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7450301 |
Reflective projection lens for EUV-photolithography
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging...
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7450300 |
High resolution objective lens assembly
A high resolution objective lens assembly ( 20, 120, 220, 320 ) is implemented with refractive lens elements made of modified fused silica for operation at deep ultraviolet (DUV) wavelengths to...
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7426076 |
Projection system for a lithographic apparatus
A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being...
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7417793 |
Structure for supporting an optical telescope
An apparatus for the focusing of incident light includes a base assembly that is adapted to support a primary mirror. The primary mirror includes an outside circumference and an inside aperture. An...
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7414781 |
Catoptric objectives and systems using catoptric objectives
In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of...
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7408703 |
Wide-angle imaging optical system and wide-angle imaging apparatus surveillance imaging apparatus vehicle-mounted imaging apparatus and projection apparatus using the wide-angle imaging optical system
A wide-angle imaging optical system includes a refractive optical system ( 3 ), a reflective optical system, and an image-forming optical system ( 5 ). The reflective optical system includes a...
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7385755 |
Adjustable mirror
An adjustable mirror includes first and second fluids in contact over a meniscus extending transverse an optical axis. The fluids are substantially immiscible and have different indices of...
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7370977 |
Optical projection system and image display device having the same
An optical projection system which creates pincushion distortion of an image and then creates a barrel distortion of the pincushion-distorted image to compensate for the pincushion distortion and...
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7344282 |
Optical sheet and backlight assembly of liquid crystal display with the same
An optical sheet includes a substrate onto which light is incident, and a convex part protruded from the substrate by a predetermined thickness. A thickness of the convex part increases from an...
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7324269 |
Projection optical system, exposure apparatus and device fabricating method
A projection optical system is provided for projecting a pattern on an object plane onto an image plane in a reduced size. The projection optical system has six reflective surfaces that include, in...
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7319556 |
Wide field of view telescope
A wide field of view telescope having two concave and two convex reflective surfaces, each with an aspheric surface contour, has a flat focal plane array. Each of the primary, secondary, tertiary,...
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7310184 |
Cylindrical body of a Newton reflective telescope
A cylindrical body of a Newton reflective telescope includes a first cylindrical body and a second cylindrical body combined together. The first cylindrical body has an eyepiece fixed on an outer...
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7298548 |
Multi-directional viewing and imaging
A solution for directing electromagnetic radiation, such as visible light, from multiple fields of view in differing directions to a single view point is provided. The radiation received from one...
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7218445 |
Microlithographic reduction projection catadioptric objective
A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a...
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7209286 |
Objective with pupil obscuration
In accordance with the present invention, a projection exposure apparatus includes an illuminating system to illuminate a drivable micromirror array and an objective which projects the drivable...
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7209285 |
Common axis three mirror anastigmatic optic
A three mirror anastigmatic optic (and corresponding method of making) comprising a primary mirror, a secondary mirror, a tertiary mirror, and a vertex common to the primary and tertiary mirrors.
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7209212 |
Tunable optical integrated element using liquid crystal as active layer
The present invention discloses a tunable optical integrated element using liquid crystal as an active layer, which is applied to filters, couplers or optical add/drop multiplexer. The present...
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7199922 |
Reflective projection lens for EUV-photolithography
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging...
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7186983 |
Illumination system particularly for microlithography
There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm....
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7180659 |
Multiple field cassegrain-type optical combination
The invention is directed to multispectral multifield optical combinations that are intended to be integrated into an optical device. A Cassegrain-type multifield optical combination has an image...
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7177076 |
8-mirror microlithography projection objective
There is provided a microlithographic projector lens for EUV-lithography with a wavelegth in a range of 10–30 nm, an incident aperture diaphragm and an emergent aperture diaphragm for the...
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7161735 |
Projection optical system, exposure apparatus and device fabricating method
A projection optical system is provided for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system has six reflective surfaces that...
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7158215 |
Large field of view protection optical system with aberration correctability for flat panel displays
An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical...
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7088516 |
Wide field of view head mounted display device
Provided is a wide field of view head mounted display device capable of presenting 120 degree field of view per one eye and 180 or more by both eyes horizontally while keeping resolution at least...
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7075713 |
High efficiency collector for laser plasma EUV source
Collector optics ( 70 ) for an EUV radiation source ( 10 ) for collecting EUV radiation ( 78 ). The collector optics ( 70 ) includes an elliptical dish reflector ( 72 ) where light generated at a...
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7031059 |
Device for acquiring stereoscopic images
The invention concerns a device for acquiring stereoscopic images comprising a primary mirror ( 1 ) or a near-parabolic mirror, a secondary mirror ( 2 ) located on the primary mirror optical axis...
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7030965 |
Catadioptric system and exposure device having this system
A catadioptric system includes: a first image forming optical system that includes at least two reflecting mirrors and forms a first intermediate image of a first plane with light originating from...
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6970286 |
Multiple field of view reflective telescope
A reflective afocal telescope is described herein that has multiple field of views and can be packaged in a compact arrangement. In one embodiment, the reflective telescope includes two entrance...
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6969840 |
Imaging optical system including a telescope and an uncooled warm-stop structure
An all-reflective telescope has, in order, a positive-optical-power primary mirror, a negative-optical-power secondary mirror, a positive-optical-power tertiary mirror, a negative-optical-power...
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6963678 |
Electro-optical transducer with multi-reflector beam-expanding and collimating input/output device
A system of reflectors is used to form beam-expanding and collimating electro-optic transducer devices, including radiation sources and/or detectors. Preferably, the reflector system is of the...
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6947210 |
Catoptric projection optical system, exposure apparatus and device fabrication method using same
A catoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first,...
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6927901 |
Reflective projection lens for EUV-photolithography
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging...
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6912042 |
6-mirror projection objective with few lenses
There is provided a projection objective for wavelengths of ≦193 nm for imaging an object field in an object plane into an image field, in an image plane. The projection objective includes a...
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6903774 |
Viewfinder device including first and second prisms to reflect light from outside the viewing area
A thin viewfinder device includes, in order an object side to a viewing eye side, a first prism, and a second prism disposed separately from the first prim across an air gap. The first prism, the...
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6894834 |
Objective with pupil obscuration
An objective is configured with a first partial objective and a second partial objective. The first partial objective, which projects a first field plane onto an intermediate image, has a first,...
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6878407 |
Suede-like fabric
The suede-like fabric according to the invention is produced by the process which comprises the steps of supplying aqueous chemical composed of acrylic resin, emulsifying agent and water to...
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6867931 |
Dual-imaging optical system
An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of...
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6867913 |
6-mirror microlithography projection objective
There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment...
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6859328 |
Illumination system particularly for microlithography
A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of...
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6859263 |
Apparatus for generating partially coherent radiation
Techniques for generating partially coherent radiation and particularly for converting effectively coherent radiation from a synchrotron to partially coherent EUV radiation suitable for projection...
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6856630 |
Beam homogenizer, laser irradiation apparatus, semiconductor device, and method of fabricating the semiconductor device
An optical system (in FIGS. 1 A and 1 B) wherein a rectilinear laser beam of homogeneous energy distribution is defined for annealing a non-single crystalline semiconductor film (a surface...
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6850361 |
Wide-angle catoptric system
A bright wide-angle catoptric system is provided which will not deteriorate the picture quality of images. The wide-angle catoptric system includes, successively from an object, a secondary...
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6788805 |
Electronic component-recognizing device
There is provided an electronic component-recognizing device for taking an image of an electronic component brought to a component-sensing station, for recognition thereof. The component-sensing...
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6765719 |
Multiple field of view telescope
The optical system includes a first set of optics, an optical switch and a second set of optics. The first set of optics is capable of receiving light and directing the light along a first optical...
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6735014 |
Aberration correcting optical relay for optical system, in particular mirror telescope
An aberration-correcting optical relay for an optical system. The relay comprises front and rear converging optical units together with a correcting meniscus or two correcting meniscuses placed...
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6717722 |
Catadioptric optical system and exposure apparatus having the same
A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the...
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6707603 |
Apparatus and method to distort an optical beam to avoid ionization at an intermediate focus
An optical system has a light source of an optical beam, and a wavefront distortion generator that introduces a known wavefront distortion into at least one wavelength component of the optical beam...
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6674571 |
Optical architecture for an observation telescope, in particular a telescope for observing the earth from a satellite
An optical architecture for observation telescopes, in particular for telescopes intended to be installed on board a vehicle, such as a space satellite, for observing terrestrial areas, includes a...
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6636350 |
Microlithographic reduction projection catadioptric objective
A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a...
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6598986 |
Zoom strobe device
A zoom strobe device is provided with a light emitting unit, which includes a light source and a reflector and a light collecting lens that collects the light emitted by the light emitting unit....
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