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7430036 |
Maskless exposure apparatus using optical modulator, and method for monitoring pattern generating performance by the optical modulator
A pattern monitoring method for an exposure apparatus that includes an optical modulator having at least one element that provides incident light with plural phase differences, and a projection...
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7428059 |
Measurement method and apparatus, exposure apparatus, and device manufacturing method
A measurement method measures a wavefront aberration of a target optical system using an interference pattern formed by lights from first and second image side slits. The first image side slit has...
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7428058 |
Apparatus and method for in situ and ex situ measurements of optical system flare
Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ...
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7426038 |
Detection device, optical path length measurement device, measurement instrument, optical member evaluation method, and temperature change detection method
An object of the invention is to provide a detection apparatus, an optical path length measuring apparatus, a method for evaluating an optical member, and the like, which can evaluate optical...
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7426037 |
Diffraction grating based interferometric systems and methods
Diffraction grating based fiber optic interferometric systems for use in optical coherence tomography, wherein sample and reference light beams are formed by a first beam splitter and the sample...
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7423766 |
Interferometric optical profiler
An imaging-type interferometric optical profiler splits a beam reflected from a sample into two beam portions. One portion is a reference beam and the other a sample beam. The reference and sample...
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7422891 |
Label-free high-throughput optical technique for detecting biomolecular interactions
Methods and compositions are provided for detecting biomolecular interactions. The use of labels is not required and the methods can be performed in a high-throughput manner. The invention also...
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7420687 |
Condition assessment system for a structure including a semiconductor material
An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at...
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7417745 |
Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry
Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure ( 6 a ) to be arranged on the object side, and/or a...
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7414731 |
Microscope and interferometer thereof
An interferometer comprises a light source unit, a first splitter, a reference beam unit and a detection unit. The light source unit provides a laser beam. The first splitter receives the laser...
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7414730 |
High precision interferometer apparatus employing a grating beamsplitter
Measurement of a distance change between a reference surface and a target is provided. A substrate has a first surface facing the target and including a grating. The grating and target combine to...
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7411687 |
Speckle reduction method and system for EUV interferometry
A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object...
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7405834 |
Compensated coherent imaging for improved imaging and directed energy weapons applications
An imaging method and associated system for producing high-resolution images. The method includes illuminating an object or scene with coherent radiation such as beams from a laser and then,...
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7403293 |
Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method
A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical...
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7394550 |
Displacement detector
The displacement detector includes: a light source 140 ; a beam splitter 170 for dividing the light, which is sent from the light source 140 , into two beams of light; reflection mirrors 181,...
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7379613 |
Optimized image processing for wavefront coded imaging systems
An image processing method includes the steps of wavefront coding a wavefront that forms an optical image, converting the optical image to a data stream, and processing the data stream with a...
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7369253 |
Systems and methods for measuring sample surface flatness of continuously moving samples
Measurement of sample surface flatness of a continuously moving sample. A conveyor continuously conveys a sample beneath a grating disposed at a non-zero angle with respect to the plane of...
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7365861 |
Method and apparatus for determining telecentricity and microlithography projection exposure apparatus
An apparatus having a wavefront measuring device ( 1, 2, 7 ), which is designed to determine a wavefront tilt in one or more non-parallel transverse directions perpendicular to an optical axis of...
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7352475 |
Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
A measuring apparatus for irradiating measuring light and for measuring optical performance of a target optical system includes a barrel for housing the target optical system, the barrel being...
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7349102 |
Methods and apparatus for reducing error in interferometric imaging measurements
Described is a fringe generator for an interferometric measurement system having improved fringe stability and reproducibility. The fringe generator includes a light source at a characteristic...
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7333216 |
Apparatus for wavefront detection
An apparatus for wavefront detection includes a wavefront source for the production of a wavefront, an optical system transforming the wavefront, a diffraction grating through which the transformed...
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7327468 |
Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films
In an opto-acoustic measuring device for thin films and solid surfaces, the probe beam is split into a first probe beam portion and a second reference beam portion. The splitting of the probe beam...
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7327467 |
Phase measuring method and apparatus for measuring characterization of optical thin films
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object...
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7324212 |
Optical encoder having slanted optical detector elements for harmonic suppression
An optical encoder includes a source of a light beam, an optical grating that generates a spatial pattern of interference fringes, and an optical detector which includes generally elongated...
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7304749 |
Point diffraction interferometer and exposure apparatus and method using the same
A point diffraction interferometer measures optical performance of a target optical system based on a light intensity distribution of an interference fringe through an interference between a wave...
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7304746 |
Common-path point-diffraction phase-shifting interferometer
A common-path, point-diffraction, phase-shifting interferometer uses a half wave plate having a diffractive element, such as pin hole. A coherent, polarized light source simultaneously generates a...
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7301646 |
Device and method for the determination of imaging errors and microlithography projection exposure system
A device, a microlithography projection exposure system, and a method for the determination of imaging errors of an optical imaging system using a radiation-superposition measuring technique which...
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7298498 |
Optical property measuring apparatus and optical property measuring method, exposure apparatus and exposure method, and device manufacturing method
By an insertion/withdrawal mechanism, a wavefront division optical element is inserted to an optical path of a light via an optical system to be examined, or the inserted wavefront division optical...
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7298497 |
Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
Apparatus for splitting, imaging, and measuring wavefronts with a reference wavefront and an object wavefront. A wavefront-combining element receives and combines into a combined wavefront an...
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7295327 |
Measuring apparatus and exposure apparatus having the same
A measuring apparatus for measuring optical performance of a test optics by using light includes a first member for generating a first ideal wave front, a second member for generating a second...
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7286245 |
Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser
A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of...
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7283252 |
Measuring method and apparatus using interference, exposure method and apparatus using the same, and device fabrication method
A measuring method for measuring an interference fringe includes the steps of generating a reference wave as a result of transmission through a slit or pinhole in a mask of a portion of light that...
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7280187 |
Method for resolving phase in electronic speckle interferometry
The invention is a method of determining the phase difference between two interferometric images. The method includes the steps of measuring the intensities of the two beam arms, and measuring the...
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7274465 |
Optical metrology of a structure formed on a semiconductor wafer using optical pulses
A structure formed on a wafer can be examined by directing an incident pulse at the structure, the incident pulse being a sub-picosecond optical pulse. A diffraction pulse resulting from the...
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7268891 |
Transmission shear grating in checkerboard configuration for EUV wavefront sensor
A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first...
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7253907 |
Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
A measuring method for measuring a wave front of light, which has passed through a target optical system. The method includes the steps of dividing the light that passes the target optical system...
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7230719 |
High sensitivity scanning probe system
The present invention provides a hybrid optical and interferometric atomic force microscope system ( 40 ) for monitoring a cantilever probe ( 46 ). A light source ( 42 ) provides a light beam which...
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7230717 |
Pixelated phase-mask interferometer
A phase-difference sensor measures the spatially resolved difference in phase between orthogonally polarized reference and test wavefronts. The sensor is constructed as a pixelated phase-mask...
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7224469 |
Optical system alignment system and method with high accuracy and simple operation
A system for aligning of optical components includes an interferometer and a first diffractive alignment element. A housing is used for positioning a first optical element being aligned. A detector...
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7187451 |
Apparatus for measuring two-dimensional displacement
An apparatus for measuring a two-dimensional displacement is disclosed and includes a laser light source, a collimator lens, a beam splitter, a plurality of staggered conjugate optic lens and a...
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7184149 |
Methods and apparatus for reducing error in interferometric imaging measurements
The present invention provides a method and apparatus for reducing error in interferometric fringe stability and reproducibility in an interference fringe generator. In one aspect, the method for...
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7177031 |
Grating array systems having a plurality of gratings operative in a coherently additive mode and methods for making such grating array systems
A plurality of gratings (G 1 , G 2 ) are arranged together with a wavefront sensor, actuators, and feedback system to align the gratings in such a manner, that they operate like a single, large,...
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7173715 |
Reduced coherence symmetric grazing incidence differential interferometer
A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a diffraction grating that widens and passes nth order...
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7173272 |
Quantum optical CNOT gate
A nondeterministic quantum CNOT gate ( 10 ) for photon qubits, with success probability 1/9, uses beamsplitters (B 1 –B 5 ) with selected reflectivities to mix control and target input modes. It...
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7161684 |
Apparatus for optical system coherence testing
The present invention is directed at a coherence test reticle or lithographic plate, and a method for testing the coherence of a laser beam using the test reticle. The quality or coherence of the...
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7161683 |
Polarization-dependent grating interferometer for measuring optical profile depth and spectral properties of a sample
The present invention relates to a spectrally dispersive interferometric optical apparatus having a light source, generating a phase shift, measuring the intensity of the interference signals,...
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7158237 |
Interferometric measuring device and projection exposure installation comprising such measuring device
A measuring device for interferometric measurement of an optical imaging system that is provided for projecting a useful pattern, provided on a mask, into the image plane of the imaging system,...
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7154612 |
Method for calibrating a radius test bench
In a method for calibrating a radius test bench for measuring radii of optical elements, in particular of lenses and spherical mirrors, there are provided an illuminating system 1 that generates...
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7133139 |
Longitudinal differential interferometric confocal microscopy
A differential interferometric confocal microscope for measuring an object, the microscope including a source-side pinhole array; a detector-side pinhole array; and an interferometer that images...
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7130054 |
Diffraction grating based interferometric systems and methods
Diffraction grating based fiber optic interferometric systems for use in optical coherence tomography, wherein sample and reference light beams are formed by a first beam splitter and the sample...
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