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7612891 Measurement of thin films using fourier amplitude  
Thin-film thickness and refractive index are measured using the Fourier amplitude of a broadband interferometric spectrum. Due to the smooth nature of the Fourier amplitude as a function of...
7545510 Method of characterizing transparent thin-films using differential optical sectioning interference microscopy  
An imaging, differential optical sectioning interference microscopy (DOSIM) system and method for measuring refractive indices and thicknesses of transparent thin-films. The refractive index and...
7522287 Photothermal conversion measurement apparatus, photothermal conversion measurement method, and sample cell  
A liquid sample is irradiated with excitation light and measurement light, and a measurement position at which a traveling path of the measurement light passes through an excitation section of the...
7495772 Multi-cavity Fabry-Perot interferometric thin-film sensor with built-in temperature compensation  
A fiber optic sensor includes at least two Fabry-Perot (FP cavities) defined by at least three partially reflecting surfaces which individually and together are capable of generating different...
7492465 Method for determining optimal resist thickness  
In an example embodiment, there is a method ( 600 ) for determining an approximately optimal resist thickness comprising providing a first substrate coated with a resist film having a first...
7477408 System and method for thickness measurement  
A system and a method for thickness measurement that comprises providing a first confocal microscope, emitting a first light beam from the first confocal microscope in a first direction, focusing...
7471396 Dual polarization interferometers for measuring opposite sides of a workpiece  
An optical interferometer ( 100 ) includes a first optical interferometer ( 200 ) disposed on a front surface side of a workpiece (W) and a second optical interferometer ( 300 ) disposed on a rear...
7466428 Method of measuring thickness of thin layer in semiconductor device and apparatus for performing method  
A method of measuring the thickness of a thin layer formed on a substrate comprises generating a measured signal spectrum by reflecting a light off of the thin layer and analyzing a resulting...
7446881 System, apparatus, and method for determining temperature/thickness of an object using light interference measurements  
A measuring apparatus including a light source that emits light with a wavelength that allows the light to be transmitted through and reflected at each measurement target, a splitter that splits...
7426039 Optically balanced instrument for high accuracy measurement of dimensional change  
An instrument for measuring dimensional changes in materials, such as ultra-low thermal expansion materials, contains an optically balanced measuring loop. Both an object beam and a loop beam...
7417743 Interferometry systems and methods  
In general, in a first aspect, the invention features apparatus that include an interferometer having a main cavity and an auxiliary reference surface, the main cavity including a primary reference...
7411684 Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method  
A system including: a film thickness measuring apparatus for measuring a film thickness of a member to be processed, including: a differential waveform pattern data base for holding a standard...
7403288 Method and apparatus for measuring thickness of thin article  
An apparatus ( 100 ) for measuring a thickness of a thin article according to an embodiment of the present apparatus is provided. The apparatus includes an optical fiber interferometer ( 101 ), a...
7403323 Process control monitors for interferometric modulators  
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide...
7403289 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures  
A method including: imaging test light emerging from a test object over a range of angles to interfere with reference light on a detector, wherein the test and reference light are derived from a...
7400411 Method for optically testing semiconductor devices  
A method for optically testing semiconductor devices or wafers using a holographic optical interference system with a light source providing a light beam of coherent wavelength with a wavelength to...
7387027 Characterization of materials with optically shaped acoustic waveforms  
A method for characterizing one or more properties of a sample using acoustic waveforms is disclosed, and comprises directing a sequence of at least three optical pulses to the sample to generate...
7379189 Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method  
In the apparatus according to the present invention, light from a light source is split into measurement light and reference light, the optical path length of the reference light is altered and a...
7365860 System capable of determining applied and anodized coating thickness of a coated-anodized product  
A system for forming an anodized coating on at least a portion of a substrate thereby creating an anodized substrate is disclosed. The system includes a bath, a coating thickness monitor, at least...
7353141 Method and system for monitoring component consumption  
A method for monitoring consumption of a component, including the steps of emitting a radiation beam onto a first area of the component and detecting a portion of the radiation beam that is...
7327467 Phase measuring method and apparatus for measuring characterization of optical thin films  
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object...
7301645 In-situ critical dimension measurement  
A method of monitoring a critical dimension of a structural element in an integrated circuit is provided comprising the following steps: collecting an optical interference endpoint signal produced...
7298492 Method and system for on-line measurement of thickness and birefringence of thin plastic films  
A system and method for analyzing the characteristics of a thin film is provided whereby the in-plane birefringence of thin films is determined by measuring the interference fringes in the...
7259866 Semiconductor fabricating apparatus with function of determining etching processing state  
A semiconductor fabricating apparatus for etching a semiconductor wafer, which is placed in a chamber and which has a multiple-layer film composed of a first film formed on a surface thereof and a...
7251043 Method and system for measuring thin films  
An optical system is presented for use in a measurement system ( 100 ) for use in measurements of thin films of a workpiece (W), the system comprising an optical assembly ( 14 ), comprising...
7239397 Device for high-accuracy measurement of dimensional changes  
Thermal expansion characteristics of test materials of ultra-low thermal expansion material are measured with a test beam that is split into a test material-measuring portion and an...
7233401 Method and apparatus for measuring thickness of a material  
A method and apparatus for measuring wafers, thin films, or other planar layers are disclosed. This invention utilizes a tunable, monochromatic light source reflected from or transmitted through...
7206076 Thickness measurement of moving webs and seal integrity system using dual interferometer  
A system and method for measuring the thickness of materials and coatings across a moving length of material such as sheet, film, or web by the use of non-contact optical interferometry is...
7206074 Apparatus and method for measuring spectral reflectance and apparatus for measuring film thickness  
A film thickness measurement apparatus has an image pickup part ( 32 ) for acquiring a plurality of single-band images corresponding to a plurality of wavelengths, and the image pickup part ( 32 )...
7193724 Method for measuring thickness of thin film-like material during surface polishing, and surface polishing method and surface polishing apparatus  
A thickness of a wafer during polishing operation is detected to accurately perform the polishing. A thickness measuring method, which measures the thickness of the wafer of wafer 7 in polishing...
7173715 Reduced coherence symmetric grazing incidence differential interferometer  
A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a diffraction grating that widens and passes nth order...
7164481 Coefficient of linear expansion measuring apparatus and coefficient of linear expansion measuring method  
A coefficient of linear expansion measuring apparatus includes: two reflection plates between which a sample is put, a container to house them, which is filled with a gas having known rate of a...
7158240 Measurement device and method  
Apparatus for determining the thickness of a configuration having flat, parallel surfaces that are transparent, or nearly so, to pre-specified types of energy. Embodiments comprise a mechanism for...
7139081 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures  
A method including: imaging test light emerging from a test object over a range of angles to interfere with reference light on a detector, wherein the test and reference light are derived from a...
7133137 Integrated scanning and ocular tomography system and method  
Systems and methods of the present invention measure at least one reflecting surface of an object disposed along an optical path. In some embodiments a measured optical interference signal for each...
7116429 Determining thickness of slabs of materials by inventors  
A method and apparatus for determining the thickness of slabs of materials using an interferometer.
7116428 Method and device for measuring wall thickness of a pipe in a pipe-rolling mill  
A method and device for measuring the wall thickness of a pipe in a pipe-rolling mill wherein a Fabry-Pérot interfero-meter has its mirror spacing set by providing an input to a linear activity...
7057735 Method for measuring the optical and physical thickness of optically transparent objects  
A method and apparatus for measuring the optical thickness and absolute physical thickness of an optically transparent object utilizes a reflective interferometric process. A broadband optical...
7042581 Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers  
A characteristic of a surface is measured by illuminating the surface with optical radiation over a wide angle and receiving radiation reflected from the surface over an angle that depends on the...
7030998 Phase measurement apparatus for measuring characterization of optical thin films  
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object...
7012699 Method of and apparatus for measuring thickness of thin film or thin layer  
The present invention provides a method of measuring the thickness of a thin film or thin layer by a spectroscopic measurement, which is applicable to the measurement of a multiple layered film...
6999180 Optical film topography and thickness measurement  
An apparatus capable of measuring topography and transparent film thickness of a patterned metal-dielectric layer on a substrate without contact with the layer. A broadband interferometer measures...
6982796 Wavefront splitting element for EUV light and phase measuring apparatus using the same  
A wavefront splitting element includes a diffraction grating for splitting light into multiple beams including transmitting light and reflected light.
6963407 Process end point detection apparatus and method, polishing apparatus, semiconductor device manufacturing method, and recording medium recorded with signal processing program  
A detection apparatus for detecting the process end point in the removal process of a layer on a wafer in an IC or other semiconductor device manufacturing process. This point can be detected...
6952231 Apparatus based on a telecentric imaging system for forming an image of a linear zone of an object  
The invention relates to an apparatus based on the telecentric imaging system for forming an image of a linear zone ( 17 ) of an object ( 1 ). The apparatus comprises a non-telecentric camera ( 9 )...
6950193 System for monitoring substrate conditions  
A system for determining at least one condition of a substrate includes an optical waveguide for transmitting light from a light source. The optical waveguide can be embedded in the substrate and...
6940604 Thin-film inspection method and device  
Disclosed is a thin-film inspection device with two or more light sources. This device can control the wavelength and intensity of light and illuminate the lights with different incident angles,...
6900900 Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements  
A high-resolution and high-speed film thickness and thickness uniformity measurement method is disclosed in this invention. The disclosed method includes a step a) of measuring a film thickness at...
6897964 Thickness measuring apparatus, thickness measuring method, and wet etching apparatus and wet etching method utilizing them  
At each measurement time, measurement light is supplied from a measurement light source 11 , and interference light obtained when reflected light from a semiconductor wafer W and reference light...
6888639 In-situ film thickness measurement using spectral interference at grazing incidence  
A method and system using spectral interference of light from plasma emissions collected at near grazing incidence to in-situ monitor and control the film thickness of a non-opaque film....
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