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7609392 |
Harmonically matched diffraction grating pair
A method and device realize shallow gratings-based planar beam splitter/combiner. Non-trivial phase shifts between different ports of resulting interferometers are used to acquire full-field phase...
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7609391 |
Optical lattice microscopy
An optical system includes a substrate adapted for supporting a sample, where the substrate has a refractive index, n sub , larger than a refractive index of the sample, n sample , a source of...
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7605926 |
Optical system, method of manufacturing an optical system and method of manufacturing an optical element
A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are...
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7599071 |
Determining positional error of an optical component using structured light patterns
Described is an interferometric surface contour measurement system for projecting structured light patterns onto an object. The measurement system includes an interferometric projector, an imager,...
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7595892 |
Multiple channel interferometric surface contour measurement system
Described are a multiple channel interferometric surface contour measurement system and methods of determining surface contour data for the same. The measurement system includes a multiple channel...
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7580586 |
Enhanced recovery of low spatial frequency spectral information in a Fizeau Fourier transform spectrometer
A method of restoring low spatial frequency spectral information to an image using a Fizeau Fourier transform spectrometer (“FFTS”) system is provided. Portions of a wavefront collected by the...
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7576870 |
Measurement apparatus, exposure apparatus, and device fabrication method
A measurement apparatus which measures a wavefront aberration of an optical system to be measured, the apparatus comprises a detection unit configured to detect an interference pattern formed by...
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7576308 |
Mosaic imager using wave front control
A wave front control system (“WFCS”) organizes the object scene into a mosaic comprised of a grid of segments and transmits each segment in a temporal sequence. The WFCS steers the light fronts...
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7573581 |
Position-measuring device
A position-measuring device is for measuring the position of two objects that are movable relative to one another. The device includes a measuring graduation, which is connected to one of the two...
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7557930 |
Bessel beam interferometer and measurement method
A measurement method and apparatus rely upon the coherent optical interference between a reference beam and a diffractionless sensing beam having an optical path length that has been disturbed. The...
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7554675 |
Light wavefront measuring instrument, light wavefront measuring method, and light source adjusting method
A light wavefront measuring apparatus ( 2, 2 a , 42 ) includes a separating element ( 7 a , 47 a ) for separating a flux of light which exits from an optical head ( 1, 31 ) into a first beam and a...
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7544449 |
Method and apparatus for measurement of crossfield chromatic response of projection imaging systems
A method and apparatus for measuring the chromatic response of lithographic projection imaging systems is described. An apparatus for determining the lens aberrations for a lithographic projection...
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7538891 |
Surface characterization based on lateral shearing of diffracted wave fronts to measure in-plane and out-of-plane displacement gradient fields
Apparatus and techniques for using an optical shearing interferometry to obtain full field mapping of in-plane and out-of-plane displacement field gradients of a sample surface of a sample.
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7518737 |
Displacement-measuring optical device with orifice
Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive...
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7518735 |
Measurement method and apparatus, exposure apparatus, and device manufacturing method
A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image...
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7495200 |
Holographic adaptive optic system
A holographic adaptive optic system for correcting the wavefront of a light. A phase correction device with a plurality of pixels in the path of the light. A holographic wavefront sensor in the...
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7480060 |
Interferometric optical position encoder employing spatial filtering of diffraction orders for improved accuracy
An optical position encoder employs spatial filtering of diffraction orders other than +/− 1st diffraction orders for greater accuracy. The encoder includes a light source, a scale including a...
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7480057 |
Interferometric device
Device for white light interferometry comprising a light source of main emission wavelength λ 0 and spectral width Δλ and an evaluating unit with a line sensor of pixel width P for detecting an...
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7477362 |
Moiré interferometric strain sensor
A moiré interferometric strain sensor for detecting strain on a specimen, a diffraction grating being on the specimen, the strain sensor including an array of a plurality of microlenses for...
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7474413 |
Method and apparatus for analyzing interference fringe
Disclosed is a method of analyzing an interference fringe, with which method the optical characteristics of an optical system to be examined can be analyzed very precisely. In one preferred form of...
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7462326 |
Device for the detection of at least one ligand contained in a sample that is to be analyzed
Disclosed is a device for detecting at least one ligand contained in a sample that is to be analyzed. Said device comprises an optical waveguide, on the surface of which at least one...
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7460248 |
Tissue imaging system
A tissue imaging system ( 200 ) for examining the medical condition of tissue ( 290 ) has an illumination optical system ( 205 ), which comprises a light source ( 220 ), having one or more light...
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7460231 |
Alignment tool for a lithographic apparatus
An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a...
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7453560 |
Method of evaluating optical element
There is provided an evaluation method of a reflective optical element on which a multilayer film is formed, including the step of calculating a phase difference between light incident upon the...
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7445938 |
System and method for detecting presence of analytes using gratings
The present invention is directed to an optical grating sensor configured to detect a phase change in light passing though the system due to a binding event caused by an analyte. The grating sensor...
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7443514 |
Diffractive null corrector employing a spatial light modulator
The present invention is directed to a system and method for using a spatial light modulator (SLM) to perform a null test of an (aspheric) optical surface. In an embodiment, such a system includes...
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7440117 |
Highly-sensitive displacement-measuring optical device
Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive...
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7436521 |
Optical measuring apparatus and operating method for imaging error correction in an optical imaging system
A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of...
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7430036 |
Maskless exposure apparatus using optical modulator, and method for monitoring pattern generating performance by the optical modulator
A pattern monitoring method for an exposure apparatus that includes an optical modulator having at least one element that provides incident light with plural phase differences, and a projection...
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7428058 |
Apparatus and method for in situ and ex situ measurements of optical system flare
Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ...
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7426038 |
Detection device, optical path length measurement device, measurement instrument, optical member evaluation method, and temperature change detection method
An object of the invention is to provide a detection apparatus, an optical path length measuring apparatus, a method for evaluating an optical member, and the like, which can evaluate optical...
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7426037 |
Diffraction grating based interferometric systems and methods
Diffraction grating based fiber optic interferometric systems for use in optical coherence tomography, wherein sample and reference light beams are formed by a first beam splitter and the sample...
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7423766 |
Interferometric optical profiler
An imaging-type interferometric optical profiler splits a beam reflected from a sample into two beam portions. One portion is a reference beam and the other a sample beam. The reference and sample...
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7422891 |
Label-free high-throughput optical technique for detecting biomolecular interactions
Methods and compositions are provided for detecting biomolecular interactions. The use of labels is not required and the methods can be performed in a high-throughput manner. The invention also...
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7420687 |
Condition assessment system for a structure including a semiconductor material
An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at...
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7417745 |
Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry
Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure ( 6 a ) to be arranged on the object side, and/or a...
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7414731 |
Microscope and interferometer thereof
An interferometer comprises a light source unit, a first splitter, a reference beam unit and a detection unit. The light source unit provides a laser beam. The first splitter receives the laser...
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7414730 |
High precision interferometer apparatus employing a grating beamsplitter
Measurement of a distance change between a reference surface and a target is provided. A substrate has a first surface facing the target and including a grating. The grating and target combine to...
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7411687 |
Speckle reduction method and system for EUV interferometry
A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object...
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7405834 |
Compensated coherent imaging for improved imaging and directed energy weapons applications
An imaging method and associated system for producing high-resolution images. The method includes illuminating an object or scene with coherent radiation such as beams from a laser and then,...
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7403293 |
Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method
A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical...
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7394550 |
Displacement detector
The displacement detector includes: a light source 140 ; a beam splitter 170 for dividing the light, which is sent from the light source 140 , into two beams of light; reflection mirrors 181,...
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7379613 |
Optimized image processing for wavefront coded imaging systems
An image processing method includes the steps of wavefront coding a wavefront that forms an optical image, converting the optical image to a data stream, and processing the data stream with a...
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7369253 |
Systems and methods for measuring sample surface flatness of continuously moving samples
Measurement of sample surface flatness of a continuously moving sample. A conveyor continuously conveys a sample beneath a grating disposed at a non-zero angle with respect to the plane of...
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7365861 |
Method and apparatus for determining telecentricity and microlithography projection exposure apparatus
An apparatus having a wavefront measuring device ( 1, 2, 7 ), which is designed to determine a wavefront tilt in one or more non-parallel transverse directions perpendicular to an optical axis of...
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7352475 |
Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
A measuring apparatus for irradiating measuring light and for measuring optical performance of a target optical system includes a barrel for housing the target optical system, the barrel being...
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7349102 |
Methods and apparatus for reducing error in interferometric imaging measurements
Described is a fringe generator for an interferometric measurement system having improved fringe stability and reproducibility. The fringe generator includes a light source at a characteristic...
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7333216 |
Apparatus for wavefront detection
An apparatus for wavefront detection includes a wavefront source for the production of a wavefront, an optical system transforming the wavefront, a diffraction grating through which the transformed...
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7327468 |
Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films
In an opto-acoustic measuring device for thin films and solid surfaces, the probe beam is split into a first probe beam portion and a second reference beam portion. The splitting of the probe beam...
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7327467 |
Phase measuring method and apparatus for measuring characterization of optical thin films
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object...
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