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7450301 Reflective projection lens for EUV-photolithography  
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging...
7450300 High resolution objective lens assembly  
A high resolution objective lens assembly ( 20, 120, 220, 320 ) is implemented with refractive lens elements made of modified fused silica for operation at deep ultraviolet (DUV) wavelengths to...
7426076 Projection system for a lithographic apparatus  
A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being...
7417793 Structure for supporting an optical telescope  
An apparatus for the focusing of incident light includes a base assembly that is adapted to support a primary mirror. The primary mirror includes an outside circumference and an inside aperture. An...
7414781 Catoptric objectives and systems using catoptric objectives  
In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of...
7408703 Wide-angle imaging optical system and wide-angle imaging apparatus surveillance imaging apparatus vehicle-mounted imaging apparatus and projection apparatus using the wide-angle imaging optical system  
A wide-angle imaging optical system includes a refractive optical system ( 3 ), a reflective optical system, and an image-forming optical system ( 5 ). The reflective optical system includes a...
7385755 Adjustable mirror  
An adjustable mirror includes first and second fluids in contact over a meniscus extending transverse an optical axis. The fluids are substantially immiscible and have different indices of...
7370977 Optical projection system and image display device having the same  
An optical projection system which creates pincushion distortion of an image and then creates a barrel distortion of the pincushion-distorted image to compensate for the pincushion distortion and...
7344282 Optical sheet and backlight assembly of liquid crystal display with the same  
An optical sheet includes a substrate onto which light is incident, and a convex part protruded from the substrate by a predetermined thickness. A thickness of the convex part increases from an...
7324269 Projection optical system, exposure apparatus and device fabricating method  
A projection optical system is provided for projecting a pattern on an object plane onto an image plane in a reduced size. The projection optical system has six reflective surfaces that include, in...
7319556 Wide field of view telescope  
A wide field of view telescope having two concave and two convex reflective surfaces, each with an aspheric surface contour, has a flat focal plane array. Each of the primary, secondary, tertiary,...
7310184 Cylindrical body of a Newton reflective telescope  
A cylindrical body of a Newton reflective telescope includes a first cylindrical body and a second cylindrical body combined together. The first cylindrical body has an eyepiece fixed on an outer...
7298548 Multi-directional viewing and imaging  
A solution for directing electromagnetic radiation, such as visible light, from multiple fields of view in differing directions to a single view point is provided. The radiation received from one...
7218445 Microlithographic reduction projection catadioptric objective  
A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a...
7209286 Objective with pupil obscuration  
In accordance with the present invention, a projection exposure apparatus includes an illuminating system to illuminate a drivable micromirror array and an objective which projects the drivable...
7209285 Common axis three mirror anastigmatic optic  
A three mirror anastigmatic optic (and corresponding method of making) comprising a primary mirror, a secondary mirror, a tertiary mirror, and a vertex common to the primary and tertiary mirrors.
7209212 Tunable optical integrated element using liquid crystal as active layer  
The present invention discloses a tunable optical integrated element using liquid crystal as an active layer, which is applied to filters, couplers or optical add/drop multiplexer. The present...
7199922 Reflective projection lens for EUV-photolithography  
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging...
7186983 Illumination system particularly for microlithography  
There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm....
7180659 Multiple field cassegrain-type optical combination  
The invention is directed to multispectral multifield optical combinations that are intended to be integrated into an optical device. A Cassegrain-type multifield optical combination has an image...
7177076 8-mirror microlithography projection objective  
There is provided a microlithographic projector lens for EUV-lithography with a wavelegth in a range of 10–30 nm, an incident aperture diaphragm and an emergent aperture diaphragm for the...
7161735 Projection optical system, exposure apparatus and device fabricating method  
A projection optical system is provided for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system has six reflective surfaces that...
7158215 Large field of view protection optical system with aberration correctability for flat panel displays  
An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical...
7088516 Wide field of view head mounted display device  
Provided is a wide field of view head mounted display device capable of presenting 120 degree field of view per one eye and 180 or more by both eyes horizontally while keeping resolution at least...
7075713 High efficiency collector for laser plasma EUV source  
Collector optics ( 70 ) for an EUV radiation source ( 10 ) for collecting EUV radiation ( 78 ). The collector optics ( 70 ) includes an elliptical dish reflector ( 72 ) where light generated at a...
7031059 Device for acquiring stereoscopic images  
The invention concerns a device for acquiring stereoscopic images comprising a primary mirror ( 1 ) or a near-parabolic mirror, a secondary mirror ( 2 ) located on the primary mirror optical axis...
7030965 Catadioptric system and exposure device having this system  
A catadioptric system includes: a first image forming optical system that includes at least two reflecting mirrors and forms a first intermediate image of a first plane with light originating from...
6970286 Multiple field of view reflective telescope  
A reflective afocal telescope is described herein that has multiple field of views and can be packaged in a compact arrangement. In one embodiment, the reflective telescope includes two entrance...
6969840 Imaging optical system including a telescope and an uncooled warm-stop structure  
An all-reflective telescope has, in order, a positive-optical-power primary mirror, a negative-optical-power secondary mirror, a positive-optical-power tertiary mirror, a negative-optical-power...
6963678 Electro-optical transducer with multi-reflector beam-expanding and collimating input/output device  
A system of reflectors is used to form beam-expanding and collimating electro-optic transducer devices, including radiation sources and/or detectors. Preferably, the reflector system is of the...
6947210 Catoptric projection optical system, exposure apparatus and device fabrication method using same  
A catoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first,...
6927901 Reflective projection lens for EUV-photolithography  
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging...
6912042 6-mirror projection objective with few lenses  
There is provided a projection objective for wavelengths of ≦193 nm for imaging an object field in an object plane into an image field, in an image plane. The projection objective includes a...
6903774 Viewfinder device including first and second prisms to reflect light from outside the viewing area  
A thin viewfinder device includes, in order an object side to a viewing eye side, a first prism, and a second prism disposed separately from the first prim across an air gap. The first prism, the...
6894834 Objective with pupil obscuration  
An objective is configured with a first partial objective and a second partial objective. The first partial objective, which projects a first field plane onto an intermediate image, has a first,...
6878407 Suede-like fabric  
The suede-like fabric according to the invention is produced by the process which comprises the steps of supplying aqueous chemical composed of acrylic resin, emulsifying agent and water to...
6867931 Dual-imaging optical system  
An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of...
6867913 6-mirror microlithography projection objective  
There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment...
6859328 Illumination system particularly for microlithography  
A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of...
6859263 Apparatus for generating partially coherent radiation  
Techniques for generating partially coherent radiation and particularly for converting effectively coherent radiation from a synchrotron to partially coherent EUV radiation suitable for projection...
6856630 Beam homogenizer, laser irradiation apparatus, semiconductor device, and method of fabricating the semiconductor device  
An optical system (in FIGS. 1 A and 1 B) wherein a rectilinear laser beam of homogeneous energy distribution is defined for annealing a non-single crystalline semiconductor film (a surface...
6850361 Wide-angle catoptric system  
A bright wide-angle catoptric system is provided which will not deteriorate the picture quality of images. The wide-angle catoptric system includes, successively from an object, a secondary...
6788805 Electronic component-recognizing device  
There is provided an electronic component-recognizing device for taking an image of an electronic component brought to a component-sensing station, for recognition thereof. The component-sensing...
6765719 Multiple field of view telescope  
The optical system includes a first set of optics, an optical switch and a second set of optics. The first set of optics is capable of receiving light and directing the light along a first optical...
6735014 Aberration correcting optical relay for optical system, in particular mirror telescope  
An aberration-correcting optical relay for an optical system. The relay comprises front and rear converging optical units together with a correcting meniscus or two correcting meniscuses placed...
6717722 Catadioptric optical system and exposure apparatus having the same  
A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the...
6707603 Apparatus and method to distort an optical beam to avoid ionization at an intermediate focus  
An optical system has a light source of an optical beam, and a wavefront distortion generator that introduces a known wavefront distortion into at least one wavelength component of the optical beam...
6674571 Optical architecture for an observation telescope, in particular a telescope for observing the earth from a satellite  
An optical architecture for observation telescopes, in particular for telescopes intended to be installed on board a vehicle, such as a space satellite, for observing terrestrial areas, includes a...
6636350 Microlithographic reduction projection catadioptric objective  
A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a...
6598986 Zoom strobe device  
A zoom strobe device is provided with a light emitting unit, which includes a light source and a reflector and a light collecting lens that collects the light emitted by the light emitting unit....
Matches 1 - 50 out of 241 1 2 3 4 5 >