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7507518 |
Photosensitive resin precursor composition
The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises...
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7419763 |
Near-field exposure photoresist and fine pattern forming method using the same
A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field...
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7368205 |
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure...
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7217489 |
Planographic printing plate
A negative-type planographic printing plate having, disposed on a support, a recording layer comprising an image recording material which contains an infrared ray absorbing agent and can be...
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7214455 |
Photosensitive resin composition and process for producing heat-resistant resin film
The present invention is directed to a photosensitive resin composition comprising (a) a resin having a specific structure, (b) a photosensitive agent, and (c) an organic solvent having a boiling...
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7101650 |
Photosensitive resin composition for photoresist
The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate...
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7001705 |
Positively photosensitive resin composition and method of pattern formation
The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high...
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6908717 |
Positive photosensitive resin composition, process for its preparation, and semiconductor devices
The present invention provides a positve photosensitive resin composition of high sensitivity which can form a pattern of high resolution and high residual film ration and which can give a cured...
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6893795 |
Lithographic printing plate precursor and production method of lithographic printing plate
A positive working lithographic printing plate precursor comprising a lower layer containing a water-insoluble and alkali-soluble resin, and an upper heat-sensitive layer containing a...
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6893791 |
Photoresist composition and method of forming pattern using the same
Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by...
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6841330 |
Planographic printing plate precursor
A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A...
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6824947 |
Photosensitive composition comprising a phenol resin having a urea bond in the main chain
Photosensitive compositions comprising a phenol resin having a urea bond in the main chain, planographic printing plate precursors containing the photosensitive compositions, and methods for...
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6821692 |
Kind of thin films for microsystem technology and microstructuring and their use
The present invention relates to novel thin layers for microsystem techniques and microstructuring. It is an object of the invention to provide thin layers which can be manufactured under less...
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6815140 |
Positive resist composition
A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, is described and includes a novolac resin, a...
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6806019 |
High-resolution photosensitive resin composition usable with i-line and method of forming pattern
A radiation sensitive resin composition for i-line light exposure comprising an alkaline soluble resin and a quinonediazide group-containing photosensitizer where said alkaline soluble resin...
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6783911 |
Isocyanate crosslinked imageable compositions
The present invention provides a positive working imageable composition, which includes a hydroxyfunctional resin comprising a covalently bound radiation sensitive group capable of increasing the...
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6773858 |
Positive photoresist composition
A photoresist composition comprising a novolac resin in which 3-27 mol % of the hydroxyl group hydrogens are substituted with 1,2-naphthoquinonediazidosulfonyl groups and an alkali-soluble...
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6746812 |
Photosensitive resin composition
A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula —L—P (wherein L represents a divalent...
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6733949 |
Novolak resin mixtures and photosensitive compositions comprising the same
Disclosed is an alkali-soluble, film-forming novolak resin mixture containing at least two novolak resins, each novolak resin containing the addition-condensation reaction product of at least one...
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6713225 |
1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition
The invention provides a 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated...
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6706454 |
Method for the production of a printing plate using particle growing acceleration by an additive polymer
A coating solution useful in the preparation of printing plate precursors comprises: a) a radiation sensitive composition C comprising a phenolic resin; b) at least one thermoplastic polymer P...
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6699636 |
Imaging element comprising a thermally activated crosslinking agent
Imageable elements useful in lithographic printing, and processes for their use, are disclosed. The elements comprise a hydrophilic substrate, an imageable layer over the substrate, and a thermally...
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6689531 |
Resist composition
A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing...
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6680155 |
Positive photoresist composition
A composition includes (A) an alkali-soluble resin; and (B) (b-1) a compound of Formula (I): wherein Ds are each a hydrogen atom or a naphthoquinonediazidosulfonyl group; and (b2) a...
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6677099 |
Positive type photosensitive polyimide resin composition
A positive type photosensitive resin composition which can be developed by an aqueous alkaline solution and which is excellent in the developability and the adhesion to a substrate, is presented....
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6670090 |
Positive working photosensitive composition, article and process for forming a relief pattern
The present invention relates to a positive-working photosensitive composition comprising a partially diazonaphthoquinone (DNQ) capped polyamic ester with a capping level of about 5-80 molar %; a...
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6660445 |
Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide...
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6649319 |
Method of processing lithographic printing plate precursors
A method of processing imageable elements useful as alkaline-developable lithographic printing plate precursors that does not require either a rinsing step or a further gumming step is disclosed....
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6645689 |
Solvent resistant polymers with improved bakeability features
A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a...
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6641972 |
Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same
A positive photoresist composition includes an alkali-soluble novolak resin (A), an alkali-soluble acrylic resin (B) and a quinonediazido-group-containing compound (C) and is used for the formation...
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6638680 |
Material and method for making an electroconductive pattern
A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element...
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6613494 |
Imageable element having a protective overlayer
Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive...
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6607865 |
Positive photosensitive resin composition
The present invention provides a positive photosensitive resin composition which can form a pattern of high resolution and high residual film ratio and has high sensitivity. That is, the present...
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6593043 |
Composition of positive photosensitive resin precursor, and display device thereof
A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl...
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6558872 |
Relation to the manufacture of masks and electronic parts
Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as...
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6525152 |
Copolymer for improving the chemical and developer resistance of positive working printing plates
Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R 1 and R 4 are selected...
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6524764 |
Positive-type photosensitive polyimide precursor composition
The present invention relates to a positive type photosensitive resin precursor composition which is characterized in that it contains polymer having, as its chief component, structural units...
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6517987 |
Positive-working presensitized plate useful for preparing a lithographic printing plate
The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at...
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6517988 |
Radiation-sensitive, positive working coating composition based on carboxylic copolymers
A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the...
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6503682 |
Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition
A positive photoresist composition having improved sensitivity and resolution, a method of making the composition, and a method for forming a pattern during semiconductor processing using the...
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6475692 |
Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising such compositions
Radiation-sensitive compositions comprise at least one novolak, at least one naphthoquinone diazide derivative and a copolymer; the copolymer consisting of the units A, B and C wherein unit A is...
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6440646 |
Positive resist composition suitable for lift-off technique and pattern forming method
A positive resist composition contains (A) a novolak resin having a weight average molecular weight calculated as polystyrene of 2,000-20,000 wherein 2.5-27 mol % of the hydrogen atom of a hydroxyl...
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6426173 |
Preparation method for printing plate
The present invention relates to a planographic printing plate employed in the field of offset printing, and more particularly, to a preparation method for a printing plate employing a conventional...
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6417317 |
Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin
A novolak resin precursor is composed of bonded phenolic moieties, one of the hydrogen atoms in the o- or p-positions relative to the hydroxy group of each phenolic moiety is substituted with an...
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6383709 |
Positive resist composition comprising N-(n-octylsulfonyloxy) succinimide
A positive resist composition which gives improved profile without lowering other properties such as sensitivity and resolution, and comprises an alkali-soluble novolak resin, a quinone diazide...
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6376150 |
IR- and UV-radiation-sensitive composition and lithographic plate
An IR- and UV-radiation-sensitive composition comprising a diazo resin, a diazo ester, at least one novolac resin and an IR-ray absorber. A lithographic plate comprising a support coated with the...
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6372403 |
Photosensitive resin composition
A photosensitive resin composition comprising (a) a photosensitizer having in its structure 1,2-diazidonaphthoquinone structure, and a methylene-bridged structure composed of two or more...
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6296982 |
Imaging articles
An imagable composition, for example a coating on a lithographic printing plate, comprises a carboxylic acid derivative of a cellulosic polymer and a diazide moiety, and may be imaged in various...
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6265129 |
Positive photosensitive compositions for application of the lift-off technique and a method of forming patterns using the compositions
Improved positive photosensitive composition for application of the lift-off technique comprises (A) an alkali-soluble resin and (B) a mixture of two photosensitive agents in admixture with the...
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6232031 |
Positive-working, infrared-sensitive lithographic printing plate and method of imaging
A positive-working, infrared imageable coating and a lithographic printing plate or other element with the coating are described. The coating is a phenolic resin containing an o-diazonaphthoquinone...
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