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9039872 Method for producing a transparent and conductive metal oxide layer by highly ionized pulsed magnetron sputtering  
A method for producing a transparent and conductive metal oxide layer on a substrate, includes atomizing at least one component of the metal oxide layer by highly ionized, high power pulsed...
8955456 Microwave plasma reactor for manufacturing synthetic diamond material  
A microwave plasma reactor for manufacturing a synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber (2); a substrate holder (4)...
8895114 Method and device for functionalizing the surfaces of adhesive closure parts  
The invention relates to a method for functionalizing the surfaces of adhesive closing parts which form, with correspondingly formed adhesive closing parts, an adhesive closure that can be...
8883269 Thin film deposition using microwave plasma  
A method of processing a substrate in a processing chamber is provided. The method generally includes applying a microwave power to an antenna coupled to a microwave source disposed within the...
8859057 Device for applying electromagnetic microwave radiation in a plasma inside a hollow glass substrate tube, and method for manufacturing an optical preform  
A device for applying electromagnetic microwave radiation in a plasma inside a substrate tube including inner and outer cylindrical walls defining an annular cavity therebetween, the inner wall...
8859058 Microwave plasma reactors and substrates for synthetic diamond manufacture  
A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapor deposition, the microwave plasma reactor comprising: a microwave generator configured to generate...
8859044 Method of preparing graphene layer  
Disclosed is a method of forming a graphene layer, including: putting a substrate in a chamber of an electron cyclotron resonance device, and then evacuating the chamber. Conducting a...
8828504 Deposition of hydrogenated thin film  
A hydrogenated thin film is formed in a controlled vacuum on a substrate by evaporating one or more solid materials and passing the resulting vapor and a hydrogen-containing gas into a space...
8808812 Oriented carbon nanotube manufacturing method  
Disclosed is a method capable of accelerating the growth of oriented carbon nanotubes when manufacturing the oriented carbon nanotubes by a plasma CVD. Under the circulation of a gas which is the...
8747963 Apparatus and method for diamond film growth  
An apparatus and methods for forming a diamond film, are provided. An example of an apparatus for forming a diamond film includes an electrodeless microwave plasma reactor having a microwave...
8741779 Plasma processing apparatus and plasma processing method  
A plasma processing apparatus for processing an object to be processed using a plasma. The apparatus includes a processing chamber defining a processing cavity for containing an object to be...
8728586 RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus  
In large area plasma processing systems, process gases may be introduced to the chamber via the showerhead assembly which may be driven as an RF electrode. The gas feed tube, which is grounded, is...
8728588 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma  
A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of...
8697196 Method of forming a metal pattern  
A method of forming a metal pattern comprises: (a) providing a substrate; (b) depositing at least one patterned metal layer which includes a metal selected from an inert metal, an inert metal...
8679594 Index modified coating on polymer substrate  
The invention includes the structure of a multilayer protective coating, which may have, among other properties, scratch resistance, UV absorption, and an effective refractive index matched to a...
8679592 System to continuously produce carbon fiber via microwave assisted plasma processing  
A method for continuously processing carbon fiber including establishing a microwave plasma in a selected atmosphere contained in an elongated chamber having a microwave power gradient along its...
8668962 Microwave plasma reactors  
New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures...
8637123 Oxygen radical generation for radical-enhanced thin film deposition  
A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O.),...
8603402 Microwave-excited plasma device  
A microwave-excited plasma device is proposed. The device comprises of a plurality of microwave plasma reaction units which are capable of generating plasma independently such that a large-area...
8574687 Method and device for depositing a non-metallic coating by means of cold-gas spraying  
In a method for depositing a non-metallic, in particular ceramic, coating on a substrate (2) by cold gas spraying, the method has the steps of: producing a reactive gas flow (5) having at least...
8518182 Substrate processing apparatus  
A substrate processing apparatus comprising: a processing chamber which is to accommodate at least one substrate; a gas supply system which is to supply processing gas into the processing chamber;...
8513137 Plasma processing apparatus and plasma processing method  
A plasma processing apparatus for processing an object to be processed using a plasma. The apparatus includes a processing chamber defining a processing cavity for containing an object to be...
8512798 Plasma assisted metalorganic chemical vapor deposition (MOCVD) system  
The present invention is a high-throughput, ultraviolet (UV) assisted metalorganic chemical vapor deposition (MOCVD) system for the manufacture of HTS-coated tapes. The UV-assisted MOCVD system of...
8404313 Synthesis of nanocrystalline diamond fibers  
Provided herein is a method for the synthesis of nanocrystalline diamond (NCD) wires by depositing nanocrystalline diamond on Si nanowires using chemical vapor deposition methods. Seeding the...
8394197 Corrosion-resistant internal coating method using a germanium-containing precursor and hollow cathode techniques  
Enhanced corrosion resistance is achieved in a coating by using a germanium-containing precursor and hollow cathode techniques to form a first layer directly on the surface of a workpiece, prior...
8383210 Method of forming a film by deposition from a plasma  
A method is described of depositing film of an amorphous or microcrystalline material, for example silicon, from a plasma on to a substrate. Microwave energy is introduced into a chamber as a...
8318267 Method and apparatus for forming silicon oxide film  
An object to be processed which has silicon on its surface is loaded in a processing chamber. A plasma of a processing gas containing oxygen gas and nitrogen gas is generated in the processing...
8308897 Plasma processing apparatus and plasma processing method  
A plasma processing apparatus for processing an object to be processed using a plasma. The apparatus includes a processing chamber defining a processing cavity for containing an object to be...
RE43651 Surface coatings  
A method of coating a surface with a polymer layer, which method comprises exposing said surface to a plasma comprising a monomeric unsaturated organic compound which comprises a chain of carbon...
8222125 Plasma deposition of amorphous semiconductors at microwave frequencies  
Apparatus and method for plasma deposition of thin film photovoltaic materials at microwave frequencies. The apparatus avoids deposition on windows or other microwave transmission elements that...
8206776 Insulator coating for reducing power line system pollution problems  
Methods of reducing pollution problems in power lines systems are disclosed herein. In one embodiment, the method comprises applying Lotus Effect materials as a (superhydrophobicity) protective...
8168268 Thin film deposition via a spatially-coordinated and time-synchronized process  
A deposition system and process for the formation of thin film materials. In one embodiment, the process includes forming an initial plasma from a first material stream and allowing the plasma to...
8138458 Microwave chemical reaction device  
The invention performs uniform chemical reactions with high efficiency by action of microwave onto reaction targets placed within a flow path along a center axis of a waveguide for transmission of...
8133562 Plastic formed articles having a vapor deposited film and method of producing the same  
A plastic formed article comprising a plastic substrate and a vapor deposited film formed on the surface of the plastic substrate by a plasma CVD method, wherein the vapor deposited film includes...
8101245 Plasma deposition of amorphous semiconductors at microwave frequencies  
Apparatus and method for plasma deposition of thin film photovoltaic materials at microwave frequencies. The apparatus avoids deposition on windows or other microwave transmission elements that...
8097082 Nonplanar faceplate for a plasma processing chamber  
A method and apparatus for adjust local plasma density during a plasma process. One embodiment provides an electrode assembly comprising a conductive faceplate having a nonplanar surface. The...
8075950 Process of preparing graphene shell  
Provided are a process for economically preparing a graphene shell having a desired configuration which is applicable in various fields wherein in the process the thickness of the graphene shell...
8021723 Method of plasma treatment using amplitude-modulated RF power  
A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of...
8006641 Installation for depositing, by means of a microwave plasma, an internal barrier coating in thermoplastic containers  
Installation for depositing, by means of a microwave plasma, a barrier coating on thermoplastic containers (5), this installation comprising treatment stations (1) each comprising a treatment...
7981485 Apparatus and method for performing a PCVD process  
The present invention relates to an apparatus for carrying out a PCVD process in which one or more doped or undoped glass layers are coated onto the interior of a glass substrate tube. The...
7976908 High throughput processes and systems for barrier film deposition and/or encapsulation of optoelectronic devices  
Processes for simultaneously encapsulating multiple optoelectronic devices and/or depositing a barrier film onto multiple substrates suitable for fabrication of optoelectronic devices thereon...
7976893 Superconductivity in boron-doped diamond thin film  
A heavily boron-doped diamond thin film having superconductivity is deposited by chemical vapor deposition using gas mixture of at least carbon compound and boron compound, including hydrogen. An...
7947337 Method and apparatus for plasma enhanced chemical vapor deposition  
A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be...
7879396 High aspect ratio performance coatings for biological microfluidics  
We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication...
7875322 Plasma processing method  
Pulsated microwaves are supplied to a wave guide tube from a microwave generation unit through a matching circuit. The microwaves are supplied through an inner conductor to a planar antenna...
7857984 Plasma surface treatment method, quartz member, plasma processing apparatus and plasma processing method  
A plasma surface treatment method for performing a surface treatment on a quartz member used under a plasma-exposed environment by using a plasma having an ion energy greater than about 5.3 eV....
7838071 Container-treatment method comprising vacuum pumping phases, and machine for implementing same  
A container-treatment method, of the type in which the container (12) is disposed inside a chamber (16) which defines a cavity (18) outside the container (12) and which is connected to a Vacuum...
7829157 Methods of making multilayered, hydrogen-containing thermite structures  
Methods of making multi-layered, hydrogen-containing thermite structures including at least one metal layer and at least one metal oxide layer adjacent to the metal layer are disclosed. At least...
7824742 Plasma-coated conveyor belt  
Conveyor belt bodies having a plastic material or having an upper plastic layer that typically has an elasticity module of between approximately 200 and approximately 900 N/mm2 , the bodies being...
7807234 Plasma processing method, plasma processing apparatus, and computer recording medium  
According to the present invention, plasma oxidation processing and plasma nitridation processing are applied at the same time to the surface of a semiconductor substrate by plasma using a...
Matches 1 - 50 out of 435 1 2 3 4 5 6 7 8 9 >