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6906866 Compact 1½-waist system for sub 100 nm ArF lithography  
According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first...
6903804 Projection optical system and projection and light exposure apparatus using it  
A projection optical system is disclosed that includes six lens groups, four of which are positioned in pairs symmetrically about a stop. The second and fifth lens groups, in order from the object...
6894842 Projection optical system, image display apparatus, and image display system  
The invention discloses a projection optical system for projecting an original image onto a projection surface. The projection optical system comprises a plurality of aspherical curved mirrors,...
6891683 Refractive projection objective with a waist  
A refractive projection objective for use in microlithography with lenses made exclusively of one and the same material has an image-side numerical aperture larger than 0.7. A light bundle defined...
6888682 Projector lens system  
A projector lens system includes a negative first lens group and a positive second lens group. The first lens group comprises a first lens element that is formed as a negative meniscus lens...
6880937 Projection optical system and image projection apparatus  
In a projection optical system projecting an image displayed on a predetermined play surface onto a predetermined projection surface, two decentering lens units movable in directions vertical to...
6870689 Projection zoom lens system and projector  
A projection zoom lens system that is suited to a projector with a DMD is provided. The zoom lens system includes a fixed fifth lens group that is positioned on the light modulator side and is...
6856377 Relay image optical system, and illuminating optical device and exposure system provided with the optical system  
This invention provides a relay imaging optical system which is composed of a small number of lenses and can be miniaturized and reduced in weight with maintaining required optical...
6853492 Conductive lens  
A method and system for a conductive lens. In one method embodiment, the present invention forms a silver flash layer on a lens. A polyester sheet is then applied over the silver flash layer....
6850371 Optical member and method of producing the same, and projection aligner  
An optical member of the invention is an optical member for photolithography used together with light having a wavelength of not more than 250 nm. The optical member is made of a fluoride crystal...
6844982 Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system  
A projection optical system includes a plurality of light-transmissive members and projects an image of a first surface onto a second surface. The projection optical system includes a...
6844919 Projection optical system and exposure apparatus having the projection optical system  
A projection optical system according to the present invention whose image side numerical aperture is greater than or equal to 0.75, and which forms an image of a first object upon a second object...
6844981 Non-symmetrical light stop  
In a projection display system for example, a projection lens includes a non-radially symmetrical light stopped that is painted or otherwise applied directly to the surface of an optical lens...
6842294 Catadioptric objective  
A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The...
6831794 Objective with at least one aspheric lens  
A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of...
6831783 Diffractive optical element and optical system  
A diffractive optical element includes a first layer having a relief-type grating, a second layer having a relief-type grating, and a third layer having a relief-type grating. The first, second...
6822804 Projection lens and liquid crystal projector  
The present invention is directed to a projection lens that has a sufficiently long back focus to enable a wide-angle projection and has astigmatism, abaxial spherical aberration (coma),...
6809876 Optical element equipped with lanthanum fluoride film  
An optical element of the present invention comprises a fluorite substrate 1, and a lanthanum fluoride film 2 formed directly on the substrate 1. The substrate 1, on which the lanthanum fluoride...
6801365 Projection type image display system and color correction method thereof  
There is provided a projection type image display system comprising color image displaying means for displaying an image to be projected onto a screen, means for storing a correlation between an...
6801373 Projection lens  
A lens assembly comprising nine lenses. Each lens includes u greater than or equal to about 12.8°, LEP equal to or from about 100 mm to about 400 mm, α Rba greater than or equal to about 1°, and α...
6801366 Projection lens system and projection image display apparatus using the same  
When a projection lens system used for a rear projection type image display apparatus has a first lens group having an aspherical lens surface, a second lens group, a third lens group sharing...
6798579 Real imaging system with reduced ghost imaging  
A real image display system includes a primary image source for projecting a primary image from the start of a primary light path to an end of the primary light path at which the primary image is...
6798584 Lens apparatus for projection  
A lens apparatus for projection includes a plurality of lenses on an optical axis. A shading plate 11 for covering the peripheral portion of the lens to block off light entering the peripheral...
6795255 Projection objective  
A lens assembly comprising seven lenses. Each lens includes u greater than or equal to about 12.8°, LEP equal to or from about 100 mm to about 400 mm, σRba greater than or equal to about 1°, and...
6788471 Projection exposure apparatus for microlithography  
The invention relates to a projection exposure apparatus for microlithography at λ<200 nm. The projection exposure apparatus for microlithography has a light source with a wavelength less than 200...
6781766 Projection optical system  
A projection optical system comprises a first lens group with positive power, a second lens group with negative power, a third lens group with positive power, a fourth lens group with negative...
6771427 Image-forming optical system  
A luminous flux, from one conjugate surface (A), having an opening angle of at least 10° sequentially passes through a first optical system (30) having a luminous flux convergent action in the...
6768594 Projection lens apparatus and rear projection type image display apparatus using the same  
In a projection lens, there are arranged in order from a screen side, a first lens group including a meniscus lens having a convex lens surface in a central portion toward a screen with refracting...
6765731 Low element count projection lenses for use with pixelized panels  
Projection lenses for use with pixelized panels (PP) are provided. The projection lenses have a negative first unit (U1) separated from a positive second unit (U2) by a reflective surface (RS)...
6712474 Projection lens and projector provided with the same  
A projection lens includes a first lens having a negative refractive power, a second lens having a positive refractive power, a third lens having a negative refractive power and including§a first...
6710930 Illumination optical system and method of making exposure apparatus  
In a projection optical system for projecting and transferring a pattern on a projection original R onto a photosensitive substrate W, one or a plurality of lenses having an in-homogeous radial...
6710932 Zoom lens system with temperature compensation function and video camera using the same  
A zoom lens system with temperature compensation function includes the first lens group having a positive refractive power, the second lens group that has negative refractive power and moves along...
RE38465 Exposure apparatus  
A projection optical system of the present invention has a first lens group G1 being positive, a second lens group G2 being negative, a third lens group G3 being positive, a fourth lens group G4...
6707616 Projection exposure apparatus, projection exposure method and catadioptric optical system  
A projection exposure apparatus has an illumination optical system 3 for illuminating a mask formed with a pattern with beams of radiation, and a projection optical system for forming an image of...
6690517 Tilt projection optical system  
A tilt projection optical system, that performs enlarged projection from the primary image plane on the reduction side to the second image plane on the enlargement side without forming an...
RE38403 Projection optical system and projection exposure apparatus  
In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical...
6683729 Objective with crystal lenses and projection exposure equipment for microlithography  
An objective with lenses made of two different crystals, in particular CaF2 and BaF2 is particularly suitable as a refractive projection objective for microlithography at 157 nm. Such projection...
6683728 Illumination system with reduced energy loading  
An illumination system having a rod integrator and an objective for imaging an object field onto an image field, which has an entry surface, an exit surface, and reflecting side surfaces. A...
6680803 Partial objective in an illuminating systems  
Partial objective for illumination of an image field in an illuminating device of a microlithographic projection exposure apparatus, arranged between a aperture plane and an image plane. The...
6671102 Projection optical system, projection type image display apparatus, and image projection system  
A projection optical system which sufficiently corrects variations in aberrations during focusing irrespective of a distance at which an object is located, i.e. whether the object is located at a...
6665126 Projection exposure lens with aspheric elements  
A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical...
6639734 Catadioptric imaging system and a projection exposure apparatus provided with said imaging system  
The object of the present invention is to provide a catadioptric imaging system, or the like, which is capable of obtaining a desired image-side NA and an image circle without increasing the size...
6636361 Zoom lens and image display apparatus using the same  
It is an object of this invention to provide a zoom lens capable of projecting an original projection image displayed by a liquid crystal display element onto a screen surface with high optical...
6614597 Illumination apparatus and projection exposure apparatus  
An illumination apparatus that can adjust telecentricity of beams on a wafer without reducing the use efficiency of light is provided. The illumination apparatus moves an inner surface reflection...
6603606 System and methods for position-control of light modulation device  
The present invention provides a position-control device for a light modulation device, capable of easily performing a position-control operation. A position-control device is provided with a...
6600606 Projection optical system with diffractive optical element  
An optical system includes an aperture stop and binary optics having a plurality of rings disposed adjacent to the aperture stop. The rings of the binary optics have different mutual intervals and...
6597511 Microlithographic illuminating system and microlithographic projection exposure arrangement incorporating said system  
A microlithographic projection exposure arrangement has an off-axis field and has a catoptric or catadioptric projection objective (P). In this arrangement, the illumination system (ILL) is made...
6595916 Endoscope apparatus using curvature of field  
This endoscope apparatus utilizes a phenomenon called “curvature of field” of a lens to satisfactorily bring a shape, into focus, of an object to be observed such as unevenness especially during...
6594089 Projection lens shifting mechanism and rear projection television  
A projection lens shifting mechanism comprises a projection lens unit in the shape of a cylinder for projecting incoming image light, a flange integrated with the projection lens unit, a...
6590716 Projection zoom lens  
A projection zoom lens includes a first lens group having a negative refracting power, a second lens group having a positive refracting power, a third lens group having a negative refracting...