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8163343 |
Method of forming an aluminum oxide layer
Methods of forming aluminum oxide layers on substrates are disclosed. In some embodiments, the method includes depositing an aluminum oxide seed layer on the substrate using a first process having...
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8105437 |
Method and system for large scale manufacture of thin film photovoltaic devices using multi-chamber configuration
A method for large scale manufacture of photovoltaic devices includes loading a substrate into a load lock station and transferring the substrate in a controlled ambient to a first process station....
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8097302 |
Electroconductive tin oxide having high mobility and low electron concentration
Tin oxide having high mobility and a low electron concentration, and methods for producing layers of the tin oxide layers on a substrate by atmospheric pressure chemical vapor deposition (APCVD)...
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8080283 |
Method for forming a yttria-stabilized zirconia coating with a molten silicate resistant outer layer
A method for providing a component with protection against sand related distress includes the steps of: providing a substrate; depositing a layer of a yttria-stabilized zirconia material on the...
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8053029 |
Method for fabricating CuInS2 thin film by metal organic chemical vapor deposition, CuInS2 thin film fabricated by the same and method for fabricating In2S3 thin film therefrom
Disclosed is a method for fabricating a CuInS2 thin film by metal-organic chemical vapor deposition (MOCVD). The method comprises fabricating a copper thin film by depositing an asymmetric copper...
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8021491 |
Method for selectively removing coatings from metal substrates
A method for selectively removing an aluminum-poor overlay coating from a substrate of a component, which as a result of its low aluminum content is highly resistant to a selective stripping...
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7935382 |
Method for making crystalline composition
A method of making a metal nitride is provided. The method may include introducing a metal in a chamber. A nitrogen-containing material may be flowed into the chamber. Further, a hydrogen halide...
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7927662 |
CVD method in vertical CVD apparatus using different reactive gases
A method of performing a CVD process on target substrates all together in a vertical CVD apparatus includes repeating, a plurality of times, first and second steps of supplying first and second...
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7858151 |
Formation of CIGS absorber layer materials using atomic layer deposition and high throughput surface treatment
An absorber layer may be formed on a substrate using atomic layer deposition reactions. An absorber layer containing elements of groups IB, IIIA and VIA may be formed by placing a substrate in a...
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7838084 |
Atomic layer deposition method of depositing an oxide on a substrate
The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is...
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7794787 |
Methods of depositing materials over substrates, and methods of forming layers over substrates
The invention includes methods of utilizing supercritical fluids to introduce precursors into reaction chambers. In some aspects, a supercritical fluid is utilized to introduce at least one...
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7763317 |
High K dielectric growth on metal triflate or trifluoroacetate terminated III-V semiconductor surfaces
Surface preparation of a compound semiconductor surface, such as indium antimonide (InSb), with a triflating agent, such as triflic anhydride or a trifluoroacetylating agent, such as...
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7736446 |
Method for manufacturing a lanthanum oxide compound
A method for manufacturing a lanthanum oxide compound on a substrate includes: setting the number of H2O molecule, the number of CO molecule and the number of CO2 molecule to one-half or less,...
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7695764 |
Alumina layer with enhanced texture
A refined method to produce textured α-Al2O3 layers in a temperature range of from about 750 to about 1000° C. with a controlled texture and substantially enhanced wear resistance and toughness t...
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7641937 |
Method for manufacturing absorber layers for solar cell
The present invention relates to a process for producing CuInSe2 and CuIn1XGa,Se2 thin films used as an absorption layer for a solar cell such that they have a structure near to chemical...
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7608301 |
Process for forming a protective coating containing aluminium and zirconium on a metal
This relates to an improvement to the process of aluminization or activated cementation in which a donor cement containing the aluminium is attacked at high temperature and in a neutral or reducing...
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7569251 |
Method of forming a thermal protective coating on a super alloy metal substrate
A method of forming a gas turbine part includes forming a bonding underlayer on a superalloy metal substrate, the underlayer including an intermetallic compound of aluminum, nickel, and platinum,...
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7531214 |
Method for manufacturing an oxide coated cutting tool
A method of depositing a crystalline α-Al2O3 layer onto a cutting tool insert by Chemical Vapor Deposition at a temperature of from about 625 to about 800° C. includes the following steps: d...
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7531213 |
Method for making coated cutting tool insert
A method for making a coated cutting tool insert by depositing by CVD, onto a cemented carbide, titanium based or ceramic substrate a hard layer system, having a total thickness of from about 2 to...
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7485583 |
Method for fabricating superlattice semiconductor structure using chemical vapor deposition
The invention provides a method for fabricating a superlattice semiconductor structure capable of achieving excellent interfacial properties and uniformity. For the superlattice semiconductor...
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7445672 |
Method of forming group-III nitride crystal, layered structure and epitaxial substrate
Heat treatment is conducted at a predetermined temperature of not less than 1250° C. on an underlying substrate obtained by epitaxially forming a first group-III nitride crystal on a predetermined ...
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7431966 |
Atomic layer deposition method of depositing an oxide on a substrate
The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is...
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7258895 |
Methods of forming material on a substrate, and a method of forming a field effect transistor gate oxide on a substrate
The invention includes methods of forming material on a substrate and methods of forming a field effect transistor gate oxide. In one implementation, a first species monolayer is chemisorbed onto a...
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7195022 |
Production apparatus for producing gallium nitride semiconductor film and cleaning apparatus for exhaust gas
There are disclosed a production apparatus for producing a gallium nitride semiconductor film by HVPE process, a cleaning apparatus for cleaning exhaust gas coming from the above apparatus and an...
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7160578 |
Method for depositing aluminum oxide coatings on flat glass
A chemical vapor deposition process for laying down an aluminum oxide coating on a glass substrate through the use of an organic ester having a β hydrogen on the alkyl group bonded to the ...
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7011867 |
α-alumina coated cutting tool
A coated cutting tool is composed of one or more layers of refractory compounds of which at least one layer is single-phase α-alumina with a pronounced columnar grain-structure and strong texture ...
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7008669 |
Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element
A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for...
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6964791 |
High-temperature articles and method for making
A coated article, a coating for protecting an article, and a method for protecting an article are provided. The article comprises a metallic substrate and a substantially single-phase coating...
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6866890 |
Method of forming a dielectric film
A method of forming a dielectric film on a Si substrate comprises the steps of adsorbing a gaseous molecular compound of a metal element constituting a dielectric material on a Si substrate, and...
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6852406 |
Anti-static, anti-reflection coating
An anti-static, anti-reflection, transparent coating for a transpatent substrate, the coating including at least one electrically conductive layer, wherein the sheet resistance of the coating is...
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6849297 |
Encapsulated long life electroluminescent phosphor
A process for making an electroluminescent phosphor having a given emission spectra A, comprises the steps of manufacturing a beginning electroluminescent phosphor having an emission spectra B,...
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6780476 |
Method of forming a film using chemical vapor deposition
An object of the present invention is to provide a liquid material for chemical vapor deposition (CVD), a method of forming a film by CVD and a CVD apparatus, capable of achieving film formation of...
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6773751 |
Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.
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6767581 |
Process for the deposition of thin layers by chemical vapor deposition
A process for the deposition of thin layers by chemical vapor deposition includes adding an effective amount of nitroxyl radicals of the formula to a gas stream including the materials to be...
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6750120 |
Method and apparatus for MOCVD growth of compounds including GaAsN alloys using an ammonia precursor with a catalyst
A method of using ammonia to form a GaAs alloy with nitrogen atoms is described. The method includes the operation of introducing ammonia with an agent to assist in the breakdown of the ammonia...
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6720038 |
Method of forming a coating resistant to deposits and coating formed thereby
A thermal barrier coating (TBC) system and method for forming the coating system on a component. The method generally entails forming a TBC on the surface of the component so that the TBC has at...
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6686043 |
Method for making long-life electroluminescent phosphor
A method of coating phosphor particles comprises introducing an inert gas into a reaction vessel and charging phosphor particles into the reaction vessel. The reaction vessel is then heated to a...
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6645302 |
Vapor phase deposition system
An object of the present invention is to reduce variance in the flow rates of source gasses and inconsistency in the mixing ratio of the source gasses when the flow paths of the source gasses are...
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6630199 |
Ceramic layer produced by reacting a ceramic precursor with a reactive gas
A structure protected by a ceramic coating is prepared by providing a substrate having a surface, and depositing a layer of a sacrificial ceramic precursor material, preferably silica, onto the...
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6623794 |
Multilayer heat processable vacuum coatings with metallic properties and method of heat processing
A heat processable coated article suitable for tempering and/or bending which has metallic properties is prepared by coating a glass substrate. The substrate has deposited over it a stabilizing...
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6592942 |
Method for vapour deposition of a film onto a substrate
Method for chemical vapor deposition of a film onto a substrate. Before bulk chemical vapor deposition the substrate is subjected to a nucleation treatment. The nucleation treatment comprises...
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6555167 |
Method for growing high quality group-III nitride thin film by metal organic chemical vapor deposition
A method for growing a group-III nitride compound (including BN, AlN, GaN and InN) semiconductor film, to which much attention is currently paid in the field of optical semiconductors. If the...
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6551718 |
Low friction coating
Disclosed is a metal sulphide coating composition of the formula MXSiVRYSZFW where M is one or more metals selected from: Mo, Ti, W, Nb, Ta, Zr, and Hf; Si is silicon; R is one or more elements...
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6472018 |
Thermal barrier coating method
An outwardly grown diffusion aluminide bondcoat is formed on a superalloy substrate and has higher concentrations of Al and Pt and lower concentrations of harmful impurities (e.g. Mo, W, Cr, Ta, S,...
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6409830 |
Process for preparing a limo2 type heterometallic oxide film
An organometallic compound of formula LiOR′.(R′O)MR2 is vaporized at a low temperature and employed in a CVD process of a heterometallic oxide film of the LiMO2 type, wherein M is a Group 13 ele...
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6403156 |
Method of forming an A1203 film in a semiconductor device
A method is disclosed for forming an aluminum oxide film on a semiconductor device. In a process of depositing an aluminum oxide film by atomic layer deposition method using TMA (trimethyl...
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6337035 |
Phosphor and method for producing same
A phosphor is prepared by depositing a compound semiconductor of Groups III-V in the form of fine particles or a thin film on a surface of a carrier particle by hetero-epitaxial growth. Thus, the...
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6210755 |
Method and evaporation chamber for generating a continuous vapor stream containing a compound having monovalent gallium therein, and a vacuum coating apparatus
In a method and evaporation chamber for generating a continuous vapor stream containing a compound in which gallium is present in monovalent form of a vacuum coating method for vacuum coating a...
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6162500 |
Method of treating a casting having a casting surface
A method for treating a casting having a casting surface by vapor-depositing a wear-resistant coating on to the casting surface.
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6139921 |
Method for depositing fine-grained alumina coatings on cutting tools
A method for depositing refractory alumina (A2 O3) thin layers on cutting tools made of cemented carbide, cermet, ceramics or high speed steel is disclosed. The present method is a Plasma Activated...
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