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7531207 |
MOCVD PGO thin films deposited on indium oxide for feram applications
Methods of forming depositing a ferroelectric thin film, such as PGO, by preparing a substrate with an upper surface of silicon, silicon oxide, or a high-k material, such as hafnium oxide,...
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7517554 |
Process for producing nanostructure of mixed film of Al, Si, and/or Ge
A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an...
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7510740 |
Method for making piezoelectric element
A method for making a piezoelectric element including a piezoelectric film formed on a substrate by a gas deposition technique includes the steps of ejecting ultra-fine particles of a piezoelectric...
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7479443 |
Germanium deposition
A method comprises, in a reaction chamber, depositing a seed layer of germanium over a silicon-containing surface at a first temperature. The seed layer has a thickness between about one monolayer...
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7413776 |
Method of depositing a metal-containing film
A method of depositing a Group IV metal-containing film on a substrate by conveying one or more of certain Group IV organometallic compounds in a gaseous phase to a deposition reactor containing a...
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7390381 |
Information recording medium and method of manufacturing the same
An information recording medium that is excellent in repeated-rewriting performance and is deteriorated less in crystallization sensitivity with time is provided, with respect to which high density...
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7259085 |
Method for forming thin film, substrate having thin film formed by the method, and photoelectric conversion device using the substrate
The present invention provides a method of forming a thin film containing a metal oxide as the main component, the film thickness of which is relatively uniform, at a high film deposition rate over...
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7037560 |
Film forming method, and film modifying method
A film forming and film modifying method utilizing a film forming apparatus which has an alcohol supply unit to form a metal oxide film on a semiconductor wafer in a vacuum atmosphere in which a...
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7037555 |
Method of manufacturing a glazing panel
A method of manufacturing a glazing panel having a solar factor (FS) of less than 70% and being composed of a vitreous substrate and a tin/antimony oxide coating layer provided on the vitreous...
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6887523 |
Method for metal oxide thin film deposition via MOCVD
An MOCVD process is provided for forming metal-containing films having the general formula M′ x M″ (1−x) M y O z , wherein M′ is a metal selected from the group consisting of La, Ce, Pr,...
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6884475 |
Chemical vapor deposition method for depositing a high k dielectric film
The invention includes chemical vapor deposition and physical vapor deposition methods of forming high k ABO 3 comprising dielectric layers on a substrate, where “A” is selected from the group...
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6872419 |
Method or process for producing PZT films at low substrate temperatures by chemical vapor deposition
A method or process for producing PZT films by using a Ti material having a broad allowable temperature range for providing a predetermined film composition, easily thermally deposited from...
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6866882 |
Method of forming a thin film
The vacuum degree in a reactor is set to as low as 0.1 Torr. In this state, a butyl acetate solution in which Pb(DPM) 2 is dissolved at a concentration of 0.1 mol is transported from a Pb source...
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6815003 |
Method for fabricating electrode for lithium secondary battery
A method for fabricating an electrode for lithium secondary battery formed by depositing a thin film composed of active material capable of lithium storage and release, on a metallic foil to be...
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6730354 |
Forming ferroelectric Pb(Zr,Ti)O3 films
Improved methods of forming PZT thin films that are compatible with industry-standard chemical vapor deposition production techniques are described. These methods enable PZT thin films having...
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6689203 |
Liquid coating composition for production of fluorine doped tin oxide thin layers suitable for chemical vapor deposition process
Composition containing a chlorinated organotin derivative and a polyfluoroalkenyl compound and/or a halo polyfluoroalkenyl compound useful for CVD formation of fluorine doped tin oxide coatings.
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6669990 |
Atomic layer deposition method using a novel group IV metal precursor
An atomic layer deposition method which comprises forming a metal oxide thin film by using, as a group IV metal precursor, a complex of a formula M(L) 2 in which M is a group IV metal ion having a...
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6605319 |
Use of integrated polygen deposition and RTP for microelectromechanical systems
The method of the invention involves depositing a plurality of thin layers of film, each layer having a thickness ranging from about 500Å to about 2000Å. Low Pressure Chemical Vapor Deposition...
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6602541 |
Method of preparing vaporized antimony precursors
A process for depositing an antimony-containing coating upon a surface of a heated glass substrate includes dissolving an antimony halide in an organic solvent to form an antimony halide containing...
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6585821 |
Method of monitoring PGO spin-coating precursor solution synthesis using UV spectroscopy
A method of monitoring the synthesis of a PGO spin-coating precursor solution includes monitoring heating of the solution with a UV spectrometer and terminating the heating step when a solution...
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6551718 |
Low friction coating
Disclosed is a metal sulphide coating composition of the formula M X Si V R Y S Z F W where M is one or more metals selected from: Mo, Ti, W, Nb, Ta, Zr, and Hf; Si is silicon; R is one or more...
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6509066 |
Sensitized photoconductive infrared detectors
A series of processes have been discovered whereby uniform oxygen doping of lead chalcogenides have been achieved by using vapor deposition combined with in situ or ex situ ion implantation...
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6428850 |
Single-substrate-processing CVD method of forming film containing metal element
A single-substrate-processing CVD apparatus is used for forming a BST thin film on a semiconductor wafer while supplying a first process gas containing a mixture of Ba(thd) 2 and Sr(thd) 2 , and a...
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6416814 |
Volatile organometallic complexes of lowered reactivity suitable for use in chemical vapor deposition of metal oxide films
Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality...
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6379873 |
Method and apparatus for the construction of photosensitive waveguides
There is disclosed a method of constructing photosensitive waveguides on silicon wafers through the utilization of a Plasma Enhanced Vapor Deposition (PECVD) system. The deposition is utilized to...
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6361825 |
Micro-bolometer cell structure
A pyroelectric detector system, the pyroelectric detector element therefor and the method of making the detector element which comprises an integrated circuit ( 1 ) and a pyroelectric detector...
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6333066 |
Method for forming PZT thin film using seed layer
A method for forming a PZT (lead zirconate titanate: Pb(Zr x Ti 1 -x)O 3 ) thin film using a seed layer is provided. In the method for forming a PZT thin film, PZT is grown on a PbO seed layer or...
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6145345 |
Modified chemical vapor deposition using independently controlled thermal sources
The deposition rate of MCVD processes is enhanced by applying at least a first and a second independently controlled heat source to a plurality of reactants which are used to form deposited...
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5989634 |
Process of manufacturing solid oxygen ion conducting oxide layers
Electrochemical vapor deposition (EVD) of oxygen ion conducting and mixed conducting, oxygen-ionic/electronic, oxide layers is achieved at near atmospheric pressure process conditions by employing...
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5853799 |
Liquid methyltin halide compositions
Liquid methyltin halide compositions and their use as intermediates in chemical synthesis and as precursors for forming tin oxide coatings on substrates are disclosed.
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5830530 |
Chemical vapor deposition of tin oxide films
A method of depositing a tin oxide film onto a heated substrate is provided, by chemical vapor deposition using a tetraalkyoxy tin compound. Further provided is a method for doping the film with...
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5744215 |
Reduction of haze in transparent coatings
Surface haze resulting from a rough surface of a substrate e.g. a fluorine doped tin oxide coated glass piece is reduced by coating the rough surface with a smooth surface coating of sufficient...
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5714391 |
Method of manufacturing a compound semiconductor thin film for a photoelectric or solar cell device
This invention relates to a manufacturing method of a compound semiconductor thin film derived from a metal sulfide produced by thermal decomposition of a sulfur-containing metal organic compound,...
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5674563 |
Method for ferroelectric thin film production
A ferroelectric thin film is produced on a substrate placed in an oxygen gas atmosphere within a reaction chamber. Evaporated source materials (organic metal compounds) are separately introduced in...
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5464657 |
Method for coating a moving glass substrate
A method for coating a moving substrate provides a coating having a chemical composition which varies continuously from the interface with the substrate to the opposite surface of the coating. The...
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5389401 |
Chemical vapor deposition of metal oxides
Films of metal oxides are deposited from vaporized precursor compounds, such as metal alkoxides, by reaction with the vapor of a compound, such as cyclohexenone, that is derived formally from a...
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5372850 |
Method of manufacturing an oxide-system dielectric thin film using CVD method
In a process for manufacturing an oxide-system dielectric thin film using a raw material compound in which a metal atom is coupled with an organic group through oxygen atoms by the CVD method. A...
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5324539 |
Method for forming CVD thin glass films
The present invention provides a method for forming a chemical vapor deposition film which is suitable for an interlevel insulator between Al and Al or an interlevel insulator between Al and a...
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5230923 |
Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film
A process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a traveling flexible plastic film. The process comprises evaporating a deposition material...
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5151379 |
Method for manufacturing a color filter
The present invention relates to a color filter substrate and a color filter electrooptical device, for example, such as color liquid crystal display device having a transparent electrode over a...
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5147688 |
MOCVD of indium oxide and indium/tin oxide films on substrates
Disclosed is a metalorganic chemical vapor deposition (MOCVD) process of depositing an indium oxide or an indium/tin oxide film on a substrate using indium alkyl etherate or indium alkyl etherate...
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5136976 |
Method and means for controlled-profile coating of glass containers
Apparatus for the coating of glass containers has a series of vertical slots for applying coating chemicals to a hot glass jar with a minimal neck and shoulder area. An opposing horizontal slot...
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5133988 |
Method of manufacturing thin film EL device
The disclosure describes a thin film EL device including a luminescent layer made of column polycrystals formed by independently evaporating luminescent host material and an activator and then...
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5124180 |
Method for the formation of fluorine doped metal oxide films
The invention relates to a method of producing a substantially haze free, fluorine doped metal oxide coating on a substrate such as glass. The method includes the steps of heating a surface of the...
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5122391 |
Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD
An atmospheric pressure chemical vapor deposition (APCVD) system for doping indium-oxide films with both tin and fluorine to produce dual electron donors in a non-batch process. The APCVD system...
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5102691 |
Method of pretreatment for the high-deposition-rate production of fluorine-doped tin-oxide coatings having reduced bulk resistivities and emissivities
A method for producing coatings on a heated substrate, preferably glass, comprises pretreating the substrate with a gaseous composition of water, air and a fluorine compound, and thereafter...
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5102721 |
Textured tin oxide
A textured layer of tin oxide on a vitreous substrate in which the thickness and degree of texture of the layer can be controlled independently of one another. The tin oxide fabricated by a process...
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5090985 |
Method for preparing vaporized reactants for chemical vapor deposition
Vaporized reactants, useful for chemical vapor deposition of a coating on the surface of a hot substrate, are prepared by initially heating a liquid coating precursor, injecting the liquid coating...
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5041150 |
Process for coating glass
A process for coating a moving ribbon of hot glass by chemical vapor deposition comprises establishing a first flow of a first reactant gas along the hot glass surface substantially parallel to the...
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5006363 |
Plasma assited MO-CVD of perooskite dalectric films
Disclosed is a method of forming a Perovskite-type dielectric film on a substrate under low temperature by decomposing and reacting vapor of organometallic compound containing metal for the...
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