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7300729 |
Method for monitoring a reticle
Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a...
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7302091 |
Method and apparatus for determining defect detection sensitivity data, control method of defect detection apparatus, and method and apparatus for detecting defect of semiconductor devices
A method of determining defect detection sensitivity data, comprises: taking image data from the desired surface areas of each of semiconductor devices, processing at least two of the image data...
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7302090 |
Method and device for determining the properties of an integrated circuit
Process for determination of properties, particularly, the integrity, of an integrated circuit by calculation, wherein a calculation-simulated image of the circuit is compared with a design of the...
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7297453 |
Systems and methods for mitigating variances on a patterned wafer using a prediction model
Disclosed are systems and methods for mitigating variances (e.g., critical dimension variances) on a patterned wafer are provided. In general, variances of a patterned wafer are predicted using one...
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7289231 |
Apparatus and method for determining physical properties of a mask blank
An apparatus for determining physical properties of a mask blank. The apparatus includes, for example, an illumination device for radiating a predetermined light laterally into the mask blank, a...
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7289657 |
Method of inspecting photo-mask
Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask...
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7289658 |
Removal of relatively unimportant shapes from a set of shapes
A method for reducing a number of shapes, and a computer readable program code adapted to perform said method. The method forms first and second shape patterns. The second shape pattern includes...
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7286284 |
Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging...
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7283659 |
Apparatus and methods for searching through and analyzing defect images and wafer maps
Disclosed are methods and apparatus for automatically organizing and/or analyzing a plurality of defect images without first providing a predefined set of classified images (herein referred to as a...
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7252913 |
Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer
A simulation is carried out of a projection based on an electronically stored circuit pattern and adjustable projection parameters and optical parameters which characterize the specific...
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7249343 |
In-plane distribution data compression method, in-plane distribution measurement method, in-plane distribution optimization method, process apparatus control method, and process control method
After a process is performed on a substrate, the in-plane distribution over the substrate is measured. Measured data of the in-plane distribution which is obtained by the measurement is stored. A...
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7243331 |
Method and system for controlling the quality of a reticle
A method and system are presented for use in controlling the quality of a reticle. The method includes processing and analyzing reference data and test data, and generating output data indicative...
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7239735 |
Pattern inspection method and pattern inspection device
In this pattern inspection device, the optical scanning section scans the inspected pattern using a laser beam. A photoelectric image processing section generates an image of the inspected pattern....
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7233887 |
Method of photomask correction and its optimization using localized frequency analysis
A method of level assist feature OPC layout is described using frequency model-based approach. Through low-pass spatial frequency filtering of a mask function, the local influence of zero...
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7234128 |
Method for improving the critical dimension uniformity of patterned features on wafers
A method for improving the critical dimension uniformity of a patterned feature on a wafer in semiconductor and mask fabrication is provided. In one embodiment, an evaluation means for evaluating...
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7228257 |
Architecture for general purpose programmable semiconductor processing system and methods therefor
A method of optimizing a set of steps in a semi-conductor processing system comprising a software control program, wherein the semi-conductor processing system includes a first function, a second...
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7220969 |
Mask blanks inspection tool
Embodiments include determining whether defects exist in an extreme ultraviolet (EUV) light mask blank. Incident EUV light scattered or diffused by abnormalities in the layers of the mask blank may...
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7221788 |
Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system
A method of inspecting a mask or reticle, the mask or reticle being provided with a pattern to be transferred onto a semiconductor wafer, the pattern having a defect, includes the step of creating...
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7215808 |
High throughout image for processing inspection images
Disclosed is an image processing system for analyzing images of a specimen to determine whether the specimen contains defects. The system includes a plurality of processors for receiving image data...
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7209584 |
Pattern inspection apparatus
A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in...
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7200257 |
Structure and methodology for fabrication and inspection of photomasks
A photomask, method of designing, of fabricating, of designing, a method of inspecting and a system for designing the photomask. The photomask, includes: a cell region, the cell region comprising...
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7200833 |
Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method
A method in which a desired pattern is compared with a finish pattern to be formed on a wafer, which is predicted from a design pattern, based on a calculation of a light beam intensity, and a...
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7190823 |
Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
An overlay vernier pattern for measuring multi-layer overlay alignment accuracy and a method for measuring the same is provided. A distance between a first alignment mark in a first material layer...
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7187796 |
Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication
The present invention relates to monitoring and controlling a reticle fabrication process (e.g. employed with an electron beam lithography process). A typical fabrication process involves discrete...
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7183025 |
Phase difference specifying method
A phase shift mask comprises first and second mask patterns. The first mask pattern is a backing film enabling a first optical image to be formed on a substrate. The first optical image forms a...
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7181707 |
Method of setting process parameter and method of setting process parameter and/or design rule
Disclosed is a method of setting a process parameter for use in manufacturing a semiconductor integrated circuit, comprising correcting a first pattern by using process parameter information to...
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7179568 |
Defect inspection of extreme ultraviolet lithography masks and the like
A dark-field imaging method for detecting defects in reflective lithography masks (e.g., extreme ultraviolet (EUV) masks) used, e.g., in processes for the fabrication of microelectronic devices. A...
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7175940 |
Method of two dimensional feature model calibration and optimization
A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system. The method includes the steps of: (a) defining...
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7175952 |
Method of generating mask distortion data, exposure method and method of producing semiconductor device
A method of generating mask distortion data capable of improving accuracy of distortion measurement, an exposure method using the same and a method of producing a semiconductor device, wherein a...
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7171034 |
Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography
A method for detecting phase and amplitude error of an alternating phase shifting mask is disclosed. In an exemplary embodiment, the method includes passing a collimated light beam through a pair...
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7167582 |
Mask inspection method, mask defect inspection system, and method of production of mask
A method of inspection for detecting pattern defects in a mask used for transferring a predetermined pattern of regions passing and blocking an exposure beam, comprising the steps of presetting...
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7162071 |
Progressive self-learning defect review and classification method
A progressive self-learning (PSL) method is provided for enhancing wafer or mask defect inspection review and classification by identifying a plurality of wafer or mask defects, and by classifying...
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7160650 |
Method of inspecting a mask
The invention relates to a method of inspecting a mask comprising the steps: patterning a semiconductor material with a reference mask, patterning the semiconductor material with the mask as the...
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7155052 |
Method for pattern inspection
A method for inspecting a patterned surface employs reference data related to the pattern to provide a map for identifying regions which are expected to generate equivalent images. These regions...
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7152219 |
Reference image generation from subject image for photolithography mask analysis
A reference image is generated from a subject image of at least a portion of a photolithography mask to enable a photolithography mask inspection and analysis system that otherwise cannot generate...
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7151855 |
Pattern measurement method, manufacturing method of semiconductor device, pattern measurement apparatus, and program
A pattern measurement method includes acquiring graphic data of a plurality of patterns including image data; processing the graphic data to detect a coordinate of an edge point of the pattern;...
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7149340 |
Mask defect analysis for both horizontal and vertical processing effects
A method and system for detecting defects in a physical mask used for fabricating a semiconductor device having multiple layers is disclosed, where each layer has a corresponding mask. The method...
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7146035 |
Pattern image comparison method, pattern image comparison device, and program
A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input...
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7139996 |
Mask pattern correction apparatus and mask pattern correction method and mask preparation method and method of production of a semiconductor device
By correcting an optical proximity effect with respect to design patterns by an optical proximity effect correcting means and simulating patterns after the correction of optical proximity effect by...
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7133548 |
Method and apparatus for reticle inspection using aerial imaging
A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool...
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7133549 |
Local bias map using line width measurements
A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time....
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7131100 |
Identifying phantom images generated by side-lobes
Features of a mask, when close enough to one another, can cause unwanted phantom images to print on an integrated circuit. Advantageously, potential locations of phantom images can be automatically...
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7123356 |
Methods and systems for inspecting reticles using aerial imaging and die-to-database detection
Methods and systems for inspecting a reticle are provided. In an embodiment, a method may include forming an aerial image of the reticle using a set of exposure conditions. The reticle may include...
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7120285 |
Method for evaluation of reticle image using aerial image simulator
A method of evaluating a wafer structure formation process includes extracting the outline of an actual mask pattern, and simulating a lithographic process using the actual mask pattern to obtain a...
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7116814 |
Image-based container defects detector
The image-based container defects detector consists of a plurality of camera units, a sensor unit, a frame grabber, and an image recognizer unit. The sensor unit serves to detect the vehicles...
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7116815 |
Chrome-less mask inspection method
A chrome-less mask inspection method is provided. The chrome-less mask at least includes a transparent region and a phase shift region. The method includes providing a database having a mask...
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7113630 |
PICA system detector calibration
Methods, apparatus and data structures useful in correcting PICA image data are described. An exemplary method comprises acquiring optical image data of a target having identifiable optical-image...
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7106896 |
ID recognition apparatus and ID recognition sorter system for semiconductor wafer
A semiconductor wafer ID recognition apparatus includes an image sensing optical section and recognition processing section. The image sensing optical section reads at least one identification...
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7106895 |
Method and apparatus for inspecting reticles implementing parallel processing
Disclosed is an apparatus for analyzing a plurality of image portions of at least a region of a sample. The apparatus includes a plurality of processors arranged to receive and analyze at least one...
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7103209 |
Method for extracting objective image
Noted portions of an image, such as a pin point hole in an isolated area or a pattern contour that forms a continuous boundary area, are clearly displayed by first erasing background noise by...
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