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8071161 DLI-MOCVD process for making electrodes for electrochemical reactors  
A method for fabricating an electrode for electrochemical reactor is provided, wherein the electrode includes a porous carbon diffusion layer and a catalyst layer. The method includes a step of...
8065798 Method of manufacturing printed circuit board  
A fabrication method which can improve electrical properties, shorten processing time, and reduce the thickness of a chip package by achieving an ultra-thin fine circuit pattern. The method for...
8053038 Method for making titanium-based compound film of poly silicon solar cell  
A method is disclosed for making a titanium-based compound film of a poly-silicon solar cell. In the method, a ceramic substrate is made of aluminum oxide. The ceramic substrate is coated with a...
8029923 Vaporizing material for producing highly refractive optical layers  
The invention relates to a vapour-deposition material for the production of optical layers of high refractive index which comprises titanium oxide and gadolinium oxide and/or dysprosium oxide, to a...
8029851 Nanowire fabrication  
Techniques for making nanowires with a desired diameter are provided. The nanowires can be grown from catalytic nanoparticles, wherein the nanowires can have substantially same diameter as the...
8003162 Method of forming phase change layer using a germanium precursor and method of manufacturing phase change memory device using the same  
A method of forming a phase change layer using a Ge compound and a method of manufacturing a phase change memory device using the same are provided. The method of manufacturing a phase change...
7923381 Methods of forming electronic devices containing Zr-Sn-Ti-O films  
A dielectric film containing Zr—Sn—Ti—O and methods of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than attainable using...
7893006 Systems and methods for solution-based deposition of metallic cap layers for high temperature superconductor wires  
Under one aspect, a method of making a superconductor wire includes providing an oxide superconductor layer overlaying a substrate; forming a substantially continuous barrier layer over the oxide...
7879410 Method of fabricating an electrochemical device using ultrafast pulsed laser deposition  
A method of fabricating a multi-layered thin film electrochemical device is provided. The method comprises: providing a first target material in a chamber; providing a substrate in the chamber;...
7849587 Method of manufacturing a solenoidal magnet  
A method of manufacturing a solenoidal magnet structure, includes the step of providing a collapsible accurate mold in which to wind the coils winding wire into defined positions in the mold,...
7846862 Methanol oxidation catalyst  
A methanol oxidation catalyst is provided, which includes nanoparticles having a composition represented by the following formula 1: PtxRuyTzQu formula 1 In the formula 1, the T-element is at least...
7842353 Manufacturing process of electrodes for electrolysis  
A process for manufacturing electrodes for electrolysis, including steps of forming an arc ion plating (AIP) undercoating layer including valve metal or valve metal alloy containing a crystalline...
7838065 Method for preparing an electrode comprising an electrochemical catalyst layer thereon  
Disclosed is a method for preparing an electrode having an electrochemical catalyst layer, comprising the steps of: providing a substrate having a conductive layer thereon, immersing the substrate...
7785658 Method for forming metal wiring structure  
A method for forming a metal wiring structure includes: (i) providing a multi-layer structure including an exposed wiring layer and an exposed insulating layer in a reaction space; (ii) introducing...
7785721 Thermally treatable layer assembly that filters sun and heat and method for producing the same  
A layer system that filters sun and heat can be applied to glass by a vacuum coating process. The system comprises at least one series of metal layers in addition to a respective series of lower...
7786010 Method for forming a thin layer on semiconductor substrates  
An apparatus and a method form a thin layer on each of multiple semiconductor substrates. A processing chamber of the apparatus includes a boat in which the semiconductor substrates are arranged in...
7732002 Method for the fabrication of conductive electronic features  
Precursor compositions in the form of a tape that can be transferred to a substrate and converted to an electronic feature at a relatively low temperature, such as not greater than about 200° C. ...
7727580 Method of manufacturing electrode for lithium secondary batteries  
A method of manufacturing an electrode for a lithium secondary battery in which a thin film of active material is deposited on a current collector is provided that eliminates adverse effects on the...
7682710 Vapour-deposition material for the production of optical layers of high refractive index  
The invention relates to a vapour-deposition material for the production of optical layers of high refractive index which comprises titanium oxide and ytterbium oxide in a molar ratio of from 4:1...
7641998 Conductive mono atomic layer coatings for fuel cell bipolar plates  
An electrically conductive separator element and assembly for a fuel cell which comprises an electrically conductive substrate having a monoatomic layer coating overlying the substrate. The...
7632351 Atomic layer deposition processes for the formation of ruthenium films, and ruthenium precursors useful in such processes  
This invention is directed to processes for the formation of ruthenium-containing films on surfaces in atomic layer deposition (ALD) processes. The ALD process includes depositing a...
7622149 Reactive metal sources and deposition method for thioaluminate phosphors  
A physical vapor deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a...
7560016 Selectively accelerated plating of metal features  
To make a metal feature, a non-plateable layer is applied to a workpiece surface and then patterned to form a first plating region and a first non-plating region. Then, metal is deposited on the...
7501155 Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus  
In a method for coating a phosphor or a scintillator layer onto a flexible substrate, within a sealed zone maintained under vacuum conditions, by the step of vapor deposition, said phosphor or...
7488435 Copper(I) complexes and processes for deposition of copper films by atomic layer deposition  
The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic...
7445810 Method of making a tantalum layer and apparatus using a tantalum layer  
A method of making tantalum structures, including, creating a tantalum layer disposed on a first layer region of a first layer and on a second layer region of a second layer. The tantalum layer has...
7442407 Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)  
Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta,R1 and R2 C1 to C12 alkyl, C5 to...
7427435 Coating composition for adhering metallized layers to polymeric films  
A metallized film and a process for making the film are disclosed. In general, the metallized film includes a polymeric film layer that is coated with a polyester coating composition. A metal layer...
7410917 Atomic layer deposited Zr-Sn-Ti-O films using TiI4  
Various structures having a dielectric film containing Zr—Sn—Ti—O formed by atomic layer deposition using a TiI4 precursor and a method of fabricating structures having such a dielectric film produ...
7393555 Dicopper(I) oxalate complexes as precursor for metallic copper deposition  
The invention relates to dicopper(I) oxalate complexes stabilized by neutral Lewis bases, such as alkenes or alkynes, and to the use of dicopper(I) oxalate complexes as precursors for the...
7323411 Method of selective tungsten deposition on a silicon surface  
In one embodiment, a selective tungsten deposition process includes the steps of pre-flowing silane into a deposition chamber, pumping down the chamber, and then selectively depositing tungsten on...
7273811 Method for chemical vapor deposition in high aspect ratio spaces  
A method of depositing conformal film into high aspect ratio spaces includes the step of forming a gradient of precursor gas inside the space(s) prior to deposition. The gradient may be formed, for...
7226894 Superconducting wire, method of manufacture thereof and the articles derived therefrom  
Disclosed herein is method for making a wire comprising contacting a first end of a first superconducting wire with a second end of a second superconducting wire, wherein the superconducting wire...
7169947 Dicopper(I) oxalate complexes for use as precursor substances in metallic copper deposition  
The invention relates to dicopper(I) oxalate complexes stabilised by neutral Lewis base components and to the use thereof as precursors for the deposition of metallic copper. The neutral Lewis...
7166354 Metal coated fiber and electroconductive composition comprising the same and method for production thereof and use thereof  
The present invention provides a metal coated fiber with excellent coating strength and corrosion resistance, and a conductive resin composition with excellent conductivity. A feature of a metal...
7107668 Method of manufacturing a longitudinal microsolenoid  
A photosensitive material is coated on an insulating material (13) stacked on a substrate (1) (FIG. 16A), and exposed and developed using a mask having a light-shielding film capable of controlling...
7101795 Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer  
A method and system to form a refractory metal layer on a substrate features nucleating a substrate using sequential deposition techniques in which the substrate is serially exposed to first and...
7081267 Nanostructured powders and related nanotechnology  
Methods to manufacture nanoscale particles comprising metals, alloys, intermetallics, ceramics are disclosed. The thermal energy is provided by plasma, internal energy, heat of reaction, microwave,...
7077927 Method of applying an edge electrode pattern to a touch screen  
A method of applying an edge electrode pattern to a touch screen. The method includes depositing, on a first surface of a decal strip, conductive material in the form of an edge electrode pattern,...
7022298 Exhaust apparatus for process apparatus and method of removing impurity gas  
An exhaust apparatus for a process apparatus which processes an object using a process gas includes an exhaust pipe to be connected to an exhaust port of the process apparatus, and a trap mechanism...
6975453 Multilayer electrically conductive anti-reflective coating  
The present invention comprises a multilayer inorganic anti-reflective coating with predetermined optical properties, for application on a flexible substrate. The coating comprises a stack...
6974547 Flexible thin film capacitor and method for producing the same  
According to a flexible thin film capacitor of the present invention, an adhesive film is formed on a substrate composed of at least one selected from the group consisting of an organic polymer and...
6905726 Component having at least two mutually adjacent insulating layers and corresponding production method  
The invention relates to a component having two adjacent insulating layers and to a production process therefore. The component has an activated insulating layer, which can be converted into an...
6899966 Composite surface on a stainless steel matrix  
A composite surface having a thickness from 10 to 5,000 microns comprising a spinel of the formula MnxCr3−xO4 wherein x is from 0.5 to 2 and oxides of Mn, Si selected from the group consisting of M...
6900129 CVD of tantalum and tantalum nitride films from tantalum halide precursors  
A chemical vapor deposition (CVD) method for depositing high quality conformal tantalum (Ta) and tantalum nitride (TaNx) films from inorganic tantalum pentahalide (TaX5) precursors is described....
6881446 Method and device for production of endless plastic hollow profiles  
A method for production of endless plastic hollow profiles, in particular tubes, comprises several production stages for the plastic tube and a coating stage for a metal coating. A reduced pressure...
6878628 In situ reduction of copper oxide prior to silicon carbide deposition  
The invention relates generally to improved silicon carbide deposition during dual damascene processing. In one aspect of the invention, copper oxide present on a substrate is reduced at least...
6867149 Growth of multi-component alloy films with controlled graded chemical composition on sub-nanometer scale  
The chemical composition of thin films is modulated during their growth. A computer code has been developed to design specific processes for producing a desired chemical composition for various...
6855369 Transparent laminate, method for producing the same, and plasma display panel  
In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit by unit successively on a surface of a substrate, and a high-refractive-index transparent thin film is deposited on a...
6838202 Fuel cell bipolar plate having a conductive foam as a coolant layer  
A bipolar plate for use with a fuel cell is provided including an electrically conductive foam as a coolant layer between thin metal foil layers. The thin metal foil layers are provided with...