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8121732 Target position detection apparatus for robot  
A target position detection apparatus for a robot includes: a robot including an arm configured to be freely moved in at least two directions of X and Y axes, the arm having a wrist axis provided...
8113487 Vacuum processing apparatus  
A grease supply mechanism is provided inside a vacuum transfer chamber. The grease supply mechanism includes: a grease storage part in a bottomed cylindrical shape storing grease therein; and a...
8113757 Intermediate transfer chamber, substrate processing system, and exhaust method for the intermediate transfer chamber  
An intermediate transfer chamber that can prevent formation of defects in substrates. The intermediate transfer chamber is provided between a loader module being in a first environment where the...
8100620 Vacuum processing apparatus  
A vacuum processing apparatus includes vacuum processing vessels each having a processing chamber with a pressure-reduced interior space, a vacuum transfer vessel which is coupled to the vacuum...
8096744 Wafer processing system, wafer processing method, and ion implantation system  
Two load lock chambers having a load lock pedestal are provided adjacent to a vacuum process chamber through a vacuum intermediate chamber. A passage opening is provided between the vacuum process...
8092139 Inline-type wafer conveyance device  
There are comprised a load chamber (51) for carrying in a wafer from outside, an unload chamber (53) for carrying out a wafer to outside, and a plurality of conveyance chambers (54a, 54b, 54c) and...
8091863 Gate valve and semiconductor manufacturing apparatus  
A gate valve of a semiconductor manufacturing apparatus, which is formed between a processing chamber in which processing is performed and a transfer chamber which carries a substrate on which the...
8092137 Substrate transfer apparatus and method for controlling down flow  
The present invention relates to an apparatus for transferring a substrate through a gate for loading and unloading is provided, and includes a transfer chamber having the gate for loading and...
8092138 Large area substrate processing system with between chamber platform  
Embodiments of the invention generally relate to a vacuum processing system for processing large area substrates, such as flat panel displays (i.e., LCD, OLED, and other types of flat panel...
8082955 Lid opening/closing system of an airtight container  
A curtain nozzle is located above an opening portion (10) in a FIMS. A gas curtain formed of inert gas for closing the opening portion is formed. A cover is so provided as to cover a part of the...
8083456 Contained object transfer system  
A so-called transfer chamber in a semiconductor processing apparatus in which an FIMS system is secured is separated into a second chamber in which a transfer robot is disposed and a first chamber...
8083463 Mini clean room for preventing wafer pollution and using method thereof  
A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean...
RE43023 Dual loading port semiconductor processing equipment  
A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing...
8070410 Scalable stocker with automatic handling buffer  
Scalable storage can be achieved with linear array storage of wafers, comprising two linear arrays of storage compartments on opposite walls, with a middle transfer mechanism. Together with a...
8070408 Load lock chamber for large area substrate processing system  
The present invention generally includes a load lock chamber for transferring large area substrates into a vacuum processing chamber. The load lock chamber may have one or more separate,...
8071019 Methods for introduction of a reactive material into a vacuum chamber  
Methods for the introduction of a reactive material into a vacuum chamber while minimizing or eliminating the simultaneous introduction of contaminating materials or substances. As a result,...
8066466 Substrate processing sequence in a Cartesian robot cluster tool  
A method and apparatus for processing substrates using a multi-chamber processing system, or cluster tool, is provided. In one embodiment of the invention, a robot assembly is provided. The robot...
8061949 Multiple slot load lock chamber and method of operation  
Embodiments of the invention include a load lock chamber, a processing system having a load lock chamber and a method for transferring substrates between atmospheric and vacuum environments. In...
8060252 High throughput method of in transit wafer position correction in system using multiple robots  
Methods correcting wafer position error are provided. The methods involve measuring wafer position error on a robot, e.g. a dual side-by-side end effector robot, during transfer to an intermediate...
8057151 Foup door positioning device for foup opener  
The FOUP door positioning device of a FOUP opener is compatible with all kinds of FOUPs, is inexpensive, and has a simple positioning-ping adjustment mechanism. In a state in which a flange...
8056256 Method for reconditioning FCR APG-68 tactical radar units  
A method for reconditioning Fire Control Radar APG-68 tactical radar systems (FCR) utilized in military aircraft and returning them to operation with extended useful life expectancies equivalent...
8043039 Substrate treatment apparatus  
A substrate treatment apparatus is disclosed. The substrate treatment apparatus includes: a cassette loading portion on which a cassette for containing a substrate is loaded when the cassette is...
8033769 Loadlock designs and methods for using same  
Provided are apparatuses and methods disclosed for wafer processing. Specific embodiments include dual wafer handling systems that transfer wafers from storage cassettes to processing modules and...
8033772 Transfer chamber for vacuum processing system  
A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body...
8033770 Vacuum processing apparatus  
A vacuum processing apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a...
8033771 Minimum contact area wafer clamping with gas flow for rapid wafer cooling  
Apparatuses and methods for cooling and transferring wafers from low pressure environment to high pressure environment are provided. An apparatus may include a cooling pedestal and a set of...
8029226 Semiconductor manufacturing systems  
Linear semiconductor handling systems provide more balanced processing capacity using various techniques to provide increased processing capacity to relatively slow processes. This may include use...
8029224 Substrate transfer apparatus, substrate transfer method, and storage medium  
A substrate transfer apparatus 100 includes a substrate transport means 4 having a transport base 5 and a plurality of retention arms 41a-41e for retaining substrates W, an optical sensor 62 that...
8029227 Dust resistant load port apparatus and mini-environment system  
In a load port apparatus, a clearance is formed between an inner circumferential surface of an opening of the chamber and an outer circumferential surface of a door. The area of the clearance...
8029225 Stacked process modules for a semiconductor handling system  
Methods and systems are provided for a vacuum-based semiconductor handling system. The system may be a linear system with a four-link robotic SCARA arm for moving materials in the system. The...
8016537 Inline-type wafer conveyance device  
A structure is provided in which a load lock chamber (51) for carrying in an unprocessed wafer from outside and carrying out a processed wafer to outside, a first end conveyance chamber (54a) to...
8008637 High-temperature ion implantation apparatus and methods of fabricating semiconductor devices using high-temperature ion implantation  
A semiconductor device fabrication apparatus includes a load lock chamber, a loading assembly in the load lock chamber, and an ion implantation target chamber that is hermetically connected to the...
8007218 Unit and method for transferring substrates and apparatus and method for treating substrates with the unit  
The present invention is related to a method for transferring substrates. The method comprise simultaneously transferring two substrates, by means of a transfer unit, between first support plates...
8007644 Inclined carrier transferring apparatus  
An inclined carrier transferring apparatus for use inline sputtering equipment. The inclined carrier transferring apparatus includes rollers and a guiding portion. The rollers transfer and support...
7988398 Linear substrate transport apparatus  
Substrate processing apparatus having a chamber, a generally linear array of process modules, a substrate transport, and a drive system. The chamber is capable of being isolated from the outside...
7988399 Mid-entry load lock for semiconductor handling system  
In a system having a number of semiconductor processing modules sharing a common vacuum environment, a mid-entry load lock is provided to permit insertion and removal of wafers into the vacuum...
7984543 Methods for moving a substrate carrier  
Systems, methods, and apparatus are provided for electronic device manufacturing. The invention includes removing a first substrate carrier and a second substrate carrier from a moving conveyor...
7980000 Vapor dryer having hydrophilic end effector  
Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip...
7980255 Single wafer dryer and drying methods  
In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating...
7976262 FOUP opener  
This invention relates to a FOUP opener in which a FOUP is placed and the FOUP door of the FOUP can be detached so as to allow access to the interior of the FOUP. The FOUP opener includes a port...
7967147 Substrate storage container  
A substrate storage container includes a container body capable of storing a plurality of substrates in array, a lidding body, and a retainer for retaining substrates therebetween. The retainer...
7963736 Wafer processing apparatus with wafer alignment device  
A semiconductor-processing apparatus includes: a wafer handling chamber; a wafer processing chamber; a wafer handling device; a first photosensor disposed in the wafer handling chamber in front of...
7959395 Substrate processing apparatus  
Substrate processing apparatus having a transport chamber, a linear array of substrate holding modules alongside the transport chamber, and a substrate transport located in the chamber. The...
7959403 Linear semiconductor processing facilities  
Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include linear semiconductor processing facilities...
7955041 Quick changeover apparatus and methods for wafer handling  
Quick changeover apparatus for wafer handlers capable of handling at least two sizes of wafer frames and methods of using such apparatus are disclosed.
7950890 Vacuum robot, vacuum motor for vacuum robot, and production method of said vacuum motor  
A vacuum robot includes an arm portion on which a work is to be disposed under a reduced pressure environment and a motor portion for rotatably driving the arm portion, the vacuum robot being...
7942619 Carrier unit of substrate transfer apparatus  
In the present invention, a base 43 of a robot 27 is fixed to a fixing portion 53 of a frame divided body 50. The base 43 allows force exerted from a robot main body 27A to be transmitted to the...
7945348 Methods and systems for controlling a semiconductor fabrication process  
Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical...
7942622 Transfer/alignment method in vacuum processing apparatus, vacuum processing apparatus and computer storage medium  
In a vacuum transfer chamber 10, a position detecting mechanism 33 for detecting the positions of semiconductor wafers W is arranged. The semiconductor wafers W disposed at predetermined positions...
7940023 Geometric end effector system  
A geometric end effector system for use on a robot. The system includes a platform and a frame secured to the platform. At least one base is arranged at a predetermined position on the frame. The...