Matches 1 - 50 out of 597 1 2 3 4 5 6 7 8 9 10 11 12 >
Match Document Document Title
7450365 Electrostatic chuck  
The object of the present invention is to provide an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a...
7446993 Alumina sintered body  
An alumina sintered body comprises an alumina substrate having a first main surface and a second main surface opposing each other, an embedded film electrode made of a metal and embedded in the...
7446284 Etch resistant wafer processing apparatus and method for producing the same  
A wafer processing apparatus is fabricated by depositing a film electrode onto the surface of a base substrate, the structure is then overcoated with a protective coating film layer comprising at...
7436645 Method and apparatus for controlling temperature of a substrate  
A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes an electrostatic chuck coupled to a...
7430104 Electrostatic chuck for wafer metrology and inspection equipment  
An electrostatic chuck is configured for electrostatically securing a wafer while limiting charge on the wafer and physical contact between the electrostatic chuck and the wafer. The electrostatic...
7430037 Reticle cassette and exposure apparatus using reticle cassette  
A reticle cassette includes a bearing portion and a cover, a reticle being disposed on the bearing portion and accommodated in a space between the bearing portion and the cover. The bearing portion...
7422656 Dry etching method and apparatus for use in the LCD device  
A dry etching step during the manufacturing of a substrate for a liquid crystal display (LCD) device is improved by placing the substrate at a predetermined distance away from the lower electrode...
7417236 Sheet beam-type testing apparatus  
An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam...
7416793 Electrostatic chuck and manufacturing method for the same, and alumina sintered member and manufacturing method for the same  
An electrostatic chuck comprises a dielectric ceramic layer made of an alumina sintered body having a volume resistivity equal to or greater than about 1×10 17 Ω·cm at room temperature and a...
7414823 Holder for use in semiconductor or liquid-crystal manufacturing device and semiconductor or liquid-crystal manufacturing device in which the holder is installed  
Affords a holder for use in semiconductor or liquid-crystal manufacturing devices—as well as semiconductor or liquid-crystal manufacturing devices in which the holder is installed—in which...
7411773 Electrostatic chucking device and manufacturing method thereof  
An electrostatic chucking device having a laminated structure formed by sequentially laminating a first insulation layer, an electrode layer, and a second insulation layer on a metal substrate. The...
7408760 Charged particle beam application system  
During the writing operation, the wafer potential is dynamically detected and corrected. By doing so, the positional accuracy of the circuit patterns written on a wafer can be improved. After a...
7407559 Method of producing liquid crystal display devices  
A method of producing a liquid crystal display device. A first substrate having a liquid crystal dripped thereon, and a second substrate, are arranged in a vacuum chamber. The first substrate is...
7403386 Electrostatic chuck  
An electrostatic chuck includes; a base made of ceramics, in which an electrode generating electrostatic attractive force is embedded; a cooling member which contains metal; a bonding material...
7397648 Electrostatic chuck including a heater mechanism  
An electrostatic chuck comprises a main body with a mounting surface and an opposed surface facing away from the mounting surface. At least one chucking electrode extends along the mounting surface...
7394640 Electrostatic chuck and substrate fixing method using the same  
The electrostatic chuck 101 where pairs of electrodes 3 a/ 3 b, 4 a/ 4 b and 5 a/ 5 b to which voltages are applied are embedded in the main body 1 , and where a substrate 110 is placed...
7393433 Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof  
A wiring member which becomes substantially symmetrical on the plane of an electrostatic chuck unit is connected to the tip end of an RF introduction rod between the RF introduction rod and the...
7385799 Offset phase operation on a multiphase AC electrostatic clamp  
A method for clamping a workpiece is provided, wherein a workpiece is placed on a surface of a clamping plate of a multi-polar electrostatic clamp having a plurality of electrodes. A plurality of...
7381293 Convex insert ring for etch chamber  
A new and improved insert ring for a wafer support inside a processing chamber for the processing, particularly dry etching, of semiconductor wafer substrates. The insert ring includes a generally...
7378616 Heating apparatus and method for semiconductor devices  
A heating apparatus and method for heating a semiconductor device during bonding of electrical contacts onto the device is provided, which includes a heating plate that is provided for heating the...
7375947 Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output  
In a plasma reactor having an electrostatic chuck, wafer voltage is determined from RF measurements at the bias input using previously determined constants based upon transmission line properties...
7375946 Method and apparatus for dechucking a substrate  
A method and apparatus for dechucking a substrate is provided. In one embodiment, a processing chamber is provided that includes a grounded chamber body having a substrate support assembly disposed...
7372691 Apparatus and method for joining two substrates  
A substrate attaching device ( 3 ) includes a vacuum chamber ( 31 ), a first electrostatic chuck ( 32 ) at least partly set in the vacuum chamber, and further includes a chuck body ( 321 ) with a...
7372690 Substrate holder which is self-adjusting for substrate deformation  
A wafer chuck is designed to allow the substrate to thermally deform during charged particle beam lithography. The wafer chuck includes a compliant layer disposed over an chuck body. During...
7372689 Guard wafer for semiconductor structure fabrication  
An apparatus (and method for operating the same) which allows tightly coupling the device wafer to the electrostatic chuck of the process chamber after the process chamber is conditioned. The...
7369393 Electrostatic chucks having barrier layer  
An electrostatic chuck for supporting a semiconductor wafer, including: a chuck body having a dielectric region and an insulating region, the insulating region having a higher electrical...
7364624 Wafer handling apparatus and method of manufacturing thereof  
A wafer processing device or apparatus, i.e., a heater or an electrostatic chuck, comprises a planar support platen, a support shaft having centrally located bore, and a pair of electrical...
7361230 Substrate processing apparatus  
In the substrate processing apparatus, a ceramic module for mounting a substrate has a flat plate portion having an electric circuitry and a ceramic base body, and as at least a part of a surface...
7359177 Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output  
A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias power comprising first and second frequency components, f( 1 ), f( 2 ), respectively, and an RF power path...
7352555 Electrostatic chuck  
Provided is an electrostatic chuck, including: a first insulating layer including a heat conductive silicone rubber with a thermal conductivity of at least 0.2 W/mK, which is formed on top of a...
7352554 Method for fabricating a Johnsen-Rahbek electrostatic wafer clamp  
The present invention is directed to a J-R electrostatic clamp (ESC) and method for forming same. The ESC comprises a ceramic layer for clamping a wafer thereto, and a plurality of electrodes...
7336471 Charge eliminating mechanism for stage and testing apparatus  
A charge eliminating mechanism of the invention includes a mechanical switching mechanism (e.g., a POGO pin), and a wiring line so connected as to be able to be electrically connected to the POGO...
7330346 Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus  
The invention provides a means for estimating a self-bias voltage under arbitrary etching conditions via a simple procedure. The present invention provides a method for measuring self-bias voltage...
7327438 Lithographic apparatus and method of a manufacturing device  
A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to...
7317606 Particle trap for electrostatic chuck  
Wafer supporting apparatus, including an electrostatic chuck for supporting the wafer. The apparatus further includes an electrostatic shield which is positioned in proximity to the chuck and the...
7312974 Electrostatic chuck  
The electrostatic chuck includes: a conductive base formed of metal or both metal and ceramics, serving as a chucking electrode; and an insulating film formed on one principal plane of the...
7292428 Electrostatic chuck with smart lift-pin mechanism for a plasma reactor  
A lift pin assembly for use in a reactor for processing a workpiece includes plural lift pins extending generally parallel with a lift direction, each of the plural lift pins having a top end for...
7292427 Pin lift chuck assembly for warped substrates  
A vacuum chuck apparatus may include chuck plate having a substantially flat chucking surface, one or more lift pins, and a lifting mechanism. The lift pins are configured to clamp a substrate at...
7292426 Substrate holding system and exposure apparatus using the same  
A substrate holding system having a chuck for vacuum attraction and electrostatic attraction of a substrate. The system includes a ring-like rim for carrying a substrate thereon, a plurality of...
7283346 Electrostatic chuck and its manufacturing method  
An electrode pattern of an electrostatic chuck includes linear portions in a radial direction and a plurality of concentric C-shaped portions branching out from the linear portions. The linear...
7281491 Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film  
A dielectric-coated electrode having a conductive base material coated with a dielectric on a surface thereof, the dielectric including a first metal atom and a second metal atom. As for an ionic...
7280341 Electrostatic chuck  
An electrostatic chuck is provided in which a lower oxide coating, an electrode, and an upper oxide coating are formed on a substrate. The lower oxide coating is formed by spraying an oxide of Gd,...
7265963 Holding mechanism of object to be processed  
According to the present invention, there is provided a holding mechanism of an object to be processed W, which comprises a relay switch to electrically disconnect a detection circuit having the...
7265962 Electrostatic chuck and production method therefor  
The present invention provides an electrostatic chuck comprising a substrate, a dielectric layer formed by thermal spraying on an upper face of the substrate, an internal electrode embedded in the...
7264699 Workpiece holder for processing apparatus, and processing apparatus using the same  
An inexpensive workpiece holder having high reliability and a processing apparatus equipped with the workpiece holder are provided, in which damage caused by oxygen in the air is prevented. The...
7264676 Plasma apparatus and method capable of adaptive impedance matching  
A plasma apparatus capable of adaptive impedance matching comprises a plasma reactor which can produce plasma to proceed with CVD (chemical vapor deposition) process, a bi-polar electrostatic chuck...
7259955 Electrostatic holding device and electrostatic tweezers using the same  
An electrostatic holding device ( 100 ) in which an electrode group ( 103 ) having a plurality of electrodes covered with an insulating material ( 102 ) is used as a holding surface applies...
7248457 Electrostatic chuck  
The object of the present invention is to provide an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a...
7248456 Electrostatic chuck  
An electrostatic chuck is provided which includes a circular ceramic plate having an electrostatic attractive electrode, a mounting surface for supporting a waferhich is formed on one of the main...
7245357 Lithographic apparatus and device manufacturing method  
A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of...
Matches 1 - 50 out of 597 1 2 3 4 5 6 7 8 9 10 11 12 >