Matches 301 - 350 out of 447 < 1 2 3 4 5 6 7 8 9 >
Match Document Document Title
5221414 Process and system for stabilizing layer deposition and etch rates while simultaneously maintaining cleanliness in a water processing reaction chamber  
Extraneous and undesirable particulate matter is suppressed in a reaction chamber for treating semiconductor materials by depositing a thin layer of polymeric or equivalent insulating material over...
5204506 Plasma pinch surface treating apparatus and method of using same  
The inventive system treating the surface of a material by utilizing high intensity ultraviolet light for glazing, cleaning and other such purposes. The system includes a high intensity ultraviolet...
5203960 Method of operation of electron cyclotron resonance plasma source  
A method is disclosed employing electron cyclotron resonant (ECR) heating to produce plasma for applications including but not limited to chemical vapor deposition and etching. A magnetic field is...
5203924 Method of and apparatus for synthesizing diamondlike thin film  
A method of and an apparatus for synthesizing a diamondlike thin film on a substrate, the method comprising the steps of: generating plasma of gas containing hydrocarbon gas, in a first vacuum...
5202149 Method for making a magnetic recording medium  
In the method for making the magnetic recording wherein a first magnetic layer is formed on a substrate and a second magnetic layer is formed on the first magnetic layer, before forming the second...
5192582 Procedure for processing joints to be soldered  
The invention is directed to a procedure for processing joints to be soldered, preferably printed circuit boards fitted with electric components, and an arrangement for executing this procedure,...
5182234 Profile tailored trench etch using a SF.sub.6 -O.sub.2 etching composition wherein both isotropic and anisotropic etching is achieved by varying the amount of oxygen  
A dopant-opaque layer of polysilicon is deposited on gate oxide on the upper substrate surface to serve as a pattern definer during fabrication of the device. It provides control over successive P...
5132248 Direct write with microelectronic circuit fabrication  
In a process for deposition of material onto a substrate, for example, the deposition of metals or dielectrics onto a semiconductor laser, the material is deposited by providing a colloidal...
5131907 Method of treating a synthetic naturally occurring surface with a collagen laminate to support microvascular endothelial cell growth, and the surface itself  
A novel implantable prosthesis for implantation in human patients is disclosed which comprises a synthetic substrate and a Type IV/V collagen surface layer seeded with a confluent monolayer of...
5123998 Method of forming patterns  
A method of forming patterns for providing satisfactory pattern shapes of high resolution and high sensitivity is disclosed. A resin film comprising hydroxyl groups is formed on a substrate. Deep...
5114738 Direct optical fiber glass formation techniques using chemically and/or physically removable filamentary substrates  
An optical fiber is formed by continuously coating a precursor core filam with a glass-forming coating. The precursor filament is continuously moved from a storage reel through a stationary coating...
5112434 Method for patterning electroless metal on a substrate followed by reactive ion etching  
This invention describes methods for altering a substrate in a fine line image pattern using microlithographic processes including formation of a metal mask over a polymer coating to protect the...
5110407 Surface fabricating device  
Anisotropic etching can be obtained in the direction of the incident heated beam of reactive gas with the introduction of a second material for controlling reactivity.
5108543 Method of surface treatment  
Surface treatment is applied to a substrate by supplying thereto excited molecules in which the vibrational energy level is excited. SF 6 , O 2 , N 2 , etc., are used as the excited molecules and...
5087608 Environmental protection and patterning of superconducting perovskites  
A method for the passivation of superconductive rare earth cuprates involves depositing thereon a thin film of an amorphous or diamond-like carbon film of a thickness ranging from 100 Å to 10...
5082685 Method of conducting plasma treatment  
A treatment, typically plasma treatment apparatus comprises a plasma creating chamber adapted to create a plasma therein, a treating chamber in communication with the plasma creating chamber...
5082359 Diamond films and method of growing diamond films on nondiamond substrates  
A method of forming a polycrystalline film, such as a diamond, on a foreign substrate involves preparing the substrate before film deposition to define discrete nucleation sites. The substrate is...
5075256 Process for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer  
A method and apparatus are disclosed for removing one or more materials deposited on the backside and end edges of a semiconductor wafer which comprises urging the front side of the wafer against a...
5070228 Method for plasma spray joining active metal substrates  
A method for joining substrates of the active metals, such as niobium, tantalum, and titanium, and alloys of the active metals is disclosed. The substrates are joined in a deposit zone traversing...
5069748 Method for forming refractory resistors with etch stop for superconductor integrated circuits  
This is a structure of, and method for preparation of, molybdenum resistors in a superconductor integrated circuit. It utilizes a pattern superconductor film; applying a titanium film on the...
5064809 Method of making a Josephson junction with a diamond-like carbon insulating barrier  
A Josephson junction consisting of high temperature ceramic superconductors layers, separated by an ultra-thin insulating barrier made of an non-oxide substance like diamond-like carbon. An...
5064681 Selective deposition process for physical vapor deposition  
The invention relates to a dry method for depositing a material on a substrate having nucleating sites for the material which includes deposition of a material in the vapor phase on the substrate...
5061512 Method of producing lubricated bearings  
A method of applying solid lubricant to a bearing with rolling surfaces which comprises the steps of sputter cleaning the bearing substrate and implanting ions of the solid lubricant to a shallow...
5055318 Dual ion beam ballistic alloying process  
The invention relates to a low temperature, dual beam vacuum deposition process for forming a hard, stress reduced, ballistically alloyed film such as diamond onto a substrate.
5053383 Method of reducing critical current density of oxide superconductors by radiation damage  
The critical current density J c of a superconductive oxide film can be tailored, without substantial change in the critical temperature T c (R0), by introduction of radiation damage into the...
5048163 System for processing semiconductor materials  
A system for processing the surface of semiconductor material for annealing and etching purposes. The system established a high intensity ultraviolet light which is repetitively pulsed to rapidly...
5039548 Plasma chemical vapor reaction method employing cyclotron resonance  
An improved plasma chemical vapor reaction apparatus is described. The apparatus comprises a reaction chamber, a gas feeding system for introducing a reactive gas into the reaction chamber,...
5039376 Method and apparatus for the plasma etching, substrate cleaning, or deposition of materials by D.C. glow discharge  
The invention provides new methods and apparatus for the deposition of materials on substrates by the use of a D.C. glow discharge, sometimes also called a plasma discharge. A precursor gas (or...
5017511 Method for dry etching vias in integrated circuit layers  
A process is disclosed through which vias (50) can be formed by the reaction of an etchant species (52) with a mercury cadmium telluride (HgCdTe) or zinc sulfide (ZnS) layer (42). The activating...
5017439 Micro-contamination-free coating for die-cast component in magnetic disk drive  
A process for treating the surface of a die-cast article including the steps of chemically cleaning the surface, cleaning the surface with an argon plasma, depositing an ion vapor generated...
5015330 Film forming method and film forming device  
A film forming method comprises the steps of placing a plurality of objects to be processed and supplying an etching gas in a reaction container, removing a natural oxidization originated film on...
5013399 Method of preparing support for lithographic printing plate  
A method of preparing a support for a lithographic printing plate is described, which comprises roughening the support surface by laser irradiation performed under the condition that the support is...
5011705 Plasma processing method  
The method of the present invention for forming a high-quality thin film on a substrate comprises a step of introducing a cleaning gas into a treatment container, and a step of bringing the...
5004673 Method of manufacturing surface relief patterns of variable cross-sectional geometry  
A method of manufacturing surface relief patterns of variable depth in solid materials is disclosed, which patterns, when seen in cross-section, are of variable geometry. After determining the...
4996078 Method of removing particles from substrate surfaces  
A method is described for the vacuum-coating of substrates, such as glass plates, foils, plastics substrates for optical discs etc., in which the substrates are introduced into a vacuum-coating...
4992298 Dual ion beam ballistic alloying process  
The invention discloses a dual ion beam ballistic alloying process for forming a film such as diamond onto a substrate, which comprises the steps of: (a) cleaning the surface of the substrate with...
4990363 Method of producing very adhesive metallic structures on fluorine polymers and thermoplastic synthetic materials  
A method of producing metallic structures on non-conductors includes the steps of metallizing the nonconductors by decomposing of metallo-organic compounds in a glow discharge with formation of a...
4988644 Method for etching semiconductor materials using a remote plasma generator  
An apparatus and a method for the etching of semiconductor materials is disclosed. The apparatus includes a process chamber which includes a plasma generator remote from and in fluid communication...
4987008 Thin film formation method  
Film formation without damage on the surface of semiconductor can be established by generating active halogen or active hydrogen by a photochemical reaction, cleaning on the surface of the...
4985113 Sample treating method and apparatus  
A sample treating method and apparatus adapted to treat a sample such as a semiconductor element substrate or the like and, particularly, a sample that must be etched and anticorrosion-treated. The...
4973381 Method and apparatus for etching surface with excited gas  
A system (10) is provided for etching a surface (14). A vacuum enclosure (12) is provided to create a vacuum around containers (13) and the surface to be etched (14). A pressurized gas source (16)...
4966668 Method for the treatment of metal objects  
A sintered permanent magnet having the composition RE 2 T 14 B, where RE is a rare earth metal, T is a transition metal and B is boron, is treated by ion plating the magnet at an elevated...
4956196 Method for producing a corrosion-resistant coating on the surface of lacquered workpieces  
In a method and in an apparatus for the production of a corrosion-resistant coating of high reflectivity on the surface of workpieces, especially reflector inserts formed from plastic, in a vacuum...
4910042 Apparatus and method for treating material surfaces  
An apparatus and a method for coating electronic elements in particular semi-conductor wafers, circuit boards and the like are provided where the flow of the gaseous coating material is directed so...
4908096 Photodefinable interlevel dielectrics  
Ethers of oligomeric phenol-dialdehyde condensation products containing vinyl benzyl moieties in at least half of the ether moieties are excellent photosensitive prepolymers. Through simple masking...
4906592 Method for forming a multilayered metal network for bonding components of a high-density integrated circuit using a spin on glass layer  
In a high-density integrated circuit having a multilayered metal interconnection network, a planarization layer is formed over a lower metal layer which includes conductors having steep edges by...
4883560 Plasma treating apparatus for gas temperature measuring method  
Nitrogen gas plasma emission intensities are theoretically calculated at various gas temperatures, while they are actually measured by a spectroscope. By comparing the waveforms of the calculated...
4877757 Method of sequential cleaning and passivating a GaAs substrate using remote oxygen plasma  
A processing apparatus and method for depositing a passivating layer on a mercury-cadmium-telluride wafer utilizing a single process chamber to provide oxygen gas to the chamber with the excitation...
4857139 Method and apparatus for forming a layer  
A photo CVD apparatus includes a reaction chamber, a vacuum pump, and a light source chamber disposed in the reaction chamber, the light source chamber having a light window. A light source is...
4851068 Method of making a sealing element  
A seal for rock bits having a Belleville type spring and a lock-ring embedded in rubber is made in a process where the spring and the lock-ring are plasma etched before the metal parts are embedded...
Matches 301 - 350 out of 447 < 1 2 3 4 5 6 7 8 9 >