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6356808 Method for cell alignment and identification and calibration of robot tool  
A method for cell alignment, identification and calibration of part of a robot tool, preferably a part of the robot tool, is positioned close to a detector, whereupon it is moved repeatedly past...
6352403 Controlled environment enclosure and mechanical interface  
A system for vacuum-processing objects such as electronic integrated circuit wafers comprises (a) a carrier for transporting the wafers under vacuum in a cassette, the cassette being supported on...
6347919 Wafer processing chamber having separable upper and lower halves  
A wafer processing apparatus includes a processing chamber having a top chamber portion and a bottom chamber portion, respectively. The apparatus further includes an annular ring valve associated...
6347990 Microelectronic fabrication system cleaning methods and systems that maintain higher air pressure in a process area than in a transfer area  
A microelectronic fabrication system that includes a service area, a process area in the service area where microelectronic devices are processed, and a transfer area in the service area where...
6338604 Lid latch mechanism for clean box  
A latch mechanism for latching a lid of a clean box having a box body opening at one surface and a lid for closing the opening includes a latch member pivotal about a shaft mounted on the box...
6338626 Load-lock mechanism and processing apparatus  
A load-lock mechanism according to the invention comprises a vacuum chamber 31 arranged between a vacuum first transferring chamber 20 and atmospheric second transferring chambers 40. The vacuum...
6334751 Air lock  
Air lock for introducing and continuously passing a strip of a substrate into and through a vacuum chamber, including an enclosure containing at least three successive rollers in the direction of...
6332898 Substrate processing apparatus and maintenance method therefor  
A substrate processing apparatus comprises a semiconductor wafer processing chamber, a wafer transfer device, a wafer cassette holding unit, a wafer cassette transfer device and a wafer cassette...
6319373 Substrate transfer apparatus of substrate processing system  
A substrate transfer system is used in an in-line film deposition system. The substrate transfer system is provided with an auxiliary vacuum chamber and a main vacuum chamber. The auxiliary vacuum...
6318945 Substrate processing apparatus with vertically stacked load lock and substrate transport robot  
A substrate processing apparatus substrate transport and load lock assembly comprising a first load lock, a first substrate elevator, and a transport robot. The substrate elevator has a first...
6318944 Semiconductor fabricating apparatus, method for modifying positional displacement of a wafer in a wafer cassette within the semiconductor fabricating apparatus and method for transferring the wafer cassette  
A semiconductor fabricating apparatus having a vertical reaction furnace, a boat for holding plural wafers in a multi-layered fashion and being loaded into the vertical reaction furnace, a storage...
6318948 Substrate transfer apparatus and substrate processing apparatus  
This invention related to a substrate transfer apparatus having an arm holder moving into and out of a cassette while a substrate is mounted thereon, a forward and backward driving mechanism for...
6318953 SMIF-compatible open cassette enclosure  
An ergonomic loading assembly for an I/O port onto which a bare cassette may be easily loaded and unloaded. The loading assembly further provides isolation between the operator and the I/O port...
6315512 Systems and methods for robotic transfer of workpieces between a storage area and a processing chamber  
A workpiece handling system with dual load locks, a transport chamber and a process chamber. Workpieces may be retrieved from one load lock for processing at vacuum pressure, while workpieces are...
6315879 Modular deposition system having batch processing and serial thin film deposition  
A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film...
6305895 Transfer system for vacuum process equipment  
A transfer system 7 for carrying a wafer W into/out of a process chamber 4 is provided in a box 10 defining a load-lock chamber 3. The box 10 is divided into a first chamber 11 and a second...
6302927 Method and apparatus for wafer processing  
A wafer treatment apparatus is divided into a working zone (S1) and a loading zone (S2) by a wall (2). A closed wafer cassette(3) has a cassette body 31 having a bottom wall provided witha...
6291252 Automatic method to eliminate first-wafer effect  
A method of manufacturing semiconductor wafers in a processing tool in which it is determined whether the tool has been on idle beyond a predetermined period of time. If the tool has not been on...
6291801 Continual flow rapid thermal processing apparatus and method  
A rapid thermal processing apparatus and a method of using such apparatus for the continuous heat treatment of at least one workpiece, which apparatus includes a cavity of generally elongated...
6287386 Carousel wafer transfer system  
The present invention generally provides a rotary wafer carousel and related wafer handler for moving wafers or other workpieces through a processing system, i.e., a semiconductor fabrication...
6286230 Method of controlling gas flow in a substrate processing system  
A method of transferring and processing a substrate in an evacuable chamber which is located adjacent a process chamber and back-to-back process chambers, and other combinations of evacuable...
6281516 FIMS transport box load interface  
A box load interface implemented in a FIMS system includes a retractable port door that is attachable to the box door of a transport box. The port door selectively moves the box door toward or...
6280134 Apparatus and method for automated cassette handling  
An interface for transferring wafer carriers between a conveyor and a process chamber load location is provided. The interface has two portions. The first portion is configured so that a first...
6282459 Structure and method for detection of physical interference during transport of an article  
A method for detecting physical interference with desired transport of an article. The method includes the step of detecting an operative acoustic signal representing the structure-borne sound...
6273664 Coupling system for the transfer of a confined planar object from a containment pod to an object processing unit  
A coupling system for the transfer of a flat object from a confinement box towards a processing unit for processing the flat object. The coupling system includes a first shutter, at least one...
6270306 Wafer aligner in center of front end frame of vacuum system  
A vacuum processing system has a wafer handling chamber, such as a mini-environment, for moving wafers therethrough. The wafer handling chamber has a wafer aligner, or orienter, for aligning the...
6270582 Single wafer load lock chamber for pre-processing and post-processing wafers in a vacuum processing system  
A vacuum processing system has a load lock chamber for transitioning wafers between an ambient environment pressure and a transfer chamber vacuum pressure. The load lock chamber has wafer supports...
6267545 Semiconductor processing platform architecture having processing module isolation capabilities  
An interlocked control system is provided for dual sided slot valves contained in a vacuum body between each of a plurality of adjacent process and transport modules. Separate valves are provided...
6261044 Pod to port door retention and evacuation system  
A system is disclosed for retaining a pod door on a port door at a load port, and for removing contaminants, particulates and/or gasses from between the pod and port door surfaces and from within...
6257827 Apparatus and method for transporting substrates  
A method and apparatus for substrate processing at lower cost than existing processing systems are disclosed, which by implementing an arrangement using load locks of smaller dimensions or of a...
6254328 High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock  
A dual stage load lock is provided for transfer of semiconductor wafers between an environment at atmospheric pressure and a high vacuum environment, such as a wafer processing system. The dual...
6246923 Control device for a work carrying system  
A control device for a work carrying system characterized in that a first point where the moving action of a work transitions from a moving action from an origin process chamber to a transfer...
6244812 Low profile automated pod door removal system  
An automated door removal and replacement system utilizes a combination of linear and rotational drive to remove a door of a wafer supporting device and store the door below the device. In one...
6244811 Atmospheric wafer transfer module with nest for wafer transport robot  
A load lock wafer transfer face is provided at an acute angle with respect to a footprint dimension line, so the length of the footprint dimension line does not include the entire minimum length...
6241427 System and method for substantially touchless hydrodynamic transport of objects  
A object processing system is disclosed. The object processing system includes processing modules for performing process steps on objects, and hydrodynamic transport chutes coupled between the...
6238161 Cost effective modular-linear wafer processing  
An inventive module and fabrication system for processing semiconductor devices reduces the overall cost per unit processed, by eliminating the need for expensive rotational robots. The modules...
6238160 Method for transporting and electrostatically chucking a semiconductor wafer or the like  
An electrically conductive workpiece such as a semiconductor wafer or the like is transported between a staging area and an electrostatic chuck within a processing chamber using an electrostatic...
6235171 Vacuum film forming/processing apparatus and method  
Disclosed is a vacuum film forming/processing apparatus and method which is hardly influenced by dusts and contamination on a substrate and moreover has a reduced exhaust volume. A substrate...
6235634 Modular substrate processing system  
The invention provides an apparatus and method for performing a process on a substrate. At least two types of structures may be used to provide a flow path for a substrate so that the substrate...
6231289 Dual plate gas assisted heater module  
A dual plate gas assisted heater module having a vertically movable poppet movable between an upper and a lower subchamber has a passive heating feature which preheats a substrate prior to...
6224312 Optimal trajectory robot motion  
An apparatus for processing wafers generally comprising a transfer chamber, a loadlock chamber mounted on the transfer chamber, one or more processing chambers mounted on the transfer chamber, a...
6220808 Ergonomic, variable size, bottom opening system compatible with a vertical interface  
A system is described herein including a load port which allows various pod sizes, including 200 mm and 300 mm, add various configurations, including front opening and bottom opening, to operate...
6217272 In-line sputter deposition system  
An apparatus for simultaneously transporting and processing substrates is described. The apparatus includes a load lock that stores at least one substrate prior to processing and that stores at...
6213704 Method and apparatus for substrate transfer and processing  
The present invention allows large glass substrates to be rapidly moved from one processing station to another. Such movement occurs such that drives in different chambers are synchronized to move...
6216058 System of trajectory planning for robotic manipulators based on pre-defined time-optimum trajectory shapes  
A system for providing the reliable and numerically efficient generation of time-optimum trajectories with easy-to-track or continuous acceleration profiles for simple and blended moves of single-...
6193459 Integrated wafer pod-load/unload and mass-transfer system  
A system includes an interface for receiving a pod having a carrier that receives wafers, and that is initially enclosed within a base and a pod cover. The system also includes a mechanism that...
6190113 Quartz pin lift for single wafer chemical vapor deposition/etch process chamber  
A wafer support device is provided. The wafer support device includes a susceptor having a surface configured to support a bottom surface of a wafer. The susceptor has a plurality of guiding...
6190104 Treatment object conveyor apparatus, semiconductor manufacturing apparatus, and treatment object treatment method  
A method and apparatus for conveying a treatment object whereby a drive unit for driving a treatment object conveyor robot is deployed inside a vacuum chamber. The robot comprises a conveyor arm...
6190103 Wafer transfer device and method  
A substrate handling apparatus includes a transfer elevator and a process station disposed inside a load lock chamber. The process station includes a top module, a bottom module, and a seal ring...
6186722 Chamber apparatus for processing semiconductor devices  
An apparatus suitable for producing semiconductors. The apparatus includes a processing chamber, a first preparatory chamber, and a second preparatory chamber. Workpieces are transferred to the...