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9036772 Mirror for the EUV wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective  
A mirror for the EUV wavelength range (1) having a layer arrangement (P) applied on a substrate (S), the layer arrangement having a periodic sequence of individual layers, where the periodic...
8976927 Substrate for mirrors for EUV lithography  
Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body (2) and a polishing layer (3). The polishing layer (3) has a thickness of less than 10 μm...
8944615 Projection objective and method for its manufacture  
A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each...
8928972 Reflective optical element for EUV lithography  
A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system (4) of at least two alternating...
8930859 Method of decomposing layout of semiconductor device  
Embodiments relate to a method of decomposing a layout of a semiconductor device. The method may include generating a pattern layout including first patterns and second patterns, generating an...
8891732 Apparatus and method for detecting marks and semiconductor device processing system  
The present invention discloses an apparatus and a method for detecting a mark as well as a semiconductor device processing system. In order to address the problem existing in the prior art that...
8893067 System and method for lithography simulation  
In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs,...
8841625 Method for the detection of the irradiance distribution in an extreme ultraviolet light source device and an extreme ultraviolet light source device  
An extreme ultraviolet light source device, comprising a collector mirror focusing extreme ultraviolet radiation at a focal point, wherein a porous plate having a plurality of through holes...
8831170 Mirror with a mirror carrier and projection exposure apparatus  
A mirror with a mirror carrier, as well as related apparatuses, systems and methods are disclosed. The mirror carrier can be embodied as cooling device with at least one cooling channel. Tube...
8823309 Stage device  
Disclosed is a smaller and lighter stage device which can be applied to a device such as a length measurement SEM for inspecting and/or evaluating a semiconductor, and in which the effect of a...
8817233 Illumination optical system for projection lithography  
An illumination optical system for projection lithography for the illumination of an illumination field has a facet mirror. An optical system, which follows the illumination optical system, has an...
8811568 Correction of optical elements by correction light irradiated in a flat manner  
The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light,...
8804902 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus  
A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an...
8785893 Extreme ultraviolet light source and positioning method of light focusing optical means  
In an extreme ultraviolet (“EUV”) light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image...
8576376 Imaging optical system and projection exposure system for microlithography  
An imaging optical system includes a plurality of mirrors that image an object field in an object plane into an image field in an image plane. At least one of the mirrors is obscured, and thus has...
8542346 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations  
The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations....
8525973 Method and apparatus for printing periodic patterns  
A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features,...
8497977 Optical integrator, illumination optical system, exposure apparatus, and device manufacturing method  
An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source has a first fly's eye optical system having a...
8467032 Exposure apparatus and electronic device manufacturing method  
An exposure apparatus including a field stop is provided. The exposure apparatus includes an illumination optical system that guides light from a light source to a pattern forming section, a...
8411815 Grazing incidence collector for laser produced plasma sources  
Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs...
8368032 Radiation source, lithographic apparatus, and device manufacturing method  
A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section...
8351748 Mask-less method and structure for patterning photosensitive material using optical fibers  
An apparatus for patterning objects for the manufacture of semiconductor integrated circuits includes an optical source, multiple fiber cores coupled to the optical source, each of the fiber cores...
8335039 Method of measuring aerial image of EUV mask  
An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate...
8335038 Apparatus for measuring aerial image of EUV mask  
An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate...
8300205 Apparatus and method for washing alignment film printing mask and method for fabricating a liquid crystal display device  
The present invention relates to an alignment film printing mask, and more particularly, to a jig for an alignment film printing mask. A jig according to the present invention includes a plurality...
8289499 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby  
Spectral purity of a radiation beam of a first wavelength may be improved by providing an optical element that includes a structure having at least first layer including a first material, which...
8229062 Transmission mask with differential attenuation to improve ISO-dense proximity  
A system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined...
8153994 Cooling systems and methods for grazing incidence EUV lightography collectors  
A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling...
8144830 Reflective optical element for EUV lithography device  
A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate...
8121396 Assessing critical dimension and overlay tolerance  
A method for constructing an error map for a lithography process, by constructing a first error map using spatial error data compiled on a lithography tool used in the lithography process, and...
8121254 Optical element, exposure apparatus using this, and device manufacturing method  
On a multilayer film mirror, a protective layer is formed having a varied composition in the depth direction. The protective layer includes an interface side layer formed on a thin film layer,...
8111900 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle  
Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority...
8103984 System and method for compressed design phase contour data  
According to various embodiments of the invention, systems and methods are provided for compressed design phase contour data created during the manufacturing of integrated circuits. In one...
8101930 Method of increasing the operation lifetime of a collector optics arranged in an irradiation device  
The present invention relates to a method of increasing the operation lifetime of an optical collector unit (33)) arranged in an irradiation device. The irradiation device at least comprises a...
8064730 Device manufacturing method, orientation determination method and lithographic apparatus  
A method to determine a rotation of a substrate with respect to the patterning device without using a reference mark on the substrate is presented. At least two structures having corresponding...
8051391 Method for layout of random via arrays in the presence of strong pitch restrictions  
Exemplary embodiments provide a method for laying out an integrated circuit (“IC”) design and the IC design layout. In one embodiment, the IC design layout can include a first feature placed on a...
8050380 Zone-optimized mirrors and optical systems using same  
A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation (18) includes a reflective surface (S) having two or more substantially discrete zones (Z1, Z2, . . . Zn)...
7919596 Method of arranging ferritin and method of arranging inorganic particles  
To provide a method of arranging ferritin by which a high rate of the number of the molecular film spots on which sole ferritin molecule was arranged in effect, with respect to total number of the...
7903780 X-ray ablation of hyaluronan hydrogels  
Disclosed is a method for ablating hyaluronan-based hydrogels with X-rays, the method comprising the steps of: (a) preparing hyaluronan-based hydrogels; and (b) performing X-ray irradiation to the...
7897941 Lithographic apparatus, device manufacturing method, and use of a radiation collector  
A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided...
7885387 Extreme ultraviolet light and X-ray source target and manufacturing method thereof  
The present invention is made to provide an extreme ultraviolet light source target or an X-ray source target having a good operationality. An extreme ultraviolet light source target in accordance...
7880153 Extreme ultra violet light source apparatus  
An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which...
RE42065 Illumination system particularly for microlithography  
There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical...
7873935 Method of manufacturing a mask  
A method of manufacturing a mask includes designing a first mask data pattern, designing a second mask data pattern for forming the first mask data pattern, acquiring a first emulation pattern,...
7871744 Near-field exposure apparatus and near-field exposure method  
A near-field exposure apparatus includes a near-field exposure mask and a mechanism places a substrate, to be exposed, opposed to the near-field exposure mask. A mechanism performs relative...
7872244 Lithographic apparatus and device manufacturing method  
A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in...
7872245 Systems and methods for target material delivery in a laser produced plasma EUV light source  
Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline...
7863591 Radiation system and lithographic apparatus comprising the same  
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism...
7859648 Passivation of multi-layer mirror for extreme ultraviolet lithography  
A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the...
7842936 Lithography system and projection method  
The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not...