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Document Title |
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7252912 |
Polymer composite
A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer...
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6924085 |
Photoresist coatings for copper clad stainless steel printing plates
A copper clad metal printing plate can be coated with an azide-containing photoresist comprising a polyformal resin together with a modified polyformal resin that has up to 100% of its hydroxyl...
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6908719 |
Photosensitive compound and photosensitive composition
The present invention relates to a water-soluble photosensitive compound represented by the general formula (1):
or by the general formula (2):
in the formula, X represents a direct bond,...
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6821692 |
Kind of thin films for microsystem technology and microstructuring and their use
The present invention relates to novel thin layers for microsystem techniques and microstructuring. It is an object of the invention to provide thin layers which can be manufactured under less...
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6664019 |
Aluminum printing plates and method of making
A method of making improved aluminum printing plates comprising graining the aluminum plates, de-smutting them by treating them with nitric acid solution, then rinsing with hot water, acetating the...
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6605406 |
Imageable photoresist laminate
A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at...
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6444391 |
Photosensitive compositions and pattern formation method
Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The...
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6291060 |
Water-developable plate package
The present invention concerns a water-developable plate package comprising water-developable plates packaged in a laminated state. The water-developable plate is a sheet-like plate comprising a...
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6232037 |
Lithographic printing plate, method for producing lithographic printing plate, and method for producing support for lithographic printing plate
A lithographic printing plate having an average curvature in a rolling direction of 1.5×10 -3 mm -1 or less, a curvature distribution in a crosswise direction of 1.5×10 -3 mm -1 or less, and...
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6112408 |
Method for fabricating a chip carrier which includes at least one photo-via
A method for fabricating a chip carrier, e.g., a printed circuit board, which includes at least one photo-via is disclosed. This method inlcudes the steps of forming a first dielectric layer on a...
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6027849 |
Ablative imageable element
This invention provides an imageable element comprising a substrate having on at least one major surface thereof a layer of energy-sensitive material that is capable of being developed to form a...
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6020093 |
Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin...
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6004705 |
Photosensitive ceramics green sheet
A ceramics green sheet which is suitably used for producing sintered ceramics substrates and the like is disclosed. The ceramics green sheet according to the present invention includes a ceramics...
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5885744 |
Photoresist composition
A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of...
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5866296 |
Photosensitive resin composition
A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic...
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5853928 |
Method for forming braun tube's fluorescent layer
A method for electrophotographically forming a Braun tube's fluorescent layer coats conductive and photoconductive layers on the internal surface of a Braun tube's panel. The photoconductive layer...
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5795701 |
Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound
Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in...
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5783361 |
Microlithographic structure with an underlayer film containing a thermolyzed azide compound
Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in...
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5725978 |
Water-soluble photosensitive resin composition and a method of forming black matrix patterns using the same
The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula(I): ##STR1## (where X is Na, K or NH 4 ) and a water-soluble polymer...
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5705309 |
Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder
An infrared imaging composition comprises three essential components: a photocrosslinkable polymeric binder having pendant photopolymerizable olefinic double bonds, a polyazide photoinitiator and...
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5663036 |
Microlithographic structure with an underlayer film comprising a thermolyzed azide
Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in...
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5650257 |
Radiation sensitive devices
A radiation sensitive device comprising a substrate carrying a radiation sensitive layer is coated with a discontinuous covering layer which is more light sensitive than the radiation sensitive...
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5629132 |
Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photo-sensitive film which comprises...
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5614354 |
Method of forming positive polyimide patterns
The present invention relates to a method of forming positive polyimide patterns which includes a process wherein a film of a composition of actinic radiation-sensitive polyimide precursor is...
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5593814 |
Control of cell arrangement
A device for controlling cell arrangement having a pattern composed of a cell adhesive surface and a cell non-adhesive surface, which has a good selectivity of cell adhesion and which can provide a...
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5565301 |
Process for forming a colored image
A process for forming a colored image comprising, in order: (A) imagewise exposing to actinic radiation a photosensitive element comprising a carrier support, a carrier surface, a first adhesive...
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5561026 |
Photosensitive materials comprising fullerene
A photosensitive material comprising a photosensitive-group-containing fullerene such as a photosensitive material which is obtained by adding a photosensitive group to fullerene and/or a...
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5541035 |
Method of forming multicolor image
A method of forming a multicolored image wherein image layers etc. formed on photosensitive transfer sheets are transferred in turn onto an image-receiving sheet and then, its image layer etc. are...
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5532116 |
Aqueous alkaline developing solution
An aqueous alkaline developing solution comprises an alkali compound, water and an alkylnaphthalene sulfonate having the following formula: ##STR1## in which R represents an alkyl group of 3 to 5...
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5532105 |
Photolithographically viahole-forming photosensitive element comprising two photosensitive layers for the fabrication process of multilayer wiring board
A photolithographically viahole-forming photosensitive element is formed of a light-transmitting base material and a photosensitive resin composition laminated as a layer on the light-transmitting...
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5529879 |
Photosensitive sheet comprising a substrate having a molecular orientation ratio in the range of from 1.0 to 1.4
This invention relates to a photosensitive sheet having on a substrate one or more resin layers that are peelable from the substrate and heat-fusible, and a colored photosensitive layer in this...
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5518857 |
Image-carrying mask photo-sensitive laminate film for use in making an image carry mask
A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photo-sensitive film which comprises...
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5518864 |
Method of forming polyimide film pattern
Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1##...
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5518858 |
Photochromic compositions and materials containing bacteriorhodopsin
Photochromic compositions comprise a bacteriorhodopsin suspension, at least one organic nitrogen-containing compound and a binder. The composition may further include a detergent. Photochromic...
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5486447 |
Negative resists with high thermal stability comprising end capped polybenzoxazole and bisazide
Cost-effective, negative resists having high thermal stability based on oligomeric and/or polymeric polybenzoxazole precursors are disclosed. Also disclosed are resist solutions having a high level...
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5443938 |
Photosensitive printing member having ink-receptive capillary structures in the support and photosensitive layer
A photosensitive printing member comprises a porous supporting member and a photosensitive layer formed on the porous supporting member. The photosensitive layer comprises a photosensitive material...
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5441844 |
Optical information recording medium using bisazo or trisazo compounds
Bisazo compounds of formula (I), an intermediate for producing the bisazo compound of formula (I), and trisazo compounds of formula (II) for use in optical information recording media, and methods...
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5427890 |
Photo-sensitive laminate film for use in making the mask comprising a supporting sheet, an image mask protection layer which is water insoluble and a water soluble image mask forming composition
A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photosensitive film which comprises...
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5424368 |
Photosensitive resin comprising a polymer having an azide group in the side chain
A photosensitive resin having at least one group as shown below in Chemical Formula (1) in a molecule. ##STR1## wherein n represents an integer from 1 to 10. Since the photosensitive resin has an...
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5419995 |
Photoresist composition with alternating or block copolymer resins and positive-working o-quinone diazide or negative-working azide sensitizer compound
A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an...
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5415968 |
Surface protective film of color filter
A solution containing a low-temperature curing type organosilicon ladder resin composition comprising: (A) a polylphenysylsesquioxane which has a hydroxyl group at the end, in which 3% of the side...
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5401603 |
Aqueous-processable imaging element tonable at room temperature before and after exposure to actinic radiation
A tonable, aqueous-processable, photosensitive element and process for forming a colored image from said element is described. The element comprises a support and a tonable, aqueous-processable...
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5393640 |
Peel apart photosensitive material utilizing a barrier layer containing an aromatic (meth)acrylate containing copolymer with a T.sub.g under 70° C.
A photosensitive material either comprises a support, a peel layer, a barrier layer and a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a...
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5385804 |
Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer
A silicon-containing negative photoresist is used as the top imaging layer in a bilayer substrate patterning scheme. The photoresist is a single component resist in which the photoactive element is...
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5348835 |
Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent
Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1##...
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5342727 |
Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition
A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C 1 to C 4 alkyl...
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5340684 |
Photosensitive composition and resin-encapsulated semiconductor device
A photosensitive composition contains a polyimide constituted by a repeating unit having a hydroxyl group and a repeating unit having a siloxane bond, or a repeating unit having a hydroxyl group, a...
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5326670 |
Process for forming resist pattern
A resist composition for forming a upper resist layer and a process for forming a pattern thereby are disclosed. This resist comprises an azide compound and a polyacrylic copolymer of the following...
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5320935 |
Method of forming a pattern from a photosensitive heat-resistant poly(amide)imide having hydroxyphenyl groups
A photosensitive polymer containing a repeating unit represented by the following formula (I) and having a logarithmic viscosity number of from 0.1 to 5 dl/g as measured in a solvent at a...
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5298359 |
Photosensitive heat-resistant polymer having hydroxyphenyl group for forming a patterned image
A photosensitive polymer containing a repeating unit represented by the following formula (I) and having a logarithmic viscosity number of from 0.1 to 5 dl/g as measured in a solvent at a...
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