Matches 101 - 150 out of 277 < 1 2 3 4 5 6 >
Match Document Document Title
5407506 Reaction bonding through activation by ion bombardment  
A method for enhancing the bond energy of reaction bonded surfaces in which polished (10) and cleaned surfaces (12) are bombarded with oxygen ions, fluorine ions or a mixture of oxygen and fluorine...
5405458 Method of producing hard film of Ti-Si-N composite material  
Deposition of a hard film of Ti--Si--N composite material on a substrate is carried out by using a source of evaporation possessing a composition of Ti a Si b (wherein "a" and "b" stand for...
5399386 In-situ texturing of a thin film magnetic medium  
A magnetic storage medium is composed of a non-wettable substrate upon which a transient liquid metal layer is deposited and maintained as a distribution of discontinuous liquid features. An...
5391407 Process for forming protective diamond-like carbon coatings on metallic surfaces  
Process for forming diamond-like carbon coatings on metal surfaces to produce increased resistance to penetration, abrasion, and corrosion. A Ni/P coating is formed on an uncoated metal workpiece...
5389195 Surface modification by accelerated plasma or ions  
The present invention is a surface modification process which provides a means of rapidly heating a thin layer of a polymer surface or a thin coating of material on a coated substrate and various...
5354584 In situ low energy ion doping of materials grown by CVD  
A material growing by deposition is exposed to a low energy beam of ionized dopant. The ion beam energy is sufficient to implant the dopant in the growing surface of the material. This doping...
5354583 Apparatus and method for selective area deposition of thin films on electrically biased substrates  
An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for...
5350698 Multilayer polysilicon gate self-align process for VLSI CMOS device  
A new method of forming a self-aligning polysilicon gate is described. A gate silicon oxide is formed over a silicon substrate. A polysilicon layer is formed over the gate oxide. A native silicon...
5346717 Method of preparing dental ceramics for bonding  
A method of preparing the fitting surface of a dental ceramic body for subsequent bonding to a tooth with, for example, glass polyalkenoate and resin based cements, including the step of...
5336532 Low temperature process for the formation of ceramic coatings  
A single or multilayer ceramic or ceramic-like coating process is provided which can be applied to heat sensitive substrates such as electronic devices. The process includes the steps of coating...
5324551 Slidable ceramic member and method of manufacturing same  
A slidable ceramic member includes a base of a sintered ceramic material which is a compound including silicon (Si) as a constituent element, the base having a sliding surface, and a coated layer...
5266398 Amorphous thin film as solid lubricant on a substrate and method for production thereof  
An amorphous thin film as a solid lubricant having a low coefficient of friction. It is composed of silicon (Si), oxygen (O), carbon (C), and hydrogen (H), and has a composition defined by the...
5252174 Method for manufacturing substrates for depositing diamond thin films  
A method for manufacturing substrates for depositing diamond thin films is disclosed. In the method, a hydrocarbon gas is discharge-decomposed, products generated by the discharge decomposition are...
5223309 Ion implantation of silicone rubber  
A process to improve the surface properties of products made, at least in part, from silicone rubber is disclosed. The products find uses in industrial and medical device applications, such as...
5208079 Process for improving the resistance to corrosion of stainless steel  
There is provided a process for improving the resistance to corrosion of stainless steel by ion plating process, the process comprising coating a component-adjusted stainless steel having an Mn/S...
5198262 Method of forming mirror for electromagnetic radiations of short wavelengths  
Disclosed herein is a method of producing a mirror for electromagnetic radiations of short wavelengths, the method including forming a film on a substrate having a surface roughness smaller than 5...
5158801 Method of forming a multiple layer dielectric and a hot film sensor therewith  
The invention is a method of forming a multiple layer dielectric for use in a hot-film laminar separation sensor 21. The multiple layer dielectric substrate is formed by depositing a first layer 22...
5139869 Thin dielectric layer on a substrate  
Disclosed is a thin dielectric inorganic layer overlaying a substrate, and having a thickness of ≤ about 20 nm and a defect density of ≤ about 0.6 defects/cm 2 determined by BV measurements....
5122483 Method of forming a highly insulative thin films  
A method of forming a highly insulative silicon oxide thin film including the steps of providing a substrate, depositing silicon on the substrate, and injecting an ion beam of oxygen or a mixed gas...
5102736 Process for the manufacture of reflecting glass and the product thereof  
A process for the manufacture of reflecting glass comprises implantation of ions of selected metal elements under selected conditions of temperature, energy and dosage in a glass substrate to...
5098792 Process for the manufacture of glass with modified radiant energy characteristics and the product so obtained  
A process for the manufacture of a glass capable of transmitting and reflecting radiant energy in an amount different from that transmitted and reflected by the original glass is disclosed. An ion...
5098736 Method for preparing electrophotographic photoreceptor  
A method for preparing an electrophotographic photoreceptor comprising the steps of either forming a charge transporting layer comprising aluminum oxide and then forming a charge generating layer...
5089289 Method of forming thin films  
Thin films having controlled properties are formed on a substrate by a method comprising the steps of (a) placing the substrate on a support member within a reaction chamber capable of being...
5079223 Method of bonding metals to ceramics  
A method of forming a composite by providing a ceramic capable of having zero electrical resistance and complete diamagnetism at superconducting temperatures, bonding a thin layer of Ag, Au or...
5077112 Floor covering with inorganic wear layer  
A floor covering is a laminate including a hard inorganic wear layer deposited on a support, preferably by a reduced pressure environment technique such as ion assisted physical vapor deposition....
5066514 Method of forming optical waveguides by ion implantation  
An optical wave guide is formed by implanting at least two ionic species capable of forming an oxide, a nitride or a halide into the surface of a substrate.
5051396 Method of manufacturing superconducting patterns by adding impurities  
A manufacturing method of Josephson devices is described. A superconducting ceramic film is deposited on a non-conductive surface and partly spoiled in order to form a barrier film by which two...
5045345 Energy beam treatment for improved adhesion of coatings to surfaces  
The coating of a substrate with a coating different from and non-reactive with the substrate is improved by energetic surface alloying of the substrate prior to coating. The ion implantation alters...
5035916 Optical waveguide and method for its manufacture  
An optical waveguide is made by forming a layer of SiO 2 on a substrate and implanting a region of the SiO 2 layer with Si ions to define a region containing a stoichiometric excess of Si which...
5015353 Method for producing substoichiometric silicon nitride of preselected proportions  
An apparatus and method for producing films of silicon nitride whose index of refraction varies continuously with film depth by preselected amounts between n=3.9 and n=1.99. This is done by...
5013690 Method for deposition of silicon films from azidosilane sources  
A low temperature chemical vapor deposition process comprising heating in a chemical vapor depositon reactor a substrate upon which deposition is desired to a temperature of from about 550° C. to...
5011783 Forming selective single crystal regions in insulated pockets formed on silicon by energy beams and devices formed in the pockets  
A method for producing a semiconductor device including the steps of forming an insulating layer on a substrate, the insulating layer having a plurality of concave portions, forming a non-single...
4992298 Dual ion beam ballistic alloying process  
The invention discloses a dual ion beam ballistic alloying process for forming a film such as diamond onto a substrate, which comprises the steps of: (a) cleaning the surface of the substrate with...
4987007 Method and apparatus for producing a layer of material from a laser ion source  
A method and apparatus is provided which produces a layer of material on a substrate by extracting ions from a laser ablation plume in a vacuum environment. In a basic embodiment, the apparatus...
4973388 Method of depositing a decorative wear-resistant coating layer on a substrate  
A method for depositing a wear-resistant decorative coating on a substrate, comprising a first stage of vacuum deposition on the surface of the substrate of a layer of at least one metal of the...
4957771 Ion bombardment of insulator surfaces  
A system is disclosed which will improve the flashover strength of high-voltage insulators in vacuum. Treatments which deposit a small amount of metal on an insulator surface can improve flashover...
4938992 Methods for thermal transfer with a semiconductor  
Thermal transfer between a semiconductor wafer and a platen during vacuum processing is provided through a soft, thermally-conductive polymer layer having a thin, hard surface film. The soft...
4918027 Method of fabricating semiconductor device  
A method of fabricating a semiconductor device comprising a step of forming a trench on a semiconductor substrate, a step of positioning the semiconductor substrate in a first position such that...
4902652 Method for production of a sintered article of diamond  
A sintered article of diamond is obtained by coating the surface of diamond particles with 30 to 0.1% by volume, based on the total volume of the diamond particles and aids, of at least one member...
4892752 Method of ion implantation  
In an apparatus for and a method of ion implantation for implanting boron (B) and/or arsenic (As) ions in a substrate surface, a four-element alloy of platinum, silicon, arsenic, and boron or a...
4882827 Process for producing glass mold  
According to the present process for producing a glass mold, a base for a glass mold to be produced is subjected to a sputtering treatment using an inert gas and graphite as a target at a mold base...
4857484 Method of making an ion-implanted bonding connection of a semiconductor integrated circuit device  
A method for forming a bonding connection in a semiconductor integrated cirucit device includes a step of ion implanting a bonding pad of aluminum with silicon atoms before bonding a bonding wire...
4851257 Process for the fabrication of a vertical contact  
A process for the formation of a compact vertical contact having reduced lateral space requirements yet compatible with highly planarized semiconductor manufacturing processes. The contact is made...
4849299 Watch cover glass and process for the manufacture of such a glass  
Sapphire watch cover glass or crystal. The glass or crystal (18) comprises on a part of its upper face, a superficial layer (28) having an amorphous structure. This layer (28) makes it possible to...
4849248 Ion implantation method for making silicon-rich silicon dioxide film  
A silicon dioxide film containing additional silicon in the form of segregates having controlled grain sizs is fabricated by forming a silicon dioxide, injecting silicon ions into the silicon...
4844775 Ion etching and chemical vapour deposition  
Apparatus for use in treating semiconductor wafers or other work pieces by an active ion technique or by chemical vapour deposition, comprising a "vacuum" chamber having means for connection to an...
4837114 Process for producing magnets having improved corrosion resistance  
Fe-B-R type permanent magnet is produced by: forming an anticorrosive coating film layer on a Fe-B-R base permanent magnet material body by means of vapor deposition to thereby improve the...
4828870 Method of forming a thin aluminum film  
A method for depositing a thin aluminum film in a vacuum on a surface of a substrate which comprises the steps of: (a) Irradiating the surface of the substrate with a beam of ions of an inert...
4822466 Chemically bonded diamond films and method for producing same  
This invention comprises a method by which a carbon based film is deposited by ion beam deposition upon and chemically bonded to a substrate article. The carbon based film deposited by the method...
4819039 Devices and device fabrication with borosilicate glass  
Semiconductor devices are described which are made by a process involving the use of certain types of glass layers. These glass layers have high silica content, small amounts of boron oxide and...
Matches 101 - 150 out of 277 < 1 2 3 4 5 6 >