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9040127 Low temperature silicon carbide deposition process  
Methods for formation of silicon carbide on substrate are provided. Atomic layer deposition methods of forming silicon carbide are described in which a first reactant gas of the formula SinHaXb...
9040125 Covalently bound monolayer for a protective carbon overcoat  
A magnetic data storage medium may include a substrate, a magnetic recording layer, a protective carbon overcoat, and a monolayer covalently bound to carbon atoms adjacent a surface of the...
9040126 Fabrication of zeolite composite film  
A fabrication of a zeolite composite film includes mixing a composition of water, aluminum isopropoxide, TMAOH, and TEOS according to a set ratio, followed by stirring and heating to obtain a...
9028925 Product having functional layer and method for fabricating the same  
A product having a functional layer and a method for fabricating the same. A method for fabricating a product having a functional layer includes the step of conducting a plasma reaction with...
9029264 Methods for depositing a tin-containing layer on a substrate  
Methods of depositing a tin-containing layer on a substrate are disclosed herein. In some embodiments, a method of depositing a tin-containing layer on a substrate may include flowing a tin source...
9023227 Increased deposition efficiency and higher chamber conductance with source power increase in an inductively coupled plasma (ICP) chamber  
Embodiments described herein generally relate to a substrate processing system and related methods, such as an etching/deposition method. The method comprises (A) depositing a protective layer on...
9023437 Ceramic coating deposition  
A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The...
9023438 Methods and apparatus for combinatorial PECVD or PEALD  
Apparatus and methods for depositing materials on a plurality of site-isolated regions on a substrate are provided. The deposition uses PECVD or PEALD. The apparatus include an inner chamber with...
9017776 Apparatuses and methods for atomic layer deposition  
Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which...
9012839 Mass spectrometer vacuum interface method and apparatus  
A method of operating a mass spectrometer vacuum interface comprising a skimmer apparatus having a skimmer aperture and downstream ion extraction optics. An expanding plasma is skimmed through the...
9005718 Process for depositing films simultaneously onto both sides of a substrate  
A process for the simultaneous deposition of films onto both sides of a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (106, 206) or making said...
9005552 Selective CO methanation catalyst, method of producing the same, and apparatus using the same  
Provided is a new catalyst capable of removing carbon monoxide economically without adding particular reaction gas externally. Also provided are a process for producing and an apparatus using such...
8999456 Method for manufacturing of drug-releasing stent coated with titanium—oxide thin film  
A method for manufacturing a drug-releasing stent is provided. The method includes providing a titanium precursor, a carrier gas and a reactant gas in a plasma vacuum chamber, and generating a...
8986794 Vapor deposition apparatus and method of manufacturing organic light-emitting display apparatus  
A vapor deposition apparatus efficiently performs a deposition process to form a thin film with improved characteristics on a substrate, and a method manufactures an organic light-emitting display...
8986795 Manufacturing method of functional film  
When manufacturing a functional film to be formed by using a plasma CVD method while transporting an elongated substrate in a longitudinal direction, an object is to provide a manufacturing method...
8975603 Systems and methods for plasma doping microfeature workpieces  
Systems and methods for plasma doping microfeature workpieces are disclosed herein. In one embodiment, a method of implanting boron ions into a region of a workpiece includes generating a plasma...
8968837 Method for the plasma-enhanced treatment of internal surfaces of a hollow body, fluid separator, and use thereof  
The present invention relates to the treatment of internal surfaces of a hollow body, on the inner surfaces of which areas having different surface properties, for example, having hydrophilic and...
8968839 Method for producing surface-treated metallic material  
There is provided a method for producing a surface-treated metallic material, by use of which a metallic material having a stable and excellent sliding characteristic can be produced with a low...
8968838 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation  
A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a...
8962101 Methods and apparatus for plasma-based deposition  
High-deposition rate methods for forming transparent ashable hardmasks (AHMs) that have high plasma etch selectivity to underlying layers are provided. The methods involve placing a wafer on a...
8962099 Plasma surface activation method and resulting object  
A method for depositing functional groups on a surface of an object, and to the object treated as such, by generating and maintaining a plasma, bringing the object surface close to or in a space...
8956704 Methods for modulating step coverage during conformal film deposition  
Methods for processing a substrate include a) arranging a substrate on a pedestal in a processing chamber; b) supplying precursor to the processing chamber; c) purging the processing chamber; d)...
8951615 Doping control by ALD surface functionalization  
Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A...
8940374 Nanolayer deposition process  
A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, including introducing a first plurality of...
8927052 Process for deposition and characterization of a coating  
Provided herein are processes for depositing a plasma coating on a substrate and coated substrates obtained thereby. More particularly, processes for characterizing a plasma coating on a substrate...
8927748 Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films  
Organometallic complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The organometallic complexes are (alkyl-substituted η3-allyl)(carbonyl)metal complexes.
8920888 Plasma process, film deposition method and system using rotary chuck  
A chuck and a wafer supported thereon are rotated during a plasma process or a film deposition process to reduce thickness non-uniformity of a film processed or deposited on the wafer.
8911836 Spectrally selective coatings and associated methods for minimizing the effects of lightning strikes  
A method for reducing structural damage to a substrate resulting from interaction between the substrate and a plasma, the method including the steps of identifying a wavelength at which a spectral...
8906471 Method of depositing metallic film by plasma CVD and storage medium  
For depositing a metallic film, the following steps are repeatedly conducted: a step in which a precoat film is formed on the inside of a chamber; a step in which two or more substrates to be...
8900663 Methods for coating articles  
Methods and systems for coating articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature...
8895108 Method for forming thin film using radicals generated by plasma  
A method for forming a thin film using radicals generated by plasma may include generating radicals of a reactant precursor using plasma; forming a first thin film on a substrate by exposing the...
8895114 Method and device for functionalizing the surfaces of adhesive closure parts  
The invention relates to a method for functionalizing the surfaces of adhesive closing parts which form, with correspondingly formed adhesive closing parts, an adhesive closure that can be...
8895115 Method for producing an ionized vapor deposition coating  
A method of depositing a coating by vapor deposition. The method including ionizing a process gas, generating a metal vapor and creating a metal flow having a metal atom flow density in the range...
8895116 Manufacturing method of crystalline semiconductor film and manufacturing method of semiconductor device  
The crystalline semiconductor film is formed following steps that supplying a film formation gas to a second gas diffusion area from a gas introduction port provided in an upper electrode;...
8889534 Solid state source introduction of dopants and additives for a plasma doping process  
A method of doping a non-planar surface or a surface of a substrate subject to poor view factors is provided. The processing chamber comprises a window, walls, and a bottom of the processing...
8883268 Method and device for producing a parylene coating  
A method of producing a parylene coating on at least one surface of at least one component includes providing a first gas containing parylene monomers and depositing the parylene monomers on the...
8883025 Plasma processing apparatus and plasma processing method  
A plasma processing apparatus includes a stock unit, a processing unit, and an alignment chamber. The stock unit supplies and collects a conveyable tray formed with a plurality of housing holes in...
8883257 Method for manufacturing gas barrier thin film-coated plastic container  
Disclosed herein is a method for producing a plastic container coated with a thin film that is excellent in gas barrier properties, film coloration and film adhesiveness without using an external...
8883270 Systems and methods for thin-film deposition of metal oxides using excited nitrogen—oxygen species  
Systems and methods are delineated which, among other things, are for depositing a film on a substrate that is within a reaction chamber. In an exemplary method, the method may comprise applying...
8883267 Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus  
A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic...
8877301 Plasma processing including asymmetrically grounding a susceptor  
An asymmetrically grounded susceptor used in a plasma processing chamber for chemical vapor deposition onto large rectangular panels supported on and grounded by the susceptor. A plurality of...
8877000 Shower head gas injection apparatus with secondary high pressure pulsed gas injection  
A plasma-processing chamber including pulsed gas injection orifices/nozzles utilized in combination with continuous flow shower head injection orifices is described. The continuous flow shower...
8877300 Atomic layer deposition using radicals of gas mixture  
Performing atomic layer deposition (ALD) using radicals of a mixture of nitrogen compounds to increase the deposition rate of a layer deposited on a substrate. A mixture of nitrogen compound gases...
8871312 Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber  
Specialty ceramic materials which resist corrosion/erosion under semiconductor processing conditions which employ a corrosive/erosive plasma. The corrosive plasma may be a halogen-containing...
8865271 High rate deposition for the formation of high quality optical coatings  
High rate deposition methods comprise depositing a powder coating from a product flow. The product flow results from a chemical reaction within the flow. Some of the powder coatings consolidate...
8857372 Method of fabricating optical fiber using an isothermal, low pressure plasma deposition technique  
An isothermal, low pressure-based process of depositing material within a substrate has been developed and results in creating an extremely narrow reaction zone within which a more uniform and...
8859035 Powder treatment for enhanced flowability  
A method of enhancing the flowability of a powder. The powder is defined by a plurality of particles having an initial level of inter-particle forces between each particle. The method comprises:...
8859056 Bonding an adherent to a substrate via a primer  
A method of bonding an adherent to a substrate, wherein a primer is applied to the substrate by plasma deposition and the adherent is bonded to the primer treated surface of the substrate, and the...
8852460 Alkali earth metal precursors for depositing calcium and strontium containing films  
Methods and compositions for the deposition of a film on a substrate. In general, the disclosed compositions and methods utilize a precursor containing calcium or strontium.
8846187 Transparent gas barrier film and method for producing transparent gas barrier film  
Disclosed is a transparent gas barrier film having good transparency and good gas barrier properties, which exhibits excellent adhesion even after storage under severe environmental conditions,...