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7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications...
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7544397 |
Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
The invention provides systems and methods for the deposition of an improved diamond-like carbon material, particularly for the production of magnetic recording media. The diamond-like carbon...
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7531205 |
High throughput ion beam assisted deposition (IBAD)
A method of continuously coating at least one substrate with a buffer layer as a support for a ceramic superconducting material is disclosed. The method includes loading the at least one substrate...
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7517561 |
Method of coating a substrate for adhesive bonding
A method for depositing a coating onto a glass substrate for adhesive bonding. The process comprises depositing a coating where the surface is cleaned during a first time period, and depositing a...
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7501161 |
Methods and apparatus for reducing arcing during plasma processing
In a first aspect, a method is provided for use during plasma processing. The first method includes the steps of (1) placing a substrate on a substrate holder of a plasma chamber; (2) positioning a...
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7465478 |
Plasma immersion ion implantation process
A method of processing a workpiece includes placing the workpiece on a workpiece support pedestal in a main chamber with a gas distribution showerhead, introducing a process gas into a remote...
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7393562 |
Deposition methods for improved delivery of metastable species
A method of providing material into a deposition chamber is provided. A reservoir is in fluid communication with the deposition chamber. A metastable specie is provided and contained within the...
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7279201 |
Methods and apparatus for forming precursors
This invention relates to a method of forming a precursor for chemical vapour deposition including the steps of: (a) forming metal ions at a source, (b) introducing the ions into a reaction...
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7276266 |
Functionalization of carbon nanotubes
Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H 2 or F 2 or C n H m ) is irradiated to provide a cold plasma of selected target...
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7214413 |
Method and device for generating an activated gas curtain for surface treatment
The invention relates to a surface treatment device comprising: electrodes ( 24 a, 24 b ) that are used to initiate an electric arc of stabilised plasma ( 14 ); a stabilising channel ( 12 ) which...
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7211708 |
Exhaust processing method, plasma processing method and plasma processing apparatus
A chemical-reaction inducing means is provided in an exhaust line connecting a processing space for subjecting a substrate or a film to plasma processing to an exhaust means, and at least either an...
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7166335 |
Layer formation method, and substrate with a layer formed by the method
A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a...
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7074460 |
Method for treating the surface of a part and resulting part
A surface treatment method in which a surface of a part ( 7 ) is contacted with at least one activated species. The activated species is obtained by activating a gaseous medium containing at least...
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6988463 |
Ion beam source with gas introduced directly into deposition/vacuum chamber
An ion source is provided wherein depositing gas and/or maintenance gas is/are introduced into the ion source via the vacuum/depositing chamber, thereby reducing the amount(s) of undesirable...
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6982071 |
Thin-film magnetic recording media with dual intermediate layer structure for increased coercivity
Ion beam-deposited, nitrogen-doped C:H films having substantially lower resistivities than undoped ion beam-deposited C:H films and suitable for use as hard, abrasion-resistant overcoat layers for...
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6936310 |
Plasma processing method
In a plasma processing method making use of a plasma processing gas of a reactant gas and an inert gas, it is aimed at enhancing an efficiency of use of high-frequency power and a reactant gas to...
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6924004 |
Apparatus and method for synthesizing films and coatings by focused particle beam deposition
A particle beam deposition apparatus includes a particle source for generating a plurality of particles in suspended form, an expansion chamber, and a deposition chamber connected to the expansion...
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6849306 |
Plasma treatment method at atmospheric pressure
A plasma treatment method for surface treatment of a substrate with an atmospheric pressure plasma treatment apparatus is disclosed. The apparatus has a first electrode and a second electrode...
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6841201 |
Apparatus and method for treating a workpiece using plasma generated from microwave radiation
An apparatus and method that generates plasma using a microwave radiation supply. The plasma is used to treat a surface of a workpiece at approximately atmospheric pressure. Plasma excites a...
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6838125 |
Method of film deposition using activated precursor gases
A method for depositing a film on a substrate is provided. In one aspect, the method includes providing a metal-containing precursor to an activation zone, and activating the metal-containing...
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6818259 |
Porous article with surface functionality and method for preparing same
Porous organic articles having no surface functionality may be treated by remote plasma discharge to thereby introduce functionality to the surface of the article. The functionality is introduced...
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6800336 |
Method and device for plasma coating surfaces
A method for coating surfaces, for which a precursor material is caused to react with the help of plasma and the reaction product is deposited on a surface, the reaction as well as the deposition...
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6797339 |
Method for forming thin film with a gas cluster ion beam
A method of forming a thin film on the surface of a substrate such as silicon, in which a gas cluster (which is a massive atomic or molecular group of a reactive substance taking the gaseous form...
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6797336 |
Multi-component substances and processes for preparation thereof
The present invention is a method and apparatus for the synthesis of multi-component substances, comprising entities of at least two elements, molecules, grains, crystals, structural units, or...
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6787199 |
Composite device and manufacturing method therefor
This invention provides a composite device whereby surface reflection and interference colors can be inhibited, photocatalytic decomposition performance may be improved and hydrophilicity-acquiring...
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6770332 |
Method for forming film by plasma
In a case where a CF film is used as an interlayer dielectric file for a semiconductor device, when a wiring of tungsten is formed, the CF film is heated to a temperature of, e g., about 400 to...
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6726963 |
Method of preparation of fuel cell
A fuel cell and methods of producing same are provided. The fuel cell includes a fuel electrode, an oxygen electrode and a proton conductor material disposed there between. The fuel cell can be...
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6703081 |
Installation and method for vacuum treatment or powder production
Vacuum treatment installation with a vacuum treatment chamber containing a plasma discharge configuration as well as a gas supply configuration. The plasma discharge configuration has at least two...
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6689425 |
Nitrogen-doped hydrogenated carbon films by ion beam deposition
Ion beam-deposited, nitrogen-doped C:H films having substantially lower resistivities than undoped ion beam-deposited C:H films and suitable for use as hard, abrasion-resistant overcoat layers for...
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6673722 |
Microwave enhanced CVD system under magnetic field
An improved chemical vapor deposition or etching is shown in which cyclotron resonance and photo or plasma CVD cooperate to deposit a layer with high performance at a high deposition speed. The...
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6673392 |
Method of vertically aligning carbon nanotubes on substrates at low pressure using thermal chemical vapor deposition with DC bias
A method of vertically aligning pure carbon nanotubes on a large glass or silicon substrate at a low temperature using a low pressure DC thermal chemical vapor deposition method is provided. In...
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6673386 |
Method and apparatus for forming pattern onto panel substrate
A method for forming a pattern on a surface of a panel substrate, includes electrically charging pattern-forming material particles, jetting out the electrically charged pattern-forming material...
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6656537 |
Plasma enhanced chemical deposition with low vapor pressure compounds
A method for plasma enhanced chemical vapor deposition of low vapor monomeric materials. The method includes flash evaporating a polymer precursor forming an evaporate, passing the evaporate to a...
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6649222 |
Modulated plasma glow discharge treatments for making superhydrophobic substrates
A method for treating substrates including the steps of: providing a substrate; exposing said substrate to a plasma glow discharge in the presence of a fluorocarbon gas; maintaining said gas at a...
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6632483 |
Ion gun deposition and alignment for liquid-crystal applications
The present invention includes a method of forming an aligned film on a substrate. The film is deposited and aligned in a single step by a method comprising the step of bombarding a substrate with...
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6616985 |
Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor
An apparatus and method for injecting gas within a plasma reactor and tailoring the distribution of an active species generated by the remote plasma source over the substrate or wafer. The...
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6610350 |
Method of modifying ophthalmic lens surface by plasma generated at atmospheric pressure
A method of modifying a surface of an ophthalmic lens, includes the steps of: generating plasma at an atmospheric pressure between electrodes of a plasma generating device; and blowing the plasma...
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6497924 |
Method of making non-linear optical polymer
A method for making a non-linear optical polymer layer. The method includes flash evaporating a liquid polymer precursor mixture containing a plurality of non-linear optical molecules forming an...
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6465052 |
Method for production of nano-porous coatings
A method for producing a nano-porous coating onto a substrate, including the steps of: (a) operating a twin-wire arc nozzle to heat and at least partially vaporize two wires of a metal for...
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6444275 |
Method for remote plasma deposition of fluoropolymer films
A thermal ink jet printhead contains, on a front face, a remote plasma deposited fluoropolymer film. The fluoropolymer film has a high fluorine to carbon ratio. The film also possesses excellent...
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6435131 |
Ion flow forming method and apparatus
An ion flow forming method and apparatus for attracting ions from a plasma generated in a plasma generation chamber and forming a flow of the ions are disclosed. This ion flow forming apparatus...
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6406759 |
Remote exposure of workpieces using a recirculated plasma
An OAUGD plasma is generated using, for example, paraelectric or peristaltic electrohydrodynamic (EHD) techniques, in the plasma generator of a remote-exposure reactor, wherein one or more active...
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6395347 |
Micromachining method for workpiece observation
A method for preparing a sample for observation, by the steps of: contacting a first predetermined area of the sample surface with an organic compound vapor while irradiating the first...
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6306225 |
Process for producing wear-resistant boride layers on metallic material surfaces
A process is provided for producing wear-resistant boride layers on metal material surfaces. The process is characterized in that a boron halide selected from the group comprising boron...
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6287642 |
Method for coating a rubber wiper blade
In the process for coating the elastomeric rubber wiper a vaporous coating material is generated and activated by a plasma and/or laser; a protective coating is formed on a rubber wiper surface by...
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6280802 |
Method of forming film of ultrafine particles
A method of forming a film of ultrafine particles includes the steps of accelerating ultrafine particles within a vacuum chamber to cause them to collide with a substrate and be deposited, and, at...
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RE37294 |
Ion beam process for deposition of highly abrasion-resistant coatings
An ion beam deposition method is provided for manufacturing a coated substrate with improved abrasion resistance, and improved lifetime. According to the method, the substrate is first chemically...
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6261634 |
Apparatus and method for forming film
When a thin film is formed on a flexible and filmy substrate by a vapor phase method, the substrate is prevented from warping to be caused by the internal stress remaining in the thin film. When...
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6254940 |
Electrically assisted synthesis of particles and film with precisely controlled characteristic
The present invention related to methods of manufacturing oxide, nitride, carbide, and boride powders and other ceramic, organic, metallic, carbon and alloy powders and films and their mixtures...
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6245396 |
CVD apparatus and method of using same
To suppress the formation of dust particles, prevent the implantation of ions into a substrate and to achieve a good plasma distribution in the vicinity of the substrate when depositing a silicon...
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