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7374856 |
Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film
A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a...
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7361444 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose...
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6815138 |
Heat-sensitive recording material
A heat-sensitive recording material includes a support having disposed thereon a heat-sensitive recording layer and a protective layer. The heat-sensitive recording layer contains at least two...
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6683674 |
Image recording device
There is provided an image recording device which is compact and free of waste materials, which has a completely dry system and a simplified exposure system, and which can carry out high speed...
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6531257 |
Photosensitive copper paste and method of forming copper pattern using the same
Provided is a photosensitive copper paste permitting the formation of a fine and thick copper pattern having high adhesion to a substrate, and having excellent preservation stability without...
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6346361 |
Method for synthesizing polymeric AZO dyes
A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase;...
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5994031 |
Method of processing presensitized planographic printing plate
Disclosed is a method of processing an exposed presensitized planographic printing plate employing an automatic processor, the method comprising the steps of developing the exposed presensitized...
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5866295 |
Photosensitive quinolone compounds and a process of preparation
The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as,...
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5858627 |
Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers
Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl...
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5853947 |
Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate
A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming...
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5837417 |
Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl...
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5753403 |
Diazo based imaging element containing hydrolysed polyvinyl alcohol and metal-free phthalocyanine
The present invention provides an imaging element comprising on a hydrophilic base a light-sensitive layer containing polyvinyl alcohol hydrolyzed to at least an extent of 95% by weight, a cationic...
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5753404 |
Photosensitive recording material containing negative working diazonium salt layer and discontinuous top layer
A photosensitive recording material is described which has a layer base, a negative-working photosensitive layer containing a diazonium salt and a water-insoluble polymeric binder which is soluble...
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5725903 |
Sedimentary deposition of photoresist on semiconductor wafer
A conformal, substantially uniform thickness layer of photoresist is deposited on a semiconductor wafer by causing photoresist solids to "sediment" out of solution or suspension. Generally, the...
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5719003 |
Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers
A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a...
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5688627 |
Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them
A water soluble diazonium salt composition made by the condensation of diazoaryl amines and aldehydes and precipitated to form a polymeric anionic species having both ZnCl 4 = and HSO 4 - ...
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5670294 |
Aqueous alkaline solution for developing offset printing plates
The present invention relates to an aqueous alkaline developing solution comprising an alkaline mixture of an alkali metal silicate and/or an alkali metal metasilicate, wherein the M 2 O/SiO 2 ...
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5656413 |
Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
The present invention provides methods for producing TPPA having low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition...
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5637436 |
Method for removing photoresist composition from substrate surfaces
Ternary mixtures of C 4 to C 8 alkyl acetate, C 4 to C 8 alkyl alcohol, and water, formulated to have a flash point of above 100° F., are disclosed, particularly for use in edge residue...
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5618655 |
Process of reducing trace levels of metal impurities from resist components
A process of removing trace metal impurities from an impure resist component solution comprising the steps of: (1) forming an impure resist component solution containing trace amounts of...
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5614349 |
Using a Lewis base to control molecular weight of novolak resins
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis...
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5547806 |
Process for producing microcapsule containing diazonium salt compound and photo- and heat-sensitive recording material produced using the same
The invention is directed to a process for producing microcapsules containing a diazonium salt compound by the steps of (i) adding a dialkyl sulfate compound represented by the formula: RO--SO 2 ...
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5492789 |
Process for producing microcapsules containing a diazonium salt compound and a photofixation thermal recording material employing the same
A process for producing microcapsules containing a diazonium salt compound, and a photofixation thermal recording material employing the same. The process comprises adding an organic solvent...
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5476750 |
Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions and a substantially consistent molecular weight. A...
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5457003 |
Negative working resist material, method for the production of the same and process of forming resist patterns using the same
A resist material comprises a polysiloxane obtained by hydrolysis and condensation with dehydration of one or more alkoxysilanes having an oxirane ring, or of a mixture of the alkoxysilane(s)...
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5426017 |
Composition and method for removing photoresist composition from substrates surfaces
Ternary mixtures of C 4 to C 8 alkyl acetate, C 4 to C 8 alkyl alcohol, and water, formulated to have a flash point of above 100° F., are disclosed, particularly for use in edge residue...
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5422221 |
Resist compositions
In a resist composition, a novolak resin including at least one recurring unit of the formula (1): ##STR1## wherein n is an integer of 1 to 4 and m is an integer of 0 to 3, having a weight average...
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5401604 |
Positive-type photosensitive resin compositions with quinone diazide sulfonyl unit
A positive-type photosensitive resin composition containing a resin which results from reactions between a specific polyepoxide compound, a carboxylic acid compound having a specific phenolic...
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5376504 |
Acid-hardening photoresists comprising a purified hexamethoxy methylmelamine resin as a crosslinker
Photoresists are disclosed that display increased sensitivity, measured as lithographic potential, when compared to known photoresists that contain melamine resin as a crosslinker. The melamine...
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5340681 |
Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
Photopolymeric printing plates are presented wherein and electrochemically etched and anodized, silicated aluminum substrate has a single photosensitive coating thereon composed of a...
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5328797 |
Process for producing a negative-working lithographic printing form utilizing solvent mixture of mono-(C.sub.1 -C.sub.4) alkyl ether of diethylene glycol and a solvent having boiling point between 50° and 150° C.
The present invention relates to a process for producing a negative-working photosensitive lithographic printing form, in which a negative-working photosensitive mixture which is dissolved in a...
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5326826 |
Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation
Radiation-sensitive polymers, a mixture containing these radiation-sensitive polymers as binder, and a process for the preparation of the radiation-sensitive polymer binders are disclosed. A...
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5302490 |
Radiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resin
The invention relates to radiation sensitive compositions having high uniformity when deposited as thick films. The compositions of the invention comprise a radiation sensitive component and a...
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5300396 |
Process of making naphthoquinone diazide esters using lactone solvents
A method of preparing a photosensitizer condensate comprising: condensing a phenolic compound with a diazo sulfonyl chloride, wherein from about 50 to 100 mole percent of the diazo moiety is...
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5242780 |
Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
An electrophoretic positive working photosensitive composition for producing a photoresist pattern on metal base plate comprises a photosensitive compound, in which a photosensitive quinone diazide...
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5223376 |
Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent
A method for producing fine patterns is disclosed, comprising spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, water...
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5217840 |
Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone...
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5192640 |
Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof
A process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof, of the general formula Z ##STR1## is disclosed in which X=hydrogen, a metal or an ammonium group,...
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5183722 |
Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition
A positive photosensitive composition for forming lenses, which comprises a polymer, a photosensitive agent, a thermosetting agent and a solvent, wherein said polymer is an alkali-soluble resin,...
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5166036 |
Electrodeposition coating composition and image-forming method using the same
The invention provides an aqueous electrodeposition coating composition for a positive working resist and an image-forming method using the same. The coating composition is very stable under...
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5151339 |
Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin
Process for producing dimer-free phenolic polymers, particularly novolak polymers produced from cresol mixtures, and photoresist compositions containing such dimer-free novolak polymers. The...
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5145763 |
Positive photoresist composition
A positive photoresist composition containing (i) a quinone diazide polymer formed by reacting a cresol-formaldehyde novolac resin and an o-quinonediazide compound, and (ii) a sulfonamide...
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5122442 |
Method for forming an image from a high speed screen printing composition on a screen mesh
The method for forming an image which comprises I). providing a mesh fabric substrate, and II). coating said substrate with a light sensitive screen printing composition which comprises in...
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5087547 |
Dual-tone photoresist utilizing diazonaphthoquinone resin and carbodiimide stabilizer
The resolution and stability of liquid, dual-tone photoresist formulations containing novolac resins and photoactive compounds are enhanced by the incorporation therein of certain carbodiimide...
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5080998 |
Process for the formation of positive images utilizing electrodeposition of o-quinone diazide compound containing photoresist on conductive surface
A process for the formation of an image comprises (i) electrodepositing on a conductive surface a photosensitive film from an aqueous composition which is a solution or dispersion comprising a...
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5080997 |
Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture
A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation...
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5080996 |
Color proofing system having a graduated layer of resins with different solubilities
A photosensitive element which comprises a substrate having a release surface; a photosensitive layer having a photosensitizer, pigment, and mixture of binders with different solubility...
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5075193 |
Desensitized quinone diazide compounds utilizing microcrystalline cellulose as desensitizing agent
The invention relates to desensitized quinone diazide compounds for use as photoactive components in radiation-sensitive compositions, such as, especially, photoresists, which compounds contain...
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5066561 |
Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl...
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5063138 |
Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
A light-sensitive composition comprising an admixture of: (a) at least one alkali-soluble binder resin; (b) at least one photoactive compound; (c) a sufficient amount of a solvent mixture...
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