Matches 501 - 550 out of 598 < 1 2 3 4 5 6 7 8 9 10 11 12 >
Match Document Document Title
4544627 Negative image forming process in o-quinone diazide layer utilizing laser beam  
A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide...
4536465 Positive-working photosensitive composition with o-quinone diazide and admixture of resins  
A positive-working photosensitive composition comprising (a) an o-quinonediazide compound and (b) a condensed resin containing a condensation unit composed of an aromatic compound having a...
4526856 Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents  
A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in...
4515885 Diazo vesicular imaging films with nitrate salt  
Vesicular imaging films have good speed and stable latent images when comprised of a diazonium compound, nitrate salt, and binder comprising gelatin or poly(vinyl alcohol). The film can even have...
4504567 Light-sensitive lithographic printing plate  
The invention provides a light-sensitive lithographic printing plate containing a light-sensitive composition which has a different degree of solubility in an exposed area of said printing plate...
4497888 Light-sensitive o-quinonediazide printing plate with oxonol dye  
A light-sensitive printing plate precursor is disclosed. The printing plate precursor is comprised of an aluminum support base having provided on a grained and anodized surface. The surface is...
4493884 Light-sensitive composition  
A light-sensitive composition containing a high molecular compound and a light-sensitive o-naphthoquinonediazide compound is disclosed. The high molecular compound includes a structure unit...
4487823 Light-sensitive copying material and process for the manufacture thereof utilizing non-ionic fluorinated ester surfactant  
The present invention describes a light-sensitive copying material comprising a support and a light-sensitive layer which contains from 0.01 to 10 percent by weight of a non-ionic ester which is...
4477553 Photosensitive compositions  
There is disclosed a photosensitive composition comprising an o-quinonediazide compound and, as a binder resin, a resin containing in the molecule the unit represented by the following formula...
4467025 Photosensitive compositions  
A photosensitive composition containing an o-naphthoquinonediazido compound of Formula I ##STR1## wherein X is an oxy or amino group, Y is a cyano or nitro group, and n is an integer of 2 to 5, and...
4464458 Process for forming resist masks utilizing O-quinone diazide and pyrene  
A resist system for semiconductor device fabrication comprised of bottom positive resist layer of a diazoquinone/novolak resist applied to a substrate and overcoated with a like or different...
4460674 Posi-type quinone diazide photosensitive composition with sensitizer therefor  
A posi-type photosensitive composition having enhanced sensitivity is prepared by incorporating a specific sensitizer selected from gallic acid, its derivative, naphthoquinone compound and its...
4458000 Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light  
Disclosed is a light-sensitive mixture comprising (a) a 1,2-quinonediazide or a mixture of (a 1 ) a compound forming an acid on exposure and (a 2 ) a compound having at least one C--O--C bond...
4457999 Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light  
Disclosed is a light-sensitive mixture comprising (a) a 1,2-quinonediazide or a mixture of (a 1 ) a compound forming an acid on exposure and (a 2 ) a compound having at least one C--O--C bond...
4451550 Vesicular film and composition with phenoxy resin matrix  
Novel, coatable, highly long-chain branched, ungelled, most preferably endblocked, non-linear phenoxy resins of random structure devoid of regularly recurring units, with the average distance...
4444869 Process for using positive-working resist materials to form negative resist pattern on substrate  
An improved positive-working resist material capable of forming on a substrate either a positive resist pattern or a negative resist pattern. The positive-working resist material comprises a...
4442195 Photosensitive composition and article with o-quinone diazide and 6-membered cyclic acid-anhydride  
A photosensitive composition for making lithographic printing plate and for use as a photoresist material which comprises a photosensitive o-quinone diazide compound, an alkali-soluble resin, and...
4431725 Light-sensitive material and image forming processes using the same  
A light-sensitive material having on a support a light-sensitive layer containing an o-quinonediazide compound as a main component and, additionally, a particular compound represented by the...
4424270 Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester  
A light-sensitive mixture comprising a water-insoluble binder soluble in aqueous alkaline solutions, and the reaction product of a naphthoquinonediazidesulfonyl halide with a mixture composed of a...
4411978 Photoresist materials and processes of using with photosensitive naphthoquinone diazides and nitrones  
A photosensitive recording material which includes in a supported layer a mixture of photosensitive substances in admixture with one or more polymers that are soluble in an alkaline aqueous liquid,...
4404272 Light-sensitive mixture and copying material prepared therefrom with novolak having brominated phenol units  
A light-sensitive mixture, which is composed of a light-sensitive compound, for example, an o-quinone-diazide or a diazonium salt polycondensate, or a light-sensitive combination of compounds, for...
4399210 Photosensitive compositions  
A photosensitive composition containing at least one o-naphthoquinonediazide compound represented by the following general formula (I): ##STR1## wherein A represents a divalent aliphatic residue, a...
4377631 Positive novolak photoresist compositions  
Fast positive photoresist compositions employing cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a...
4373017 Photosensitive compound and photosensitive material containing it  
A photosensitive material having a photosensitive layer provided on a support which photosensitive layer comprises a photosensitive compound which forms a color dye directly under irradiation of...
4371602 Photosensitive printing plate  
The photosensitive printing plate of this invention features incorporation of an organic foaming agent in the photosensitive composition that constitutes the photosensitive layer, said organic...
4370405 Multilayer photoresist process utilizing an absorbant dye  
An improved photoetch technique is presented of the multilayer resist type wherein a thin top layer of resist and a thick planarizing layer are deposited on a substrate and the thin layer is...
4365019 Positive-working resist quinone diazide containing composition and imaging method having improved development rates  
There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.
4363866 Recording materials  
Process for forming a vesicular image utilizing a vesicular recording material having an imaging layer which includes a defined sulphone and/or sulphonamide additive in an amount of 1 to 100% by...
4356254 Image-forming method using o-quinone diazide and basic carbonium dye  
An image-forming method is described using a light-sensitive material comprising a support and a light-sensitive layer on the support, said light-sensitive layer containing an o-quinonediazide...
4356255 Photosensitive members and a process for forming patterns using the same  
A photosensitive member comprising a photosensitive layer containing an o-quinonediazide compound as a photosensitive agent and an additive, characterized in that the additive is selected from a...
4350753 Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff  
A colored, positive-acting, radiation-sensitive composition whose color is extinguished or greatly decreased in intensity upon irradiation comprising at least one acid-free resin, at least one...
4347305 Photosensitive lithographic printing plate precursors and methods of preparing printing plate therefrom  
A photosensitive lithographic printing plate precursor which has a camera speed together with all the advantageous features inherent to positive type, conventional PS plates is disclosed. On an...
4336319 Light-solubilizable composition  
A light-solubilizable composition comprising at least one o-quinonediazide compound and at least one alkali-soluble resin compatible therewith as essential components and containing fine particles...
4330479 Thermal decomposition of aryl urethanes  
A process for making aryl isocyanates comprises thermally decomposing aryl urethanes at a temperature between 175° C. and 600° C. in the presence of a catalyst, present in the heterogeneous...
4307178 Plasma develoment of resists  
Exposed patterns in phenol-formaldehyde Novolak resin/diazo ketone resist layers are developed in an oxygen plasma by treating the resist layers, prior to development, with a magnesium salt. This...
4307173 Light-sensitive composition comprising phthalic anhydride  
Disclosed is an improved photosensitive composition having increased light sensitivity. Said composition comprises an O-quinone diazide, phthalic anhydride and an aromatic sulfonic acid.
4307181 Masking agent for the deposition of a material and method for such a deposition using this masking agent  
To prepare a masking agent resistant to temperature, one adds silica powder to a photoresist. The mixture thus obtained is used to produce selective deposition of a layer of material on a...
4299906 Light-sensitive color proofing film with surfactant in a light-sensitive coating  
A color proofing foil of increased developability is provided which comprises a substantially transparent polymeric base sheet having a thin coating of a light sensitive composition on the surface...
4296194 Positive-working light sensitive diazo materials with azo dye  
A positive working light-sensitive composition comprises in admixture (a) a first component which is an azo dye formed by reacting a p-amino-benzene diazonium salt and a compound including the...
4284706 Lithographic resist composition for a lift-off process  
Lithographic resist compositions are provided which permit an improved lift-off process in which the deposition mask with apertures has the desirable negative slope or overhang. The resist...
4279982 Photosensitive compositions  
A photosensitive composition containing the 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compound represented by the following general formula: ##STR1## wherein X represents a chlorine atom or a bromine...
4271251 Photosensitive compositions  
A stabilized photosensitive composition comprising a leuco dye, a photooxidizing agent, and further a 2,4-dihydroxybenzaldoxime which is suitable for use in lithography, photoresists, etc., for...
4266001 Light-sensitive mixture  
A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble...
4259430 Photoresist O-quinone diazide containing composition and resist mask formation process  
A resist composition includes an alkali soluble resin, a light sensitive diazo compound, and a thermally activated free radical initiator. Resist masks are formed from the above composition by...
4247611 Positive-working radiation-sensitive copying composition and method of using to form relief images  
This invention relates to a radiation-sensitive copying composition which comprises (a) a compound which forms an acid under the influence of actinic radiation, and (b) an organic polymeric...
4232106 Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors  
Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds represented by the following general formula (I): ##STR1## wherein W represents a substituted or unsubstituted...
4212935 Method of modifying the development profile of photoresists  
The cross-sectional profile which is produced upon development of a layer of alkali soluble resin-diazo ketone photoresist is modified by treating the layer with a solvent or solvent mixture which...
4191573 Photosensitive positive image forming process with two photo-sensitive layers  
A photosensitive image forming element comprising: a support; photosensitive layer therein which is rendered alkali-soluble upon exposure and which comprises (i) an azide compound having at least...
4168978 Transfer foil  
Composite foils for producing colored advertising indicia comprise a colored, tacky layer between two release foils, the colored layer being sensitive to light either as being solubilized in...
4164421 Photocurable composition containing an o-quinonodiazide for printing plate  
A photosensitive printing plate comprising a support having thereon a photosensitive layer comprising a photo-curable composition and an o-quinonediazide compound in an amount of about 0.05 to 4...
Matches 501 - 550 out of 598 < 1 2 3 4 5 6 7 8 9 10 11 12 >