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7374642 Treatment process for improving the mechanical, catalytic, chemical, and biological activity of surfaces and articles treated therewith  
A continuous, uninterrupted two-step treatment process capable of forming nanometer scale physical structures on the surface of articles fabricated from metallic, ceramic, glass, or plastic...
7311881 Chips, and apparatus and method for reaction analysis  
A chip having a deaerating function and requiring no bonding or welding for forming a channel, and an apparatus and method for the reaction analysis are provided. The chip contains a first...
7229675 Protective coating method for pieces made of heat resistant alloys  
The invention relates to metallurgy and mechanical engineering, in particular to the development of methods for providing metallic pieces with protective coatings with a view to improving the...
7179508 Conducting polymer films and method of manufacturing the same by surface polymerization using ion-assisted deposition  
Conducting polymers having improved optical properties, and a method of manufacturing the conducting polymers, are disclosed. The conducting polymers are prepared by a process wherein organic ions...
7141096 Gas-selective permeable membrane and method of manufacturing thereof  
A gas-selective permeable membrane ( 1 ) utilisable in a leak detector for a gas, more particularly helium, comprising a sheet-like body ( 11 ) on which at least one reduced thickness area ( 15 )...
7112453 Retentate chromatography and protein chip arrays with applications in biology and medicine  
This invention provides methods of retentate chromatography for resolving analytes in a sample. The methods involve adsorbing the analytes to a substrate under a plurality of different selectivity...
7097884 Stability of ion beam generated alignment layers by surface modification  
A method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions, and reactive gas is introduced to the ion beam to saturate dangling...
6916541 Modified substrates for the attachment of biomolecules  
The present invention relates to a substrate for attachment of biomolecules. The substrate is coated with a multiamino organosilane. If desired, the substrate can be further modified prior to...
6893543 Information carrier and method for producing the same  
A method and apparatus for producing an information carrier which has at least two solid material interfaces at which information is, or may be applied and where the information is stored by local...
6878415 Methods for chemical formation of thin film layers using short-time thermal processes  
A method is provided for forming a thin film layer of a substrate. The method includes the steps of forming a thin surface layer containing a dopant material on the substrate, and short-time...
6808606 Method of manufacturing window using ion beam milling of glass substrate(s)  
This invention relates to a method of making a window (e.g., vehicle windshield, architectural window, etc.), and the resulting window product. At least one glass substrate of the window is ion...
6797339 Method for forming thin film with a gas cluster ion beam  
A method of forming a thin film on the surface of a substrate such as silicon, in which a gas cluster (which is a massive atomic or molecular group of a reactive substance taking the gaseous form...
6743369 Method for manufacturing electrode for secondary battery  
A method of manufacturing an electrode for a secondary battery by depositing a thin film composed of active material on a current collector in which a surface-treated layer such as an...
6736982 Micromachined vertical vibrating gyroscope  
A micromachined vertical vibrating gyroscope consists of three single crystal silicon assemblies: an outer single crystal silicon assembly, an intermediate single crystal silicon assembly, and an...
6683012 Method for epitaxially growing crystalline insulation layer on crystalline silicon substrate while simultaneously growing silicon oxide, nitride, or oxynitride  
Metal which forms a crystalline insulation layer is sputtered at a target and deposited as a film on a silicon substrate, the metal is chemically combined with reactive gas around the silicon...
6632482 Plasma immersion ion implantation process  
Implantation process for cold cathode plasma immersion ion implantation (C 2 PI 3 ) without a continuous plasma using very short high voltage, low duty cycle ionization pulses, in conjunction with...
6627320 Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film  
A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The...
6602558 Non-linear optical silica thin film manufacturing method and non-linear optical silica element  
A non-linear optical silica thin film ( 22 ) whose main material is SiO 2 —GeO 2 is formed by irradiating positive or negative polar particles and polarization orientation is carried out in the...
6569534 Optical material and optical element using the same  
An optical material including a crystalline silicon and Fe x Si 2 in the form of dots, islands, or a film is provided. The Fe x Si 2 has a symmetrical monoclinic crystalline structure belonging...
6551718 Low friction coating  
Disclosed is a metal sulphide coating composition of the formula M X Si V R Y S Z F W where M is one or more metals selected from: Mo, Ti, W, Nb, Ta, Zr, and Hf; Si is silicon; R is one or more...
6541079 Engineered high dielectric constant oxide and oxynitride heterostructure gate dielectrics by an atomic beam deposition technique  
A method of forming a layer of oxide or oxynitride upon a substrate including first placing a substrate having an upper surface and a lower surface in a high vacuum chamber and then exposing the...
6503578 Method for preparing ZnSe thin films by ion-assisted continuous wave CO2 laser deposition  
Zincselenide (ZnSe) thin films were grown on quartz glass and GaAs(100) substrates by continuous wave (CW) CO 2 laser with ion beam assisted deposition. The ZnSe thin films are applied for...
6475573 Method of depositing DLC inclusive coating on substrate  
A substrate is coated with a coating system including at least one diamond-like carbon (DLC) inclusive layer(s) using an ion beam deposition technique. Prior and/or during the ion beam deposition...
6447652 Thin-film forming method and thin-film forming apparatus  
A Raman spectrum of a thin film which must be formed is measured in a thin-film forming step for forming the thin film on a member to be processed in an atmosphere, the pressure of which has been...
RE37718 Ion beam modification of bioactive ceramics to accelerate biointegration of said ceramics  
The present invention provides for faster and stronger tissue-implant bonding by treating a ceramic implant with an ion beam to modify the surface of the ceramic. The surface modification can give...
6379873 Method and apparatus for the construction of photosensitive waveguides  
There is disclosed a method of constructing photosensitive waveguides on silicon wafers through the utilization of a Plasma Enhanced Vapor Deposition (PECVD) system. The deposition is utilized to...
6358572 Method for manufacturing a nonlinear optical thin film  
A method for manufacturing a nonlinear optical thin film of a silica glass system with sufficient nonlinear optical characteristics, in which a glass substrate 12 is disposed within a vacuum...
6335062 Reactive oxygen-assisted ion implantation into metals and products made therefrom  
A method of ion implantation using oxygen backfill and a modified surface layer formed therefrom are provided. The method of ion implantation includes the steps of placing a substrate metal in an...
6329023 Process for producing a magnetic head slider  
A magnetic hard disk drive comprising a magnetic disk and a magnetic head slider, characterized in that said magnetic head slider is coated with a layer having a contact angle of 50° or more when...
6303192 Process to improve adhesion of PECVD cap layers in integrated circuits  
A method for making a multi-layered integrated circuit structure, includes depositing a methyl compound spin on glass layer over a substrate. The spin on glass layer is treated by plasma-deposition...
6300641 Process for modifying surfaces of materials, and materials having surfaces modified thereby  
A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas...
6294223 Method for ion implantation induced embedded particle formation via reduction  
A method for ion implantation induced embedded particle formation via reduction with the steps of ion implantation with an ion/element that will chemically reduce the chosen substrate material,...
6270857 Method of modifying a surface of an insulator  
When an insulator is irradiated with an electron beam, a pulse-shape voltage is applied to the insulator from a pulse power source. As a result, a charge-up state of the insulator can be prevented....
RE37294 Ion beam process for deposition of highly abrasion-resistant coatings  
An ion beam deposition method is provided for manufacturing a coated substrate with improved abrasion resistance, and improved lifetime. According to the method, the substrate is first chemically...
6251417 Antimicrobial composition supported on a honeycomb-shaped substrate  
An inorganic antimicrobial composition has the formula AB 2 O 4 , wherein A and B are low temperature far infrared irradiating metals, A is Mg, Zn, Mn, Ni, Co, or Fe(II), B is Al, Cr(III), Mn(III)...
6217951 Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device  
An impurity solid including boron as impurity and a solid sample to which boron is introduced are held in a vacuum chamber. Ar gas is introduced into the vacuum chamber to generate plasma composed...
6217724 Coated platen design for plasma immersion ion implantation  
A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating...
6177147 Process and apparatus for treating a substrate  
To produce a desirable amount of desirable radical and/or ion in treating a substrate such as etching the substrate, depositing a thin film on the substrate and the like by using plasma and the...
6176979 Method of manufacturing an object in a vacuum recipient  
A method of manufacturing an object in a vacuum treatment apparatus having a vacuum recipient for containing an atmosphere, includes the steps of supporting a substrate on a work piece carrier...
6165567 Process of forming a semiconductor device  
A film is formed over a substrate using a physical vapor deposition method. When using ionized metal plasma physical vapor deposition, the deposition chamber configuration or operating parameters...
6146765 Transparent conductive film and method for its production, and sputtering target  
A transparent conductive film of a zinc oxide type containing gallium and silicon, which contains silicon in an amount of from 0.01 to 1.5 mol % in terms of SiO 2 .
6126793 Method of forming films over inner surface of cylindrical member  
The present invention relates to a method of forming an intermediate film and a hard cabon film over the inner surface of a cylindrical member having a bore, such as a bushing or a cylinder, with...
6103318 Method for making an optical waveguide component using a low-stress silicon photomask  
A method of forming a layer of silicon on a surface comprises the steps of depositing silicon on the surface by a physical deposition process such as electron beam evaporation and, during said...
6083567 Sequential ion implantation and deposition (SIID) technique  
A surface of a substrate is vacuum coated with a material by sequentially implanting and depositing ions from a single ion source. First ions of the coating material are initially implanted into...
6059937 Sensor having tin oxide thin film for detecting methane gas and propane gas, and process for manufacturing thereof  
The present invention relates to a sensor for detecting hydrocarbon type gas such as methane gas and propane gas, and process for manufacturing thereof. SiO 2 was deposited in 1 μm by ion beam...
6040020 Method of forming a film having enhanced reflow characteristics at low thermal budget  
A method of forming a film having enhanced reflow characteristics at low thermal budget is disclosed, in which a surface layer of material is formed above a base layer of material, the surface...
6040019 Method of selectively annealing damaged doped regions  
A method of forming a region of impurity in a semiconductor substrate with minimal damage. The method includes the steps of: forming a reaction-inhibiting impurity region in the semiconductor...
6020024 Method for forming high dielectric constant metal oxides  
A method for forming a metal gate (20) structure begins by providing a semiconductor substrate (12). The semiconductor substrate (12) is cleaned to reduce trap sites. A nitrided layer (14) having a...
6013332 Boron doping by decaborane  
A method of manufacturing a semiconductor device comprising the steps of: ionizing decaborane; and implanting ionized decaborane into a silicon wafer. Solid decaborane can be vaporized in a reduced...
5980974 Coated orthopaedic implant components  
An improved coated orthopaedic implant component is disclosed. The implant may be coated with platinum, iridium or other metals for improved characteristics. Ion beam coating orthopaedic parts by...
Matches 1 - 50 out of 276 1 2 3 4 5 6 >