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8168372 |
Method of creating photolithographic structures with developer-trimmed hard mask
Novel, developer-soluble, hard mask compositions and methods of using those compositions to form microelectronic structures are provided. The composition comprises the compound a compound for...
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8168371 |
Positive photosensitive resin composition
It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface...
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8163463 |
Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a...
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8133644 |
Method of forming an image having multiple phases
A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting...
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8097386 |
Positive-type photosensitive resin composition, method for producing patterns, and electronic parts
A positive-type photosensitive resin composition for electronic materials having good film adhesiveness and sensitivity without causing a corrosion reaction to copper and copper alloys in metal...
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8053167 |
Curable compositions containing hydroxythiol compound, and cured products thereof
Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by...
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8048613 |
Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same
An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the...
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7972754 |
Fluorinated polymer, negative photosensitive resin composition and partition walls
To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative...
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7928262 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Sulfonate salts have the formula: HOCH2CH2CF2CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts a...
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7867810 |
Method for manufacturing a solid-state image capturing apparatus
A method for manufacturing a solid-state image capturing apparatus including a pixel array constituted of a plurality of pixels, is provided, where each of the plurality of pixels includes a...
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7851125 |
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern...
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7781131 |
Positive photosensitive resin composition, cured layer , protecting layer, insulating layer and semiconductor device and display therewith
A positive-type photosensitive resin composition comprises (A) an alkali-soluble resin having at least a polybenzoxazole precursor structure, (B) a sensitizer, and (C) a cyclic compound having an...
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7776515 |
Method for forming a pattern on a semiconductor device using an organic hard mask
A composition for the organic hard mask includes a polyamic acid compound, and a method for forming a pattern is used in a manufacturing process of semiconductor devices by coating the composition...
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7713680 |
Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device
A radiation sensitive resin composition for forming a protective film, comprising: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy...
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7704673 |
Prevention of photoresist scumming
A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist...
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7700246 |
Conductive lithographic polymer and method of making devices using same
A conductive photolithographic film and method of forming a device using the conductive photolithographic film. The method includes depositing a conductive photolithographic film on a top surface...
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7695875 |
Photo-sensitive composition
The invention pertains to a photo-sensitive composition which comprises a photochemical initiator, a polyacid or a salt thereof, and a poly(3,4-alkylenedioxythiophene) wherein the alkylene moiety...
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7687208 |
Positive photosensitive resin composition
A positive photosensitive resin composition excellent in sensitivity and resolution, characterized by comprising 100 parts by mass of (A) a hydroxypolyamide comprising repeating units represented...
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7678514 |
Positive-type photosensitive resin composition, cured film, protecting film, insulating film and semiconductor device and display device using these films
A positive-type photosensitive resin composition that exhibits excellent adhesion to a substrate after a humidification treatment includes (A) an alkali-soluble resin, (B) a photosensitive...
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7655365 |
Wettability variable substrate and wettability variable layer forming composition
It is a main object of the present invention to provide a wettability variable substrate provided with a wettability variable layer which is free from any cloud and is superior in adhesion to a...
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7642018 |
Photosensitive resin composition, pattern forming method and electronic parts using the photosensitive resin composition
A photosensitive resin composition includes (a) a polymer mainly composed of a repeating unit represented by the following general formula (I); (b) a dissolution accelerator for a developing...
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7629091 |
Polyimide compound and flexible wiring board
A polyimide compound has a low coefficient of linear thermal expansion comparable to the coefficient of linear thermal expansion of a conductor to be covered by the polyimide. The polyimide...
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7615324 |
Photosensitive composition, and cured relief pattern production method and semiconductor device using the same
A photosensitive resin composition includes (a) a resin comprising a repeating unit represented by a following formula (1); (b) a photosensitive agent; (c) a thermo-acid generator; and (d) a...
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7615323 |
Lithographic printing plate precursors with oligomeric or polymeric sensitizers
Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more...
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7598009 |
Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device
According to the present invention, there is provided: a photosensitive resin composition comprising a polyamide resin having a specific structure, a photosensitive agent, and a compound having at...
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7582403 |
Metal compositions, thermal imaging donors and patterned multilayer compositions derived therefrom
The invention provides metal compositions, including silver compositions, and thermal imaging donors prepared with the compositions. The donors are useful for thermal transfer patterning of a metal...
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7575851 |
Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member
A cationic photopolymerizable epoxy resin composition includes an epoxy resin, a cationic photopolymerization initiator, an inhibitor of cationic polymerization and a compound that has a...
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7569327 |
Curable polymer compound
This invention relates to a novel polymer compound, and a process for preparing the same and a radical polymerizable, curable composition using the same. The polymer of the invention has in the...
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7524594 |
Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films...
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7524613 |
Material for the treatment of lithographic substrates and lithographic printing plates
Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first...
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7524610 |
Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound
An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization...
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7517641 |
High performance curable polymers and processes for the preparation thereof
Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the...
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7504341 |
Method of manufacturing a semiconductor apparatus using a substrate processing agent
A method of manufacturing a semiconductor device, including the steps of forming one or more insulation films over a substrate, said one or more insulation films including an insulation film at a...
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7476476 |
Photosensitive resin composition, electronic component using the same, and display unit using the same
This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having...
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7452950 |
Photochromic monomers, photochromic polymers based on the same, photochromic recording media comprising the photochromic polymers, and 3D read/write optical memory comprising the recording media
Photochromic monomers and methods for preparing these photochromic monomers, photochromic polymers based on these photochromic monomers and methods for preparing these photochromic polymers, as...
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7416822 |
Resin and resin composition
Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and...
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7405028 |
Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography
A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives.
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7378222 |
Antihalation compositions
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a...
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7374862 |
Photosensitive resin composition and curing product thereof
A photosensitive resin composition that excels in sensitivity to actinic energy rays (photosensitivity), is hardenable within a short period of time and can form pattern through development with a...
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7368205 |
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure...
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7361445 |
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
A positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH2OH group but not a phenolic h...
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7338737 |
Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl...
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7332254 |
Positive photosensitive insulating resin composition, cured product thereof, and electronic component
Disclosed is a positive photosensitive insulating resin composition including: (A) an alkali soluble resin,(B) a compound having a quinonediazide group, and(C) an epoxy resin having a softening...
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7318985 |
Block copolymer composition for photosensitive flexographic plate
A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking...
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7309550 |
Photosensitive composition with low yellowing under UV-light and sunlight exposure
This disclosure relates to a photosensitive composition useful in preparing water-developable, relief printing plates and other photosensitive articles. The compositions comprise an unsaturated...
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7297751 |
Photocontrolled photochromic electroluminescent and electroconductive polymers for photonics
The invention relates to photochromic monomers based on benzothiophenes and a method for preparing them, and to photochromic polymers-polyazomethines that are reversibly photocontrollable due to...
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7290328 |
Method of manufacturing optical modulator
Major surface of a substrate having an optical waveguide and a modulation electrode is pasted to a base substrate through a thermosetting resin, and then the rear surface of the substrate is...
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7291444 |
Photosensitive ceramic composite and method for manufacturing multilayer substrate including the composite
The present invention relates to a photosensitive ceramic composite and a method for manufacturing a multilayer substrate using the composite. The photosensitive ceramic composite and manufacturing...
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7285372 |
Radiation-sensitive elements and their storage stability
Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the...
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7282323 |
Highly heat-resistant, negative-type photosensitive resin composition
Disclosed is a negative type photosensitive resin composition comprising (A) a polyamide having a photopolymerizable unsaturated double bond, (B) a monomer having a photopolymerizable unsaturated...
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