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7390537 Methods for producing low-k CDO films with low residual stress  
Methods of preparing a carbon doped oxide (CDO) layer with a low dielectric constant and low residual stress are provided. The methods involve, for instance, providing a substrate to a deposition...
7381452 Amorphous hydrogenated carbon film  
The present invention concerns an improved process for the deposition of amorphous hydrogenated carbon film, more specifically an improved low temperature, low power and low vacuum cathodic...
7329608 Method of processing a substrate  
The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the...
7323219 Apparatus and method for applying diamond-like carbon coatings  
The invention relates to a coating and apparatus and method for applying the same, said coating including Diamond Like Carbon (DLC) applied by chemical vapor deposition using a pulsed DC biased...
7314540 Diamond-coated electrode and method for producing same  
A diamond electrode having a sufficiently low resistance is disclosed which is realized by increasing the amount of boron added thereto. A method for producing a high-performance, high-durability...
7303790 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained  
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber...
7303789 Methods for producing thin films on substrates by plasma CVD  
Methods are provided to form a thin film reproducibly in a process for forming the thin film on the inner wall surface facing a space formed in a substrate by plasma CVD. A thin film is produced on...
7273655 Slidably movable member and method of producing same  
A slidably movable member such as an adjusting shim used in a valve operating mechanism of an internal combustion engine of an automotive vehicle. The slidably movable member is used in contact...
7264850 Process for treating a substrate with a plasma  
A process for depositing a diamond-like carbon film, which comprises providing a means for generating a sheet-like beam-type plasma region inside a vacuum vessel for depositing the diamond-like...
7247348 Method for manufacturing a erosion preventative diamond-like coating for a turbine engine compressor blade  
Methods for making an erosion resistant gas turbine engine compressor airfoil substrates coated with a diamond-like coating (DLC), wherein the coating airfoil substrates are protected from ingested...
7238393 Method of forming silicon carbide films  
A method for depositing a silicon carbide layer onto a substrate comprises providing a silicon and carbon source gas and an inert gas into a reaction zone. The reaction zone contains the substrate....
7226643 Thermal pyrolysising chemical vapor deposition method for synthesizing nano-carbon material  
A thermal cracking chemical vapor deposition method for synthesizing a nano-carbon material is provided. The method includes steps of (a) providing a substrate, (b) spreading a catalyst on the...
7200460 Method of depositing low dielectric constant silicon carbide layers  
A method of forming a silicon carbide layer for use in integrated circuits is provided. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon source, a carbon source,...
7189290 Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus  
A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas...
7179923 N-sulfonylaminocarbonyl containing compounds  
Compounds having two reactive functional groups are described that can be used to provide a connector group between a substrate and an amine-containing material. The first reactive functional group...
7166336 DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container  
Disclosed is an apparatus for producing DLC film-coated plastic containers, which comprises an outer electrode unit disposed outside a plastic container, an inner electrode disposed inside the...
7160617 Boron doped diamond  
A layer of single crystal boron doped diamond produced by CVD and having a total boron concentration which is uniform. The layer is formed from a single growth sector, or has a thickness exceeding...
7160616 DLC layer system and method for producing said layer system  
The invention describes a device and a process that render possible the production of a layer system for wear protection, corrosion protection and improvement of the slipping properties and the...
7160585 Process for making at least one nanotube between two electrically conducting elements and device for implementing such a process  
A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one...
7144606 Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers  
The present invention generally provides improved adhesion and oxidation resistance of carbon-containing layers without the need for an additional deposited layer. In one aspect, the invention...
7128974 Thick single crystal diamond layer method for making it and gemstones produced from the layer  
This invention relates to diamond and more particularly to diamond produced by chemical vapour deposition (hereinafter referred to as CVD). According to a first aspect of the invention, there is...
7125588 Pulsed plasma CVD method for forming a film  
A method of forming an insulating ceramic film or a metallic film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power...
7117064 Method of depositing dielectric films  
A method of forming a silicon carbide layer for use in integrated circuit fabrication processes is provided. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon...
7115306 Method of horizontally growing carbon nanotubes and device having the same  
Provided are a method of growing carbon nanotubes and a carbon nanotube device. The method includes: depositing an aluminum layer on a substrate; forming an insulating layer over the substrate to...
7087271 Method for preparing low dielectric films  
A low dielectric constant hydrogenated silicon-oxycarbide (SiCO:H) film is prepared by bringing an organosilicon or organosilicate compound having at least one vinyl or ethynyl group, or a mixture...
7074461 Method for fabricating hydrogenated silicon oxycarbide thin film  
A hydrogenated SiOC thin film fabrication method includes supplying bis-trimethylsilylmethane and oxygen retaining gas to a wafer installed inside a reaction channel through one supply pipe,...
7060323 Method of forming interlayer insulating film  
A material containing, as a main component, an organic silicon compound represented by the following general formula: R 1 x Si(OR 2 ) 4-x...
7045175 Magnetic recording medium and method for manufacturing the same  
A method for manufacturing a magnetic recording medium includes forming a first protective layer of first material over a magnetic film provided on a substrate. The first protective layer has a...
7033649 Hydrophilic DLC on substrate with UV exposure  
A substrate is coated with a layer(s) or coating(s) that includes, for example, amorphous carbon in a form of diamond-like carbon (DLC). In certain embodiments, the DLC inclusive layer may be doped...
6982071 Thin-film magnetic recording media with dual intermediate layer structure for increased coercivity  
Ion beam-deposited, nitrogen-doped C:H films having substantially lower resistivities than undoped ion beam-deposited C:H films and suitable for use as hard, abrasion-resistant overcoat layers for...
6969447 Thin film protective layer with buffering interface  
A method for sputtering a thin film protective layer with improved durability is disclosed. The method reduces kinetic energy of the ions of the overcoat material during the initial period of...
6967043 Method of manufacturing the densely fitted multi-layer carbon nano-tube  
A method of manufacturing, with high purity and high efficiency, a multi-wall carbon nanotube ( 10 ) having layers densely fitted to the center part thereof, comprising the step of leading a...
6958175 Film forming method and film forming device  
A plasma 10 is generated within a film formation chamber 2 , and mainly a nitrogen gas 11 is excited within the film formation chamber 2 . Then, the excited nitrogen gas 11 is reacted with...
6926926 Silicon carbide deposited by high density plasma chemical-vapor deposition with bias  
A SiC-based layer is deposited on a substrate having an electrical resistivity between about 1 and 100 Ω cm. The substrate is disposed in a process chamber. A gaseous mixture having a...
6924001 Production device for DLC film-coated plastic container and production method therefor  
A production device for a DLC film-coated plastic container and a production method therefor, capable of forming DLC (diamond-like carbon) films simultaneously on the inner surfaces of a plurality...
6919107 Method and device for treating surfaces using a glow discharge plasma  
In a process for treating a surface with the aid of a glow discharge plasma sustained in a gas of substantially ambient pressure between two electrodes ( 10, 10 ′) unwanted effects of plasma...
6916511 Method of hardening a nano-imprinting stamp  
A method of forming a hardened nano-imprinting stamp is disclosed. The hardened nano-imprinting stamp includes a plurality of silicon-based nano-sized features that have an hardened shell of...
6913795 Method of making tetrahedral amorphous carbon film including fluorine atoms  
A method of making a tetrahedral amorphous carbon (ta-C) film comprises depositing carbon atoms over the surface of an object. The surface of the object is kept exposed to fluorine atoms during the...
6881538 Array comprising diamond-like glass film  
Materials for use in miniaturized arrays, the arrays, and methods of manufacturing. Materials for making arrays described include a substrate with a silicon-containing layer, optionally with...
6878419 Plasma treatment of porous materials  
The application discloses methods of plasma treatment that employ an ion sheath in a capacitively-coupled system to increase the hydrophilicity of porous articles, including microporous articles...
6878418 Method for making zone-bonded lubricant layer for magnetic hard discs  
A system and method for improving the durability and reliability of recording media used in hard drives is disclosed. A protective overcoat made by depositing a diamond like carbon (DLC) layer over...
6863938 Filled diamond foam material and method for forming same  
A diamond foam article comprises diamond deposited material on a substrate having an open contiguous structure at least partially filled with a filler material. Methods for forming a diamond foam...
6858078 Apparatus and method for diamond production  
An apparatus for producing diamond in a deposition chamber including a heat-sinking holder for holding a diamond and for making thermal contact with a side surface of the diamond adjacent to an...
6855484 Method of depositing low dielectric constant silicon carbide layers  
A method of forming a silicon carbide layer for use in integrated circuits is provided. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon source, a carbon source,...
6855232 Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content  
A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second...
6851939 System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same  
A system for chemical vapor deposition at ambient temperature using electron cyclotron resonance (ECR) comprising: an ECR system; a sputtering system for providing the ECR system with metal ion; an...
6838126 Method for forming I-carbon film  
A film comprising an i-carbon is formed by converting a reactive gas containing a carbon compound gas into plasma by a resonance using a microwave and a magnetic field.
6827976 Method to increase wear resistance of a tool or other machine component  
A method for manufacturing a tool or machine component increases wear resistance by providing a base body made of a metal or of a hard metal and having a surface. At least a portion of the surface...
6824836 Protection overcoat for recording media  
A magnetic recording medium comprising a magnetic layer and a protective carbon-containing overcoat comprising a first carbon density, preferably of a low-density carbon, and a second carbon...
6797336 Multi-component substances and processes for preparation thereof  
The present invention is a method and apparatus for the synthesis of multi-component substances, comprising entities of at least two elements, molecules, grains, crystals, structural units, or...
Matches 1 - 50 out of 596 1 2 3 4 5 6 7 8 9 10 11 12 >