|
Match
|
Document |
Document Title |
|
|
7473501 |
Method for reducing photo-mask distortion
The present invention describes a structure and method for reducing or eliminating the flatness distortion effects of a photomask assembly which occurs when a pellicle is mounted to the photomask....
|
|
|
7432023 |
Method for producing a pellicle for lithography
There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one...
|
|
|
7430823 |
Snow globe
A snow globe comprises a holder and a photo frame. The holder comprises a globe, a stand and a base. The globe is transparent and comprises a slot, a frame mount and decoration comprising...
|
|
|
7351503 |
Fused silica pellicle in intimate contact with the surface of a photomask
A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the...
|
|
|
7316869 |
Mounting a pellicle to a frame
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be...
|
|
|
7314667 |
Process to optimize properties of polymer pellicles and resist for lithography applications
Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF...
|
|
|
7312287 |
Fluorinated polymers useful as photoresists, and processes for microlithography
This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically...
|
|
|
7288299 |
Fullerenes to increase radiation resistance in polymer-based pellicles
A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure...
|
|
|
7282525 |
Pellicle, producing method thereof and adhesive
A pellicle comprises a pellicle film and a pellicle frame for supporting the pellicle film, wherein the pellicle film is adhered to the pellicle frame through an adhesive layer comprising a...
|
|
|
7264853 |
Attaching a pellicle frame to a reticle
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be...
|
|
|
7220471 |
Insert film used for forming resin panel, process for producing the film and resin panel using the film
An insert film having a printed part is integrally molded to a surface of a panel body made of a resin by an insert molding. The printed part is printed on a first binder layer applied to a resin...
|
|
|
7214452 |
Using perfluoropoly-ethers to form pellicles
Exposure systems may use pellicles made of perfluoropoly-ether. These materials may exhibit reduced darkening upon repeated exposures compared to other materials.
|
|
|
7205074 |
Venting of pellicle cavity for a mask
The present invention describes a method of providing a substrate, the substrate being transparent to radiation at an actinic wavelength; forming an absorber layer over the substrate, the absorber...
|
|
|
7199199 |
Perfluorinated polymers
Amorphous perfluorinated homopolymers and copolymers of perfluorodioxoles of formula (IA):
wherein R′ F is equal to R F or OR F wherein R F is a linear or branched perfluoroalkyl radical...
|
|
|
7000772 |
Package for the presentation of goods especially perfume
A display package for displaying merchandise includes a base, at least one merchandise receptacle located in the base and a cover. Merchandise to be packaged or displayed is inserted into the...
|
|
|
6994897 |
Method of processing high-resolution flex circuits with low distortion
A mechanism and a method for framing a low-distortion flexible dielectric substrate during subsequent flex circuit processing. The processing method comprising the following steps: making a...
|
|
|
6986918 |
System and method for facilitating customer appreciation
The present invention relates to an article for association with a motor vehicle. The article may include a base, and a plurality of inserts received in the base. Each insert has at least two...
|
|
|
6984474 |
Reticle barrier system for extreme ultra-violet lithography
The present invention is directed to a reticle barrier system that prevents contaminants from landing on a mask within lithographic systems using extreme ultra violet light. In particular, a...
|
|
|
6977126 |
Pellicle, photomask, pellicle frame, and method for manufacturing pellicle
A pellicle for protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter, comprising: a pellicle film having a...
|
|
|
6921613 |
Electrostatic pellicle system for a mask
The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system...
|
|
|
6911283 |
Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism
A method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism are disclosed. A pellicle is coupled to a photomask with a non-distorting mechanism that is located on...
|
|
|
6893780 |
Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern
A photomask and method for reducing electrostatic discharge on the photomask with an ESD protection pattern are disclosed. A photomask includes a substrate and a patterned layer formed on at least...
|
|
|
6869733 |
Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks
The present invention is a method of protecting reticles from electrostatic damage during their use in manufacturing lines and while patterning photoresist films on device substrates. An...
|
|
|
6849320 |
Decorative molding/casing
A decorative molding/casing for use in decorating a room or furniture as disclosed. The decorative molding/casing in general has a routed or lazered front surface establishing a front face section....
|
|
|
6841312 |
Method and apparatus for coupling a pellicle assembly to a photomask
A method and apparatus for coupling a pellicle assembly to a photomask are disclosed. A pellicle assembly is mounted on a photomask by bringing an adhesive material formed on a surface of a frame...
|
|
|
6811936 |
Structure and process for a pellicle membrane for 157 nanometer lithography
A pellicle membrane structure ( 800 ) is made by a process that includes depositing ( 115 ) a etch mask layer ( 110 ) on the backside of the semiconductor wafer, deposting ( 120 ) a first pellicle...
|
|
|
6803159 |
Method of keeping contaminants away from a mask with electrostatic forces
The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system...
|
|
|
6741333 |
Multiple image photolithography system and method
A multiple image photolithography system includes a radiation source ( 18 ) projecting electromagnetic radiation along a path. A reticle cartridge ( 26 ) is located in the path of the projected...
|
|
|
6727029 |
Method for making reticles with reduced particle contamination and reticles formed
A reticle for holding a mask thereon with reduced particle contamination problem is described. The reticle is constructed by a base plate that is formed of an optically transparent material such as...
|
|
|
6713136 |
Pellicle
A pellicle comprising a pellicle film, a pellicle frame supporting the pellicle film, and an adhesive resin layer provided on the surface of the pellicle frame on the side opposite to the surface...
|
|
|
6703172 |
Pellicle and producing method of mask with pellicle
A pellicle comprises a pellicle frame, a pellicle film and at least two liners. The pellicle frame has one end face and the other end face and is provided at its central portion with an opening....
|
|
|
6692806 |
Device for displaying photographs, certificates, compact discs and the like
A device, used for holding and displaying items such as photographs, certificates, compact discs and the like, includes a coversheet having an outward side and an inward side and an edge. A foam...
|
|
|
6645580 |
Soft-shelled ornament
A soft-shelled ornament includes a transparent soft shell being clamped along an annular flange between a hold-down ring and a seat. The hold-down ring and the seat are tightly sealed into an...
|
|
|
6635336 |
Luminescent mouse pad
To achieve the above-mentioned and other objectives, the present invention provides a luminescent mouse pad including a substrate, a cover including a window defined therein and a frame around the...
|
|
|
6623893 |
Pellicle for use in EUV lithography and a method of making such a pellicle
A pellicle utilizes a film attached to a barrier layer above a substrate. The film is relatively transparent to radiation in the EUV range. The substrate and barrier layer are coupled to a...
|
|
|
6620555 |
Pellicle, method of preparing the same and exposure method
A pellicle that excellently transmits ultraviolet rays and, particularly, vacuum ultraviolet rays, does not lose the film thickness thereof that stems from the photolysis and, hence, exhibits...
|
|
|
6605392 |
X-ray mask structure, and X-ray exposure method and apparatus using the same
An X-ray mask structure for use in X-ray lithography includes an X-ray transmission film to be disposed opposed to a workpiece in X-ray exposure, the X-ray transmission film having an X-ray...
|
|
|
6593035 |
Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
A pellicle utilizes a thin film attached to a frame. The film is relatively transparent to radiation. The frame is coupled to a periphery of the film and is exclusive of the center portion of the...
|
|
|
6582859 |
Dust cover for use in semiconductor fabrication
A dust cover having a film with an inorganic, anti-reflective coating and method for use during semiconductor fabrication. The dust cover is primarily for use during photolithography. The dust...
|
|
|
6562423 |
Sports memorabilia article and display method
A sports memorabilia article includes a casing at least partially enclosing a sports-related subject to be displayed. The casing is transparent at least over a sufficiently large area portion to...
|
|
|
6548146 |
Composite consisting of a coated polycarbonate and a polymer
A composite plastic structure is described. The composite structure includes: (a) a shaped polycarbonate article having an edge region, the edge region having an adhesion-promoting geometric...
|
|
|
6548128 |
Decorative emblems having an embedded image or design with an enhanced depth of vision and method of making same
A decorative emblem with an enhanced depth of vision is provided. The decorative emblem comprises a decorative substrate, at least one layer of transparent plastic material formed on the top...
|
|
|
6534222 |
Reticles including support frame for charged-particle-beam microlithography, and methods for making same
Reticles and reticle blanks are disclosed, especially for charged-particle-beam microlithography, that include a peripheral frame and a support frame bonded to each other in a manner that...
|
|
|
6507390 |
Method and apparatus for a reticle with purged pellicle-to-reticle gap
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system is described. A porous frame between a reticle and a pellicle maintains the...
|
|
|
6492067 |
Removable pellicle for lithographic mask protection and handling
A removable pellicle for a lithographic mask that provides active and robust particle protection, and which utilizes a traditional pellicle and two deployments of thermophoretic protection to keep...
|
|
|
6475575 |
Pellicle and method for manufacture thereof
It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is...
|
|
|
6472038 |
Exchangeable decorative frame cover
An exchangeable decorative frame cover is provided for decoration. The exchangeable decorative frame cover includes a frame cover made of flexible material with a shape adaptable to a solid frame,...
|
|
|
6443302 |
Pellicle and storage case therefor having chemical traps
A pellicle includes a reticle, a pellicle frame, a pellicle film, and a capturing material. The pellicle frame has a reticle pattern surface formed with a reticle pattern. The pellicle frame has...
|
|
|
6440617 |
Photomask structure
A photomask structure with an anti-electrostatic-discharge (Anti-ESD) ability. The photomask structure comprises a photomask, a conductive dust pellicle, a conductive frame and a conductive film....
|
|
|
6436586 |
Pellicle with a filter and method for production thereof
There is disclosed a pellicle having a pellicle frame with at least one vent for controlling atmospheric pressure and a filter attached so as to cover the vent, wherein it takes 5 minutes to 180...
|