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4838978 |
Dry etching apparatus
A dry etching apparatus which includes an anode located at an upper side and a cathode located at a lower side which face each other in a vacuum vessel. A high-frequency power can be applied across...
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4836882 |
Method of making an acceleration hardened resonator
An acceleration hardened resonator is made by a method including the steps f: (A) manufacturing and mounting the resonator, (B) performing acceleration tests to determine the acceleration...
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4832980 |
Magneto-optical recording medium and manufacturing thereof
According to a disk-shaped magneto-optical recording medium of the invention, a transparent thin film serving as an interference layer is formed on a transparent substrate. The thin film is...
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4830873 |
Process for applying a thin, transparent layer onto the surface of optical elements
In a process for applying a thin, transparent layer onto the surface of optical plastic elements for protecting the surface of such element against mechanical and chemical influences that surface...
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4780176 |
Method of wetting metals
A method of wetting and coating various metals, which have been mechanically polished and chemically cleaned and etched, includes plasma cleaning and etching the metal and delivering mercury or...
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4772488 |
Organic binder removal using CO.sub.2 plasma
An improved method of fabricating thick film dielectrics and copper conductors comprises depositing and drying an appropriate thick-film ink, treating the resulting patterned layer with a carbon...
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4735820 |
Removal of residual catalyst from a dielectric substrate
Residual catalyst is removed from a dielectric substrate by exposing the substrate to a plasma formed from an inert gas.
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4729905 |
Method for production of cutting tools
A method for the production of cutting tools from an iron-based alloy and having a wear-resistant coating based on interstitial phases is provided and comprises depositing the wear-resistant...
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4726962 |
Alternating segment ring structure
A ring is formed having alternating segments of ferromagnetic and paramagnetic materials. The ring is formed by first providing an annular ring of a high strength magnetic steel. Teeth are formed...
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4721629 |
Method of manufacturing photovoltaic device
A transparent conductive film is formed on a glass substrate covering substantially its entire surface area and this transparent conductive film is divided into a plurality of transparent...
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4702930 |
Method of producing implantable bone replacement materials
Metallic implants with a coating of hydroxyl apatite are described. Hot isostatic pressing permits pore-free compaction of the hydroxyl apatite layer and results in firm bonding of the layer on the...
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4696828 |
Passivation of InP by plasma deposited phosphorus
Pnictide thin films, particularly phosphorus, grown on III-V semiconductors, particularly InP, GaP, and GaAs, are amorphous and have a novel layer-like, puckered sheet-like local order. The thin...
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4690729 |
Tapered trench process
A plasma dry etch process for etching deep trenches in single crystal silicon material with controlled wall profile, for trench capacitors or trench isolation structures. HCl is used as an etchant...
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4686111 |
Passivated and low scatter acoustic wave devices and method thereof
Passivated and low scatter acoustic wave devices comprise surface acoustic wave (SAW) and shallow bulk acoustic wave (SBAW) devices having transducers composed of oxidizable metal and layers of...
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4683024 |
Device fabrication method using spin-on glass resins
A new method for fabricating a device, such as a semiconductor device, is disclosed. The method includes the step of patterning a substrate with a trilevel resist containing a spin-deposited...
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4678539 |
Dry-etching method
A dry-etching method for etching materials of the silicon group comprises: providing the material to be etched in a reaction chamber; supplying a mixed gas as the etching gas comprising carbon...
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4676867 |
Planarization process for double metal MOS using spin-on glass as a sacrificial layer
A method of providing a planar or iso-planar surface to the interlevel dielectric layer between metal layers of a multilevel MOS wafer includes applying a first dielectric over the first metal...
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4668365 |
Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
A plasma CVD reactor and associated process use magnetic field enhancement to provide high quality, very high deposition rate metal, dielectric and conformal semiconductor films. The reacter and...
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4663829 |
Process and apparatus for continuous production of lightweight arrays of photovoltaic cells
A process and apparatus for continuously producing a relatively large-area, lightweight array of amorphous semiconductor alloy photovoltaic cells having no substrate includes depositing a...
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4647338 |
Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas
A method of manufacturing a semiconductor device, in which a semiconductor substrate (1) is subjected to a surface treatment in a reactor vessel (2), through which a current (3) of a reaction gas...
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4645562 |
Double layer photoresist technique for side-wall profile control in plasma etching processes
A photolithographic process useful for VLSI fabrication is disclosed for achieving side-wall profile control of poly lines, metal lines, contact and via openings. Layers of a first and second...
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4634496 |
Method for planarizing the surface of an interlayer insulating film in a semiconductor device
A method for planarizing the surface of an insulation layer deposited on a first interconnection layer to allow a second interconnection layer deposited thereon without causing a breakage of the...
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4632724 |
Visibility enhancement of first order alignment marks
A method of enhancing first order alignment marks formed in the respective layers of a processed semiconductor wafer in which critical masking steps are carried out. After a given mark is formed,...
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4617193 |
Planar interconnect for integrated circuits
An integrated circuit having a plurality of devices on a substrate is disclosed, wherein a plurality of metallization layers, separated by a plurality of insulating layers, are used to interconnect...
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4613519 |
Electron-beam-induced information storage in hydrogenated amorphous silicon device
A method for recording and storing information in a hydrogenated amorphous silicon device, comprising: depositing hydrogenated amorphous silicon on a substrate to form a charge-collection device;...
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4613518 |
Monolithic capacitor edge termination
Edge termination of monolithic capacitors having thin electrode layers bonded in dielectric resin is accomplished by ashing away some resin to expose electrode edge surfaces, plating the edge...
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4613400 |
In-situ photoresist capping process for plasma etching
A two-step photoresist capping process for enhancing the etch resistance of photoresist during chlorinated plasma etching of silicon-containing materials comprises exposing the photoresist to a...
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4612085 |
Photochemical patterning
Formation of a plasma etch mask on a film on a substrate by photodecomposition of a gas at selective portions of the film's surface to deposit etch mask material and form the etch mask is...
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4606931 |
Lift-off masking method
A lift-off process for depositing a metallurgy layer on a substrate wherein the improvement is the use of a sacrificial masking layer that is substantially unaffected by exposure to high intensity...
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4599243 |
Use of plasma polymerized organosilicon films in fabrication of lift-off masks
Pinhole-free thin films deposited by glow discharge or plasma polymerization of organosilanes, organosilazones and organosiloxanes for use as reactive ion etch oxygen barriers in multilayer resist...
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4594265 |
Laser trimming of resistors over dielectrically isolated islands
Single crystal dielectrically isolated islands are formed providing a substantially non-reflective or indentured silicon surface before the application of the dielectric isolation layer and the...
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4585668 |
Method for treating a surface with a microwave or UHF plasma and improved apparatus
A method for etching or chemically treating a surface of an article utilizing a radio frequency wave ion generating apparatus which provides a thin disk shaped plasma is described. The plasma disks...
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4579609 |
Growth of epitaxial films by chemical vapor deposition utilizing a surface cleaning step immediately before deposition
A method and apparatus for low temperature deposition of epitaxial films using low pressure chemical vapor deposition (CVD) with and without plasma enhancement. More specifically, the process...
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4560576 |
Method of coating optical components
A coating having low absorbance of laser energy is provided on optical components substrates by molecular beam epitaxial growth techniques. The growth conditions prevent contamination of substrate...
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4557943 |
Metal-silicide deposition using plasma-enhanced chemical vapor deposition
A method for deposition of thin conductive layers of low resistivity titanium silicide. The method comprises the co-deposition of titanium and silicon by plasma-enhanced chemical vapor deposition...
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4555303 |
Oxidation of material in high pressure oxygen plasma
A process is disclosed for removing carbonaceous material from a surface in a high pressure oxygen plasma. A surface, such as a surface of a silicon ribbon, having a layer of carbonaceous material...
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4554048 |
Anistropic etching
The specification describes a process for treating patterned VLSI lithographic masks to retain their shape during processing of VLSI wafers. The process avoids the common postbake treatment which...
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4540596 |
Method of producing thin, hard coating
Rolling cone rock bit seal and bearing hard surfaces having been made fully ready for assembly are first provided thin overlay coatings to enhance the resistance of the surfaces to both wear and...
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4523976 |
Method for forming semiconductor devices
A method is disclosed for forming openings in polyimide layers and for thereby forming semiconductor devices. The method allows for the forming of openings having tapered side walls and precise...
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4522844 |
Corrosion resistant coating
Disclosed is a method of coating a substrate with an amorphous metal comprising the step of bombarding a solid piece of the metal with ions of an inert gas in the presence of a magnetic field to...
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4506005 |
Method of catalytic etching
Catalytic etching is carried out by placing a pattern of a catalyst on a surface to be selectively etched and treating the imaged surface with an activated fluid which consumes the material being...
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4500628 |
Process of making solid state devices using silicon containing organometallic plasma developed resists
Solid state devices are produced by dry etching of a resist film to produce a negative resist pattern. The film comprises a polymer typically containing a halogen, and at least one type of...
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4493855 |
Use of plasma polymerized organosilicon films in fabrication of lift-off masks
Pinhole-free thin films deposited by glow discharge or plasma polymerization of organosilanes, organosilazones and organosiloxanes for use as reactive ion etch oxygen barriers in multilayer resist...
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4475794 |
Aluminum, aluminum oxide, cromium, gold mirror
A composite mirror and a method for making the mirror. The mirror has an aluminum reflective surface and coatings of aluminum oxide, chromium and gold deposited thereon, thus making the mirror...
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4465551 |
Graded microstructured layers formed by vacuum etching
Into the surface of a material a microstructure determined by an agglomerated thin film is reactively sputter-etched forming a graded-index layer which is useful in optical reflection reduction....
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4464460 |
Process for making an imaged oxygen-reactive ion etch barrier
A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
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4463028 |
Method for preparing composite or elementary semi-conducting polycrystalline films
There is described a method for preparing polycrystalline semi-conducting films comprised of two elements respectively from Groups III and V, or Groups II and VI of the Periodic Table, by...
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4461689 |
Method and apparatus for coating a graphite member
A method and apparatus for coating a member of graphite with a thin layer of an electrically highly conductive material from the vapor phase in which at least part of the material is deposited on...
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4431683 |
Process for producing transparent electroconductive film
A transparent electroconductive film formed on a glass substrate by a special wettability-improving treatment of the surface portion of a SiO 2 film formed on the glass substrate, followed by...
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4425210 |
Plasma desmearing apparatus and method
This invention is based on desmearing holes of multi-layered printed wiring boards by flowing plasma through the holes. Desmearing of plasma etching applies active gases to organic surfaces causing...
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