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8147153 |
Rinsing method, developing method, developing system and computer-read storage medium
The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development...
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8122851 |
Temperature measurement in a substrate processing apparatus
A substrate processing apparatus is configured to provide in series a plurality of processing blocks, each block including a processing unit and a transport robot transporting a substrate. A...
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7864290 |
Film security code
A system and method for coding an intermediate film element, e.g., an interpositive or an internegative, in an effective manner while maintaining the integrity of the film element. A first coat of...
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7841787 |
Rinsing method, developing method, developing system and computer-read storage medium
The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development...
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7828488 |
Developing apparatus, developing method, coating and developing system and storage medium
A developing apparatus includes two rotating members respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming...
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7789577 |
Coating and developing system, coating and developing method and storage medium
A coating and developing system that includes two rotating members having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming...
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7766566 |
Developing treatment apparatus and developing treatment method
In the present invention, a substrate transfer unit into/from which a substrate is transferred from/to the outside of a treatment container and a developing treatment unit in which development of...
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7550043 |
Substrate processing method and substrate processing apparatus
A processing chamber actually performs a heating process for a substrate. The processing chamber has an upper plate, a lower plate, and an exhaust opening. The upper plate heats a resist from a...
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7470098 |
Detecting apparatus and detecting method
An optical sensor for detecting the housing state such as the thickness of a substrate in the present invention is provided at supporting arms. The supporting arms are attached to a supporting...
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7387455 |
Substrate processing device, substrate processing method, and developing device
Rinsing nozzles 310a to 310e are moved on a wafer W while they are discharging rinsing solution 326. At that point, discharging openings 317a to 317e are contacted to developing solution 350 coated...
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7315033 |
Method and apparatus for reducing biological contamination in an immersion lithography system
Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting...
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7287919 |
Developing process and apparatus
The invention discloses a developing apparatus and a developing process. Wherein the developing process comprises following steps. First, a developing apparatus and a substrate are provided,...
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7275879 |
Processing device of photo-sensitive material
Disclosed is a processing device of a photo-sensitive material which comprises a conveying device for conveying a photo-sensitive material, a slot die for applying a processing liquid to the...
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7237967 |
Developing apparatus and method
A developing apparatus and method is provided in which the use amount of a developing solution can be reduced without deteriorating the accuracy of development. The developing apparatus comprises a...
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7208263 |
Method for manufacturing photosensitive resin printing plate, and developer treatment device
A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing...
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7025514 |
Development apparatus for manufacturing semiconductor device
A development apparatus for discharging a developer onto a surface of a semiconductor substrate (15) comprises a nozzle pipe (13) for supplying the developer, and a nozzle (14) having a shape of a...
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7018115 |
Washing method and apparatus
An apparatus for washing contaminants from a coated surface of a material comprises an inclined substantially planar surface up which the material is passed, an inlet for the introduction of wash...
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6942401 |
Photographic processing system having a vertical stacker arrangement
The invention relates to a photographic processor and a method of processing photographic material. The photographic processor is adapted to achieve a high speed processing of photographic material...
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6916126 |
Developing method for semiconductor substrate
Embodiments of the present invention provide a developing method, which can efficiently prevent the developing solution from remaining on the backside surface of the wafer, so as to avoid the...
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6916125 |
Method for film inspection and development
A method of preparing a roll of film for development. The method involves inspecting the film for defects and imperfections as the film is unwound from a magazine. A method of preparing a roll of...
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6913404 |
Film processing solution cartridge and method for developing and digitizing film
A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution...
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6910815 |
Photosensitive material processing apparatus
The present invention provides a photosensitive material processing apparatus in which a photosensitive material is processed with a processing solution. Reliable liquid displacement in the...
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6910816 |
Digital film processing method
A method of developing a latent image on a photographic element (such as imagewise exposed photographic film) by absorbing a dye precursor into the film, applying a developer solution to the film...
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6905267 |
Method for reducing consumption of plate processing fluid
Disclosed herein are a method and apparatus for efficiently processing workpieces which are developed using a liquid developer. According to the invention a first set of workpieces is obtained from...
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6905266 |
Wire wound applicator for developing fluid on a lithographic printing plate
The invention relates to the application of a uniform film of a fluid to the surface of a flat workpiece as it is being conveyed through a workstation. The invention is specifically directed to the...
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6902330 |
Printing plate processing apparatus
A printing plate processing apparatus provides a step in which a printing plate which has undergone image exposure is processed by being immersed in a developing solution, and the printing plate is...
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6872014 |
Method for developing a photoresist pattern
The present invention relates to a method for developing a photoresist pattern. The method consists of mixing a concentrated chemical solution with a solvent to obtain a diluted chemical solution...
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6869234 |
Developing apparatus and developing method
A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (810). One end of a rinsing liquid supply nozzle (840) is rotatably supported by...
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6860656 |
Photographic processing system having a vacuum platen
The present invention relates to a photographic processing system and a method of processing photographic media, wherein a conveying member having slots therein is provided on top of a vacuum...
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6799907 |
Plasma enhanced method for increasing silicon-containing photoresist selectivity
Provided is a method for increasing an etching selectivity of photoresist material. The method initiates with providing a substrate with a developed photoresist layer. The developed photoresist...
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6799908 |
Developer unit having metering roller for wet-type color image forming apparatus
A developer unit for a wet-type color image forming apparatus. The developer unit includes a developer bath filled with a liquid developing agent to a predetermined depth, and a developing roller...
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6793418 |
Method and apparatus for applying a film of fluid onto a flat surface and specifically onto a lithographic printing plate in a developing station
The invention relates to the application of a uniform film of a fluid to the surface of a flat workpiece as it is being conveyed through a workstation. The invention is specifically directed to the...
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6793417 |
System and method for digital film development using visible light
One embodiment is a system for the development of a film includes an infrared light source and a visible light source. The system also includes at least one sensor operable to collect a first set...
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6770424 |
Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms
Methods and apparatus for controllably dispensing fluids within wafer track modules using rotatable liquid dispense arms and nozzles. The fluid dispense apparatus may be specifically selected for...
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6758613 |
Method and system for environmental control during film processing
A method and system for environmental control in film processing is disclosed. In general, photographic film is coated with a processing solution, such as a developer solution, and is then...
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6758612 |
System and method for developer endpoint detection by reflectometry or scatterometry
A system for regulating (e.g., terminating) a development process is provided. The system includes one or more light sources, each light source directing light to one or more patterns and/or...
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6749351 |
Apparatus for developing substrate
A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing...
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6739769 |
Photographic film developing apparatus
A photographic film developing apparatus maintains a photographic film, a developer solution and a second processing solution at a specific temperature while performing film development operation...
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6736556 |
Substrate processing apparatus
A resist coating unit includes a coater cup surrounding a wafer W held by a spin chuck and an air supply mechanism for blowing an air into the coater cup. The air supply mechanism includes a hollow...
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6733960 |
Digital film processing solutions and method of digital film processing
An aqueous developer solution for use in digital film processing. The developer solution includes a developing agent and at least one surfactant or thickener. A method of processing a photographic...
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6709174 |
Apparatus and method for development
A solution-receiving plate having solution-passing holes for passing a developer solution therethrough toward the back side of the plate is provided. Respective surfaces of the solution-receiving...
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6706321 |
Developing treatment method and developing treatment unit
The present invention relates to a method of supplying a developing solution to a surface of a substrate to perform developing treatment for the substrate, comprising a first step of supplying the...
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6705777 |
System and method for digital film development using visible light
One aspect of the invention is a system for digital dye color film processing. In one embodiment, a developer station applies a processing solution to film to initiate development of metallic...
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6629786 |
Active control of developer time and temperature
A system for regulating the time and temperature of a development process is provided. The system includes one or more light sources, each light source directing light to one or more gratings being...
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6619863 |
Method and system for capturing film images
A monobath solution is coated onto undeveloped film to produce a developed image within the film. The coated film is scanned to produce an electronic representation of the developed image. The...
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6582137 |
Polyimide coating process with dilute TMAH and DI-water backrinse
An apparatus is disclosed for coating a semiconductor wafer with polyimide so that excess polyimide is removed from the wafer edge, back side and coating process area and is conveniently drained. A...
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6572285 |
Photoresist developing nozzle, photoresist developing apparatus, and photoresist developing method
A photoresist developing nozzle, a photoresist developing apparatus and a photoresist developing method capable of effecting uniform development are provided even in the case of a large diameter...
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6558052 |
System and method for latent film recovery in electronic film development
Recovering the dye image on film in electronic film development following a latent holding stage obviates the problem common in prior art electronic film development of film image destruction....
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6554506 |
Method and apparatus for processing photographic material
The method and apparatus supplies processing solution directly to the surface of a web of sensitized material by means of a movable applicator. The web and applicator are moved relative to each...
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6550990 |
Substrate processing apparatus and processing method by use of the apparatus
An apparatus for processing a substrate comprising a substrate holding mechanism for holding the substrate substantially horizontally, a chemical solution discharge/suction mechanism having a...
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