A) shown below and an alkali-soluble resin: ##STR1## wherein R 1 to R 8 are independently...
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4882260 |
Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye
The photosensitive composition, which is suitable as a photoresist material in fine patterning works for the manufacture of semiconductor devices, contains, as a photoextinctive agent, a...
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4880722 |
Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line...
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4871644 |
Photoresist compositions with a bis-benzotriazole
Photoresist compositions which operate positively and contain at least one ocmpound of the formula I ##STR1## in which X is --C n H 2n --, --O--, --S-- or --C(O)--, n being a number from 1 to 6....
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4863827 |
Postive working multi-level photoresist
A process for forming a multi-level positive working photosensitive element. One forms a composition containing an alkali soluble resin, an o-quinonediazide compound and an in-situ generated acid...
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4863829 |
Positive type high gamma-value photoresist composition with novolak resin possessing
A positive type photoresist composition comprising a novolak resin and O-quinone diazide compound, the novolak resin being one which is obtained by the addition condensation reaction of a phenol...
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4863828 |
Positive-working o-quinone diazide photoresist composition
A positive-working photoresist composition is disclosed, which comprises a light-sensitive substance of 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3',4',5'-hexahydroxybenzophenone...
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4853314 |
Positive-working radiation-sensitive coating solution and positive photoresist material with monoalkyl ether of 1,2-propanediol as solvent
A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of...
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4847178 |
Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester
A positive type photosensitive composition capable of improving the drawback in the conventional positive type photosensitive resin composition, improving adhesion between the positive type...
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4845008 |
Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
A positive-working light-sensitive composition is herein disclosed, which comprises a mixed organic solvent consisting of (i) at least one organic solvent having a boiling point of at least 40° C....
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4842986 |
Positively working resist material
A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far...
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4840869 |
Light-sensitive composition
Light sensitive compositions are disclosed which comprise 2-halomethyl-1,3,4,-oxadiazole compounds having a heterocyclic radical in the fifth position containing at least one element selected from...
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4828960 |
Reflection limiting photoresist composition with two azo dyes
A reflection limiting photoresist is disclosed.
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4822713 |
Light-sensitive composition with fluorine containing acrylate or methacrylate copolymer surfactant
A light-sensitive composition for use in making a light-sensitive layer of, for instance, a presensitized plate from which a lithographic printing plate is to be prepared, which comprises a...
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