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4421593 |
Reverse etching of chromium
A process for reverse etching a layer of chromium on a substrate is provided wherein a layer of resist is formed on the chromium and developed, thus exposing a portion of the chromium. The exposed...
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4402993 |
Process for coating optical fibers
Vitreous optical fibers provided with hermetically sealed coatings applied by method and apparatus comprising; drawing a fiber directly from a fiber extruder into and through an elongated chamber...
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4400410 |
Coating insulating materials by glow discharge
Coatings of hard carbon, silicon, or germanium are applied to electrically insulating materials in a D.C. glow discharge chamber. Initiation and maintenance of a glow discharge is ensured by using...
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4374699 |
Method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device in which an organic lacquer layer which is locally present on a substrate is etched by bringing the layer into contact with constituents of plasma...
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4372990 |
Retaining wall technique to maintain physical shape of material during transient radiation annealing
A method for preparing semiconductor material for integrated circuit device fabrication. A retaining wall is formed around islands of semiconductor material that are to include the active devices,...
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4370356 |
Method of meniscus coating
Coating, particularly a method for uniformly depositing a micro thin layer of fluid upon the surface of an object such as a substrate, or the like. Flowing the coating material through a permeable...
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4361461 |
Hydrogen etching of semiconductors and oxides
Atomic hydrogen, typically produced in a plasma, etches a wide range of materials, including III-V materials and their oxides. GaAs oxide is etched at a faster rate than GaAs, for example,...
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4325984 |
Plasma passivation technique for the prevention of post-etch corrosion of plasma-etched aluminum films
A method for preventing the post-etch corrosion of aluminum or aluminum alloy film which has been etched utilizing chlorinated plasma wherein the etched film is exposed to fluorinated plasma.
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4324611 |
Process and gas mixture for etching silicon dioxide and silicon nitride
Process and gas mixture for etching silicon dioxide and/or silicon nitride in a plasma environment in a planar reactor. The gas mixture comprises a primary etching gas and a secondary gas which...
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4321282 |
Surface gratings and a method of increasing their spatial frequency
A method is described for increasing the spatial frequency of surface relief structures. Periods as small as 750 Angstroms have been made.
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4289798 |
Method for reducing surface gloss
This invention pertains to a method and apparatus for producing a cured resinous coating which exhibits a reduced gloss level. In a preferred embodiment, the cured resinous coating which exhibits a...
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4282267 |
Methods and apparatus for generating plasmas
An RF-excited radial-flow, cylindrical plasma reactor (10) includes a toroidal waveguide (17) of rectangular cross-section connected to a microwave source (21). One of the reactive species (37) is...
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4226932 |
Titanium nitride as one layer of a multi-layered coating intended to be etched
A multilayered thin film structure comprising layers of resistive and conductive materials on a substrate, said layers including tantalum nitride, palladium and gold. A layer of titanium nitride,...
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4226896 |
Plasma method for forming a metal containing polymer
A plasma process for forming a polymer film containing metal therein includes the steps of providing an electrode of a metal that can be etched by a halogen, providing a substrate for the polymer...
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4212933 |
Current collector for electrochemical cells and method of making
A cathode current collector for a sodium sulphur cell is formed of a metal substrate, for example of a nickel alloy such as Inconel 600, which is provided with a firmly adherent coating of carbon...
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4183780 |
Photon enhanced reactive ion etching
A method and apparatus for modifying a surface, by either plasma etching the surface or plasma depositing a material thereon, by using vacuum ultraviolet radiation to control the modification of...
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4176003 |
Method for enhancing the adhesion of photoresist to polysilicon
An adhesion-enhancing technique for preparing the surface of a polycrystalline silicon body to receive organic photoresist. In an exemplary procedure, the polysilicon is placed in an oxygen plasma...
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4160045 |
Method for producing a scabrous photosensitive surface
A layer of indium is deposited as small islands on a photosensitive material. The islands and the material not covered by the islands are bombarded with ions to cause sputtering of the islands and...
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4147573 |
Method of depositing III-V compounds on group IV element wafers by the cluster ion technique
A method of producing a compound semiconductor wafer which comprises cleaning the surface of a monocrystalline substrate of a group-IV element semiconductor by ion beam etching in a high vacuum,...
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4126712 |
Method of transferring a surface relief pattern from a wet poly(olefin sulfone) layer to a metal layer
This invention pertains to a method for forming a surface relief pattern in a metal layer which comprises forming a wet poly(olefin sulfone) layer on the metal layer, forming a surface relief...
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4098917 |
Method of providing a patterned metal layer on a substrate employing metal mask and ion milling
Method of providing a substrate with a patterned metal layer disposed thereon, wherein a patterned metal mask is employed in conjunction with ion milling to form the pattern in the metal layer on...
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4097618 |
Method of transferring a surface relief pattern from a poly(1-methyl-1-cyclopropene sulfone) layer to a non-metallic inorganic layer
This invention relates to a method of transferring a surface relief pattern to a non-metallic inorganic layer wherein a surface relief pattern is formed in a wet poly(1-methyl-1-cyclopropene...
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4039698 |
Method for making patterned platinum metallization
A method is disclosed for making precisely patterned platinum films in the manufacture of integrated circuit devices. The method calls for the deposition of a film of a platinum compound, whose...
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4004044 |
Method for forming patterned films utilizing a transparent lift-off mask
A lift-off method for use in depositing thin films in the fabrication of integrated circuits which avoids edge tearing of the films. The method involves depositing an organic polymeric first...
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3953115 |
Method for providing an abrasion resistant coating for plastic ophthalmic lenses and the resulting lenses
A process is disclosed for applying an adherent, optically clear, abrasion resistant coating to plastic ophthalmic substrates such as plastic lenses. The process includes: (a) forming a partially...
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3935328 |
Method for providing dielectric isolation in an epitaxial layer of a compound semiconductor using the plasma oxidation
Method for providing dielectric isolation of an epitaxial layer of a compound semiconductor or for providing separation and protection of pn-junction of a compound semiconductor by applying plasma...
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3928159 |
Method for forming protective film by ionic plating
In a method for formation of a protective film on a magnetic recording substance by ionic plating comprising generating a glow discharge of nitrogen or an inert gas at a vacuum of from about 1 ×...
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3776762 |
DRY LUBRICATION
Applying a dry, lubricous, protective coating of polymerous material on the surfaces of parts in a thickness of about 100 A. and in added increments thereof by cleaning the surfaces of the parts by...
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3770499 |
LIQUID PHASE DEPOSITION OF THIN INSULATING AND REFRACTORY FILM ON A SUBSTRATE
It is known to deposit zirconium dioxide, ZrO 2 , on a substrate comprising a chip or wafer by providing zirconium oxychloride, ZrOCl 2 , vapor at about 550° C, the chip or wafer being at 450° C,...
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3627597 |
ENGRAVING
The method of engraving in which a metal surface is coated with a film of an etchant resistant material that will adhere to the metal and which is decomposed upon irradiation by subatomic particles...
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3514388 |
ION METAL PLATING OF MULTIPLE PARTS
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3458342 |
METHOD FOR APPLYING A MAR-RESISTANT FILM TO A PLASTIC SURFACE AND THE PRODUCT PRODUCED THEREBY
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3436327 |
SELECTIVE SPUTTERING RATE CIRCUIT FORMING PROCESS
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3428474 |
METHOD FOR FORMING CERAMIC METALLIC BONDS
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3411938 |
Copper substrate cleaning and vapor coating method
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3404084 |
Apparatus for depositing ionized electron beam evaporated material on a negatively biased substrate
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3352713 |
Barrier-free contacting of ceramic bodies
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3087838 |
Methods of photoelectric cell manufacture
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3033701 |
Infrared transmitting optical element
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2799600 |
Method of producing electrically conducting transparent coatings on optical surfaces
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2791522 |
Insulated ceramic conductors
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3846166 |
Title is not available
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3711311 |
Title is not available
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3687716 |
Title is not available
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3671314 |
Title is not available
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3671313 |
Title is not available
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3575732 |
Title is not available
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