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7602491 Optical gain approach for enhancement of overlay and alignment systems performance  
A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final...
7557928 Apparatus using optical coherence tomography based on spectral interference, and an ophthalmic apparatus  
An apparatus using optical coherence tomography based on spectral interference and an ophthalmic apparatus, which can accurately obtain information on an object in a depth direction by correcting...
7542141 Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers  
An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the...
7535581 Nanometer-level mix-and-match scanning tip and electron beam lithography using global backside position reference marks  
An interferometric-spatial-phase imaging (ISPI) system includes a substrate wafer. An alignment configuration is permanently embedded in the substrate wafer. The alignment configuration uses a...
7495771 Exposure apparatus  
In an exposure apparatus having a plurality of substrate stages moving between a plurality of stations, errors due to the combination of the stage and a position measuring unit, such as Abbe error...
7492468 Free-form optical surface measuring apparatus and method  
A surface measuring apparatus for measuring a surface shape of an element includes a measurement frame having a mount for mounting the element to be measured, a stage including a rotatable device,...
7489407 Error correction in interferometry systems  
In general, in one aspect, the invention features methods that include using an interferometer to produce an output beam having a phase related to an optical path difference between a path of a...
7411678 Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semiconductor device by exposure apparatus controlled by the same control method  
An alignment apparatus which drives to a target position a stage capable of moving at least in a two-dimensional direction. A first measurement device and a second measurement device have a...
7397039 Real-time compensation of mechanical position error in pattern generation or imaging applications  
Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some...
7382469 Exposure apparatus for manufacturing semiconductor device, method of exposing a layer of photoresist, and method of detecting vibrations and measuring relative position of substrate during an exposure process  
Defects are prevented from occurring during an exposure process by detecting vibration of and measuring the relative position of components of the exposure apparatus. The exposure apparatus...
7382435 Exposure apparatus  
An exposure apparatus which irradiates a photosensitive agent applied to a substrate to form a latent image pattern on the photosensitive agent. The exposure apparatus includes a substrate stage...
7375823 Interferometry systems and methods of using interferometry systems  
In general, in one aspect, the invention features methods that include interferometrically monitoring a distance between an interferometry assembly and a measurement object along each of three...
7362446 Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit  
A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a...
7349105 Method and apparatus for measuring alignment of layers in photolithographic processes  
According to a first embodiment of the invention, a first and second reticle are used to form layers using a photolithographic process. The first and second reticles each include a grating...
7330275 Method and system for determining the position and alignment of a surface of an object in relation to a laser beam  
The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment...
7289226 Characterization and compensation of errors in multi-axis interferometry systems  
In general, in one aspect, the invention features a method that includes monitoring a position of a stage along a first measurement axis and a second measurement axis of a multi-axis interferometry...
7277185 Method of measuring overlay  
In a method of measuring, in a lithographic manufacturing process using a lithographic projection apparatus, overlay between a resist layer, in which a mask pattern is to be imaged, and a...
7274464 Position measuring device  
A position measuring device for detecting the spatial position of a movable element in relation to a base body, the device including a linear measuring device that measures a distance between a...
7224469 Optical system alignment system and method with high accuracy and simple operation  
A system for aligning of optical components includes an interferometer and a first diffractive alignment element. A housing is used for positioning a first optical element being aligned. A detector...
7221460 Optical system in exposure apparatus, and device manufacturing method  
Disclosed is an optical system having a plurality of optical elements, for use in an optical instrument or a projection exposure apparatus, arranged to maintain a best optical performance by...
7202491 Method for sensing wafers located inside a closed wafer cassette  
Wafers in a cassette are mapped without having to open the cassette. The cassette is at least partially transparent to a particular type of radiation. A source of the radiation is directed into the...
7177031 Grating array systems having a plurality of gratings operative in a coherently additive mode and methods for making such grating array systems  
A plurality of gratings (G 1 , G 2 ) are arranged together with a wavefront sensor, actuators, and feedback system to align the gratings in such a manner, that they operate like a single, large,...
7141080 Method and apparatus for assembling an array of micro-devices  
The invention describes a method and apparatus for deploying micromachined actuators in a plane which is orthogonal to the original fabrication plane of the devices. Using batch-processing,...
7120514 Method and apparatus for performing field-to-field compensation  
The present invention provides for a method and an apparatus for performing field-to-field compensation during semiconductor manufacturing. At least one semiconductor device is processed. Metrology...
7101053 Multidirectional retroreflectors  
Multidirectional retroreflectors and methods of reflecting light beams from multiple directions are provided. The multidirectional retroreflectors utilize a four-mirror retroreflector with a common...
7084987 Method and system to interferometrically detect an alignment mark  
Coherent illumination is used to illuminate a symmetrical alignment mark with an image rotation interferometer producing two images of the alignment mark, rotating the images 1800 with respect to...
7079259 Optical alignment for a multi-mirror telescope  
A primary mirror 22 defines an active concave surface 24 , a first planar 40 and a first concave 42 alignment surfaces, each facing an active surface 30 defined by a secondary mirror 28 ....
7016049 Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method  
An alignment apparatus including a first position measuring device and a second position measuring device which measure position information of an object to be controlled, a switching device which...
7003200 PM fiber alignment  
The polarization axes of the ends of two PM fibers are aligned in an automatic fiber splicer by first making a linear alignment of the fiber ends ( 1, 1′ ) using movable retainers ( 21 ) the same...
6950194 Alignment sensor  
The present invention relates in general to detection of an alignment mark on a workpiece. More particularly, interferometry is applied to detect alignment signals from the surface of a workpiece...
6930783 Method of aligning optical system using a hologram and apparatus therefor  
A method of aligning an optical system and an optical system incorporating the method. A hologram element is installed in the optical system so that test beams diffracted by the hologram element...
6927861 Simple deterministic method for array based optical component packaging  
A method involves aligning each of two optical components to be joined relative to a common standard, removing the common standard, and joining each of two optical components to each other in...
6924897 Point source module and methods of aligning and using the same  
A point source module is provided, comprising: a Shack cube comprising a beam splitter cube with an attached spherical reference surface defining a reference arm; a test arm that is associated with...
6912054 Interferometric stage system  
an apparatus including: a support structure; a stage configured to move relative to the support structure; a first reflection surface carried by one of the support structure and the stage; and a...
6897963 Stage device and exposure apparatus  
A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is...
6888638 Interferometry system having a dynamic beam steering assembly for measuring angle and distance  
In one aspect, the invention features an angle-measuring interferometry system that includes an interferometer which during operation directs a measurement beam to contact a measurement object, the...
6882901 Ultra-precision robotic system  
A multiple degree-of-freedom ultra-precision (DOF) robotic system yielding either rigid body guidance or large deformation analysis (LDRS, i.e. semi-flexible and flexible robotics) is developed...
6864956 Dual phase grating alignment marks  
A method for aligning a substrate on a lithographic apparatus includes providing a substrate having a first plurality of grating marks optimized for a beam of a first given diffraction order and a...
6856931 Mark detection method and unit, exposure method and apparatus, and device manufacturing method and device  
In view of a specific area having a characteristic surface state in a mark-formed area or a surrounding area thereof, an area calculation unit has a window having a dimension corresponding to the...
6856404 Scanning exposure method and apparatus, and device manufacturing method using the same  
A scan type exposure for transferring a pattern onto a substrate by scan exposure. The apparatus includes a stage for moving the substrate in a Y direction corresponding to a scan direction, and in...
6847460 Alignment and correction template for optical profilometric measurement  
An electronic template delineating distinct selected patterns corresponding to predetermined regions of interest in a sample part is used to limit analysis to those regions. The surface of the...
6809827 Self referencing mark independent alignment sensor  
Coherent illumination is used to illuminate a symmetrical alignment mark with an image rotation interferometer producing two images of the alignment mark, rotating the images 1800 with respect to...
6778281 Phase shift fringe analysis method and apparatus using the same  
A phase shift fringe image analysis method comprises the steps of shifting an object to be observed and a reference relative to each other by using a phase shift device, obtaining fringe image data...
6738147 Autostigmatic far field simulator  
A far-field simulator (FFS) which can be accurately calibrated and verified to sub-wavelength optical precision under any applicable test conditions is described. The FFS can be used over a...
6707559 Method of detecting posture of object and apparatus using the same  
A method of detecting a posture of an object comprises the steps of acquiring fringe image data carrying phase information of the object; subjecting the whole or part of fringe image data to...
6618147 Aligning device for assembling microsystems  
Microsystems or micro-biotechnical components ( 1 ) are aligned, assembled, and dispensed onto a substrate ( 2 ). An image of a microsystem receiving region of the substrate is focused along hollow...
6603539 Method for detecting the spatial position of a tracking mirror and a mirror arrangement for carrying out said method  
In a laser tracking system equipped for interferometric distance measurement there are provided at least two retroreflectors ( 3.1, 3.2, 3.3 ) which are connected to the target tracking mirror ( 1...
6563592 Interferometric alignment device  
The interferometric alignment device is a small, compact device that can be attached to any two optical instruments that need to be aligned precisely in both pitch and yaw angles. The device...
6559955 Straightness measuring apparatus for moving stage  
An apparatus for measuring rectilinear motion and rotation angle errors of a rectilinearly moving body having a horizontal, parallel two-surface mirror positioned in a horizontal plane and...
6552798 Position detecting method and system for use in exposure apparatus  
A position detecting method and position detecting system, for measuring a position of a pattern formed on an object to be observed, for use in an exposure apparatus. The method includes providing...
Matches 1 - 50 out of 155 1 2 3 4 >