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5648195 |
Radiation-sensitive resist composition comprising a diazoketone
A radiation-sensitive resist composition for manufacturing highly resolved relief structures is characterized by the following components: a film-forming base polymer; a radiation-active...
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5645969 |
Photosensitive composition and photosensitive lithographic printing plate
A photosensitive composition comprising a quinonediazide compound and a binder resin, wherein said resin is a resin obtained by condensing a phenol component comprising the following (1) to (3),...
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5639587 |
Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture
A positive photoresist composition is disclosed, which comprises an alkali-soluble resin, at least one of 1,2-naphthoquinonediazidesulfonic monoesters of specific polyhydroxy compounds, and at...
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5635328 |
Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound
Disclosed are a light-sensitive lithographic printing plate which comprises a support subjected to graining treatment and anodization treatment and a layer of a positive light-sensitive composition...
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5633111 |
Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound
A positive type or negative type photoresist composition for fine processing having excellent resolution, sensitivity, adhesive-ness and developability comprising: (a) an alkali soluble resin or a...
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5631119 |
Image-forming material and image formation process
The present invention provides an image-forming material which comprises a support having thereon, in the following order, (1) a photosensitive composition layer comprising (a) an o-quinonediazide...
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5629127 |
Positive electron beam resist composition containing cresolnovolak resin, select additive and methyl gallate/1,2-naphthoquinonediazido-4-sulfonyl chloride reaction product
The present invention relates to a positive electron beam resist composition containing a cresolnovolak resin, a lower molecular additive with a specific structure and a quinonediazide compound...
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5629128 |
Positive photoresist composition
A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the...
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5624781 |
Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition
A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising: (A) an acrylic resin...
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5620828 |
Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator
A positive photoresist composition is disclosed, which comprises prescribed amounts of an alkali-soluble novolak resin which is obtained from prescribed amounts of m- and p-cresols and at least one...
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5614349 |
Using a Lewis base to control molecular weight of novolak resins
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis...
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5612164 |
Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone...
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5609983 |
Positive working photosensitive compositions
There is provided a positive working photosensitive composition suitable for photosensitive lithographic printing plate or photoresist for fine processing, which comprises a quinonediazide ester...
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5604077 |
Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent
Proposed is an improved positive-working photoresist composition for use in the photolithographic patterning works for the manufacture of semiconductor devices, which is capable of giving a...
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5601961 |
High-sensitivity positive-working photoresist composition
Disclosed is an improved positive-working photoresist composition comprising an alkali-soluble resin as a film-forming agent and a quinone diazide group-containing compound as a photosensitive...
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5580702 |
Method for forming resist patterns
Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to...
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5576138 |
Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives
Disclosed is a positive-working photoresist composition used in the photolithographic patterning work for the manufacture of various electronic devices such as VLSIs having improved...
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5576139 |
Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst
A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the...
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5576137 |
Matted, radiation-sensitive recording material and printing plate
The invention relates to a non-continuous matte layer that can be used with a recording material having a substrate and a radiation-sensitive layer which contains a 1,2-naphthoquinone-2-diazide and...
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5552255 |
Article utilizing quinone diazide resist layer on tantalum substrate surface
Proposed is an alkali-soluble, positive-working photo-sensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate...
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5547814 |
O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images
A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1##...
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5543263 |
Photoresist having a low level of metal ions
The present invention provides methods for producing photoresist compositions having a very low level of metal ions, utilizing specially treated ion exchange resins. A method is also provided for...
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5543265 |
Photoresist solution capable of being applied as an aerosol containing 3 to 12 percent by weight solvent
Changing (varying, irregular) resist thickness on semiconductor wafers having irregular top surface topography or having different island sizes, affects the percent reflectance (and absorption...
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5538820 |
Reticulation resistant photoresist coating
The invention provides a method for forming a photoresist mask on a substrate resistant to reticulation during plasma etching. The method comprises the steps of forming an imaged and developed...
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5536616 |
Photoresists containing water soluble sugar crosslinking agents
A photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a crosslinking agent. The crosslinking agent comprises a water soluble sugar. The present invention also...
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5532107 |
Positive resist composition
Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and a photosensitive agent, characterized in that the positive resist composition contains, as the...
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5532106 |
Positive-tone photoresist containing diester dissolution inhibitors
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1##...
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5529882 |
Positive type photosensitive anionic electrocating composition
The present invention provides a positive type photosensitive anionic electrocoating composition having excellent running stability and highly reliable image formability, and a process for pattern...
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5529881 |
Postive photoresist composition
A positive photoresist composition for super fine working is disclosed, which comprises (a) an alkali-soluble resin and (b) as a photosensitive compound the 1,2-naphthoquinonediazido-5-(and/or...
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5527659 |
Chemical amplification resist composition containing photochemical acid generator, binder and squarylium compound
There is described a chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): ##STR1## wherein R 1 and R 2 are the same or different and...
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5523191 |
Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product
There are disclosed novel photoresist compositions employing phosphazene compounds as ballast, unabsorbent of light at a band of i-line and g-line and superior in thermal resistance and sensitivity...
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5518859 |
Positive-type photosensitive electrodeposition coating composition and process for producing circuit plate
A positive-type photosensitive electrodeposition coating composition comprising a water-soluble or water-dispersible resin having an ionic group and containing at least one modified...
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5518860 |
Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound
A positive-working photoresist composition comprising a cresol novolac resin as the film-forming agent and a quinonediazido group-containing compound as the photosensitizing agent is admixed with a...
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5514515 |
Photoactive compounds having a heterocyclic group used in photoresist compositions
A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may...
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5508141 |
Autodeposition emulsion and methods of using thereof to selectively protect metallic surfaces
A coating of resin and photoactive functionality is autodeposited from an emulsion onto a metallic substrate in order to selectively protect the substrate from corrosive environments such as...
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5501936 |
Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound
An improved positive-working photoresist composition useful in the fine patterning work of a resist layer is proposed which is capable of giving a patterned resist layer having excellent...
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5498506 |
Positive-acting radiation-sensitive mixture and recording material produced therewith
The invention relates to a radiation-sensitive mixture comprising a) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, b) a compound which forms...
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5494773 |
Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group
A positive photoresist composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound is described, wherein the alkali-soluble novolak resin contains a novolak resin to be...
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5492790 |
Positive photoresist composition containing a dissolution inhibitor and a dye in an organic solvent
A positive photoresist composition applicable for printing and making gas sensors, color filters and the like, without difficulties in process-control for making them, without any deteriorations in...
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5482816 |
Radiation-sensitive composition
A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R 1 represents a substituted methyl group, a substituted ethyl...
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5478692 |
Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone
Proposed is a novel positive-working photoresist composition suitable for use in the fine patterning works in the manufacture of electronic devices and capable of exhibiting excellent performance...
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5478690 |
Alkali developable photosensitive resin composition comprising a binder having betaine side groups
Disclosed is an alkali developable photosensitive resin composition useful for an offset printing plate, which has excellent developability and provides long life of a developer. The photosensitive...
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5468590 |
Positive resist composition
A positive resist composition containing a quinone diazide compound and an alkali-soluble resin which contains a resin (A) obtained by a condensation reaction of an aldehyde compound, at least one...
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5462840 |
Use of poly(35-disubstituted 4-hydroxystyrene/N-substituted maleimide for forming a negative image
A compound, method of manufacture and method for use of an alternating copolymer having the structure ##STR1## wherein X is independently H, C 1 to C 10 alkyl or alkoxy, primary or secondary...
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5460917 |
Positive working photosensitive lithographic printing plate utilizing phenol derivative compound containing photosensitive composition
A positive working photosensitive lithographic printing plate comprising a support having thereon a photosensitive layer comprising a positive photosensitive composition, wherein the positive...
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5456996 |
Radiation-sensitive positive resist composition
A positive resist composition which comprises, in admixture, a photosensitive 1,2-quinone diazide compound, an alkali-soluble resin to bind ingredients and polyphenol compound to control a...
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5451484 |
Positive resist composition
A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented...
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5446126 |
Method for removing metal impurities from resist components
A method of removing metal impurities from a resist component, comprising the steps of: (a) dissolving said resist component in a solvent; (b) washing a cation exchange resin with a solution...
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5441845 |
Photosensitive resin composition comprising a polyimide precursor and a photosensitive diazoquinone
A photosensitive resin composition which is adapted for protecting articles and particularly, electronic parts, therewith comprises a polyimide precursor of the following general formula ##STR1##...
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5437952 |
Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin
A photosensitive lithographic printing plate comprises a conductive support and provided thereon, a photoconductive layer of a composition comprising a photoconductor and an esterified compound of...
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