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4125650 |
Resist image hardening process
Resist images are hardened so that they are flow resistant at elevated temperatures by coating the image with a layer of a quinone-diazide hardening agent and heating the image to cause the agent...
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4115128 |
Positive image forming radiation sensitive compositions containing diazide compound and organic cyclic anhydride
A radiation-sensitive composition capable of producing a positive image upon exposure to actinic radiation and subsequent treatment with a basic solution which comprises (a) an o-naphthoquinone...
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4108664 |
Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine
An improved light-sensitive negative-working diazo type film is described. The film includes a diazo-oxide sensitizer and an additive therefore which improves the actinic opacity of the image...
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4105450 |
Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
A positive light-sensitive composition containing: (a) a quinonediazide type, positive light-sensitive substance and (1) (b) at least one compound selected from the group consisting of those...
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4104070 |
Method of making a negative photoresist image
The invention relates to a method of making a negative photoresist image on a substrate, where a normally positive working photoresist material containing 1-hydroxyethyl-2-alkyl-imidazoline is...
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4059449 |
Photoresist containing a thiodipropionate compound
This invention relates to a photoresist consisting of a novolak resin and a sensitizer containing a thiodipropionate compound.
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4036644 |
Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
Carboxylic acids are included in resists to increase their speed and adhesion.
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4028111 |
Light-sensitive lithographic printing plate
A light-sensitive lithographic printing plate comprising a support with a hydrophilic surface having thereon a light-sensitive layer comprising a light-sensitive polyester containing...
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4009033 |
High speed positive photoresist composition
A positive photoresist having increased sensitivity to light and formed by the addition of an acidic compound to a 1,2-quinone-diazide sulphonic acid ester sensitizer.
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3984250 |
Light-sensitive diazoketone and azide compositions and photographic elements
Light-sensitive compositions including a polymer of the type that is reactable with an azide sensitizer when exposed to light and a sensitizing amount of a naphthalene sensitizer having ortho diazo...
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3969118 |
Light-sensitive o-quinone diazide containing copying layer
This invention relates to an improvement in a light-sensitive copying layer containing an ester or an amide of an o-naphthoquinone diazide sulfonic acid or carboxylic acid together with an organic...
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3953212 |
Pre-sensitized lithoprinting plate requiring no fountain solution
A presensitized lithoprinting plate which needs no fountain solution on printing comprising a support and a coating layer of a mixture of a photosensitive material and a silicone rubber.
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3929488 |
Light sensitive diazo composition with azo dye formed from a diazonium salt and a novolak resin
A light-sensitive positive-working composition for printing plate manufacture comprises, in admixture, a diazonium salt of a strong acid, a novolak resin and an azo-dye which undergoes a colour...
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3902906 |
Photosensitive material with quinone diazide moiety containing polymer
An improved photosensitive material is disclosed which comprises an addition polymer having a molecular weight of at least 5000 as a photosensitive component. The polymer comprises the following...
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3900325 |
Light sensitive quinone diazide composition with N-3-oxohydrocarbon substituted acrylamide
This invention is for a positive working, light sensitive composition useful for diverse applications such as metal plating and etching of metal, ceramics and the like, in a pattern, for example,...
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3868254 |
POSITIVE WORKING QUINONE DIAZIDE LITHOGRAPHIC PLATE COMPOSITIONS AND ARTICLES HAVING NON-IONIC SURFACTANTS
An improved positive working lithographic plate is provided by incorporating a developing additive into the plate coating which allows rapid development of the plate with excellent clarity and...
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3859099 |
POSITIVE PLATE INCORPORATING DIAZOQUINONE
A radiation-sensitive polymer is disclosed useful in forming positive working lithographic plates of exceptional wear, printing and developability characteristics. The radiation-sensitive polymers...
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3785821 |
METHOD OF DEVELOPING VESICULAR PHOTOGRAPHIC MATERIALS
A process for producing a vesicular photographic image while minimizing shrinkage of the backing layer upon which the vesicular photographic material is coated. The coating contains, in addition to...
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3779768 |
FLUOROCARBON SURFACTANTS FOR VESICULAR FILMS
Fluorocarbon surfactants are added to vesicular films to improve the sensitivity thereof, while further maintaining very small vesicle size in the development image which results in films of...
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3778274 |
SPECTRALLY SENSITIZED DIAZO MATERIAL
A dithiocarbamate is mixed with a photolytic aromatic diazo compound to improve the intrinsic sensitivity and spectral sensitivity of the photosensitive material for diazo photography.
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3661582 |
ADDITIVES TO POSITIVE PHOTORESISTS WHICH INCREASE THE SENSITIVITY THEREOF
The use of a scanning electron beam to generate a pattern in a positive photoresist is known. Electron beam equipment can be made which is capable of scanning very quickly, but standard positive...
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3652285 |
PHOTOCHROMIC-PHOTOPOLYMERIZATION COMPOSITIONS
A photographic material and a process for the formation of non-fading images upon exposure to actinic light comprising a light-sensitive layer formed of a photochromic compound and a...
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3650756 |
SENSITIZATION OF LAYERS MADE OF POLYMERS WHICH CAN BE CROSS-LINKED BY THE ACTION OF LIGHT
Recording materials comprising at least one layer of a polymer which can be cross-linked by the action of light. The recording material can be very effectively spectroscopically sensitized,...
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3635709 |
LIGHT-SENSITIVE LITHOGRAPHIC PLATE
Light-sensitive compositions and positive-acting lithographic printing plates made therewith comprising an ester of 2-diazo-1-naphthol-4(or -5)-sulfonic acid with a polyhydroxy-phenyl that is a...
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3615532 |
PRINTING PLATE COMPOSITIONS
A printing plate composition comprising (1) the association product of a normally solid water-soluble ethylene oxide polymer and a heat-fusible phenolic resin, (2) a nonoxidizing acidic compound,...
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3522042 |
PRESENSITIZED DIAZO MATERIAL FOR THE PREPARATION OF PRINTING PLATES
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3522049 |
PHOTOHARDENING
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3404005 |
Diazo light-sensitive composition and element
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3402044 |
Light-sensitive naphthoquinone diazide composition and material containing an alkali insoluble polymer
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3201239 |
Etchable reproduction coatings on metal supports
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3180732 |
Light sensitive iminoquinone diazide and material for the photomechanical preparation of printing plates therewith
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3175906 |
Light sensitive material for the photomechanical preparation of printing plates
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3086861 |
Printing plates comprising ink receptive azo dye surfaces
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3046116 |
Light sensitive material for printing and process for making printing plates
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3046118 |
Process of making printing plates and light sensitive material suitable for use therein
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3046120 |
Light-sensitive layers for photomechanical reproduction
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3046124 |
Process for the manufacture of printing plates and light-sensitive material suitablefor use therein
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3029146 |
Reproduction material
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2974042 |
Diazotype reproduction process
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3827908 |
Title is not available
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3589898 |
Title is not available
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3759711 |
Title is not available
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3730734 |
Title is not available
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3669658 |
Title is not available
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3676134 |
Title is not available
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3567453 |
Title is not available
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