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6900900 |
Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements
A high-resolution and high-speed film thickness and thickness uniformity measurement method is disclosed in this invention. The disclosed method includes a step a) of measuring a film thickness at...
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6888639 |
In-situ film thickness measurement using spectral interference at grazing incidence
A method and system using spectral interference of light from plasma emissions collected at near grazing incidence to in-situ monitor and control the film thickness of a non-opaque film....
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6885446 |
Method and system for monitoring a process of material removal from the surface of a patterned structure
A method and system are presented for use in controlling a process of material removal from the surface of a patterned structure, by measuring at least one of residue, erosion, dishing and...
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6878301 |
Methods and apparatuses for trench depth detection and control
A method for optically detecting a trench depth includes detecting a first maxima in an intensity of multi-wavelength light. A portion of the multi-wavelength light is reflected from a top trench...
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6826511 |
Method and apparatus for the determination of layer thicknesses
A method and apparatus for determination of layer thicknesses and optical parameters of a number of layers of a specimen, in which the reflectance spectrum of the specimen is measured and then...
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6806970 |
Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same
This invention aims to measure film thickness and film thickness distribution to high precision in a wide range of transparent films. As one example, in a CMP process, the film thickness of an...
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6801322 |
Method and apparatus for IN SITU measuring a required feature of a layer during a polishing process
The invention relates to a method for measuring a required feature of a thin layer ( 4 ) used in a polishing process that is carried out by a polish head by producing a localized temperature rise...
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6801321 |
Method and apparatus for measuring lateral variations in thickness or refractive index of a transparent film on a substrate
A method or apparatus for measuring lateral variations of a property such as thickness or refractive index of a transparent film on a semiconductor, in a region of repeated patterning comprises:...
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6757067 |
Fringe pattern discriminator for grazing incidence interferometer
Flatness and thickness variation information concerning transmissive plane-parallel test plates is obtained from a grazing incidence interferometer modified to distinguish between superimposed...
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6741362 |
Method, system, and computer program product for determining refractive index distribution
The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity...
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6734977 |
Method and apparatus for measuring gap, and method and apparatus for measuring shape and method for manufacturing liquid crystal device
The present invention provides an apparatus comprising a wavelength variable light source for shifting a wavelength of light stepwise within a predetermined range and applying the light with the...
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6717677 |
Film defect inspection method for a film formed on a substrate
It is an object of the invention to inspect defects of a film formed on a relatively rough surface of a substrate by the light interference method. A substrate on which a film is formed is...
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6687014 |
Method for monitoring the rate of etching of a semiconductor
A method of measuring the rate of etching of trenches on a substrate using interferometry is provided. The method comprises transmitting onto the substrate incident electromagnetic radiation having...
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6678055 |
Method and apparatus for measuring stress in semiconductor wafers
Integrated measurement apparatus and method for measuring layer thickness and bow in a wafer. The apparatus comprises: a monochromatic light source, a white light source, a first switch for...
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6654129 |
Film thickness testing apparatus and method
To provide a film thickness testing apparatus and a film thickness testing method in which coherence between light reflected from the surface of a film and light reflected from the surface of a...
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6645045 |
Method of measuring thickness of a semiconductor layer and method of manufacturing a semiconductor substrate
The disclosed method of measuring the thickness of an active layer of an SOI substrate maintains the accuracy of previous methods but can be performed quickly and during processing of the...
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6639682 |
System of fabricating plane parallel substrates with uniform optical paths
Process and apparatus for automated production of optical devices comprising two plane parallel optical surfaces of a desired optical performance for transmitted light, by measuring and quantifying...
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6636322 |
Method and device for measuring cell gap of liquid crystal display using near-IR radiation
A method and device for measuring cell gap of a liquid crystal display, the display comprising a pair of substrates with electrodes adhered together forming a predetermined sized cell gap. The...
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6594025 |
Method of monitoring thin-film processes and metrology tool thereof
The present invention provides a method for monitoring a modifying-process taking place in a thin-film sample and thereby characterizing the sample thus modified, wherein the modifying-process is...
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6594002 |
Wafer shape accuracy using symmetric and asymmetric instrument error signatures
A method to determine the systematic error of an instrument that measures features of a semiconductor wafer includes the following sequential steps. Collecting sensor data from measurement runs on...
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6459488 |
Diffuse reflectance method and apparatus for determining thickness of an infrared translucent layer
A method for producing an interferogram of an infrared translucent layer that is on a reflective substrate, comprising generating parallel infrared interferometer beams by means of an infrared...
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6392756 |
Method and apparatus for optically determining physical parameters of thin films deposited on a complex substrate
A method and an apparatus for optically determining a physical parameter such as thickness t, index of refraction n, extinction coefficient k or a related physical parameter such as energy bandgap...
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6275297 |
Method of measuring depths of structures on a semiconductor substrate
A method and apparatus are provided for measuring a depth geometry of a structure on a semiconductor substrate including a plurality of recessed and non-recessed portions, wherein one of the...
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6252670 |
Method for accurately calibrating a constant-angle reflection-interference spectrometer (CARIS) for measuring photoresist thickness
A method is described for determining more accurate Cauchy coefficients for a constant-angle reflection-interference spectrometer (CARIS). This allows photoresist thicknesses for product wafers to...
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6246475 |
Measuring apparatus of flying height of magnetic head
An apparatus characterized by disposing a magnetic head 20 at one side of a transparent disk 10, and light emitting means 11 and light detecting means 12 at other side, for measuring the flying...
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6166819 |
System and methods for optically measuring dielectric thickness in semiconductor devices
A method for optically measuring layer thickness in accordance with the present invention includes the steps of providing a first metal layer on a semiconductor device structure, providing a second...
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6166818 |
Interference measurement apparatus, interference measurement probe and interference measurement control system
An optical system is fabricated in the form of one device, so that the simplified optical system is realized. A displacement is measured with a high resolving power utilizing an interference...
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6028669 |
Signal processing for in situ monitoring of the formation or removal of a transparent layer
The deposition material on, or removal of material from, an article, such as on an exposed surface of an intermediate integrated circuit structure, is optically monitored. The processes that are so...
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5999262 |
Process and apparatus for detecting structural changes of specimens
A process and a device are described for detecting physical, chemical, biological or biochemical reactions and interactions on biochemically or chemically functionalized specimen carriers in the...
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5982489 |
Method and apparatus for measuring depth of a depression in a pattern by light interference from crossed light beams
A depth-measurement is disclosed for highly accurately measuring the depth (step difference) of depressions in a pattern in which depressions and protrusions periodically repeat, as in, e.g. a fine...
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5956142 |
Method of end point detection using a sinusoidal interference signal for a wet etch process
A process for monitoring and determining the end point of a wet etch process for removing a thin solid film 116 from a substrate by directing a light beam onto the substrate and monitoring the...
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5923429 |
Apparatus for monitoring in-situ the thickness of a film during film deposition and a method thereof
A film deposition apparatus and a method thereof for accurately forming a film of a given thickness on the surface of a wafer is described. The film deposition apparatus includes a laser beam to...
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5909282 |
Interferometer for measuring thickness variations of semiconductor wafers
Thickness variations of semiconductor wafers are measured by interfering two beams of infrared light that are relatively modified by reflections from opposite side surfaces of the wafers. Non-null...
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5838448 |
CMP variable angle in situ sensor
A chemical-mechanical polishing (CMP) optical process monitor apparatus allows in situ measurement of the thickness of a thin film being polished. As the incidence angle of the incident light on...
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5729343 |
Film thickness measurement apparatus with tilting stage and method of operation
A film measurement apparatus having a stage with a support surface on which a substrate coated with a film may rest. An extended light source faces the stage, and an imager is aimed at the stage to...
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5696583 |
Apparatus for automatically measuring the thickness of a transparent coating material using a white light source
An apparatus for measuring a thickness of a coating formed on a surface of a component member includes a white light source for emitting a light beam to be reflected by the surface of the member,...
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5657124 |
Method of measuring the thickness of a transparent material
A method and apparatus for measuring the thickness of a transparent material. A light beam from a laser diode has a modulated optical frequency. The emitted light shines on opposite surfaces of a...
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5650851 |
Speckle interference method for remote thickness measurement of a sheet and layer and an apparatus therefor
A method and an apparatus are disclosed for remotely determining the thickness of a transparent or semi-transparent suspended sheet or solid or liquid layer, e.g. ice, on a solid surface which is...
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5644562 |
Method and apparatus for measuring and compensating birefringence in rotating disks
An apparatus and method for measuring and compensating for birefringence in a rotating ground glass disk (20) such as are employed in polarization based optical flying height testers. The polarized...
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5619329 |
Contactless thickness measuring apparatus and measuring method for the same
A contactless thickness measuring apparatus for measuring the thickness of an object includes a light source emitting a variable-frequency light beam, an oscillating center wavelength of which is...
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5587792 |
Apparatus and method for measuring thickness of thin semiconductor multi-layer film
An interference waveform dispersion spectrum of light reflected from a multi-layer film is compared to a waveform obtained by numerical calculation using an optical characteristic matrix....
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5555471 |
Method for measuring thin-film thickness and step height on the surface of thin-film/substrate test samples by phase-shifting interferometry
The film thickness and surface profile of a test sample consisting of optically dissimilar regions are measured by phase-shifting interferometry. Conventional phase-shifting interferometry at a...
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5555472 |
Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures
The thicknesses of a first layer and of a second layer on a semiconductor wafer can be measured together by assuming that the second layer has a substantially uniform thickness. The thicknesses are...
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5543919 |
Apparatus and method for performing high spatial resolution thin film layer thickness metrology
An apparatus (2) that performs high resolution thickness metrology on a thin film layer of a wafer (24), includes a filtered white light source that forms a collimated monochromatic light beam...
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5523840 |
Method and apparatus for measuring the thicknesses of layers of a multiple layer semiconductor film utilizing the comparison between a spatialgram and an optical characteristic matrix
An interference waveform dispersion spectrum of light reflected from a multi-layer film is compared to a waveform obtained by numerical calculation using an optical characteristic matrix....
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5513533 |
Detection of vibrational energy via optical interference patterns
A method and apparatus for sensing and measuring vibrational energy in a structure subject to vibrations is described. The method comprises the steps of applying a thin transparent film material...
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5465154 |
Optical monitoring of growth and etch rate of materials
A reflective method for monitoring the etch rate or growth rate of a material, such as a semiconductor material, that may be initially at least partly covered by another layer of a different...
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5452953 |
Film thickness measurement of structures containing a scattering surface
Systems for making thickness measurements in a thin film structure using an incoherently or coherently coupled structured surface. A system is used to measure the thickness of a thin film layer of...
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5451480 |
Artical fabrication utilizing lithographic processes
A procedure for producing an article such as an integrated circuit or a lithographic mask including the step of exposing and developing a resist material during a lithographic process is...
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5450205 |
Apparatus and method for real-time measurement of thin film layer thickness and changes thereof
A new technique has been developed to measure etching or deposition rate uniformity in situ using a CCD camera which views the wafer during plasma processing. The technique records the temporal...
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