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7578889 Methodology for cleaning of surface metal contamination from electrode assemblies  
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
7572482 Photo-patterned carbon electronics  
A system is provided for the manufacture of carbon based electrical components including, an ultraviolet light source; a substrate receiving unit whereby a substrate bearing a first layer of carbon...
7473443 Composition for forming silicon film and method for forming silicon film  
There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the...
7465478 Plasma immersion ion implantation process  
A method of processing a workpiece includes placing the workpiece on a workpiece support pedestal in a main chamber with a gas distribution showerhead, introducing a process gas into a remote...
7288292 Ultra low k (ULK) SiCOH film and method  
The present invention provides a multiphase, ultra low k film which exhibits improved elastic modulus and hardness as well as various methods for forming the same. The multiphase, ultra low k...
7279112 Method of manufacture of smart microfluidic medical device with universal coating  
A method of applying a universal coating for a medical device comprising a medical device component, the medical device component having an outer surface and an inner surface, the universal coating...
7273638 High density plasma oxidation  
A method of oxidizing a substrate having area of about 30,000 mm 2 or more. The surface is preferably comprised of silicon-containing materials, such as silicon, silicon germanium, silicon...
7112453 Retentate chromatography and protein chip arrays with applications in biology and medicine  
This invention provides methods of retentate chromatography for resolving analytes in a sample. The methods involve adsorbing the analytes to a substrate under a plurality of different selectivity...
6936310 Plasma processing method  
In a plasma processing method making use of a plasma processing gas of a reactant gas and an inert gas, it is aimed at enhancing an efficiency of use of high-frequency power and a reactant gas to...
6830786 Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film  
A silicon oxide film has a ratio of A 1 to A 2 which is not higher than 0.21, where A 1 is a first peak integrated intensity of a first peak belonging to Si—OH and appearing in the vicinity of...
6800336 Method and device for plasma coating surfaces  
A method for coating surfaces, for which a precursor material is caused to react with the help of plasma and the reaction product is deposited on a surface, the reaction as well as the deposition...
6797339 Method for forming thin film with a gas cluster ion beam  
A method of forming a thin film on the surface of a substrate such as silicon, in which a gas cluster (which is a massive atomic or molecular group of a reactive substance taking the gaseous form...
6797336 Multi-component substances and processes for preparation thereof  
The present invention is a method and apparatus for the synthesis of multi-component substances, comprising entities of at least two elements, molecules, grains, crystals, structural units, or...
6737121 Multilayer article and method of making by arc plasma deposition  
According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an...
6709715 Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds  
A method and apparatus for depositing a low dielectric constant film by plasma assisted copolymerization of p-xylylene and a comonomer having carbon-carbon double bonds at a constant RF power level...
6703081 Installation and method for vacuum treatment or powder production  
Vacuum treatment installation with a vacuum treatment chamber containing a plasma discharge configuration as well as a gas supply configuration. The plasma discharge configuration has at least two...
6673722 Microwave enhanced CVD system under magnetic field  
An improved chemical vapor deposition or etching is shown in which cyclotron resonance and photo or plasma CVD cooperate to deposit a layer with high performance at a high deposition speed. The...
6653245 Method for liquid phase deposition  
A method for liquid phase deposition, including the steps of providing at least two raw materials from at least two supply devices of a saturation reaction system into a mixture trough and stirring...
6616985 Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor  
An apparatus and method for injecting gas within a plasma reactor and tailoring the distribution of an active species generated by the remote plasma source over the substrate or wafer. The...
6610368 Leather and a method of dressing same  
Tanned leather is dry dressed by plasma deposition at atmospheric pressure of a matrix material such as ITO, a silicone, or polyurethane, upon the protein fibers of the surface of the leather and...
6607790 Method of forming a thin film for a semiconductor device  
The present invention relates to a plasma-enhanced chemical vapor deposition (PECVD) method of depositing a thin layer of a material, such as silicon dioxide, on the surface of a body, such as a...
6468601 Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology  
An apparatus and method for reducing the production of white powder in a process chamber used for depositing silicon nitride. Steps of the method include heating at least a portion of a wall of the...
6436487 Method for depositing a silicon oxide film  
In a film deposition process wherein a plasma generation chamber is divided from a deposition chamber, radicals are extracted from the plasma generation chamber to the deposition chamber and caused...
RE37294 Ion beam process for deposition of highly abrasion-resistant coatings  
An ion beam deposition method is provided for manufacturing a coated substrate with improved abrasion resistance, and improved lifetime. According to the method, the substrate is first chemically...
6254940 Electrically assisted synthesis of particles and film with precisely controlled characteristic  
The present invention related to methods of manufacturing oxide, nitride, carbide, and boride powders and other ceramic, organic, metallic, carbon and alloy powders and films and their mixtures...
6245396 CVD apparatus and method of using same  
To suppress the formation of dust particles, prevent the implantation of ions into a substrate and to achieve a good plasma distribution in the vicinity of the substrate when depositing a silicon...
6194036 Deposition of coatings using an atmospheric pressure plasma jet  
Deposition of coatings using an atmospheric pressure plasma jet. The use of a nonthermal source which is capable of operation at 760 torr is demonstrated. As an example of the application of the...
6180185 Method of forming a film on a substrate  
An apparatus for forming a film on a substrate includes a gas inlet and an insert attached to the gas inlet, the insert including a deposition source material such as lithium. To form the film on...
6143142 Composite coatings  
The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure...
6083569 Discharging a wafer after a plasma process for dielectric deposition  
A method and apparatus for neutralizing a wafer in a plasma reactor following a deposition process which charges the wafer and hinders removal of the wafer from the plasma reactor. The wafer is...
6077569 Highly durable and abrasion-resistant dielectric coatings for lenses  
An abrasion-resistant dielectric composite product is described comprising a substrate and an abrasion wear resistant coating material comprising carbon, hydrogen, silicon, and oxygen and a...
6059937 Sensor having tin oxide thin film for detecting methane gas and propane gas, and process for manufacturing thereof  
The present invention relates to a sensor for detecting hydrocarbon type gas such as methane gas and propane gas, and process for manufacturing thereof. SiO 2 was deposited in 1 μm by ion beam...
6042901 Method for depositing fluorine doped silicon dioxide films  
A process of preparing a moisture-resistant fluorine containing silicon oxide film includes steps of supplying reactant gases containing silicon, oxygen and fluorine into a process chamber and...
6007878 Process for producing an optical recording medium having a protective layer formed using a plasma processing device  
A process for producing an optical recording medium is disclosed which has a substrate and a recording film and an inorganic dielectric film, which are superposed on said substrate. The inorganic...
5906861 Apparatus and method for depositing borophosphosilicate glass on a substrate  
A borophosphosilicate glass is deposited on a substrate (50) by heating the substrate (50), and contacting the substrate with a mixture of the gases tetramethylcyclotetrasiloxane, trimethylborate,...
5888593 Ion beam process for deposition of highly wear-resistant optical coatings  
An ion beam deposition method is provided for manufacturing a coated substrate with improved wear-resistance, and improved lifetime. The substrate is first chemically cleaned to remove...
5879775 Protective inorganic and DLC coatings for plastic media such as plastic cards  
A plastic structure comprising: a plastic media, such as a plastic card; and a thin film amorphous inorganic or DLC coating on the plastic media, the coating being hard, transparent or...
5874350 Process for preparing a functional thin film by way of the chemical reaction among active species  
A method for forming a functional silicon- or germanium-containing amorphous deposited film on a substrate which comprises a film-forming chamber having a film-forming space, a substrate holder and...
5874134 Production of nanostructured materials by hypersonic plasma particle deposition  
A method and apparatus for the controlled synthesis and assembly of nanoparticles into nanostructured materials, including nanocomposites, includes a source of nanoparticles and a hypersonic...
5872065 Method for depositing low K SI-O-F films using SIF.sub.4 /oxygen chemistry  
An Si--O--F insulating film having a low dielectric constant is deposited on a substrate by thermally reacting disassociated SiF 4 radicals and ozone or oxygen gas in a vacuum chamber. The SiF 4 ...
5858476 Method and apparatus for making and depositing compounds  
Apparatus and methods for treatment of materials by producing gaseous product material in the form of high purity molecules including metal oxides, metal carbides, etc., using catalytic and...
5849370 Method for producing low scatter, low loss, environmentally stable dielectric coatings  
A method for creating a dielectric coating on a substrate produces near bulk density metal oxide coatings with extremely low surface roughness, microstructure and low defect density. The coatings...
5830540 Method and apparatus for reactive plasma surfacing  
A method and apparatus for reactive plasma surfacing includes at least two electrodes between which reactive gases are passed. The reactive gases are ionized by the arc between the electrodes,...
5807615 Method and device for forming an excited gaseous treatment atmosphere lacking electrically charged species used for treating metallic substrates  
A method of forming a gaseous treatment atmosphere capable of depositing a silicon on a metal substrate comprising the steps of: converting an initial gas mixture into a primary gas mixture in an...
5759635 Method for depositing substituted fluorocarbon polymeric layers  
In accordance with the invention, a method of depositing substituted fluorocarbon polymeric layers exhibiting a high degree of cross-linking is presented. The substituted fluorocarbon polymeric...
5750210 Hydrogenated carbon composition  
A composition of matter having an atomic density between that of pure diamond and at least 0.18 g-atoms per cubic centimeter and the formula: C 1 -z-w Si z A w H 1 -x F x ! y where:...
5700526 Insulator deposition using focused ion beam  
Methods are provided for depositing insulator material at a pre-defined area of an integrated circuit (IC) by: placing an IC in a vacuum chamber; applying to a localized surface region of the...
5679413 Highly abrasion-resistant, flexible coatings for soft substrates  
An abrasion wear resistant coated substrate product is described comprising a substrate and an abrasion wear resistant coating material comprising carbon, hydrogen, silicon, and oxygen. The...
5670224 Modified silicon oxide barrier coatings produced by microwave CVD deposition on polymeric substrates  
A method of depositing, by microwave plasma enhanced chemical vapor deposition, a modified, silicon oxide, barrier coating atop a temperature sensitive substrate; said barrier coating having...
5645919 Self-supporting sheet-like structure having at least one structured surface  
A self-supporting sheet-like structure is described, which contains a substrate layer and a structured coating on at least one surface of the substrate layer. The structured coating is produced by...
Matches 1 - 50 out of 95 1 2 >