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7615203 Single crystal diamond  
A single crystal diamond grown by vapor phase synthesis, wherein when one main surface is irradiated with a linearly polarized light considered to be the synthesis of two mutually perpendicular...
7604834 Formation of dielectric film by alternating between deposition and modification  
The present invention discloses a method including: providing a substrate; and sequentially stacking layers of two or more diamond-like carbon (DLC) films over the substrate to form a composite...
7603962 Rotary type CVD film forming apparatus for mass production  
A rotary type CVD film forming apparatus for mass production, wherein a film forming chamber is formed by providing one columnar body having a plurality of housing spaces for housing one plastic...
7601405 DLC coating system and process and apparatus for making coating system  
A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding...
7601402 Method for forming insulation film and apparatus for forming insulation film  
A method for forming a porous insulating film includes an insulating film forming step and a hole forming step. During the insulating film forming step, plasma processing of an organic siloxane...
7578889 Methodology for cleaning of surface metal contamination from electrode assemblies  
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
7563346 Molds having multilayer diamond-like carbon film and method for manufacturing same  
A mold having a multilayer diamond-like carbon film is provided. The mold includes: a molding surface; an adhesive layer formed on the molding surface; a densified layer formed on the adhesive...
7544397 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production  
The invention provides systems and methods for the deposition of an improved diamond-like carbon material, particularly for the production of magnetic recording media. The diamond-like carbon...
7534296 Electrically conductive diamond electrodes  
An electrically conductive diamond electrode and process for preparation thereof is described. The electrode comprises diamond particles coated with electrically conductive doped diamond preferably...
7517588 High abrasion resistant polycrystalline diamond composite  
An apparatus and method of forming a composite body. The invention includes the steps of heating diamond crystals to a temperature about 1900° C. and simultaneously subjecting the diamond crystals...
7514146 Multilayer substrate, method for producing a multilayer substrate, and device  
There is provided a multilayer substrate comprising, at least, a single crystal MgO substrate, an iridium (Ir) film heteroepitaxially grown on the MgO substrate, a diamond film vapor-deposited on...
7514125 Methods to improve the in-film defectivity of PECVD amorphous carbon films  
Methods of making an article having a protective coating for use in semiconductor applications are provided. In certain embodiments, a method of coating an aluminum surface of an article utilized...
7458585 Sliding member and production process thereof  
There is provided a sliding member including a base body and a hard carbon coating formed on the base body to define a sliding surface for sliding contact with an opposing member under lubrication...
7449221 Metallic thin film type magnetic recording medium and method of manufacturing thereof  
A method of manufacturing a metallic thin film type magnetic recording medium is provided. The method comprises the steps of arranging an initial substance of said recording medium in opposition to...
7435454 Plasma enhanced atomic layer deposition system and method  
A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the...
7422776 Low temperature process to produce low-K dielectrics with low stress by plasma-enhanced chemical vapor deposition (PECVD)  
Low K dielectric films exhibiting low mechanical stress may be formed utilizing various techniques in accordance with the present invention. In one embodiment, carbon-containing silicon oxide films...
7390537 Methods for producing low-k CDO films with low residual stress  
Methods of preparing a carbon doped oxide (CDO) layer with a low dielectric constant and low residual stress are provided. The methods involve, for instance, providing a substrate to a deposition...
7381452 Amorphous hydrogenated carbon film  
The present invention concerns an improved process for the deposition of amorphous hydrogenated carbon film, more specifically an improved low temperature, low power and low vacuum cathodic...
7329608 Method of processing a substrate  
The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the...
7323401 Semiconductor substrate process using a low temperature deposited carbon-containing hard mask  
A method of processing a thin film structure on a semiconductor substrate using an optically writable mask includes placing the substrate in a reactor chamber, the substrate having on its surface a...
7323219 Apparatus and method for applying diamond-like carbon coatings  
The invention relates to a coating and apparatus and method for applying the same, said coating including Diamond Like Carbon (DLC) applied by chemical vapor deposition using a pulsed DC biased...
7314540 Diamond-coated electrode and method for producing same  
A diamond electrode having a sufficiently low resistance is disclosed which is realized by increasing the amount of boron added thereto. A method for producing a high-performance, high-durability...
7303790 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained  
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber...
7303789 Methods for producing thin films on substrates by plasma CVD  
Methods are provided to form a thin film reproducibly in a process for forming the thin film on the inner wall surface facing a space formed in a substrate by plasma CVD. A thin film is produced on...
7273655 Slidably movable member and method of producing same  
A slidably movable member such as an adjusting shim used in a valve operating mechanism of an internal combustion engine of an automotive vehicle. The slidably movable member is used in contact...
7264850 Process for treating a substrate with a plasma  
A process for depositing a diamond-like carbon film, which comprises providing a means for generating a sheet-like beam-type plasma region inside a vacuum vessel for depositing the diamond-like...
7247348 Method for manufacturing a erosion preventative diamond-like coating for a turbine engine compressor blade  
Methods for making an erosion resistant gas turbine engine compressor airfoil substrates coated with a diamond-like coating (DLC), wherein the coating airfoil substrates are protected from ingested...
7238393 Method of forming silicon carbide films  
A method for depositing a silicon carbide layer onto a substrate comprises providing a silicon and carbon source gas and an inert gas into a reaction zone. The reaction zone contains the substrate....
7226643 Thermal pyrolysising chemical vapor deposition method for synthesizing nano-carbon material  
A thermal cracking chemical vapor deposition method for synthesizing a nano-carbon material is provided. The method includes steps of (a) providing a substrate, (b) spreading a catalyst on the...
7200460 Method of depositing low dielectric constant silicon carbide layers  
A method of forming a silicon carbide layer for use in integrated circuits is provided. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon source, a carbon source,...
7189290 Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus  
A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas...
7179923 N-sulfonylaminocarbonyl containing compounds  
Compounds having two reactive functional groups are described that can be used to provide a connector group between a substrate and an amine-containing material. The first reactive functional group...
7166336 DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container  
Disclosed is an apparatus for producing DLC film-coated plastic containers, which comprises an outer electrode unit disposed outside a plastic container, an inner electrode disposed inside the...
7160617 Boron doped diamond  
A layer of single crystal boron doped diamond produced by CVD and having a total boron concentration which is uniform. The layer is formed from a single growth sector, or has a thickness exceeding...
7160616 DLC layer system and method for producing said layer system  
The invention describes a device and a process that render possible the production of a layer system for wear protection, corrosion protection and improvement of the slipping properties and the...
7160585 Process for making at least one nanotube between two electrically conducting elements and device for implementing such a process  
A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one...
7144606 Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers  
The present invention generally provides improved adhesion and oxidation resistance of carbon-containing layers without the need for an additional deposited layer. In one aspect, the invention...
7128974 Thick single crystal diamond layer method for making it and gemstones produced from the layer  
This invention relates to diamond and more particularly to diamond produced by chemical vapour deposition (hereinafter referred to as CVD). According to a first aspect of the invention, there is...
7125588 Pulsed plasma CVD method for forming a film  
A method of forming an insulating ceramic film or a metallic film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power...
7117064 Method of depositing dielectric films  
A method of forming a silicon carbide layer for use in integrated circuit fabrication processes is provided. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon...
7115306 Method of horizontally growing carbon nanotubes and device having the same  
Provided are a method of growing carbon nanotubes and a carbon nanotube device. The method includes: depositing an aluminum layer on a substrate; forming an insulating layer over the substrate to...
7087271 Method for preparing low dielectric films  
A low dielectric constant hydrogenated silicon-oxycarbide (SiCO:H) film is prepared by bringing an organosilicon or organosilicate compound having at least one vinyl or ethynyl group, or a mixture...
7074461 Method for fabricating hydrogenated silicon oxycarbide thin film  
A hydrogenated SiOC thin film fabrication method includes supplying bis-trimethylsilylmethane and oxygen retaining gas to a wafer installed inside a reaction channel through one supply pipe,...
7060323 Method of forming interlayer insulating film  
A material containing, as a main component, an organic silicon compound represented by the following general formula: R 1 x Si(OR 2 ) 4-x...
7045175 Magnetic recording medium and method for manufacturing the same  
A method for manufacturing a magnetic recording medium includes forming a first protective layer of first material over a magnetic film provided on a substrate. The first protective layer has a...
7033649 Hydrophilic DLC on substrate with UV exposure  
A substrate is coated with a layer(s) or coating(s) that includes, for example, amorphous carbon in a form of diamond-like carbon (DLC). In certain embodiments, the DLC inclusive layer may be doped...
6982071 Thin-film magnetic recording media with dual intermediate layer structure for increased coercivity  
Ion beam-deposited, nitrogen-doped C:H films having substantially lower resistivities than undoped ion beam-deposited C:H films and suitable for use as hard, abrasion-resistant overcoat layers for...
6969447 Thin film protective layer with buffering interface  
A method for sputtering a thin film protective layer with improved durability is disclosed. The method reduces kinetic energy of the ions of the overcoat material during the initial period of...
6967043 Method of manufacturing the densely fitted multi-layer carbon nano-tube  
A method of manufacturing, with high purity and high efficiency, a multi-wall carbon nanotube ( 10 ) having layers densely fitted to the center part thereof, comprising the step of leading a...
6926926 Silicon carbide deposited by high density plasma chemical-vapor deposition with bias  
A SiC-based layer is deposited on a substrate having an electrical resistivity between about 1 and 100 Ω cm. The substrate is disposed in a process chamber. A gaseous mixture having a...