Matches 351 - 400 out of 419 < 1 2 3 4 5 6 7 8 9 >
Match Document Document Title
5917932 System and method for evaluating image placement on pre-distorted masks  
Process steps are provided to analyze image placement on a pre-distorted lithographic mask produced by a lithographic system. Obtain metrology data, form a reference array equal to the design...
5912983 Overlay accuracy measuring method  
The method of the present invention is used to measure overlay accuracy between a first pattern including a plurality of marks formed on a substrate and a second pattern including a plurality of...
5890807 Method for identifying an apparatus or device utilizing a randomly produced characteristic thereof  
A method identifying components is disclosed. Measured values of a randomly produced property of the component are recorded. The measured values are biuniquely assigned to the component by means of...
5884242 Focus spot detection method and system  
A method and system for detecting focus spots. Data from a file created during stepper operation is extracted to get field coordinate position, leveling scheme, and tilt with respect to the x- and...
5883663 Multiple image camera for measuring the alignment of objects in different planes  
A multiple image camera for measuring the alignment of objects in different planes. The camera includes two coupled imaging devices configured to directly image objects in different planes without...
5862058 Optical proximity correction method and system  
An optical proximity correction method and system are disclosed that allows for the correction of line width deviations caused by nonlinear lithography tools by calculating required chrome on glass...
5849440 Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same  
A process for fabricating a semiconductor device includes the formation of a lithographic reticle (20) having a lithographic pattern (18) overlying a reticle substrate (10). In one embodiment, a...
5804340 Photomask inspection method and inspection tape therefor  
A method of inspecting a photomask for use in photolithography which accounts for the rounding of corners of features that occurs during manufacture of the photomask. A data tape used in the...
5801954 Process for designing and checking a mask layout  
A process for designing and checking a mask layout is provided. A mask layout is generated from a binary mask layout design. An aerial image of the mask layout is then calculated using simulation...
5795688 Process for detecting defects in photomasks through aerial image comparisons  
The present invention provides a process for performing automatic inspection of advanced design photomasks. In a preferred embodiment, an aerial image of a portion of a photomask is generated. A...
5781656 Method and apparatus for inspecting patterns composed of reticle data  
A method and apparatus for inspecting patterns of reticle data includes carrying out a sizing process in which source data for designing a given device are combined with each other; carrying out a...
5773180 Measuring method of a relative positional deviation of reticle pattern  
In a projection exposure apparatus which exposes a semiconductor wafer, a reticle is set on a reticle stage, a wafer is set on a wafer stage, and a reticle pattern is projected and exposed on a...
5770337 Method of inspection to determine reticle pitch  
A reticle, for use in a stepper, and a method for using the reticle are provided. The reticle is used in performing the method for inspecting for the leveling of the reticle with respect to a...
5744381 Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof  
A pattern defect inspection apparatus comprises a light irradiating portion, a light receive element, a light receive element amplifier, a preparation portion for preparing multi-valued design...
5745168 Hole-size measuring system for CRT black matrix layer  
A hole-size measuring system that enables measurement of the size of individual holes of a black matrix layer of a CRT. This system includes an imaging device for producing an enlarged image of...
5663893 Method for generating proximity correction features for a lithographic mask pattern  
A method for synthesizing correction features for an entire mask pattern that initially divides mask pattern data into tiles of data--each tile representing an overlapping section of the original...
5650854 Method of checking defects in patterns formed on photo masks  
Disclosed is a patten defect checking method which is affected neither by the presence of a correction pattern or an auxiliary pattern nor by the waveguide effect and which makes it always possible...
5641960 Circuit pattern inspecting device and method and circuit pattern arrangement suitable for the method  
A circuit pattern inspection device includes a stage on which circuit patterns to be inspected are arranged so as to be symmetrical about a center of the stage about which the stage can rotate, a...
5640539 IC analysis system having charged particle beam apparatus for improved contrast image  
The object of the invention is to provide an IC analysis system having a charged particle beam apparatus in which the operability and picture quality have been enhanced and the measurement method...
5640200 Golden template comparison using efficient image registration  
Golden Template Comparison (GTC) is a method that can be applied to flaw and defect detection in images of 2-dimensional scenes. When a test image is compared to a golden template image, the images...
5600733 Method for locating eye points on objects subject to size variations  
A novel method for locating eye point features on patterns or objects whose size varies between the reference object and the find object includes generating a set of reference vectors that define...
5570431 Process and apparatus for automatically characterizing, optimizing and checking a crack detection analysis method  
Quantitative characterization of a crack detection analysis method is achieved by determining the detection sensitivity and background noise produced by the analysis method by suitably processing...
5568563 Method and apparatus of pattern recognition  
A pattern recognition apparatus and method in which a set is produced which includes a fundamental pattern vector on a basis place and other fundamental pattern vectors of the patterns displaced...
5537487 Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure  
A method of dividing a block pattern for use in a block exposure, to be implemented on a computer, divides an arbitrary block which is to be formed in a block mask that is used for the block...
5481624 Mask inspecting method and mask detector  
A mask inspecting method for inspecting defects of a phase-shifting mask comprises the steps of converting pattern data of a designed circuit pattern to pattern data for a phase-shifting mask,...
5475766 Pattern inspection apparatus with corner rounding of reference pattern data  
A pattern inspection apparatus for comparing/collating a test target pattern with a corresponding design pattern to detect the presence/absence of a defect which is present in the test target...
5442714 Design rule checking method and a method of fabricating a phase shift mask  
In a design rule checking method of the invention, pattern data for forming one layer is divided into two types of pattern data for an A layer and a B layer. Then, A rules to be satisfied by the...
5410400 Foreign particle inspection apparatus  
A foreign particle inspection apparatus includes a detection optical system (4) for condensing scattered light generated by slant illumination (2) by an optical system (41) with a NA of more than...
5404410 Method and system for generating a bit pattern  
A pattern defect inspection apparatus according to this invention comprises an irradiation circuit for irradiating a substrate on which a given pattern is drawn, a detector circuit for detecting...
5379348 Pattern defects inspection system  
A pattern defects inspection system inspects the presence/absence of pattern defects in a photomask as an object to be inspected in which a chromium pattern and a phase shift pattern are formed...
5347592 Pattern judging method and mask producing method using the pattern judging method  
A pattern judging method which is to be implemented on a computer automatically determines whether or not a pattern should be prohibited from being formed in a mask. The pattern judging method...
5287290 Method and apparatus for checking a mask pattern  
A method and an apparatus for checking a mask pattern including a plurality of mask pattern regions formed based on different design pattern rules. The method includes the steps of: defining each...
5272116 Method for pattern defect correction of a photomask  
A pattern defect correction method of a photomask includes the steps of directing a focused ion beam to scan a small region including a pattern defect after a planarization film is formed on a...
5125040 Inspection method of photomask reticle for semiconductor device fabrication  
A method of inspecting a photomask reticle for the fabrication of a semiconductor device such as a die having a first pattern which has its own individual shape and a plurality of second patterns...
5095447 Color overlay of scanned and reference images for display  
A laser pattern inspection and/or writing system which writes or inspects a pattern on a target on a stage, by raster scanning the target pixels. Inspection can also be done by substage...
5095511 Apparatus for verifying pattern data used in a step-and-repeat process for producing the same patterns regularly arranged on a substance  
Chip pattern data, regarding a chip pattern including a chip circuit pattern, a scribe frame pattern which surrounds the chip circuit pattern and which becomes an overlapped region between the chip...
5046109 Pattern inspection apparatus  
An apparatus for inspecting a pattern formed on an object such as a mask or a reticle in accordance with design data includes a character extraction circuit that employs a multiplicity of templates...
5029222 Photoelectron image projection apparatus  
A photoelectron image projection apparatus has a device for detecting an image of a pattern of a mask within a predetermined projection region of the mask. An image signal describing the detected...
4965842 Method and apparatus for measuring feature dimensions using controlled dark-field illumination  
A method and apparatus for measuring feature dimensions uses selective dark-field illumination to illuminate a target from a single direction at a low angle to the plane of the target. Opposing...
4962423 Mark detecting method and apparatus  
Mark detecting method and apparatus usable, for example, in a semiconductor exposure apparatus such as a stepper for printing a pattern of a reticle upon a semiconductor wafer, for detecting, by...
4962541 Pattern test apparatus  
Disclosed is a pattern test apparatus for detecting a fault on the basis of comparison/collation between a test reference pattern and a test target pattern, the apparatus being arranged such that a...
4955062 Pattern detecting method and apparatus  
A pattern detecting method for accurately detecting the position of a center of an image of a pattern is disclosed. The method includes the steps of forming an image of a pattern on an image pickup...
4926489 Reticle inspection system  
An automatic inspection system including an illuminator for illuminating a reticle or photomask to be inspected, while optically projecting a magnified image of the reticle or photomask onto a...
4922308 Method of and apparatus for detecting foreign substance  
A method of and an apparatus for detecting a fine foreign substance in which the surface of a specimen is illuminated with linearly-polarized laser beam to detect light scattered from the surface...
4870693 Mask inspecting apparatus  
A pattern forming apparatus for inverting at least one of plural patterns according to numerical design data respectively representing the plural patterns and synthesizing thus inverted pattern...
4811409 Method and apparatus for detecting defect information in a holographic image pattern  
A method and an apparatus detect in a light pattern the presence of defects (10') in a photomask (10) to which the light pattern corresponds. An inspection area (36) that includes the light pattern...
4809341 Test method and apparatus for a reticle or mask pattern used in semiconductor device fabrication  
A test method and apparatus for a reticle/mask pattern used for a semiconductor fabrication is disclosed for a case in which the reticle/mask pattern is modified from the original design data and...
4805123 Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems  
A photomask and reticle inspection method and apparatus wherein a selected surface area of an object is inspected and a first stream of data having signal values representing the image content of...
4794646 Charged beam pattern defect inspection apparatus  
A charged beam pattern defect inspection apparatus for inspecting pattern defects on materials such as masks or wafers comprising: a collecting charged beam irradiation apparatus including scanning...
4765744 Method for testing a photomask  
A photomask comprises a tested pattern (P 1 , P 2 ) and a synchronization pattern (SP 1 .about.SP 8 ). The synchronization pattern is used for synchronizing a scanning signal (S 9 ), obtained from...
Matches 351 - 400 out of 419 < 1 2 3 4 5 6 7 8 9 >