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7592118 |
Positive resist composition and pattern forming method using the same
A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to...
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7468228 |
Light shielding film for display device, production process thereof, metal-particle-containing composition, photosensitive transfer material, substrate for display device, and color filter
A light shielding film for a display device, comprising a polymer binder, metal particles dispersed in the polymer binder, and a compound including a sulfur atom or a nitrogen atom. A substrate for...
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7399576 |
Positive-working radiation-sensitive composition and elements
Radiation-sensitive compositions can be used to prepare imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble...
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7381516 |
Multiphoton photosensitization system
A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising...
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7364831 |
Positive resist composition and resist pattern formation method
A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the...
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7329478 |
Chemical amplified positive photo resist composition and method for forming resist pattern
To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an...
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7323284 |
Negative type radiation sensitive resin composition
A negative type radiation sensitive resin composition comprising:
(A) an alkali-soluble resin containing the polymerized unit of a polymerizable unsaturated compound having a phenolic...
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7282316 |
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular,...
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7226717 |
Resin composition
The present invention relates to a resin composition comprising: an alkali-soluble resin (A); an infrared absorbing agent (B); and a thiol compound (C), wherein a solubility thereof in an alkaline...
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7214465 |
Positive photosensitive composition
A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine...
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7150956 |
Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device
The present invention provides a resist composition comprising (A) polyhydroxystyrene in which at least a portion of hydrogen atoms of hydroxyl groups are substituted with an acid-dissociable...
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7141351 |
Basic compound, resist composition and patterning process
Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in...
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7118845 |
Multiphoton photochemical process and articles preparable thereby
A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical...
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7109311 |
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages...
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7101651 |
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus...
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7056640 |
Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process
Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the...
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7026091 |
Positive photoresist composition and patterning process using the same
A positive photoresist with uniform reactivity for use in a thick film lithography process, includes thermal curing during soft-baking and photo dissociation through UV exposure. The positive...
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7015256 |
Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same
A photosensitive composition for forming a dielectric of the present invention comprising inorganic particles, an alkali developable resin and additives, wherein the additives comprise a compound...
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7005229 |
Multiphoton photosensitization method
A method of multiphoton photosensitizing comprises
(a) providing a multiphoton-activatable, photoreactive composition comprising
(1) at least one reactive species that is capable of...
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6927274 |
Resin compositions, processes for preparing the resin compositions and processes for forming resin films
Polyimide precursors contained in resin compositions of the present invention have a polymer structure unit represented by formula (1) below:
wherein chemical structure A 2 includes an...
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6924323 |
Sulfonium salt compound
A compound shown by the general formula [1]
(wherein R 1 , R 2 and R 3 are each independently an aromatic hydrocarbon residual group, Y n− is an anion derived from a carboxylic acid having...
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6921621 |
Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device
The present invention provides a resist composition comprising (A) polyhydroxystyrene in which at least a portion of hydrogen atoms of hydroxyl groups are substituted with an acid-dissociable...
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6908727 |
Photosensitive composition and planographic printing plate precursor
This invention describes a heat sensitive composition comprising: (A-I) a compound which is represented by the following general formula (I) and generates a radical when heated, and (B-I) a...
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6875554 |
Positive photosensitive polyimide resin composition
A positive photosensitive polyimide resin composition comprising:
(a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that...
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6846607 |
Carbazole derivative and chemically amplified radiation-sensitive resin composition
A carbazole derivative of the following formula (1),
wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon...
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6824948 |
Electron beam or X-ray negative-working resist composition
A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B) a resin...
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6824949 |
Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor
There are disclosed polybenzoxazole precursors which can be processed by centrifugal techniques, which can be cyclized to polybenzoxazoles on substrates without difficulty, and which after...
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6790579 |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile...
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6784275 |
Active energy ray-curable polyimide resin composition
Disclosed is an active energy ray-curable polyimide resin composition which comprises a polymerizable polyimide resin (I) having an isocyanurate ring, an alicyclic structure, an imide ring and a...
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6746985 |
Heat-sensitive recording material
A full-color heat-sensitive recording material. At least a heat-sensitive recording layer that color-develops to yellow color; a heat-sensitive recording layer that color-develops to cyan color and...
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6727033 |
Positive resist composition
A positive resist composition comprising a resin (A), which is decomposed by the action of an acid to increase solubility in an alkali developing solution, containing a structural unit including a...
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6727032 |
Radiation-sensitive resin composition
A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is...
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6723483 |
Sulfonium salt compounds
A triphenyl sulfonium salt compound shown by the general formula [1] or [3]. (wherein R 1 and R 2 are each independently a hydrogen atom or a lower alkyl group, provided that at least one of R...
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6723485 |
Positive resist composition and process for forming resist pattern using same
A positive resist composition contains (a) an acrylic resin which is subject to a change in solubility in a basic aqueous solution, the acrylic resin comprising an acrylic or methacrylic acid ester...
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6713612 |
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are...
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6703178 |
Chemical amplified photoresist compositions
The present invention discloses a chemical amplified photoresist composition including a polymer having a repeated unit of the formula (II), wherein R 1 is H, haloalkyl group or C 1 -C 4 alkyl...
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6692883 |
Positive photoresist composition
A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the...
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6692884 |
Positive photoresist composition
A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound...
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6689530 |
Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C 1-4 alkyl or alkoxy, G is SO 2 or CO, R 3 is...
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6677103 |
Positive-working photoresist composition
Disclosed is a novel chemical-amplification positive-working photoresist composition capable of giving a patterned resist layer with excellent properties such as photosensitivity, pattern...
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6656660 |
Resist composition
A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane...
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6653043 |
Active particle, photosensitive resin composition, and process for forming pattern
Active particles which when incorporated into a photosensitive composition containing base resin and diazonium-series photosensitizer provide improvement in at least one or both of sensitivity and...
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6641984 |
Method of frame plating and method of forming magnetic pole of thin-film magnetic head
In the method of frame plating according to the invention, a first patterned resist layer is formed using a first resist containing a material generating an acid; the first patterned resist layer...
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RE38254 |
Positive resist composition
Disclosed is an improved, chemically-amplifying positive resist composition for radiations, especially UV rays, deep-UV rays, excimer laser beams, X-rays, electron beams. The composition comprises...
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6613844 |
Styrene polymer, chemically amplified positive resist composition and patterning process
A chemically amplified positive resist composition comprising a styrene polymer represented by formula (1), terminated with P, and having a weight average molecular wherein R is OH or OR 3 , R 1...
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6593056 |
Chemically amplified positive resist composition and patterning method
A chemically amplified, positive resist composition comprising an organic solvent, a polymer having acid labile groups, a photoacid generator, a basic compound, and a compound containing at least...
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6586152 |
Agent for reducing substrate dependence
The present invention relates to an agent for reducing substrate dependence useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which...
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6566040 |
Method of manufacturing a semiconductor device and semiconductor device manufactured by the method
First, a hole pattern or a separation pattern of a first resist that is capable of supplying acid is formed on a semiconductor substrate. Then, a crosslinked film (organic frame) is formed on the...
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6544712 |
Negative working resist composition
The present invention provides a negative working resist composition comprising a diazosulfonic acid compound capable of generating an acid with irradiation of radiation and an organic amine...
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6537722 |
Infrared-imageable recording material and offset printing plates produced from it
A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing...
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