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7597940 Methods for preparing titania coatings by plasma CVD at atmospheric pressure  
A method for deposition of titania, and titania-containing, thin films by CVD, using an atmospheric pressure glow discharge plasma as a major source of reaction, which leads to film properties, and...
7578889 Methodology for cleaning of surface metal contamination from electrode assemblies  
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
7497963 Etching method  
In this etching method, since an etching gas is introduced before introduction of free radicals into a processing chamber, the etching gas has been adsorbed on the surface of substrates when the...
7465478 Plasma immersion ion implantation process  
A method of processing a workpiece includes placing the workpiece on a workpiece support pedestal in a main chamber with a gas distribution showerhead, introducing a process gas into a remote...
7348042 Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)  
The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant...
7303790 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained  
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber...
7238393 Method of forming silicon carbide films  
A method for depositing a silicon carbide layer onto a substrate comprises providing a silicon and carbon source gas and an inert gas into a reaction zone. The reaction zone contains the substrate....
7172969 Method and system for etching a film stack  
A method and system is described for preparing a film stack, and forming a feature in the film stack using a plurality of dry etching processes. The feature formed in the film stack can include a...
7160585 Process for making at least one nanotube between two electrically conducting elements and device for implementing such a process  
A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one...
7060514 Process for fabricating films of uniform properties on semiconductor devices  
A process for forming a thin layer exhibiting a substantially uniform property on an active surface of a semiconductor substrate includes varying the temperature within a reaction chamber while a...
7048973 Metal film vapor phase deposition method and vapor phase deposition apparatus  
A copper film vapor phase deposition method includes the steps of exposing high-purity copper to a plasma of a gas containing chlorine gas to etch the high-purity copper, thereby generating active...
6858265 Technique for improving chucking reproducibility  
Method and apparatus for improving the reproducibility of chucking forces of an electrostatic chuck used in plasma enhanced CVD processing of substrates provides for precoating of the electrostatic...
6838127 Method and apparatus for forming an HSG-Si layer on a wafer  
An HSG-Si layer is formed on a wafer under a uniform temperature condition. An apparatus for forming the HSG-Si layer includes a housing forming a process chamber, a first heater on which the wafer...
6830786 Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film  
A silicon oxide film has a ratio of A 1 to A 2 which is not higher than 0.21, where A 1 is a first peak integrated intensity of a first peak belonging to Si—OH and appearing in the vicinity of...
6825134 Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow  
A method of film layer deposition is described. A film layer is deposited using a cyclical deposition process. The cyclical deposition process consists essentially of a continuous flow of one or...
6821578 Method of manufacturing an article with a protective coating system including an improved anchoring layer  
A method of placing a ceramic coating on an article of manufacture comprising a substrate formed of a nickel or cobalt-based superalloy, which includes the steps of placing a bonding layer on the...
6787200 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers  
Process and device for depositing, by electron cyclotron resonance plasma, a web of carbon nanofibres or nanotubes, on a substrate without a catalyst, by injection of a microwave power into a...
6783794 Method and arrangement for plasma boronizing  
A method and arrangement for producing a boride layer on a surface by plasma boronizing includes supplying a gas mixture containing a boron-releasing gas to a reactor and generating a glow...
6699788 Method for integrated nucleation and bulk film deposition  
An integrated nucleation and bulk deposition process is disclosed for forming a CVD metal film over a semiconductor substrate that has structures formed thereon. In the integrated deposition...
6677001 Microwave enhanced CVD method and apparatus  
A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for...
6669825 Method of forming a dielectric film  
A method of forming an insulation film includes the steps of forming an insulation film on a substrate, and modifying a film quality of the insulation film by exposing the insulation film to atomic...
6652923 Electron-emitting source, electron-emitting module, and method of manufacturing electron-emitting source  
An electron-emitting source includes a substrate and a coating film. The substrate is made of a material containing a metal serving as a growth nucleus for nanotube fibers as a main component, and...
6620247 Thin polycrystalline silicon film forming apparatus  
A method of forming a thin polycrystalline silicon film and a thin film forming apparatus allowing inexpensive formation of a thin polycrystalline silicon film at a relatively low temperature with...
6524955 Method of forming thin film onto semiconductor substrate  
In a plasma CVD apparatus including a reaction chamber and a susceptor to form a thin film on a semiconductor substrate, a pretreatment step is conducted to form a surface layer on the surface of...
6511717 Method for coating substrates with improved substrate preheating  
In the method for coating substrates the substrates are placed in recesses in a glass-ceramic plate or plates arranged over infrared high-temperature radiators with the surfaces to be coated on the...
6500500 Method for forming a deposited film by plasma chemical vapor deposition  
A film-forming method and apparatus by high frequency plasma CVD, characterized by using a specific high frequency power introduction means comprising at least an electrode for introducing a high...
6488995 Method of forming microcrystalline silicon film, method of fabricating photovoltaic cell using said method, and photovoltaic device fabricated thereby  
Disclosed herein is a method of forming a microcrystalline silicon film by using a raw gas containing at least a silicon compound by a high-frequency plasma CVD method, wherein the formation of the...
6475620 Method for depositing a coating layer on an optical fiber while it is being drawn and device for its implementation  
A method for the deposition of a coating layer on an optical fiber while it is being drawn. The coating layer is designed to reduce the permeability of the optical fiber to water vapor and...
6472048 Magnetic recording medium and process for producing the same  
A magnetic recording medium having an excellent surface smoothness comprising a substrate and a maghemite thin film formed on the substrate. The maghemite thin film has a thickness of 10 to 50 nm...
6460243 Method of making low stress and low resistance rhodium (RH) leads  
A method of making rhodium (Rh) lead layers for a read sensor comprises a first step of obliquely ion beam sputtering the rhodium (Rh) lead layer followed by a second step of annealing. This method...
6447850 Polycrystalline silicon thin film forming method  
A method of forming a thin polycrystalline silicon film and a thin film forming apparatus allowing inexpensive formation of a thin polycrystalline silicon film at a relatively low temperature with...
6444277 Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates  
Amorphous silicon thin films can be deposited onto large area glass substrates at high deposition rates by chemical vapor deposition using pressure of at least 0.8 Torr and temperatures of about...
6419994 Methods of chemical vapor deposition  
In one aspect, the invention encompasses a method of chemical vapor deposition. A vaporization surface Is provided and heated. At least one material is flowed past the heated surface to vaporize...
6413592 Apparatus for forming a deposited film by plasma chemical vapor deposition  
A film-forming apparatus is provided which comprises a reaction chamber capable of being vacuumed and having a reaction space in which a plurality of substrates can be arranged on a common...
6406925 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing  
A method and apparatus for minimizing or eliminating arcing or dielectric breakdown across a wafer during a semiconductor wafer processing step includes controlling the voltage across the wafer so...
6391394 Method for manufacturing electrophotographic photosensitive member and jig used therein  
A method for manufacturing an electrophotographic photosensitive member in which an aluminum substrate is fitted on a substrate holder and a functional film comprising a non-monocrystalline...
6372304 Method and apparatus for forming SiC thin film on high polymer base material by plasma CVD  
A high quality transparent SiC thin film can be deposited on the surface of a plastic material at low temperature utilizing Electron Cyclotron Resonance (ECR) Plasma CVD techniques, thereby...
6365495 Method for performing metallo-organic chemical vapor deposition of titanium nitride at reduced temperature  
A process for chemical vapor deposition of titanium nitride film using thermal decomposition of a metal-organic compound is disclosed. In particular, the deposition of titanium nitride film from...
6364949 300 mm CVD chamber design for metal-organic thin film deposition  
The present invention relates to plasma-enhanced chemical vapor deposition (PECVD) and related chamber hardware. Embodiments of the present invention include a PECVD system for depositing a film of...
6346301 Coating method for producing a heat-insulating layer on a substrate  
The invention relates to a component having a substrate and a ceramic heat-insulating layer which is arranged thereon. This heat-insulating layer has a columnar structure having ceramic stems which...
6337110 Process for the deposition by electron cyclotron resonance plasma of electron-emitting carbon films under the effect of an electric field applied  
The present invention relates to a process for electron cyclotron resonance plasma deposition of electron-emitting carbon films, in which by injecting a microwave power into a plasma chamber...
6282356 Optical waveguide device with enhanced stability  
The invention is an optical waveguide device and a method for forming the device which provides enhanced stability. The device includes a pyroelectric substrate such as lithium niobate where the...
6215092 Plasma overcladding process and apparatus having multiple plasma torches  
A method and associated apparatus for increasing the over cladding rate in perform production while maintaining the integrity of the glass quality of the cladding. The method and apparatus are...
6200652 Method for nucleation and deposition of diamond using hot-filament DC plasma  
A method and apparatus for nucleation and growth of diamond by hot-filament DC plasma deposition. The apparatus uses a resistively heated filament array for dissociating hydrogen in the reactant...
6184158 Inductively coupled plasma CVD  
A method of depositing a dielectric film on a substrate in a process chamber of an inductively coupled plasma-enhanced chemical vapor deposition reactor. Gap filling between electrically conductive...
6139921 Method for depositing fine-grained alumina coatings on cutting tools  
A method for depositing refractory alumina (A 2 O 3 ) thin layers on cutting tools made of cemented carbide, cermet, ceramics or high speed steel is disclosed. The present method is a Plasma...
6113993 Method of coating a substrate with a calcium phosphate compound  
The present invention is a method of coating a substrate with a calcium phosphate compound using plasma enhanced MOCVD. The substrate is a solid material that may be porous or non-porous, including...
6090455 Method for forming SBT ferroelectric thin film  
A method for forming SBT ferroelectric thin film. Sr(C 5 F 6 HO 2 ) 2 , Bi(C 6 H 5 ) 3 and Ta(C 2 H 5 O) 5 are used as the precursors of Sr, Bi and Ta and bubbled at a temperature of...
6090333 Process for the chemical modification of solids containing alkyl groups  
The invention relates to a process for the chemical modification of solids containing alkyl groups. It is provided that the solids containing alkyl groups are heated to temperatures above their...
6083572 Organic low-dielectric constant films deposited by plasma enhanced chemical vapor deposition  
A method of forming a low-dielectric constant film on a substrate. The method includes placing the substrate within a plasma processing chamber. Gas within the chamber is removed. A combination of...
Matches 1 - 50 out of 215 1 2 3 4 5 >