|
Match
|
Document |
Document Title |
|
|
7589843 |
Self referencing heterodyne reflectometer and method for implementing
A self referencing heterodyne reflectometer is disclosed which rapidly alternates between a heterodyne reflectometry (HR) mode, in which an HR beam comprised of s- and p-polarized beam components...
|
|
|
7586622 |
Measuring thickness of a device layer using reflectance and transmission profiles of baseline devices
A method for measuring a layer of a device is provided. In an embodiment, a set of baseline reflectance profiles may be generated from a corresponding set of baseline devices. Each of the baseline...
|
|
|
7580134 |
Method of measuring micro-structure, micro-structure measurement apparatus, and micro-structure analytical system
This invention provides a method and an apparatus of measuring a micro-structure, capable of evaluating a geometry of a micro-structure formed typically on the surface of a semiconductor substrate,...
|
|
|
7573582 |
Method for monitoring film thickness, a system for monitoring film thickness, a method for manufacturing a semiconductor device, and a program product for controlling film thickness monitoring system
A method monitors a thickness of a subject film deposited on an underlying structure, the underlying structure contains at least one thin film formed on a substrate. The method includes determining...
|
|
|
7551294 |
System and method for brewster angle straddle interferometry
A system and method for biomolecular sensing are disclosed. The system includes a receptor for a target, a source of p-polarized light positioned to direct light toward the receptor in a manner...
|
|
|
7545503 |
Self referencing heterodyne reflectometer and method for implementing
The present invention is directed to a self referencing heterodyne reflectometer system and method for obtaining highly accurate phase shift information from heterodyned optical signals, without...
|
|
|
7492467 |
Method and apparatus for measuring thickness and optical properties of a thin-film on a substrate
Various embodiments include a metrology tool comprising an emitter configured to emit an incident light beam at a production substrate including an ARL, a receiver configured to receive a reflected...
|
|
|
7483148 |
Ellipsometric investigation of very thin films
Use of spectroscopic data obtained by investigation of a witness sample having a relatively thick dielectric on a surface thereof during deposition of a thin film onto the witness sample and onto a...
|
|
|
7468799 |
Scanning interferometry for thin film thickness and surface measurements
A method including: providing a low coherence scanning interferometry data for at least one spatial location of a sample having multiple interfaces, wherein the data is collected using a low...
|
|
|
7443512 |
Apparatus and method for measurement of film thickness using improved fast fourier transformation
The present invention relates to an apparatus and method for a measurement of a film thickness using an improved fast Fourier transformation. The apparatus includes a light source, a light...
|
|
|
7439073 |
Kit for biochemical sensor and measuring apparatus
An object of the present invention is to provide a simple biochemical sensor making use of the light interference effect of an optical film which is capable of measuring binding of biochemical...
|
|
|
7411685 |
Spectrometric measuring instrument
Providing a spectrometric measuring instrument suitable for in-line measurement for example in a semiconductor manufacturing process, an FPD manufacturing process, or the like, by realizing size...
|
|
|
7394551 |
Vacuum ultraviolet referencing reflectometer
A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided...
|
|
|
7375360 |
Light device of arranging thin film inspection sensor array, and method and apparatus for arranging sensor array using the same
There is disclosed a light device for arranging a thin film pattern sensor array where a sensor array used for inspecting a thin film pattern is made to be arranged without a separate correction...
|
|
|
7372579 |
Apparatus and method for monitoring trench profiles and for spectrometrologic analysis
An apparatus for monitoring a trench profile of a substrate includes a radiation-emitting unit for irradiating the substrate with infrared radiation. The intensity and/or polarization state of the...
|
|
|
7365860 |
System capable of determining applied and anodized coating thickness of a coated-anodized product
A system for forming an anodized coating on at least a portion of a substrate thereby creating an anodized substrate is disclosed. The system includes a bath, a coating thickness monitor, at least...
|
|
|
7362448 |
Characterizing residue on a sample
A residue detection system collects at least one of the spectrum and image from a measurement region on a sample. Spectral analysis is performed on the collected spectrum to determine whether...
|
|
|
7339682 |
Heterodyne reflectometer for film thickness monitoring and method for implementing
The present invention is directed to a heterodyne reflectometer system and method for obtaining highly accurate phase shift information from heterodyned optical signals, from which extremely...
|
|
|
7333022 |
Safety monitoring mechanism of a wafer fabrication platform
A safety monitoring mechanism of a wafer fabrication platform is disclosed. The mechanism comprises a vibration sensor mounted at the loading apparatus of the wafer fabrication platform for...
|
|
|
7327468 |
Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films
In an opto-acoustic measuring device for thin films and solid surfaces, the probe beam is split into a first probe beam portion and a second reference beam portion. The splitting of the probe beam...
|
|
|
7321431 |
Method and system for analyzing low-coherence interferometry signals for information about thin film structures
Methods and systems are disclosed for analyzing a scanning interferometry signal. A scanning interferometry signal is provided that is produced by a scanning interferometer for a first location of...
|
|
|
7307735 |
Method for determining the depth of a buried structure
The present invention relates to a method for determining the depth of a buried structure in a semiconductor wafer. According to the invention, the layer behavior of the semiconductor wafer which...
|
|
|
7304744 |
Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light
A thin film thickness measurement apparatus that can measure immediately after film growth thickness of a thin film of a substrate that is grown includes a light receiving/projecting unit directing...
|
|
|
7301149 |
Apparatus and method for determining a thickness of a deposited material
Method and apparatus for determining a thickness of a deposited material. Energy is passed through the deposited material, wherein some of the energy is transmitted. The transmitted energy is...
|
|
|
7292349 |
Method for biomolecular sensing and system thereof
A sensing system and method for biomolecular sensing. The system includes: a receptor for the at least one target, the receptor including a substrate and a transparent coating on the substrate...
|
|
|
7286243 |
Beam profile complex reflectance system and method for thin film and critical dimension measurements
Device and method for measuring complex reflectance using a light source for generating a light beam with known polarization state, a lens for focusing the beam onto a sample surface such that...
|
|
|
7286242 |
Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same
The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by...
|
|
|
7277184 |
Method of characterization of liquid crystal cell
A method for simultaneous measuring a thickness of a liquid crystal layer and an average refractive index of the said liquid crystal in sealed liquid crystal cell is disclosed. The method is based...
|
|
|
7248372 |
Technologies for measuring thickness of an optical disc
The disclosure includes a system, device, apparatus and programmed medium of measuring thickness of an optical disc by using an interference effect of the optical disc layer. Such a system can...
|
|
|
7236253 |
Optical method measuring thin film growth
A method of determining the rate of change of optical thickness of a thin-film during deposition comprising the steps of illuminating the thin-film ( 5 ) with electromagnetic radiation ( 3 ) having...
|
|
|
7202954 |
Target detecting apparatus, target detection method and target detection substrate
A target detection apparatus is provided which can detect and quantitatively measure various detection targets such as pathogens. For this purpose, the apparatus comprises an optical irradiation...
|
|
|
7187453 |
Optical MEMS cavity having a wide scanning range for measuring a sensing interferometer
A method for measuring the cavity length of a remote sensing interferometer by locally replicating the state of the remote sensing interferometer by way of a local interferometer. The local...
|
|
|
7177030 |
Determination of thin film topography
A method and device for determining the topography of a thin film having a front surface and a back surface. The method comprises: irradiating the film with an incident coherent or partially...
|
|
|
7154611 |
Spin etcher with thickness measuring system
A spin etcher with a thickness measuring system includes a rotatable spin head, etchant supply means, and etchant supply controller. A substrate is mounted upon the spin head. The etchant supply...
|
|
|
7145662 |
Method for measuring thickness of an optical disc
A method of measuring thickness of an optical disc by using an interference effect of the optical disc layer is disclosed. The method includes detecting an intensity of a reflective light according...
|
|
|
7126697 |
Method and apparatus for determining endpoint of semiconductor element fabricating process
Standard patterns of differential values of interference light that correspond to a predetermined step height of the first material being processed and standard patterns of differential values of...
|
|
|
7119909 |
Film thickness and boundary characterization by interferometric profilometry
Two threshold parameters are used to identify the intensity modulation peaks corresponding to the interfaces of the two sides of a thin film with the adjacent media. The first parameter is used to...
|
|
|
7119908 |
Method and apparatus for measuring thickness of thin film and device manufacturing method using same
A manufacturing method and manufacturing device for high-precision thin film devices is disclosed, whereby the film thickness and film thickness distribution of a transparent film is measured to a...
|
|
|
7088456 |
Thin film thickness measurement using multichannel infrared sensor
A system and method for analyzing the characteristics of a thin film is provided. The current invention extends the capability of IR sensors to measure thin films through configuring a plurality of...
|
|
|
7057742 |
Frequency-scanning interferometer with non-specular reference surface
A frequency-scanning interferometer is modified to include a diffuse reference surface. An illuminating system produces an expanding measuring beam, portions of which reflect from a test object...
|
|
|
7057735 |
Method for measuring the optical and physical thickness of optically transparent objects
A method and apparatus for measuring the optical thickness and absolute physical thickness of an optically transparent object utilizes a reflective interferometric process. A broadband optical...
|
|
|
7019845 |
Measuring elastic moduli of dielectric thin films using an optical metrology system
An optical metrology system is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films such as silicon dioxide, other carbon doped oxides over...
|
|
|
7019844 |
Method for in-situ monitoring of patterned substrate processing using reflectometry.
A method of determining a parameter of interest during fabrication of a patterned substrate includes illuminating at least a portion of the patterned substrate with a normal incident light beam,...
|
|
|
7012699 |
Method of and apparatus for measuring thickness of thin film or thin layer
The present invention provides a method of measuring the thickness of a thin film or thin layer by a spectroscopic measurement, which is applicable to the measurement of a multiple layered film...
|
|
|
7012698 |
Method and arrangement for contactless determination of geometric and optical characteristics
A method is disclosed for contactless determination of product characteristics, particularly in continuous or discontinuous fabrication of layer systems formed of a plurality of layers with...
|
|
|
7009715 |
Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed
Standard patterns of differential values of interference light that correspond to a predetermined step height of the first material being processed and standard patterns of differential values of...
|
|
|
7009714 |
Method of dry etching a sample and dry etching system
A process recipe is controlled by processing reflection interference light on the surface of a wafer with a signal and etching is carried out by suppressing an increase in the surface roughness of...
|
|
|
7002693 |
Thickness measurement method and apparatus
A monochromatic light is cast on a thin layer, and the intensity of the reflected light which is an interference light of the lights reflected by the front surface and back surface of the layer. A...
|
|
|
6985237 |
Method for determining layer thickness ranges
The invention concerns a method for the determination of layer thickness ranges of layers of a specimen, in which the reflection spectrum of the specimen is measured in a specified wavelength range...
|
|
|
6930782 |
End point detection with imaging matching in semiconductor processing
An end point detection system may compare a production image developed during processing of production semiconductor wafer with a reference image. The reference image is representative of a desired...
|