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7619184 |
Multi-parameter process and control method
A method and system for generating control settings for a multi-parameter control system. The interdependencies of processing tools and the related effect on semiconductor wafers within a...
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7616872 |
Temperature measurement and heat-treating methods and systems
Temperature measurement and heat-treating methods and systems. One method includes identifying a temperature of a first surface of a workpiece, and controlling energy of an irradiance flash...
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7608802 |
Heating device for heating semiconductor wafers in thermal processing chambers
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer....
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7598150 |
Compensation techniques for substrate heating processes
Methods for compensating for a thermal profile in a substrate heating process are provided herein. In one embodiment, a method of processing a substrate includes determining an initial thermal...
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7554059 |
Heater unit and semiconductor manufacturing apparatus including the same
A ceramic heater attaining more uniform temperature distribution from the start to the end of cooling is provided. Further, in a cooling module used for cooling the heater, liquid leakage during...
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7528349 |
Temperature stabilization for substrate processing
A temperature stabilization system, method, composition of matter and substrate processing system are disclosed. A heat absorbing material is disposed in thermal contact with a substrate. The heat...
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7528347 |
Cooling device and heat treating device using the same
A heat treating device ( 50 ) has a cooling sleeve that covers a treating vessel ( 56 ) and a heater ( 100 ). The cooling sleeve has a cylindrical base member ( 110 ) and a cooling pipe ( 112 )...
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7525068 |
Heating system of batch type reaction chamber and method thereof
A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right...
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7522823 |
Thermal processing apparatus, thermal processing method, and substrate processing apparatus
In a thermal processing unit, a substrate is held by a local transport hand to be transported between a transfer section and a heating unit, and subjected to a heat processing by the heating unit....
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7509035 |
Lamp array for thermal processing exhibiting improved radial uniformity
A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them....
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7491913 |
Bake apparatus for use in spin-coating equipment
Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly...
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7489858 |
Heater assembly
A heater is disclosed. The comprises a housing; a reflector; and a pair of opposite connectors supported by the reflector and configured to support opposite ends of a heating element. The reflector...
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7466907 |
Annealing process and device of semiconductor wafer
A device for use in a thermal annealing process for a wafer (T) of material chosen among the semiconductor materials for the purpose of detaching a layer from the wafer at an weakened zone. During...
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7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear...
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7432475 |
Vertical heat treatment device and method controlling the same
A vertical heat processing apparatus includes a process chamber ( 5 ) defining a process field (A 1 ) configured to accommodate a plurality of target substrates (W) supported at intervals in a...
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7429717 |
Multizone heater for furnace
The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor...
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7429718 |
Heating and cooling of substrate support
A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body...
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7404670 |
Analytical furnace with predictive temperature control
An analytical furnace includes a predictive temperature control which is trained to model crucible temperature during analysis by employing a pair of temperature sensors, with one sensor being...
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7402778 |
Oven for controlled heating of compounds at varying temperatures
An oven is provided for curing or reflowing compounds on objects, such as lead frames or other substrates. The oven comprises a heating chamber, a heating assembly mounted in thermal communication...
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7398014 |
Enhanced rapid thermal processing apparatus and method
A heating arrangement heats a first major surface of a workpiece with an illumination energy such that a first portion of the illumination energy is directly incident upon the first major surface...
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7389903 |
Device and method for soldering contacts on semiconductor chips
A device for soldering contacts on semiconductor chips. A chip is held on a chip mount by a chuck and is heated from a side facing away from the wafer by means of a radiation source, so that a...
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7381928 |
Thermal processing apparatus and thermal processing method
A light source including a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between...
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7378618 |
Rapid conductive cooling using a secondary process plane
A method and apparatus for thermally processing a substrate is described. The apparatus includes a substrate support configured to move linearly and/or rotationally by a magnetic drive. The...
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7371998 |
Thermal wafer processor
A thermal processor may include a cooling jacket positionable around a process chamber within a process vessel or jar. A heater can move into a position substantially between the process chamber...
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7371997 |
Thermal processing apparatus and thermal processing method
In a thermal processing apparatus, using a lamp for heating a substrate, an opening is formed for a camera unit, which is used to image portions of an auxiliary ring supporting the substrate, to...
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7358462 |
Apparatus and method for reducing stray light in substrate processing chambers
A method and apparatus for heating semiconductor wafers in thermal processing chambers is disclosed. The apparatus includes a non-contact temperature measurement system that utilizes radiation...
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7351936 |
Method and apparatus for preventing baking chamber exhaust line clog
A method and apparatus involve providing a supply of nitrogen gas, heating the supply of nitrogen gas to a temperature, and ejecting the heated nitrogen gas through the exhaust line of the baking...
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7346273 |
Substrate processing equipment
It is an object of the invention to provide a substrate processing equipment that can predict a temperature of a substrate and easily control temperature of the substrate. Formed in a reactor...
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7335858 |
Toaster using infrared heating for reduced toasting time
A toaster uses radiant heat at infrared wavelengths optimized for producing rapid and uniform toasting of a food product. The infrared wavelengths of the radiated heat are selected for optimum...
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7335267 |
Heat treating apparatus having rotatable heating unit
An apparatus includes a stationary supporting base for mounting a semiconductor wafer thereon, and a rotatable heating unit having a plurality of heating lamps located above the wafer. The...
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7332691 |
Cooling plate, bake unit, and substrate treating apparatus
A bake unit includes a cooling plate for cooling a substrate and a lift pin assembly for loading a substrate on the cooling plate. When a wafer is cooled on the cooling plate, a guide groove is...
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7324745 |
Seat trim heater
The device is a seat trim heater. It employs electric infrared lamps to heat the seat trim before the trim is placed over the frame and cushion material of the seat. The device consists of a basic...
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7321722 |
Method for thermal processing a semiconductor wafer
A method for thermal processing a semiconductor wafer is disclosed. A rapid thermal processing (RTP) chamber encompasses a heating means, a rotation means, and a cooling system for cooling walls of...
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7317172 |
Bake system
Provided is a bake system. The bake system includes a heating plate having a heating plate having a substrate on an upper surface. A case is disposed below the heating plate to support the heating...
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7311779 |
Heating apparatus to heat wafers using water and plate with turbolators
Embodiments of the invention provide a fluid processing method and apparatus. The apparatus includes a substrate support assembly positioned in a processing volume, a disk shaped member positioned...
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7312422 |
Semiconductor batch heating assembly
A heat treatment apparatus for use in batch heating/wafer processing is provided, which comprises a process chamber for receiving a wafer boat, at least a heating element comprising a substrate...
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7274867 |
System and method for determining the temperature of a semiconductor wafer
A system and method for determining the temperature of a semiconductor wafer at the time of thermal contact of the semiconductor wafer with a temperature sensing element. According to the...
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7274006 |
Heater
A heater includes a heating member formed in a plate shape that includes a substrate-heating surface on which a substrate is mounted and a heating member rear surface which is on the opposite side...
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7262390 |
Apparatus and adjusting technology for uniform thermal processing
An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating...
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7256370 |
Vacuum thermal annealer
A vacuum thermal annealing device is provided having a temperature control for use with various materials, such as semiconductor substrates. A vacuum is used to remove air and outgas residual...
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7239804 |
Cooling device, and apparatus and method for manufacturing image display panel using cooling device
A method for manufacturing an image display panel includes the steps of heating a substrate for the image display panel having a different-emissivity member on at least a part of one surface of the...
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7238920 |
Modular bat warming system
Disclosed is a baseball and/or softball bat warmer system. Each individual bat heater includes an elongated outer tubular member having a closed bottom surface. An inner tubular member is spaced...
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7218847 |
Heating unit for heating a workpiece with light-absorbing heat conducting layer
A heating unit heats a work piece 6 by heat conduction from a heat conducting plate 4 on which light from a light source 1 is irradiated, wherein the heat conducting plate 4 comprises a...
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7211769 |
Heating chamber and method of heating a wafer
A heating chamber which can be used during a reflow process to form a metal wiring having a multi-layered writing structure and a method of heating a wafer using the same, are provided. The heating...
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7204887 |
Wafer holding, wafer support member, wafer boat and heat treatment furnace
The present invention provides a wafer holder, a wafer support member, a wafer boat and a heat treatment furnace, which are capable of sufficiently suppressing slip dislocations, without lowering...
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7197239 |
Seat dewrinkling method and apparatus
A system and method for removing wrinkles from the covering material of seats for automobiles and other vehicles. The invention may be implemented in a seat dewrinkling oven that includes front and...
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7173216 |
LED heat lamp arrays for CVD heating
A reactor chamber is positioned between a top array of LED heat lamps and a bottom array of LED heat lamps. The LED heat lamps forming the top and bottom arrays are individually or controllable in...
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7166187 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling
The present invention is directed to a semiconductor thermal processing system and an apparatus for thermally cooling a semiconductor substrate. According to one aspect of the present invention, a...
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7159535 |
Apparatus for heating and curing powder coatings on porous wood products
An improved apparatus is provided for curing powdered coatings on the face of porous wood products, such as medium density fiberboard (MDF), wherein a pair of inclined infrared catalytic heaters...
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7141763 |
Method and apparatus for rapid temperature change and control
An apparatus and a method for controlling the temperature of a substrate during substrate processing. The apparatus comprises a substrate table having a thermal surface supporting the substrate....
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