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7635647 |
Atmospheric pressure chemical vapor deposition
A process for coating a substrate at atmospheric pressure comprises the steps of vaporizing a controlled mass of semiconductor material at substantially atmospheric pressure within a heated inert...
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7625794 |
Methods of forming zirconium aluminum oxide
A dielectric layer having atomic layer deposited zirconium aluminum oxide and a method of fabricating such a dielectric layer may produce a reliable dielectric layer having an equivalent oxide...
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7618681 |
Process for producing bismuth-containing oxide films
A process for producing bismuth-containing oxide thin films by Atomic Layer Deposition, including using an organic bismuth compound having at least one silylamido ligand as a source material for...
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7604841 |
Method for extending time between chamber cleaning processes
A method for extending time between chamber cleaning processes in a process chamber of a processing system. A particle-reducing film is formed on a chamber component in the process chamber to...
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7597938 |
Method of making coated article with color suppression coating including flame pyrolysis deposited layer(s)
A method of making an oven door, or other coated article, is provided so as to have a color suppression coating on a substrate such as a glass substrate. Flame pyrolysis (or combustion CVD) is used...
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7597951 |
Coated cutting tool insert
The present invention relates to a metal cutting tool insert with a coating comprising a metal oxide multilayer, which exhibits especially high resistance to plastic deformation as well as...
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7579285 |
Atomic layer deposition method for depositing a layer
The invention is related to an ALD method for depositing a layer including the steps of a) providing a semiconductor substrate in a reactor; b) providing a pulse of a first precursor gas into the...
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7575775 |
Polysulfide thermal vapour source for thin sulfide film deposition
The present invention is a low pressure physical vapor deposition method for the deposition of multi element sulfide thin film phosphor compositions for electroluminescent devices where a thermal...
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7566477 |
Method for saturating a carrier gas with precursor vapor
A system and method for vaporizing a solid film precursor and transporting the film precursor vapor using a precursor valve system to control delivery. The film precursor vaporization system is...
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7556840 |
Coating using metal organic chemical vapor deposition
A method is provided for applying a coating over a substrate surface of an engine component. The method includes inserting the engine component within a deposition chamber, heating the deposition...
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7544388 |
Methods of depositing materials over substrates, and methods of forming layers over substrates
The invention includes methods of utilizing supercritical fluids to introduce precursors into reaction chambers. In some aspects, a supercritical fluid is utilized to introduce at least one...
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7537801 |
Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating
In certain example embodiments, a coated article includes a zirconium nitride inclusive layer before heat treatment (HT). The coated article is heat treated sufficiently to cause the zirconium...
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7537804 |
ALD methods in which two or more different precursors are utilized with one or more reactants to form materials over substrates
In some embodiments, the invention may include utilization of at least one iteration of an ALD pulse sequence that has the pulse subsets M 2 -M 1 -R- and M 1 -(R-M 2 -) x : where x is at least 2;...
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7531213 |
Method for making coated cutting tool insert
A method for making a coated cutting tool insert by depositing by CVD, onto a cemented carbide, titanium based or ceramic substrate a hard layer system, having a total thickness of from about 2 to...
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7531214 |
Method for manufacturing an oxide coated cutting tool
A method of depositing a crystalline α-Al 2 O 3 layer onto a cutting tool insert by Chemical Vapor Deposition at a temperature of from about 625 to about 800° C. includes the following steps:...
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7531212 |
Process for producing an alumina coating comprised mainly of α crystal structure
The present invention provides a process for producing an alumina coating comprised mainly of α crystal structure on a base material.
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7514119 |
Method and apparatus for using solution based precursors for atomic layer deposition
A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used....
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7498059 |
Method for growing thin films
The invention relates to a method and apparatus for growing a thin film onto a substrate, in which method a substrate placed in a reaction space ( 21 ) is subjected to alternately repeated surface...
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7482037 |
Methods for forming niobium and/or vanadium containing layers using atomic layer deposition
A method of forming a metal containing layer on a substrate, particularly a semiconductor substrate or substrate assembly for use in manufacturing a semiconductor or memory device structure, using...
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7476420 |
Process for producing metal oxide films at low temperatures
A process for producing metal oxide thin films on a substrate by the ALD method comprises the steps of bonding no more than about a molecular monolayer of a gaseous metal compound to a growth...
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7452569 |
Organic aluminum precursor and method of manufacturing a metal wiring using the same
In a method of manufacturing a metal wiring, an organic aluminum precursor that includes aluminum as a central metal is applied to a substrate. The organic aluminum precursor applied to the...
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7438949 |
Ruthenium containing layer deposition method
An exemplary apparatus and method of forming a ruthenium tetroxide containing gas to form a ruthenium containing layer on a surface of a substrate is described herein. The method and apparatus...
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7431966 |
Atomic layer deposition method of depositing an oxide on a substrate
The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is...
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7429404 |
Methods of selectively incorporating metals onto substrates
A method for forming multi-metallic sites on a substrate is disclosed and described. A substrate including active groups such as hydroxyl can be reacted with a pretarget metal complex. The target...
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7429406 |
Method of forming thin ruthenium-containing layer
A method of forming a thin ruthenium-containing layer includes performing a CVD process using butyl ruthenoscene as a ruthenium source material. The thin ruthenium-containing layer may be formed by...
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7422805 |
Cutting tool for bimetal machining
Coated cemented carbide cutting tool inserts for bimetal machining under wet conditions at moderate cutting speeds, and in particular, cutting tool inserts for face milling of engine blocks formed...
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7407686 |
Optical film, polarizing plate and display device utilising the film, and production method of optical film
An optical film is disclosed having minimal curl, minimal coating unevenness and no cracks. The optical film is obtained by casting a dope comprising a cellulose ester and a non-chlorinated solvent...
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7390381 |
Information recording medium and method of manufacturing the same
An information recording medium that is excellent in repeated-rewriting performance and is deteriorated less in crystallization sensitivity with time is provided, with respect to which high density...
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7351658 |
Process for producing yttrium oxide thin films
This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses of at least one metal source...
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7338582 |
Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure
It is an object of the present invention to provide an oxygen reduction electrode having excellent oxygen reduction catalysis ability. In a method of manufacturing a manganese oxide nanostructure...
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7332442 |
Systems and methods for forming metal oxide layers
A method of forming (and apparatus for forming) a metal oxide layer, preferably a dielectric layer, on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor...
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7309514 |
Electron beam modification of CVD deposited films, forming low dielectric constant materials
A process for forming low dielectric constant dielectric films for the production of microelectronic devices. A dielectric layer is formed on a substrate by chemical vapor depositing a monomeric or...
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7288217 |
Electroconductive compound in flake form and electroconductive composition
An electroconductive compound in a flake form, characterized in that it comprises a titanium oxide which has an average long diameter of 1 to 100 μm and an average thickness of 0.01 to 1.5 μm,...
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7285312 |
Atomic layer deposition for turbine components
A method and superalloy component for depositing a layer of material onto gas turbine engine components by atomic layer deposition. A superalloy component may have a ceramic thermal barrier coating...
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7285308 |
Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
A multi-step method for depositing ruthenium thin films having high conductivity and superior adherence to the substrate is described. The method includes the deposition of a ruthenium nucleation...
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7258895 |
Methods of forming material on a substrate, and a method of forming a field effect transistor gate oxide on a substrate
The invention includes methods of forming material on a substrate and methods of forming a field effect transistor gate oxide. In one implementation, a first species monolayer is chemisorbed onto a...
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7241479 |
Thermal CVD synthesis of nanostructures
The present invention is generally directed to a novel process for the production of nanowires and nanobelts and the novel nanostructures which can be produced according to the disclosed processes....
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7220451 |
Process for producing metal thin films by ALD
Electrically conductive noble metal thin films can be deposited on a substrate by atomic layer deposition. According to one embodiment of the invention a substrate with a surface is provided in a...
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7211296 |
Chalcogenide glass nanostructures
Chalcogenide nanowires and other micro-and nano scale structures are grown on a preselected portion of on a substrate. They are amorphous and of uniform composition and can be grown by a...
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7211216 |
Aluminum nitride ceramic, semiconductor manufacturing member, and manufacturing method for aluminum nitride ceramic
An aluminum nitride ceramic including aluminum nitride grains and grain boundary phases comprises a grain boundary phase-rich layer including more amount of the grain boundary phases in a surface...
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7208195 |
Methods and apparatus for deposition of thin films
A method for depositing a thin film includes the steps of providing a vapor including at least one selected vapor phase component into an evacuated chamber and condensing the vapor onto a heated...
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7205247 |
Atomic layer deposition of hafnium-based high-k dielectric
A method of depositing a hafnium-based dielectric film is provided. The method comprises atomic layer deposition using ozone and one or more reactants comprising a hafnium precursor. A...
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7192623 |
Thin layer of hafnium oxide and deposit process
A thin layer of hafnium oxide or stacking of thin layers comprising hafnium oxide layers for producing surface treatments of optical components, or optical components, in which at least one layer...
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7192625 |
Manufacturing method of barrier-forming film
In manufacturing a barrier-forming film, a vapor-deposited inorganic oxide film is provided on a face of a substrate film. An annealing treatment is applied to the substrate film having said...
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7189431 |
Method for forming a passivated metal layer
A method for forming a passivated metal layer that preserves the properties and morphology of an underlying metal layer during subsequent exposure to oxygen-containing ambients. The method includes...
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7182979 |
High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor
A method directed to the use of a nonvolatile precursor, either a solid or liquid precursor, suitable for CVD, including liquid source CVD (LSCVD). Using the method of the invention the nonvolatile...
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7163719 |
Method of depositing thin film using hafnium compound
A method of depositing a thin film using a hafnium compound includes depositing a primary thin film and depositing a secondary thin film. The depositing of the primary thin film and the depositing...
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7160577 |
Methods for atomic-layer deposition of aluminum oxides in integrated circuits
The present inventors devised unique atomic-layer deposition systems, methods, and apparatus suitable for aluminum-oxide deposition. One exemplary method entails providing an outer chamber...
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7160578 |
Method for depositing aluminum oxide coatings on flat glass
A chemical vapor deposition process for laying down an aluminum oxide coating on a glass substrate through the use of an organic ester having a β hydrogen on the alkyl group bonded to the...
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7156913 |
Intensely colored red effect pigments
The present invention relates to intensely colored red effect pigments comprising iron oxide-coated SiO 2 flakes, where the total thickness of the effect pigments is not greater than 500 nm...
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