|
Match
|
Document |
Document Title |
|
|
7374642 |
Treatment process for improving the mechanical, catalytic, chemical, and biological activity of surfaces and articles treated therewith
A continuous, uninterrupted two-step treatment process capable of forming nanometer scale physical structures on the surface of articles fabricated from metallic, ceramic, glass, or plastic...
|
|
|
7368151 |
Antiscattering grid and a method of manufacturing such a grid
An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions that together define a plurality of cells distributed over the...
|
|
|
7326442 |
Antireflective composition and process of making a lithographic structure
An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer...
|
|
|
7309515 |
Method for fabricating an imprint mold structure
The present invention is related to a method for fabricating an imprint mold which can be used in the field of nano-imprint lithography. Firstly, a diamond film and a photoresist film are...
|
|
|
7300684 |
Method and system for coating internal surfaces of prefabricated process piping in the field
The coating of internal surfaces of a workpiece is achieved by connecting a bias voltage such that the workpiece functions as a cathode and by connecting an anode at each opening of the workpiece....
|
|
|
7273821 |
Method for producing a porous coating
The present invention relates to a process for producing a porous layer adhering to a substrate, which comprises the steps:
a. preparation of a composition comprising an organic polymer...
|
|
|
7264850 |
Process for treating a substrate with a plasma
A process for depositing a diamond-like carbon film, which comprises providing a means for generating a sheet-like beam-type plasma region inside a vacuum vessel for depositing the diamond-like...
|
|
|
7250197 |
Plasma treatment of contact lens and IOL
Intraocular lenses or contact lenses 20 are placed on a lower spindle 34 and held there by a vacuum in conduit 34 . Noble and reactive gases 56, 58 are introduced and a voltage is applied...
|
|
|
7226869 |
Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing
Methods for forming a protective polymeric coating on a silicon or silicon-carbide electrode of a plasma processing chamber are provided. The polymeric coating provides protection to the underlying...
|
|
|
7223446 |
Plasma CVD apparatus and dry cleaning method of the same
In a parallel flat plate type plasma CVD apparatus, plasma damage of constituent parts in a reaction chamber due to irregularity of dry cleaning in the reaction chamber is reduced and the cost is...
|
|
|
7220448 |
Glass molding die and renewing method thereof
A glass molding die and renewing method thereof. The molding die for molding glass includes a substrate, a first noble metal layer overlying the substrate, a second noble metal layer overlying the...
|
|
|
7204912 |
Method and apparatus for an improved bellows shield in a plasma processing system
The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode...
|
|
|
7175878 |
Cold antireflection layer deposition process
The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing...
|
|
|
7169440 |
Method for removing photoresist and etch residues
A method is provided for plasma ashing to remove photoresist remnants and etch residues that are formed during preceding plasma etching of dielectric layers. The ashing method uses a two-step...
|
|
|
7150849 |
Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating
In certain example embodiments, a coated article includes respective layers including diamond-like carbon (DLC) and zirconium nitride before heat treatment (HT). During HT, the hydrogenated DLC...
|
|
|
7148156 |
Removable amorphous carbon CMP stop
A method is provided for processing a substrate including removing amorphous carbon material disposed on a low k dielectric material with minimal or reduced defect formation and minimal dielectric...
|
|
|
7147795 |
Method for surface treatment
A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface...
|
|
|
7144606 |
Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers
The present invention generally provides improved adhesion and oxidation resistance of carbon-containing layers without the need for an additional deposited layer. In one aspect, the invention...
|
|
|
7144521 |
High aspect ratio etch using modulation of RF powers of various frequencies
A method for etching a high aspect ratio feature through a mask into a layer to be etched over a substrate is provided. The substrate is placed in a process chamber, which is able to provide RF...
|
|
|
7141277 |
Self-generating inorganic passivation layers for polymer-layered silicate nanocomposites
A method for preparing high-use temperature, light-weight polymer/inorganic nanocomposite materials with enhanced thermal stability and performance characteristics, which comprises treating a...
|
|
|
7125587 |
Ion beam for enhancing optical properties of materials
A system and method to expose a material to an ion beam during a continuous material production process may include a vacuum fixture to form the ion beam and a slit in the fixture to allow at least...
|
|
|
7105199 |
Methods of adhering drugs to the surface of medical devices through ion beam surface modification
Methods of implanting, applying, or adhering various drug molecules directly into or onto the surface of medical devices through gas cluster ion beam (GCIB) and/or monomer ion beam surface...
|
|
|
7077889 |
Surface modification of porous metal substrates
A method for reducing the surface variance of a porous metal substrate. The method does not significantly reduce the bulk porosity. The method can be used to reduce the surface pore diameter. A...
|
|
|
7022383 |
Exchange bias structure for abutted junction GMR sensor
Although it is known that exchange bias can be utilized in abutted junctions for longitudinal stabilization, a relatively large moment is needed to pin down the sensor edges effectively. Due to the...
|
|
|
7014887 |
Sequential sputter and reactive precleans of vias and contacts
The present invention generally provides a method for improving fill and electrical performance of metals deposited on patterned dielectric layers. Apertures such as vias and trenches in the...
|
|
|
6977222 |
Pattern forming method and apparatus, and device fabrication method and device
The invention saves resources and energy. A cleaning/fluid-feeding head integrates a cleaning head portion and a fluid-feeding head portion. The cleaning head portion includes an organic substance...
|
|
|
6972071 |
High-speed symmetrical plasma treatment system
A plasma treatment system ( 10 ) and related methods for rapidly treating a workpiece ( 56 ) with ions from a plasma having an ion density that is reproducibly uniform and symmetrical. The...
|
|
|
6967043 |
Method of manufacturing the densely fitted multi-layer carbon nano-tube
A method of manufacturing, with high purity and high efficiency, a multi-wall carbon nanotube ( 10 ) having layers densely fitted to the center part thereof, comprising the step of leading a...
|
|
|
6936309 |
Hardness improvement of silicon carboxy films
A method for depositing a low dielectric constant film having an improved hardness and elastic modulus is provided. In one aspect, the method comprises depositing a low dielectric constant film...
|
|
|
6936135 |
Twist-N-Lock wafer area pressure ring and assembly for reducing particulate contaminant in a plasma processing chamber
A confinement ring coupling arrangement for coupling, in a plasma processing chamber, a confinement ring to a plunger. The plunger is configured to move the confinement ring to deploy and stow the...
|
|
|
6929831 |
Methods of forming nitride films
A silicon nitride film, for example, is deposited by introducing into a plasma region of a chamber a silicon containing gas, molecular nitrogen and sufficient hydrogen to dissociate the nitrogen to...
|
|
|
6929784 |
Chlorotrifuorine gas generator system
A ClF 3 gas generation system is provided with supply sources of chlorine ( 3 ) (for example a cylinder of compressed chlorine) and fluorine ( 4 ) (for example a fluorine generator) connected into...
|
|
|
6926803 |
Confinement ring support assembly
A confinement ring support assembly for coupling together a plurality of confinement rings in a plasma processing chamber. The confinement ring support assembly includes a post having first end and...
|
|
|
6917459 |
MEMS device and method of forming MEMS device
A method of forming a MEMS device includes providing a substructure including a base material and at least one conductive layer formed on a first side of the base material, forming a dielectric...
|
|
|
6908638 |
Organic electroluminescent element and method of manufacturing same
The purpose of the invention is to provide an organic electroluminescent element having stable luminescent characteristics with a low luminescence starting voltage and without non-luminescing black...
|
|
|
6890861 |
Semiconductor processing equipment having improved particle performance
A ceramic part having a surface exposed to the interior space, the surface having been shaped and plasma conditioned to reduce particles thereon by contacting the shaped surface with a high...
|
|
|
6878418 |
Method for making zone-bonded lubricant layer for magnetic hard discs
A system and method for improving the durability and reliability of recording media used in hard drives is disclosed. A protective overcoat made by depositing a diamond like carbon (DLC) layer over...
|
|
|
6866900 |
Deposition and chamber treatment methods
The invention encompasses a method for sequentially processing separate sets of wafers within a chamber. Each set is subjected to plasma-enhanced deposition of material within the chamber utilizing...
|
|
|
6857433 |
Process for cleaning a glass-coating reactor using a reactive gas
A process for cleaning a glass-coating reactor includes: (a) providing the reactor to be cleaned, wherein the reactor contains a glass substrate within a chamber and the chamber has an internal...
|
|
|
6852647 |
Removable amorphous carbon CMP stop
A method is provided for processing a substrate including removing amorphous carbon material disposed on a low k dielectric material with minimal or reduced defect formation and minimal dielectric...
|
|
|
6830784 |
Treatment of natural polymer based materials and the products based thereon
A substrate containing a natural polymeric material is modified by: A) treating the substrate containing the natural polymeric material with a modifying agent selected from the group consisting of...
|
|
|
6827972 |
Container with a coating of barrier effect material, and method and apparatus for manufacturing the same
The invention provides a container such as a bottle or flask, made heterogeneously from a material with a barrier effect and a polymer material, characterized in that the material with a barrier...
|
|
|
6824827 |
Method of making a polyimide film having a thin metal layer
A method of surface treating a polyimide film to impart improved adhesion to metal which comprises treating the surface of a polyimide film having a biphenyltetracarboxylic acid component by...
|
|
|
6821577 |
Staggered in-situ deposition and etching of a dielectric layer for HDP CVD
A method for depositing a conformal dielectric layer employing a dep-etch technique features selectively decreasing the deposition gas present in a process chamber where a substrate to be covered...
|
|
|
6821571 |
Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers
The present invention generally provides improved adhesion and oxidation resistance of carbon-containing layers without the need for an additional deposited layer. In one aspect, the invention...
|
|
|
6821570 |
Method for preparing a polymer for chemical mechanical polishing
The present invention is directed to a method for preparing a polymer for chemical mechanical polishing of a semiconductor substrate. The method comprises providing a thermoplastic foam substrate...
|
|
|
6803309 |
Method for depositing an adhesion/barrier layer to improve adhesion and contact resistance
A method for forming an adhesion/barrier liner with reduced fluorine contamination to improve adhesion and a specific contact resistance of metal interconnects including providing a semiconductor...
|
|
|
6802944 |
High density plasma CVD process for gapfill into high aspect ratio features
A method of depositing a film on a substrate. In one embodiment, the method includes depositing a first portion of the film using a high density plasma to partially fill a gap formed between...
|
|
|
6793978 |
Method and device for coating at least one wiper-blade element
The invention is based on a method for coating at least one wiper blade element ( 10 ) made of an elastomer material, in which first, the surface of the wiper blade element ( 10 ) is cleaned and...
|
|
|
6790476 |
Method of adhesion between an oxide layer and a metal layer
A method of controlling the wetting characteristics and increasing the adhesion between a metal and an oxide layer. By introducing a negatively-charged species to the surface of an oxide layer,...
|