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7627014 |
Extended wavelength strained layer lasers having nitrogen disposed therein
Several methods are used in novel ways with newly identified and viable parameters to decrease the peak transition energies of the pseudomorphic InGaAs/GaAs heterostructures. These techniques,...
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7602827 |
Semiconductor laser and manufacturing process therefor
There is provided a semiconductor laser comprising an n-InP substrate 1 ; a multilayer film including a strained MQW active layer 6 on the n-InP substrate 1;
a p-electrode 18 on the...
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7601985 |
Semiconductor light-emitting device
A semiconductor light-emitting device includes: a substrate; a first conductivity type layer formed on the substrate and including a plurality of group III-V nitride semiconductor layers of a first...
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7586967 |
Semiconductor laser and method of manufacturing the same
A semiconductor laser manufactured by selective MOVPE growth, in which the lattice relaxation of recombination layers grown on large width portions is suppressed, the leak current is suppressed,...
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7583715 |
Semiconductor conductive layers
Structures and methods for electronic devices with improved conductive regions are provided. The conductive region may include digital alloy superlattice structures, which allow higher doping...
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7577176 |
Surface emitting laser device
An optical resonator including a lower multilayer reflector and an upper multilayer reflector is arranged on a substrate. A strained active layer having a multiple quantum well structure formed...
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7573074 |
LED electrode
An electrode structure is disclosed for enhancing the brightness and/or efficiency of an LED. The electrode structure can have a metal electrode and an optically transmissive thick dielectric...
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7542201 |
Semiconductor optical amplification device and optical integrated circuit
A semiconductor optical amplification device is disclosed that has a gain spectrum of a wide bandwidth. The semiconductor optical amplification device includes an InP substrate and an active layer...
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7457338 |
Quantum well lasers with strained quantum wells and dilute nitride barriers
In accordance with the present invention, GaAs-based optoelectronic devices have an active region that includes a well layer composed of a compressively-strained semiconductor that is free, or...
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7420202 |
Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device
An electronic device can include a transistor structure of a first conductivity type, a field isolation region, and a layer of a first stress type overlying the field isolation region. For example,...
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7415055 |
Reliability-enhancing layers for vertical cavity surface emitting lasers
Vertical cavity surface emitting lasers (VCSELs) and methods of making the same are described. The VCSELs include reliability-enhancing layers that perform specific functions at one or more...
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7408968 |
Semiconductor laser device and method for fabricating the same
A semiconductor laser device includes: a first light emitting device, the first light emitting device including a first first-conductive-type cladding layer, a first active layer having a first...
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7391800 |
Vertical cavity surface-emitting semiconductor laser device, optical transmission module, optical transmission device, and optical switching method
In a vertical cavity surface-emitting semiconductor laser device, first and second resonance wavelengths which are different are provided while a first resonator and a second resonator are coupled...
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7378680 |
Migration enhanced epitaxy fabrication of quantum wells
Methods and systems produce flattening layers associated with nitrogen-containing quantum wells and prevent 3-D growth of nitrogen containing layers using high As fluxes. MEE (Migration Enhanced...
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7362786 |
Semiconductor laser element having tensile-strained quantum-well active layer
In a semiconductor laser element, a lower cladding layer of AlGaInP of the first conductive type, a lower optical waveguide layer of AlGaInP, a quantum-well active layer of InGaP, an upper optical...
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7301978 |
Semiconductor laser element with optical waveguide layer having increased thickness
In a semiconductor laser element: a lower cladding layer of In 0.49 (Al x1 Ga 1-x1 ) 0.51 (x2<x1<1) of a first conductive type which lattice-matches with GaAs; a lower optical waveguide layer...
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7280576 |
Type II mid-infrared quantum well laser
A mid-infrared emitting indirect bandgap quantum well semiconductor laser with an optical waveguide structure having an active waveguide core. The active waveguide core comprises at least one...
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7251381 |
Single-mode optical device
A single-mode optical device, including a first region, and a second region laterally disposed about the first region, and including an absorbing layer and an isolation layer between the absorbing...
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7197056 |
Semiconductor laser device and optical disc drive
A 780 nm band semiconductor laser device has an InGaAsP well layer, phosphorous composition of which is 0.51 smaller than 0.55 to prevent spinodal decomposition in growing InGaAsP. A compressive...
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7136406 |
Pseudomorphic layer in tunnel junction VCSEL
A vertical cavity surface emitting laser (VCSEL) includes an indium-based semiconductor alloy substrate, a first mirror stack over the substrate, an active region having a plurality of quantum...
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7113532 |
Semiconductor laser device
A semiconductor laser device is one of AlGaInAs semiconductor laser devices, and has a multi-layer structure with a n-GaAs substrate on which a n-Al 0.3 Ga 0.7 As buffer layer, a n-Al 0.47 Ga 0.53...
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7095770 |
Vertical cavity surface emitting laser including indium, antimony and nitrogen in the active region
Quantum wells and associated barriers layers can be grown to include nitrogen (N), aluminum (Al), antimony (Sb), phosphorous (P) and/or indium (In) placed within or about a typical GaAs substrate...
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7085299 |
High power semiconductor laser with a large optical superlattice waveguide
The invention relates to high power semiconductor diode lasers of the type commonly used in opto-electronics, mostly as so-called pump lasers for fiber amplifiers in the field of optical...
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7045812 |
Technology for increasing bandwidth of semiconductor optical amplifiers/superluminescent diodes using non-identical multiple quantum wells
The present invention provides a technology for increasing the spectral width of semiconductor optical amplifiers, employing different separate confinement heterostructures (SCH's) so as to form...
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7039078 |
Semiconductor optical modulator and laser with optical modulator
In a semiconductor optical modulator of this invention, each quantum-well layer and each barrier layer of a quantum-well structure serving as a light absorption layer are respectively made of In...
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6853661 |
Gain-coupled semiconductor laser device lowering blue shift
A low clad layer made of semiconductor of a first conductivity type is formed on a semiconductor substrate. An active layer is formed on the low clad layer. The active layer is constituted by...
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6816524 |
InGaAsP or InGaAs semiconductor laser element in which near-edge portion of active layer is substituted with GaAs optical waveguide layer having greater bandgap than active layer
In a semiconductor laser element, a lower cladding layer of a first conductive type, a GaAs first optical waveguide layer of the first conductive type or an undoped type, an InGaAsP or InGaAs...
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6795469 |
Semiconductor laser element
In a semiconductor laser element, a lower cladding layer of a first conductive type, a lower optical waveguide layer of the first conductive type or an undoped type, a lower GaAs layer, a...
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6744797 |
Semiconductor laser device
A semiconductor laser device improves reliability during high-power oscillation. An n-type GaAs buffer layer, an n-type In 0.48 Ga 0.52 P lower cladding layer, an n-type or i-type In x1 Ga 1−x1...
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6728283 |
Semiconductor laser and photo module using the same
A semiconductor laser which has an active layer of a lattice strain of less than 2% of a thickness mean on a GaAs substrate and can be used in a long wavelength band of 1.3 μm band or more and a...
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6643306 |
Semiconductor laser device in which compressive strain active layer is sandwiched between tensile strain optical waveguide layers and average strain is limited
In a semiconductor laser device having a substrate and an active region, the active region includes an active layer between tensile strain optical waveguide layers. The active layer includes at...
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6600770 |
High-power semiconductor laser device having current confinement structure and index-guided structure and stably oscillating in single mode
In a semiconductor-laser device: an n-type cladding layer, an optical-waveguide layer, an In x3 Ga 1−x3 As 1−y3 P y3 compressive-strain quantum-well active layer (0<x3≦0.4, 0≦y3≦0.1),...
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6434178 |
Semiconductor laser
A semiconductor laser which can emit at high output, for which the threshold current and efficiency have a low temperature dependence. In GaInAs/GaInAsP semiconductor lasers, the lower the holding...
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6330263 |
Laser diode having separated, highly-strained quantum wells
A semiconductor laser device with separated, highly-strained quantum wells employs highly-strained ternary and quasi-ternary compounds as material for each quantum well. A first device structure...
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6219365 |
High performance aluminum free active region semiconductor lasers
The semiconductor laser emitting light in the wavelength range of about 700 nm to 800 nm utilizes an aluminum-free active region layer. An epitaxial structure is grown on a GaAs or AlGaAs substrate...
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6194742 |
Strain engineered and impurity controlled III-V nitride semiconductor films and optoelectronic devices
In the present invention, an interfacial layer is added to a light-emitting diode or laser diode structure to perform the role of strain engineering and impurity gettering. A layer of GaN or Al x ...
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6154475 |
Silicon-based strain-symmetrized GE-SI quantum lasers
A family of lasers is provided which can be readily grown upon silicon wafer platforms, each laser having a highly doped stably strained SiGe or Ge collector layer formed upon a SiGe graded relaxed...
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6134251 |
Surface emission semiconductor laser
In order to facilitate control of the polarization plane of a laser beam emerging from a surface-emitting-type semiconductor laser in a specific direction and to suppress occurrence of fluctuations...
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6028874 |
Semiconductor laser
A III-V group semiconductor laser includes a first clad layer, a first optical waveguide layer, a first barrier layer, an active layer, a second barrier layer, a second optical waveguide layer and...
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6026107 |
Semiconductor optical functional device and method of driving the same
A semiconductor optical functional device is divided into two regions of a first region 1 and a second region 2 adjacent to each other in a longitudinal direction of a semiconductor optical...
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6011811 |
Buried heterostructure with aluminum-free active layer and method of making same
An epitaxially grown semiconductor heterostructure has an inner region (5) which is substantially laterally confined by confinement regions (9) and has enhanced transverse confinement by enhanced...
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5953362 |
Strain induce control of polarization states in vertical cavity surface emitting lasers and method of making same
A vertical cavity surface emitting laser is formed by eutectically bonding a laser cavity, defined by an active layer disposed between first and second, stacked mirror assemblies, to a host...
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5920079 |
Semiconductive light-emitting device having strained MQW with AlGaInAs barriers
The present invention provides a semiconductive light-emitting device involving a light-emitting layer of the multilayer strained quantum well structure that has a plurality of quantum well layers...
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5903585 |
Optoelectronic devices
A single cavity mode optoelectronic device, such as a VCSEL, an RCLED or a DFB laser diode, comprises an etched-pillar or mesa structure including an optically active region and strain-applying...
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5838706 |
Low-strain laser structures with group III nitride active layers
A Group III nitride laser structure is disclosed with an active layer that includes at least one layer of a Group III nitride or an alloy of silicon carbide with a Group III nitride, a silicon...
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5828684 |
Dual polarization quantum well laser in the 200 to 600 nanometers range
A semiconductor laser source using a strained active layer of an indium gallium aluminum nitride (In x Ga 1 -x-y Al y N) quaternary alloy to obtain semiconductor laser sources that emit TE or TM...
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5812575 |
Semiconductor laser diode
Semiconductor laser diode in which an SCL (Strain Compensated Layer) is formed at an active layer of a 635 nm band semiconductor laser diode for having very low threshold current, is disclosed,...
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5671242 |
Strained quantum well structure
A semiconductor device includes a substrate having a lattice constant and a stress compensation strained quantum well layer including compressively strained layers having a lattice constant larger...
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5666375 |
Semiconductor quantum well laser having a low threshold current density
The present invention gives rise to a 1.3 μm tensile-strained quantum well laser having a quantum well active layer which can be structurally specified as In 1 -x Ga x As y P 1 -y with X between...
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5661742 |
Light emitting diode structure
A light emitting diode comprises a multiple quantum well structure. The light emitting diode has a first conductivity type GaAs substrate, an AlGaInP lower cladding layer of the first conductivity...
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