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7597941 |
Tubular carbon nano/micro structures and method of making same
A method of synthesizing and controlling the internal diameters, conical angles, and morphology of tubular carbon nano/micro structures. Different morphologies can be synthesized included but not...
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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7498066 |
Plasma-assisted enhanced coating
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma ( 615 ) for coating objects ( 250 ). In one embodiment, a method of coating a surface of an object ( 250 )...
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7465406 |
Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semiconductor substrate deposition apparatus, and microwave plasma generating antenna assembly
In certain implementations, methods and apparatus include an antenna assembly having at least two overlapping and movable surface microwave plasma antennas. The antennas have respective pluralities...
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7435454 |
Plasma enhanced atomic layer deposition system and method
A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the...
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7404991 |
Device and control method for micro wave plasma processing
A microwave is introduced into a process chamber through a waveguide ( 26 ) of the plasma process apparatus, thereby generating plasma. A reflection monitor ( 40 ) and an electric power monitor (...
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7399500 |
Rapid process for the production of multilayer barrier layers
A process for applying alternating layers by chemical vapor deposition comprises the process steps of depositing an adhesion-promoter layer on a substrate and applying a barrier layer. Alternating...
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7361387 |
Plasma enhanced pulsed layer deposition
A process system and a deposition method for depositing a highly controlled layered film on a workpiece is disclosed. The basic component of the apparatus is a pulsing plasma source that is capable...
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7323230 |
Coating for aluminum component
A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the...
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7303790 |
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber...
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7276266 |
Functionalization of carbon nanotubes
Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H 2 or F 2 or C n H m ) is irradiated to provide a cold plasma of selected target...
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7244475 |
Plasma treatment apparatus and control method thereof
A frequency control circuit ( 45 ) controls an oscillation frequency of a second high frequency power source 51 based on a phase difference between a voltage component and a current component...
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7160585 |
Process for making at least one nanotube between two electrically conducting elements and device for implementing such a process
A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one...
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7125588 |
Pulsed plasma CVD method for forming a film
A method of forming an insulating ceramic film or a metallic film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power...
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7105208 |
Methods and processes utilizing microwave excitation
The invention includes methods and processes in which microwave radiation is utilized to activate at least one component within a reaction chamber during deposition of a material over a substrate...
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7097782 |
Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semiconductor substrate deposition apparatus, and microwave plasma generating antenna assembly
In certain implementations, methods and apparatus include an antenna assembly having at least two overlapping and movable surface microwave plasma antennas. The antennas have respective pluralities...
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6929830 |
Plasma treatment method and method of manufacturing optical parts using the same
A method for treating a non-planar surface of an object by employing a plasma treatment apparatus in which a microwave dielectric has a non-planar surface corresponding to the surface of the...
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6928839 |
Method for production of silica optical fiber preforms
A device and method is disclosed for manufacturing optical fiber preforms utilizing microwave plasma assisted chemical vapor deposition. Precursor gas is introduced to the face of a vertically...
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6905737 |
Method of delivering activated species for rapid cyclical deposition
A method for providing activated species for a cyclical deposition process is provided. In one aspect, the method includes delivering a gas to be activated into a plasma generator, activating the...
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6900138 |
Oxygen plasma treatment for nitride surface to reduce photo footing
The present invention includes a method for preventing distortion in semiconductor fabrication. The method comprises providing a substrate comprising a film comprising silicon nitride. The...
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6875480 |
Method of enhancement of electrical conductivity for conductive polymer by use of field effect control
The present invention is to provide a method of enhancement of electrical conductivity for conductive polymer by use of field effect control, wherein on the substrate, whose surface was treated...
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6855379 |
Method and device for surface-treating substrates
A method for surface treatment of at least one electrically conducting substrate or a substrate that has been coated so as to be conducting ( 1 ) by means of a gas placed in the region of an...
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6851939 |
System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same
A system for chemical vapor deposition at ambient temperature using electron cyclotron resonance (ECR) comprising: an ECR system; a sputtering system for providing the ECR system with metal ion; an...
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6849307 |
Method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith
A method of manufacturing an optical fiber and related devices using an apparatus having an elongated microwave guide coupled to a resonant cavity formed of an outer cylindrical wall and inner...
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6841202 |
Device and method for the vacuum plasma processing of objects
The invention concerns a device and a method for coating and/or surface modification of objects in a vacuum using a plasma, where there is the possibility of coating or modifying variform objects...
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6841201 |
Apparatus and method for treating a workpiece using plasma generated from microwave radiation
An apparatus and method that generates plasma using a microwave radiation supply. The plasma is used to treat a surface of a workpiece at approximately atmospheric pressure. Plasma excites a...
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6812146 |
Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound
A process for depositing titanium nitride films containing less than 5% carbon impurities and less than 10% oxygen impurities by weight via chemical vapor deposition is disclosed. Sheet resistance...
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6808748 |
Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology
A method of depositing a silicon oxide layer over a substrate having a trench formed between adjacent raised surfaces. In one embodiment the silicon oxide layer is formed in a multistep process...
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6787200 |
Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers
Process and device for depositing, by electron cyclotron resonance plasma, a web of carbon nanofibres or nanotubes, on a substrate without a catalyst, by injection of a microwave power into a...
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6770332 |
Method for forming film by plasma
In a case where a CF film is used as an interlayer dielectric file for a semiconductor device, when a wiring of tungsten is formed, the CF film is heated to a temperature of, e g., about 400 to...
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6756311 |
Methods and apparatus for producing semiconductor devices
A method for producing semiconductor devices and a production apparatus having a superior ability to control the process are disclosed. In an embodiment according to this invention, a surface of a...
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6730369 |
Device and method for plasma processing
The vacuum processing chambers 31 of the plasma processing units 3 A and 3 B are connected to the transfer chamber 2 and the wafer W in the positioned state is transferred from the transfer...
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6715441 |
PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith
The invention relates to an apparatus for performing Plasma Chemical Vapor Deposition (PCVD), whereby one or more layers of silica can be deposited on an elongated vitreous substrate. The apparatus...
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6677001 |
Microwave enhanced CVD method and apparatus
A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for...
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6673722 |
Microwave enhanced CVD system under magnetic field
An improved chemical vapor deposition or etching is shown in which cyclotron resonance and photo or plasma CVD cooperate to deposit a layer with high performance at a high deposition speed. The...
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6660342 |
Pulsed electromagnetic energy method for forming a film
A method of forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power for generating the plasma has a pulsed...
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6652923 |
Electron-emitting source, electron-emitting module, and method of manufacturing electron-emitting source
An electron-emitting source includes a substrate and a coating film. The substrate is made of a material containing a metal serving as a growth nucleus for nanotube fibers as a main component, and...
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6645575 |
Method for making a multi-layer plastic container having a carbon-treated internal surface
A method is provided for making a blow molded multi-layer container having an upper wall portion, including an opening; an intermediate sidewall portion positioned beneath the upper wall portion;...
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6617152 |
Method for creating a cell growth surface on a polymeric substrate
A method, apparatus and product for producing an advantaged cell growth surface. According to the present invention, a stream of plasma is comprised of activated gaseous species generated by a...
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6610373 |
Magnetic film-forming device and method
In a device for forming magnetic film which deposits magnetic material on a substrate 12 , a device is provided which, before the magnetic film is formed in a magnetic film-forming chamber 11 ,...
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6607790 |
Method of forming a thin film for a semiconductor device
The present invention relates to a plasma-enhanced chemical vapor deposition (PECVD) method of depositing a thin layer of a material, such as silicon dioxide, on the surface of a body, such as a...
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6582778 |
Method of treatment with a microwave plasma
Disclosed is a method of treatment with a microwave plasma by maintaining a reduced pressure in a plasma-treating chamber for treatment with a plasma in which a substrate that is to be treated with...
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6487986 |
Device for the plasma deposition of a polycrystalline diamond
In an apparatus for depositing polycrystalline diamond by plasma technology onto substrates ( 5 ) of large area, having a process chamber ( 1 ) with airlock ( 6 a ), a plurality of microwave plasma...
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6475620 |
Method for depositing a coating layer on an optical fiber while it is being drawn and device for its implementation
A method for the deposition of a coating layer on an optical fiber while it is being drawn. The coating layer is designed to reduce the permeability of the optical fiber to water vapor and...
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6468603 |
Plasma film forming method utilizing varying bias electric power
This invention is a method of: making a film-forming gas including a compound gas of carbon and fluorine into plasma in a vacuum container 2 including a stage 4 for an object to be processed ...
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6458415 |
Method of forming diamond film and film-forming apparatus
A method and an apparatus form a diamond film from a microwave plasma by controlling a manufacturing condition based on a spectroscopic measurement of the plasma light emission to obtain a large...
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6447851 |
Field emission from bias-grown diamond thin films in a microwave plasma
A method of producing diamond or diamond like films in which a negative bias is established on a substrate with an electrically conductive surface in a microwave plasma chemical vapor deposition...
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6437512 |
Plasma generator
A plasma generator comprises an ICP chamber and a surface wave conducting device. The upper wall of the ICP chamber is a quartz plate, and an electrode inside the lower ICP chamber is coupled with...
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6432492 |
HF-Plasma coating chamber or PECVD coating chamber, its use and method of plating CDs using the chamber
An Rf plasma enhanced chemical vapor deposition (PECVD) coating chamber for coating a planar dielectric substrate with a metallic layer or a plane dielectric substrate covered with a metallic...
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6423383 |
Plasma processing apparatus and method
A plasma processing apparatus and method is equipped with a reaction chamber, a microwave generator for generating a microwave within the reaction chamber, and main and auxiliary magnets for...
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