Matches 1 - 50 out of 83 1 2 >
Match Document Document Title
7422775 Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing  
A method of processing a workpiece includes introducing an optical absorber material precursor gas into a chamber containing the workpiece, generating an RF oscillating toroidal plasma current in a...
6926933 Method of manufacturing water-repelling film  
A water-repelling film is formed by using a vacuum ultraviolet rays chemical vapor deposition (CVD) system ( 100 ) comprising a vacuum ultraviolet rays generating section ( 102 ), a reaction room (...
6733848 Thin film forming equipment and method  
A thin film forming equipment and a method for forming thin films are provided which are capable of forming the thin film of high quality and of effectively preventing CVD material gas from leaking...
6677001 Microwave enhanced CVD method and apparatus  
A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for...
6673524 Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method  
An exemplary method of forming an attenuating extreme ultraviolet (EUV) phase-shifting mask is described. This method can include providing a multi-layer mirror over an integrated circuit substrate...
6616987 Procedure and device for specific particle manipulation and deposition  
A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles...
6558757 Method and device for coating substrates in a vacuum  
The invention relates to a method and a device for coating substrates in a vacuum, in which a plasma is generated from a target using a laser beam and ionized particles of the plasma are deposited...
6524517 Methods for molding and grafting highly uniform polymer layers onto electronic microchips  
Microreaction molds and methods of molding very thin films onto substrate surfaces are provided. The molds and molding methods allow for consistency and uniformity in the thicknesses of the films...
6517912 Particle manipulation  
In a method for manipulating particles arranged in a plasma-cristalline state in a plasma of a carrier gas, the particles are at least partially subject to plasma treatment and/or applied to a...
6509070 Laser ablation, low temperature-fabricated yttria-stabilized zirconia oriented films  
Formation of for example yttria stabilized zirconia films of significant 001 orientation on a variety of substrates including amorphous material and room temperature limited material is disclosed....
6480074 Method and system for wafer-level tuning of bulk acoustic wave resonators and filters by reducing thickness non-uniformity  
A method and system for tuning a bulk acoustic wave device at wafer level by reducing the thickness non-uniformity of the topmost surface of the device using a chemical vapor deposition process. A...
6375860 Controlled potential plasma source  
The occurrence of internally-formed contaminants or negatively-charged particulates within a plasma is minimized by preventing such from becoming trapped in the plasma. The plasma is formed in a...
6338778 Vacuum coating system with a coating chamber and at least one source chamber  
The invention relates to a device, in particular for a laser-induced vacuum are discharge evaporator for depositing of multiple layers with a high level of purity and high deposition rates on...
6149984 Laser irradiation method  
In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light...
6130118 Plasma reaction apparatus and plasma reaction  
A process for depositing a film at a high rate and with superior step coverage properties, which comprises installing a pair of electrodes crossing with another pair of electrodes making a right...
6110542 Method for forming a film  
A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for...
6099783 Photopolymerizable compositions for encapsulating microelectronic devices  
A novel method for producing thick composite parts based upon photopolymerizable compositions is disclosed. Also disclosed are novel methods for encapsulation of microelectronic devices based upon...
5980999 Method of manufacturing thin film and method for performing precise working by radical control and apparatus for carrying out such methods  
A first reactive gas is introduced into a vacuum chamber and a plasma of the thus introduced reactive gas is produced. A second reactive gas is introduced into a radical generating chamber and is...
5925421 Laser irradiation method  
In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light...
5776557 Method for forming a film on a substrate by activating a reactive gas  
A thin film forming method which comprises the steps of supporting a substrate to be treated, having a trench or an unevenness thereon, in a reaction vessel; introducing a reactive gas into the...
5763002 Methods of manufacture of master disk for making a die for pressing optical disks  
Master disks for providing dies in particular for pressing optical disks, methods of manufacturing same, pressing dies obtained from such master disks and optical disks obtained from the latter and...
5753320 Process for forming deposited film  
A process for forming a deposited film on a substrate according to the chemical vapor deposition method comprises previously forming excited species of a gas phase compound containing atoms which...
5725914 Process and apparatus for producing a functional structure of a semiconductor component  
In order to improve a process and an apparatus for producing a functional structure of a semiconductor component, which comprises layers arranged on a base substrate and defining the entire...
5654043 Pulsed plate plasma implantation system and method  
Method and apparatus for treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. An implantation chamber defines a chamber interior into which one or...
5591492 Process for forming and etching a film to effect specific crystal growth from activated species  
A process for forming a deposited film comprises the steps of: (a) arranging previously a substrate for formation of a deposited film in a film forming space; (b) forming a deposited film on...
5591486 Method for forming a film on a substrate by activating a reactive gas  
A thin film forming method which comprises the steps of supporting a substrate to be treated, having a trench or an unevenness thereon, in a reaction vessel; introducing a reactive gas into the...
5585148 Process for forming a deposited film using a light transmissive perforated diffusion plate  
A process for forming a deposited film on a substrate including generating a plasma in a plasma generating chamber via a light transmissive perforated diffusion plate which is located adjacent to a...
5547716 Laser absorption wave deposition process and apparatus  
Laser energy is used to make precursors of crystalline materials, such as diamond, by providing an environment in which optical radiation may be efficiently absorbed to create significant precursor...
5478609 Substrate heating mechanism  
A substrate-heating mechanism has a heat source for heating a substrate for heating a substrate face side reverse to a film formation face in a film deposition on the film formation surface of the...
5458919 Method for forming a film on a substrate by activating a reactive gas  
A thin film forming method which comprises the steps of supporting a substrate to be treated, having a trench or an unevenness thereon, in a reaction vessel; introducing a reactive gas into the...
5385763 Method for forming a film on a substrate by activating a reactive gas  
A thin film forming method comprises the steps of supporting a semiconductor substrate having a trench or an unevenness thereon in a reaction vessel; introducing a reactive gas into the vessel;...
5324552 Process for coating substrate material  
To provide a process for coating substrate material in which coating material is ablated in an ablation region by a laser beam in a coating chamber containing a negative pressure, propagates in the...
5314726 Process for forming a mixed layer of a plasma sprayed material and diamond  
A process for forming a diamond gas phase synthesized coating film which is easily controlled and affords a high quality, good adhesion strength diamond film includes a step of forming a mixed...
5300485 Method of preparing oxide superconducting films by laser ablation  
In order to enable formation of a smooth and dense oxide superconducting film with no clear appearance of grain boundaries in a fine structure even at a high film forming rate, a laser ablation...
5246529 Plasma processing method  
A workpiece is etched with a plasma. First, a chamber is provided in which a pair of electrodes are arranged parallel to each other at a distance. The electrodes define a plasma generation area...
5231047 High quality photovoltaic semiconductor material and laser ablation method of fabrication same  
A high quality, narrow band gap, hydrogenated amorphous germanium or amorphous silicon alloy material characterized by a host matrix in which all hydrogen is incorporated therein in germanium...
5211995 Method of protecting an organic surface by deposition of an inorganic refractory coating thereon  
Transparent, refractory coatings and methods for their application to environmentally exposed substrates are disclosed. The coatings can be deposited over organic decorative materials, which...
5158931 Method for manufacturing an oxide superconductor thin film  
A laser beam 5 is directed to a target made of an oxide superconductor to allow a target spot which is irradiated with the beam to be evaporated and a matter which is evaporated to be deposited as...
5156881 Method for forming a film on a substrate by activating a reactive gas  
A thin film forming method includes the steps of supporting a semiconductor substrate having a trench or unevenness thereon in a reaction vessel, introducing a reactive gas into the reaction...
5138973 Wafer processing apparatus having independently controllable energy sources  
A processing apparatus and method wherein a wafer is exposed to activated species generated by a first plasma which is separate from the wafer, but is in the process gas flow stream upstream of the...
5126165 Laser deposition method and apparatus  
For forming a metal film of a desired property on a substrate, a target and the substrate are placed in a pressure-reducing chamber, and then pulse laser is irradiated to the target. This causes...
5122632 Device for laser plasma coating  
In laser plasma coating, the feeding of the material to be applied is unsatisfactory. Too much material is blown away and not used for the coating. Moreover, the application is inhomogeneous,...
5079187 Method for processing semiconductor materials  
A method for processing semiconductor material for annealing or circuitizing purposes, includes establishing a high intensity light which is controlled at a high repetition rate, and exposing it...
5049406 Method of manufacturing solid bodies  
A substrate (35) is coated by using starting materials which are supplied in the form of clusters (28). The clusters are disintegrated into their molecular or atomic constituents, and the...
5030475 Plasma-enhanced CVD coating process  
A plasma or photo-induced chemical vapor deposition coating process and apparatus are provided for applying thin dielectric coatings on planar, curved, and large area substrates. A plasma is...
5001001 Process for the fabrication of ceramic monoliths by laser-assisted chemical vapor infiltration  
A method of forming a ceramic monolith comprises exposing a pre-formed metal substrate to a NaCl filtered continuous wave laser beam of about 50 to 100 W power and about 80 to 315 W/cm 2 power...
4988533 Method for deposition of silicon oxide on a wafer  
A processing apparatus and method for depositing a silicon oxide layer on a temperature sensitive wafer utilizing a single process chamber provide nitrous oxide gas to the chamber with the...
4981717 Diamond like coating and method of forming  
A method of depositing diamond-like films produces depositing species from a plasma of a hydrocarbon gas precurser. The plasma is generated by a laser pulse which is fired into the gas and is...
4957773 Deposition of boron-containing films from decaborane  
Depopsition of a boron nitride film is carried out by introducing decaborane and dry nitrogen or ammonia into a plasma-assisted chemical vapor deposition chamber. The nitrogen or ammonia partial...
4927704 Abrasion-resistant plastic articles and method for making them  
An abrasion-resistant article and method for making is disclosed. The article includes a plastic substrate and a gradational coating applied by plasma-enhanced chemical vapor deposition to the...
Matches 1 - 50 out of 83 1 2 >