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7626711 |
Method and system for measuring patterned structures
A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a...
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7626710 |
Method and system for measuring patterned structures
A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a...
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7623251 |
Geometric measurement system and method of measuring a geometric characteristic of an object
A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The...
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7619754 |
Curved sensor array apparatus and methods
Curved sensor array configurations and methods of processing the data gathered by the sensors. A 2 dimensional embodiment comprises singular ring of sensors that can monitor sources in a 2...
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7619740 |
Microgloss measurement of paper and board
Microgloss is a novel two-dimensional representation of how light is reflected from a target surface area. Systems and methods for measuring the microgloss can yield data for characterizing the...
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7619753 |
Method for measuring dimensions and optical system using the same
A method of measuring dimensions for an optical system to measure the critical dimension of a sample object according to this aspect of the present invention includes the steps of preparing a...
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7616330 |
Geometric measurement system and method of measuring a geometric characteristic of an object
A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The...
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7616329 |
System and method for inspecting railroad track
A system and method for inspecting railroad track is disclosed. The disclosed system includes lasers, cameras, and a processor. The lasers are positioned adjacent the track. The laser emits a beam...
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7612896 |
Optically measuring interior cavities
A method of measuring the three-dimensional volume or perimeter shape of an interior cavity includes the steps of collecting a first optical slice of data that represents a partial volume or...
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7605929 |
Apparatus and method for measuring structural parts
This present invention relates to an apparatus for measuring structural parts which includes a measuring system having at least two sensors for optoelectronic scanning of such a structural part...
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7602509 |
Method for selecting optical configuration for high-precision scatterometric measurement
The present application discloses a method for selecting an optical configuration for a high-precision scatterometric measurement. A geometric parameterization of a grating is determined, wherein...
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7602505 |
Method for the automatic parameterization of measuring systems
A method for the automatic parameterization of measuring systems for the measurement of objects transported by means of a transport device, in particular volume measurement systems, wherein at...
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7595482 |
Standard component for length measurement, method for producing the same, and electron beam metrology system using the same
A standard component for length measurement includes a first diffraction grating and a second diffraction grating. Each of components of the second diffraction grating is disposed between...
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7595869 |
Optical metrology system optimized with a plurality of design goals
Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet a plurality of design goals. Primary...
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7593119 |
Generation of a library of periodic grating diffraction signals
A method of generating a library of simulated-diffraction signals (simulated signals) of a periodic grating includes obtaining a measured-diffraction signal (measured signal). Hypothetical...
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7589845 |
Process control using an optical metrology system optimized with signal criteria
Provided is system and method for controlling a fabrication cluster using at least one parameter of a structure measured with an optical metrology system designed and configured to meet one or more...
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7586623 |
Optical metrology of single features
The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical...
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7578068 |
Detecting apparatus for workpiece
A detecting apparatus includes a detecting plate, a controlling box, and an indicator installed on the detecting plate. A region is defined on one face of the detecting plate, for supporting a...
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7580137 |
Method and apparatus for determining one or more physical properties of a rolled smoking article or filter rod
A method of determining one or more physical properties of a rolled smoking article is disclosed, the method comprising disposing a rolled smoking article within a field of view, illuminating the...
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7573584 |
Method and apparatus for angular-resolved spectroscopic lithography characterization
Both the 1 st and 0 th diffraction orders are detected in a scatterometer. The 1 st diffraction orders are used to detect the overlay error. The 0 th diffraction order is then used to flag if...
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7567351 |
High resolution monitoring of CD variations
An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining...
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7567352 |
Controlling a fabrication tool using support vector machine
A fabrication tool can be controlled using a support vector machine. A profile model of the structure is obtained. The profile model is defined by profile parameters that characterize the geometric...
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7564571 |
Method for calibrating a camera-laser-unit in respect to a calibration-object
The invention refers to a method for calibrating a camera-laser-unit ( 1 ) with respect to at least one calibration-object ( 12 ) disposed at a given position and orientation in a three-dimensional...
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7561269 |
Optical measurement system with systematic error correction
An optical measurement system and wafer processing tool for correcting systematic errors in which a first diffraction spectrum is measured from a standard substrate including a layer having a known...
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7561282 |
Techniques for determining overlay and critical dimension using a single metrology tool
Disclosed are semiconductor targets for measuring with a metrology tool having at least two incident beam modules and techniques for measuring the same. In one embodiment, the target includes an...
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7545519 |
Lead edge sheet curl sensor
A lead edge sheet curl sensor apparatus and method are disclosed. In general, a first and a second light emitter are aligned wherein the light beams from the first light emitter and second light...
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7545520 |
System and method for CD determination using an alignment sensor of a lithographic apparatus
A system and method for determining parameters such as critical dimension of a patterned structure and best focus condition of a lithographic apparatus, based on measurement of the intensity of a...
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7532334 |
Temperature controlling case
A heat deflection testing equipment ( 10 ) for measuring tolerance of a sample ( 60 ) includes a temperature controlling case ( 30 ) and an optical sensor ( 20 ). The case includes a base ( 40 )...
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7528968 |
Optical measuring machine
An optical measuring machine includes a screen having a reference line, a movable stage, a detector for detecting a displacement of the stage, the first and second image-forming units for forming...
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7525672 |
Efficient characterization of symmetrically illuminated symmetric 2-D gratings
Methods and apparatus for optical characterization based on symmetry-reduced 2-D RCWA calculations are provided. The invention is applicable to gratings having a grating reflection symmetry plane....
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7525673 |
Optimizing selected variables of an optical metrology system
A system for examining a patterned structure formed on a semiconductor wafer using an optical metrology model includes a first fabrication cluster, a metrology cluster, an optical metrology model...
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7522294 |
Measuring a process parameter of a semiconductor fabrication process using optical metrology
To measure a process parameter of a semiconductor fabrication process, the fabrication process is performed on a first area using a first value of the process parameter. The fabrication process is...
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7522293 |
Optical metrology of multiple patterned layers
One or more features of multiple patterned layers formed on a semiconductor are determined by obtaining a first measured diffraction signal measured from a first patterned layer before a second...
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7523021 |
Weighting function to enhance measured diffraction signals in optical metrology
A weighting function is obtained to enhance measured diffraction signals used in optical metrology. To obtain the weighting function, a measured diffraction signal is obtained. The measured...
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7518740 |
Evaluating a profile model to characterize a structure to be examined using optical metrology
A profile model to characterize a structure to be examined using optical metrology is evaluated by displaying a set of profile parameters that characterizes the profile model. Each profile...
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7518739 |
Use of optical fourier transform for dimensional control in microelectronics
A device for measuring the dimensional or structural characteristics of an object. A detector forms an optical Fourier transform image of an elemental surface of the object in an image focal plane....
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7515253 |
System for measuring a sample with a layer containing a periodic diffracting structure
To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the...
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7515282 |
Modeling and measuring structures with spatially varying properties in optical metrology
The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to...
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7515283 |
Parallel profile determination in optical metrology
In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more...
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7511834 |
Optical apparatus for measuring tooling position within a seaming machine
The present invention provides an optical device for measuring characteristics of toolings ( 116 ), especially chuck and roll in a seamer. The optical device comprises a radiation source ( 102 )...
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7511830 |
System for scatterometric measurements and applications
Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are...
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7511835 |
Optical metrology using a support vector machine with simulated diffraction signal inputs
A structure formed on a semiconductor wafer can be examined using a support vector machine. A profile model of the structure is obtained. The profile model is defined by profile parameters that...
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7512457 |
In-process non-contact measuring systems and methods for automated lapping systems
In-process non-contact measurement systems and methods for automated lapping systems are disclosed. In an embodiment, a moveable frame can be controllably positioned proximate to a lapped work...
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7505148 |
Matching optical metrology tools using spectra enhancement
Optical metrology tools are matched by obtaining a first set of measured diffraction signals, which was measured using a first optical metrology tool, and a second set of measured diffraction...
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7505153 |
Model and parameter selection for optical metrology
A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. The set of...
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7502660 |
Feature dimension deviation correction system, method and program product
A system, method and program product for correcting a deviation of a dimension of a feature from a target in a semiconductor process, are disclosed. The invention determines an origin of a...
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7495777 |
Method and apparatus for contact free measurement of periodically moving objects
A method and apparatus is described for contact-free 3 dimensional-measuring of a moving object with periodic motion. The method and apparatus makes use of the projection of a defined intensity...
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7495782 |
Method and system for measuring patterned structures
A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a...
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7495776 |
Three-dimensional measuring system
A three-dimensional measuring system for measuring a three-dimensional shape of a measurement object in a noncontact manner includes a first obtaining portion for obtaining arrangement information...
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7492470 |
Method for three-dimensional shape measurement of a body
The invention relates to a method for three-dimensional shape measurement of a body or of a part thereof, in particular of a dental object such as a model, by scanning non-contact distance...
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