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7361387 |
Plasma enhanced pulsed layer deposition
A process system and a deposition method for depositing a highly controlled layered film on a workpiece is disclosed. The basic component of the apparatus is a pulsing plasma source that is capable...
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7303790 |
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber...
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7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device
A device ( 1 ) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized ( 2 ) and associated with a magnetic...
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7160585 |
Process for making at least one nanotube between two electrically conducting elements and device for implementing such a process
A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one...
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7157123 |
Plasma-enhanced film deposition
Methods and equipment for depositing films. In certain embodiments, there is provided a deposition chamber having a substrate-coating region and an electrode-cleaning region. In these embodiments,...
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7156960 |
Method and device for continuous cold plasma deposition of metal coatings
A method for the deposition of a metal layer on a substrate ( 1 ) uses a cold plasma inside an enclosure ( 7 ) heated to avoid the formation of a metal deposit at its surface. The enclosure has an...
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7125588 |
Pulsed plasma CVD method for forming a film
A method of forming an insulating ceramic film or a metallic film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power...
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7112354 |
Electron spin mechanisms for inducing magnetic-polarization reversal
An apparatus includes a low magnetic-coercivity layer of material (LMC layer) having a majority electron-spin-polarization (M-ESP), an energy-gap coupled with the LMC layer, wherein a flow of...
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6863938 |
Filled diamond foam material and method for forming same
A diamond foam article comprises diamond deposited material on a substrate having an open contiguous structure at least partially filled with a filler material. Methods for forming a diamond foam...
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6838126 |
Method for forming I-carbon film
A film comprising an i-carbon is formed by converting a reactive gas containing a carbon compound gas into plasma by a resonance using a microwave and a magnetic field.
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6787200 |
Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers
Process and device for depositing, by electron cyclotron resonance plasma, a web of carbon nanofibres or nanotubes, on a substrate without a catalyst, by injection of a microwave power into a...
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6756311 |
Methods and apparatus for producing semiconductor devices
A method for producing semiconductor devices and a production apparatus having a superior ability to control the process are disclosed. In an embodiment according to this invention, a surface of a...
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6749893 |
Method of preventing cracking in optical quality silica layers
A method for making an integrated photonic device involves depositing buffer, core and cladding layers on the front side of a wafer. A thick tensile stress layer is deposited on the back side of...
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6685994 |
Coating workpiece method using beam of plasma
Method for coating workpieces generates a beam of a plasma in an evacuated container. A region of highest plasma density is at the beam axis and workpieces having surfaces to be coated, are...
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6679977 |
Method of producing flat panels
A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually...
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6676741 |
Methods for producing enhanced interference pigments
Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material...
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6673722 |
Microwave enhanced CVD system under magnetic field
An improved chemical vapor deposition or etching is shown in which cyclotron resonance and photo or plasma CVD cooperate to deposit a layer with high performance at a high deposition speed. The...
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6669996 |
Method of synthesizing metal doped diamond-like carbon films
A method of synthesizing metal doped carbon films by placing a substrate in a chamber with a selected amount of a metalorganic compound. An electron cyclotron resonance is applied to the chamber in...
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6660342 |
Pulsed electromagnetic energy method for forming a film
A method of forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power for generating the plasma has a pulsed...
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6656540 |
Method for forming metallic film and apparatus for forming the same
The present invention provides methods and apparatus for the formation of a thin noble metal film which can achieve a high rate of film growth, can use inexpensive raw materials, and do not allow...
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6616816 |
Substrate processing device and method
A substrate processing device in which a film is formed on a substrate while a magnetic field, by a magnet arranged in the periphery of a substrate holder, is imparted on to the surface of a...
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6524381 |
Methods for producing enhanced interference pigments
Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material...
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6514347 |
Apparatus and method for plasma treatment
A compensation ring 31 disposed to surround a periphery of a wafer W on a susceptor 30 is concentrically divided into an inside first compensation ring member 32 and an outside second...
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6475557 |
Method for manufacturing optical filter
A method for manufacturing an optical filter capable of manufacturing an optical filter in such a manner that the transmission wavelength varies linearly with respect to the angle θ in the...
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6468603 |
Plasma film forming method utilizing varying bias electric power
This invention is a method of: making a film-forming gas including a compound gas of carbon and fluorine into plasma in a vacuum container 2 including a stage 4 for an object to be processed ...
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6454912 |
Method and apparatus for the fabrication of ferroelectric films
The present invention is related to methods and apparatus for processing weak ferroelectric films on semiconductor substrates, including relatively large substrates, e.g., with 300 millimeter...
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6432819 |
Method and apparatus of forming a sputtered doped seed layer
The present invention generally provides a method and apparatus for forming a doped layer on a substrate to improve uniformity of subsequent deposition thereover. Preferably, the layer is deposited...
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6432281 |
Process for formation of a coating on a substrate
A process for forming a coating on a substrate by condensation of a coating material onto the substrate while the substrate is moving through an enclosure under vacuum in which evaporation of the...
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6423383 |
Plasma processing apparatus and method
A plasma processing apparatus and method is equipped with a reaction chamber, a microwave generator for generating a microwave within the reaction chamber, and main and auxiliary magnets for...
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6403490 |
Method of producing a plasma by capacitive-type discharges with a multipole barrier, and apparatus for implementing such a method
A method of producing a plasma by capacitive discharges between an active electrode and a passive electrode within a sealed chamber at controlled pressure, the passive electrode being placed at a...
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6376028 |
Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process
The described device is introduced into a plastic container with a narrow opening and serves a plasma enhanced process for treating the inside surface of the container. The device ( 2 ) extends...
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6375860 |
Controlled potential plasma source
The occurrence of internally-formed contaminants or negatively-charged particulates within a plasma is minimized by preventing such from becoming trapped in the plasma. The plasma is formed in a...
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6372304 |
Method and apparatus for forming SiC thin film on high polymer base material by plasma CVD
A high quality transparent SiC thin film can be deposited on the surface of a plastic material at low temperature utilizing Electron Cyclotron Resonance (ECR) Plasma CVD techniques, thereby...
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6368678 |
Plasma processing system and method
A substrate processing system includes a processing chamber, an electrically floating substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least...
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6346303 |
Process for synthesizing one-dimensional nanosubstances by electron cyclotron resonance chemical vapor deposition
The present invention provides a process for synthesizing one-dimensional nanosubstances. A membrane having channels serves as the host material for the synthesis. The anodic membrance is brought...
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6337110 |
Process for the deposition by electron cyclotron resonance plasma of electron-emitting carbon films under the effect of an electric field applied
The present invention relates to a process for electron cyclotron resonance plasma deposition of electron-emitting carbon films, in which by injecting a microwave power into a plasma chamber...
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6326064 |
Process for depositing a SiOx film having reduced intrinsic stress and/or reduced hydrogen content
A process for reducing intrinsic stress and/or hydrogen content of a SiO x film grown by chemical vapor deposition. The process is applicable to plasma-enhanced and electron cyclotron resonance...
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6306765 |
Method for the formation of thin films for use as a semiconductor device
A film formation method which comprises the steps of forming a high melting metal film on a substrate to cover an insulating pattern formed on the substrate therewith, and forming on the surface of...
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6291029 |
Plasma processing method
To improve the processing rate and uniformity in a plasma processing for a substrate having a relatively large area, a plasma processing apparatus includes a reaction vessel which has a portion...
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6284674 |
Plasma processing device and a method of plasma process
Disclosed is a plasma process apparatus which permits generating microwaves and a magnetic field so as to bring about electron cyclotron resonance and, thus, to generate a plasma which is applied...
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6284106 |
Method of producing flat panels
A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually...
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6265031 |
Method for plasma processing by shaping an induced electric field
A method for achieving a highly uniform plasma density on a substrate by shaping an induced electric field including the steps of positioning the substrate in a processing chamber. supplying a high...
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6261852 |
Check abnormal contact and via holes by electroplating method
A cathode-anode apparatus is constructed whereby the wafer under test, connected to a conducting wire, forms the cathode terminal and a copper plate, also connected to a conducting wire, forms the...
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6241858 |
Methods and apparatus for producing enhanced interference pigments
Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material...
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6228229 |
Method and apparatus for generating a plasma
A method and apparatus for generating a plasma by inductively coupling electromagnetic energy into the plasma. In one embodiment, first and second antenna coils are disposed about the circumference...
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6228228 |
Method of making a light-emitting fiber
A display as for images and/or information comprises a plurality of light-emitting fibers disposed in side-by-side arrangement to define a viewing surface. Each light-emitting fiber includes a...
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6210544 |
Magnetic film forming method
Disclosed is a magnetic film forming method of forming a magnetic film on a substrate by preparing a material A formed of oxide of an element T of at least one kind of Fe, Co, and Ni and a material...
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6200651 |
Method of chemical vapor deposition in a vacuum plasma processor responsive to a pulsed microwave source
A dielectric layer is deposited on a workpiece by a chemical vapor deposition method in an electron cyclotron resonance vacuum plasma processor having a plasma chamber responsive to a repetitively...
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6177148 |
Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process
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6171659 |
Process for the formation of a coating on a substrate and device for the use this process
Process for the depositing, onto a substrate, of a coating essentially constituted of an electronic conductor compound, in which the said coating is formed by producing alternatively, on the one...
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